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1. 发明授权

US06605811B2 Electron beam lithography system and method 有权
标题翻译：电子束光刻系统及方法
公开(公告)号：US06605811B2
公开(公告)日：2003-08-12
申请号：US09986485
申请日：2001-11-09
申请人： Masanao Hotta , Yasuhiko Kojima , Takaomi Ito , Katsumi Yokota , Tetsuyuki Okabayashi , Akio Otani , Susumu Ono
发明人： Masanao Hotta , Yasuhiko Kojima , Takaomi Ito , Katsumi Yokota , Tetsuyuki Okabayashi , Akio Otani , Susumu Ono
IPC分类号： G01N2300
CPC分类号： H01J37/1472 , H01J2237/3175
摘要： In an electron beam lithography system, an outputted main signal is applied directly to deflection plates, whereas an outputted auxiliary signal is applied to the deflection plate through a capacitive coupling for writing a wide strip-like pattern accurately at a high speed. In the electron beam lithography system, a deflection signal is divided into a main signal having a low frequency and a large amplitude and an auxiliary signal having a high frequency and a small amplitude. The main signal is applied directly to deflection plates, and the auxiliary signal is applied to the deflection plate through a capacitor. In the case of writing a straight line having a certain width, and a solid graphic pattern, because the electron beam is deflected in a given direction and a given width by the use of the auxiliary signal in synchronism with one sweeping cycle based on the main signal, a line whose width is as wide as may times of the electron beam diameter can be written, and a graphic pattern having a certain width can be written at a high speed.
摘要翻译：在电子束光刻系统中，输出的主信号直接施加到偏转板，而输出的辅助信号通过电容耦合施加到偏转板，用于以高速准确地写入宽的带状图案。在电子束光刻系统中，偏转信号被分成具有低频和大振幅的主信号以及具有高频和小振幅的辅助信号。主信号直接施加到偏转板，辅助信号通过电容器施加到偏转板上。在写入具有一定宽度的直线和固体图形的情况下，因为电子束通过使用辅助信号以给定方向偏转并且给定的宽度与基于主要的一个扫描周期同步地信号，可以写入其宽度与电子束直径的宽度一样宽的线，并且可以高速写入具有一定宽度的图形。

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