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1. 发明授权

US4788473A Plasma generating device with stepped waveguide transition 失效
标题翻译：等离子体发生器件，具有阶梯式波导过渡
公开(公告)号：US4788473A
公开(公告)日：1988-11-29
申请号：US63972
申请日：1987-06-19
申请人： Haruhisa Mori , Motoo Nakano , Yoshinobu Ono , Takashi Igarashi , Masanao Hotta
发明人： Haruhisa Mori , Motoo Nakano , Yoshinobu Ono , Takashi Igarashi , Masanao Hotta
IPC分类号： H01J27/18 , H01J37/08 , H01J37/32 , H01J3/04
CPC分类号： H01J37/32229 , H01J27/18 , H01J37/08
摘要： A plasma generating device comprises:a rectangular wave guide for transmitting microwaves, wherein the width of the plasma generating device is decreased in the direction of an electrical field of the microwaves; a plasma generating chamber wherein plasma is generated by absorbing, in a gas, microwave energy transmitted by the rectangular wave guide, and a part of the plasma generating chamber has a rectangular cross-section taken along the plane perpendicular to the microwave propagation direction. A magnetic field generating device is provided having the same axial direction as the direction of propagation of the microwaves and applies a magnetic field having an Electron Cyclotron Resonance intensity to the plasma generating chamber. The magnetic field generating device is provided at least one location outside of the direction of the microwave electrical field direction, and a dielectric window is provided between the rectangular wave guide and the plasma generating chamber to realize a vacuum seal of the plasma generating chamber.
摘要翻译：一种等离子体产生装置包括：用于传输微波的矩形波导，其中所述等离子体产生装置的宽度在所述微波的电场方向上减小; 等离子体产生室，其中通过在气体中吸收由矩形波导传输的微波能量而产生等离子体，并且等离子体产生室的一部分具有沿着与微波传播方向垂直的平面截取的矩形截面。提供具有与微波传播方向相同轴向的磁场产生装置，并向等离子体产生室施加具有电子回旋共振强度的磁场。磁场产生装置设置在微波电场方向外的至少一个位置处，并且在矩形波导和等离子体发生室之间设置介质窗，以实现等离子体发生室的真空密封。

2. 发明授权

US06605811B2 Electron beam lithography system and method 有权
标题翻译：电子束光刻系统及方法
公开(公告)号：US06605811B2
公开(公告)日：2003-08-12
申请号：US09986485
申请日：2001-11-09
申请人： Masanao Hotta , Yasuhiko Kojima , Takaomi Ito , Katsumi Yokota , Tetsuyuki Okabayashi , Akio Otani , Susumu Ono
发明人： Masanao Hotta , Yasuhiko Kojima , Takaomi Ito , Katsumi Yokota , Tetsuyuki Okabayashi , Akio Otani , Susumu Ono
IPC分类号： G01N2300
CPC分类号： H01J37/1472 , H01J2237/3175
摘要： In an electron beam lithography system, an outputted main signal is applied directly to deflection plates, whereas an outputted auxiliary signal is applied to the deflection plate through a capacitive coupling for writing a wide strip-like pattern accurately at a high speed. In the electron beam lithography system, a deflection signal is divided into a main signal having a low frequency and a large amplitude and an auxiliary signal having a high frequency and a small amplitude. The main signal is applied directly to deflection plates, and the auxiliary signal is applied to the deflection plate through a capacitor. In the case of writing a straight line having a certain width, and a solid graphic pattern, because the electron beam is deflected in a given direction and a given width by the use of the auxiliary signal in synchronism with one sweeping cycle based on the main signal, a line whose width is as wide as may times of the electron beam diameter can be written, and a graphic pattern having a certain width can be written at a high speed.
摘要翻译：在电子束光刻系统中，输出的主信号直接施加到偏转板，而输出的辅助信号通过电容耦合施加到偏转板，用于以高速准确地写入宽的带状图案。在电子束光刻系统中，偏转信号被分成具有低频和大振幅的主信号以及具有高频和小振幅的辅助信号。主信号直接施加到偏转板，辅助信号通过电容器施加到偏转板上。在写入具有一定宽度的直线和固体图形的情况下，因为电子束通过使用辅助信号以给定方向偏转并且给定的宽度与基于主要的一个扫描周期同步地信号，可以写入其宽度与电子束直径的宽度一样宽的线，并且可以高速写入具有一定宽度的图形。

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