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1. 发明授权

US4001010A Method for processing reduced iron 失效
标题翻译：加工减少铁的方法
公开(公告)号：US4001010A
公开(公告)日：1977-01-04
申请号：US500684
申请日：1974-08-26
申请人： Kenjiro Kanbara , Masayuki Hattori , Satoru Miyasita , Masaaki Iguchi , Jihei Yoda
发明人： Kenjiro Kanbara , Masayuki Hattori , Satoru Miyasita , Masaaki Iguchi , Jihei Yoda
IPC分类号： C21B13/00 , C21B13/02
CPC分类号： C21B13/0073 , C21B13/0086 , Y02P10/122 , Y02P10/136
摘要： Method and apparatus for processing reduced iron in which granular iron oxide charged into a vertical furnace is reduced by a reducing gas comprising mainly carbon monoxide and hydrogen, a substantial portion of the waste gas generated in the reduction process being regenerated in a recirculating system. The reduced iron which has been reduced in the vertical furnace is continuously discharged at a temperature above 500.degree. C under isolation from the exterior atmosphere and is received in a plurality of air tight, sealable component adjusting receptacles. The reduced iron received in the receptacles is subjected to component adjustment at a temperature ranging from 700.degree. to 1100.degree. C by using the regenerated reducing gas and, thereafter, it is discharged from the receptacles under isolation from the exterior atmosphere so as to be received in air tight sealable cooling receptacles thereby cooling the same to a temperature lower than 100.degree. C, the reduced iron being thereafter discharged from the receptacles.

2. 发明授权

US3947234A Method of raising the temperature of reducing gas containing CO component 失效
标题翻译：提高包含CO成分气体温度的方法
公开(公告)号：US3947234A
公开(公告)日：1976-03-30
申请号：US496026
申请日：1974-08-08
申请人： Kenjiro Kanbara , Masayuki Hattori , Jihei Yoda
发明人： Kenjiro Kanbara , Masayuki Hattori , Jihei Yoda
IPC分类号： C21B5/00 , C21B13/00
CPC分类号： C21B5/001
摘要： A method of raising the temperature of a reducing gas containing a CO component for avoiding the problems caused by soot inevitably generated in raising the temperature of the reducing gas. In heating the reducing gas to a temperature higher than 500.degree.C, the rate of raising the temperature of the reducing gas is kept higher than 350.degree.C/sec. during the time the temperature of the gas is being raised through the range of 500.degree. - 750.degree.C, while the flow velocity of the reducing gas is kept higher than 7 m/sec.

3. 发明授权

US08437426B2 Receiving apparatus, receiving method, and program 有权
标题翻译：接收装置，接收方法和程序
公开(公告)号：US08437426B2
公开(公告)日：2013-05-07
申请号：US12567856
申请日：2009-09-28
申请人： Hidetoshi Kawauchi , Masayuki Hattori , Toshiyuki Miyauchi , Takashi Yokokawa , Kazuhiro Shimizu , Kazuhisa Funamoto
发明人： Hidetoshi Kawauchi , Masayuki Hattori , Toshiyuki Miyauchi , Takashi Yokokawa , Kazuhiro Shimizu , Kazuhisa Funamoto
IPC分类号： H04B1/38 , H04N7/12 , H04L27/00
CPC分类号： H04L27/2662 , H04L25/0232 , H04L25/03159 , H04L27/2656 , H04L27/2665
摘要： Disclosed herein is a receiving apparatus including: first to third position determination sections configured to determine the start position of an FFT interval which serves as a signal interval targeted for FFT by an FFT section; a selection section configured to select one of those start positions of the FFT interval which are determined by the first through the third position determination section; and the FFT section configured to perform FFT on the OFDM time domain signal by regarding the start position selected by the selection section as the start position of the FFT interval in order to generate the first OFDM frequency domain signal.
摘要翻译：本发明公开了一种接收装置，包括：第一至第三位置确定部分，被配置为确定FFT间隔的起始位置，其作为由FFT部分进行FFT的信号间隔; 选择部，被配置为选择由所述第一至第三位置确定部确定的所述FFT间隔的那些起始位置之一; FFT部，被配置为通过将由选择部选择出的开始位置作为FFT间隔的开始位置，对OFDM时域信号进行FFT，以生成第一OFDM频域信号。

4. 发明授权

US07929628B2 OFDM receiver and OFDM signal receiving method 失效
标题翻译： OFDM接收机和OFDM信号接收方法
公开(公告)号：US07929628B2
公开(公告)日：2011-04-19
申请号：US11900636
申请日：2007-09-11
申请人： Hidetoshi Kawauchi , Masayuki Hattori
发明人： Hidetoshi Kawauchi , Masayuki Hattori
IPC分类号： H04L27/28
CPC分类号： H04L25/0234 , H04L25/0216 , H04L25/022 , H04L25/0222 , H04L25/025 , H04L25/03159 , H04L27/2647 , H04L2025/03414
摘要： An OFDM receiver may include OFDM-signal receiving means for receiving an orthogonal frequency division multiplexing (OFDM) signal; channel-characteristic estimating means for estimating a channel characteristic using pilot signals in the OFDM signal received by the OFDM-signal receiving means; and transmission-distortion compensating means for applying, on the basis of the channel characteristic estimated by the channel-characteristic estimating means, processing for compensating for transmission distortion to the OFDM signal received by the OFDM-signal receiving means. The channel-characteristic estimating means may include plural kinds of time-direction-channel estimating means used for the estimation of a channel characteristic, and switching control means for switching these estimating means according to a state of a channel.
摘要翻译： OFDM接收机可以包括用于接收正交频分复用（OFDM）信号的OFDM信号接收装置; 信道特性估计装置，用于使用由OFDM信号接收装置接收的OFDM信号中的导频信号来估计信道特性; 以及发送失真补偿装置，用于根据由信道特性估计装置估计的信道特性，应用用于补偿由OFDM信号接收装置接收的OFDM信号的发送失真的处理。信道特性估计装置可以包括用于估计信道特性的多种时间 - 方向信道估计装置，以及根据信道状态切换这些估计装置的切换控制装置。

5. 发明申请

US20100303186A1 Synchronization circuit, synchronization method, and reception system 有权
标题翻译：同步电路，同步方法和接收系统
公开(公告)号：US20100303186A1
公开(公告)日：2010-12-02
申请号：US12662669
申请日：2010-04-28
申请人： Masayuki Hattori , Tetsuhiro Futami , Yuichi Hirayama , Keita Izumi
发明人： Masayuki Hattori , Tetsuhiro Futami , Yuichi Hirayama , Keita Izumi
IPC分类号： H04L7/00 , H03L7/06
CPC分类号： H03L7/22 , H03L7/093
摘要： Disclosed herein is a synchronization circuit including: a first phase-locked loop circuit; a second phase-locked loop circuit; a first output circuit; a second output circuit; a first detection circuit; a second detection circuit; and a control circuit.
摘要翻译：这里公开了一种同步电路，包括：第一锁相环电路; 第二锁相环电路; 第一输出电路; 第二输出电路; 第一检测电路; 第二检测电路; 和控制电路。

6. 发明申请

US20090158127A1 DECODING APPARATUS AND DECODING METHOD 失效
标题翻译：解码设备和解码方法
公开(公告)号：US20090158127A1
公开(公告)日：2009-06-18
申请号：US12335802
申请日：2008-12-16
申请人： Toshiyuki MIYAUCHI , Masayuki Hattori , Takashi Yokokawa
发明人： Toshiyuki MIYAUCHI , Masayuki Hattori , Takashi Yokokawa
IPC分类号： H03M13/05 , G06F11/07
CPC分类号： H03M13/15 , H03M13/1515 , H03M13/45
摘要： Disclosed herein is a decoding apparatus that performs soft-decision decoding on a linear block code, the apparatus including a hard-decision decoder configured to perform hard-decision decoding on a received word using a hard-decision decoding algorithm; and a soft-decision decoder configured to perform, using a soft-decision algorithm, soft-decision decoding merely on a received word for which the hard-decision decoder has failed in the hard-decision decoding.
摘要翻译：本发明公开了一种对线性块码执行软判决解码的解码装置，该装置包括：硬判决解码器，被配置为使用硬判决解码算法对接收到的字执行硬判决解码; 以及软判决解码器，其被配置为仅在硬判决解码器在硬判决解码中已经失败的接收到的字上执行软判决算法的软判决解码。

7. 发明授权

US07087530B2 Aqueous dispersion for chemical mechanical polishing 有权
标题翻译：化学机械抛光用水分散体
公开(公告)号：US07087530B2
公开(公告)日：2006-08-08
申请号：US10689680
申请日：2003-10-22
申请人： Masayuki Motonari , Masayuki Hattori , Nobuo Kawahashi
发明人： Masayuki Motonari , Masayuki Hattori , Nobuo Kawahashi
IPC分类号： H01L21/302
CPC分类号： C09G1/02 , C09K3/1463 , H01L21/31053
摘要： The invention provides an aqueous dispersion for chemical mechanical polishing that can limit scratches of a specific size to a specific number, even with interlayer insulating films with small elastic moduli (silsesquioxane, fluorine-containing SiO2, polyimide-based resins, and the like.). When using the aqueous dispersion for chemical mechanical polishing of an interlayer insulating film with an elastic modulus of no greater than 20 GPa as measured by the nanoindentation method, the number of scratches with a maximum length of 1 μm or greater is an average of no more than 5 per unit area of 0.01 mm2 of the polishing surface. An aqueous dispersion for CMP or an aqueous dispersion for interlayer insulating film CMP according to another aspect of the invention contains a scratch inhibitor agent and an abrasive. The scratch inhibitor may be biphenol, bipyridyl, 2-vinylpyridine, salicylaldoxime, o-phenylenediamine, catechol, 7-hydroxy-5-methyl-1,3,4-triazaindolizine, and the like. The abrasive may consist of inorganic particles, organic particles or organic/inorganic composite particles. The organic/inorganic composite particles may be formed by polycondensation of an alkoxysilane, aluminum alkoxide, titanium alkoxide, and the like in the presence of polymer particles of polystyrene or the like, and bonding of polysiloxane, and the like, on at least the surface of the polymer particles.
摘要翻译：本发明提供了一种用于化学机械抛光的水分散体，即使使用具有小弹性模量的层间绝缘膜（倍半硅氧烷，含氟SiO 2，聚酰亚胺 - 基树脂等）。当通过纳米压痕法测量的弹性模量不大于20GPa的层间绝缘膜的化学机械抛光使用水性分散体时，最大长度为1μm或更大的划痕数是不超过平均值比抛光表面的0.01mm 2单位面积的5个。根据本发明另一方面，用于CMP的水分散体或用于层间绝缘膜CMP的水性分散体含有防刮剂和研磨剂。刮擦抑制剂可以是联苯酚，联吡啶基，2-乙烯基吡啶，水杨醛肟，邻苯二胺，邻苯二酚，7-羟基-5-甲基-1,3,4-三氮杂多卡因等。研磨剂可以由无机颗粒，有机颗粒或有机/无机复合颗粒组成。有机/无机复合颗粒可以通过在聚苯乙烯等的聚合物颗粒的存在下的烷氧基硅烷，烷氧基铝，烷氧基钛等的缩聚以及聚硅氧烷等的至少表面的聚合物颗粒。

8. 发明授权

US06786944B2 Aqueous dispersion for chemical mechanical polishing 有权
标题翻译：化学机械抛光用水分散体
公开(公告)号：US06786944B2
公开(公告)日：2004-09-07
申请号：US10412385
申请日：2003-04-14
申请人： Masayuki Hattori , Michiaki Ando , Kazuo Nishimoto , Nobuo Kawahashi
发明人： Masayuki Hattori , Michiaki Ando , Kazuo Nishimoto , Nobuo Kawahashi
IPC分类号： C09G102
CPC分类号： C09G1/02 , C09K3/1409 , C09K3/1463 , H01L21/31053
摘要： An aqueous dispersion for chemical mechanical polishing that is hard to putrefy, scarcely causes scratches, causes only small dishing and is suitable for used in a micro isolating step or a planarizing step of an inter layer dielectric in production of semiconductor devices, which dispersion comprises ceria particles, a preservative composed of a compound having a heterocyclic structure containing a nitrogen atom and a sulfur atom in the ring, such as an isothiazolone compound, and an organic component such as organic abrasive grains composed of resin particles, a dispersing agent composed of a water-soluble polymer having a specific molecular weight or the like, a surfactant and/or an organic acid or a salt thereof contained in an aqueous medium, wherein the ceria particles, preservative and organic component are contained in proportions of 0.1 to 20% by mass, 0.001 to 0.2% by mass and 0.1 to 30% by mass, respectively, when the total proportion of the aqueous medium, ceria particles, preservative and organic component is 100% by mass, and wherein the pH of this aqueous dispersion can be kept in a neutral range.
摘要翻译：用于化学机械抛光的水性分散体难以腐蚀，几乎不引起划痕，仅导致小的凹陷，并且适合用于半导体器件生产中的微层间电介质的微隔离步骤或平面化步骤，该分散体包括二氧化铈颗粒，由具有在环中含有氮原子和硫原子的杂环结构的化合物组成的防腐剂，例如异噻唑酮化合物，以及有机成分，例如由树脂颗粒组成的分散剂，由包含在水性介质中的具有特定分子量的水溶性聚合物，表面活性剂和/或有机酸或其盐，其中二氧化铈颗粒，防腐剂和有机组分的含量为0.1〜20％质量，0.001〜0.2质量％和0.1〜30质量％，当水性介质，二氧化铈颗粒，防腐剂和有机成分为100质量％，并且其中该水分散体的pH可以保持在中性范围。

9. 发明授权

US06765507B2 Encoding device and method and decoding device and method 失效
标题翻译：编码装置及方法及解码装置及方法
公开(公告)号：US06765507B2
公开(公告)日：2004-07-20
申请号：US10428905
申请日：2003-05-02
申请人： Takashi Yokokawa , Masayuki Hattori , Toshiyuki Miyauchi , Kohei Yamamoto
发明人： Takashi Yokokawa , Masayuki Hattori , Toshiyuki Miyauchi , Kohei Yamamoto
IPC分类号： H03M700
CPC分类号： H03M13/29 , H03M13/258 , H03M13/2771 , H03M13/2972
摘要： An encoding device in a data transmission/reception system includes a first convolutional encoder that encodes an outer code, an interleaver that permutes input data, a second convolutional encoder that encodes an inner code, and a muti-level modulation mapping circuit that performs signal-point mapping based on eight-phase shift keying. When the encoding device uses the second convolutional encoder having two or more memories, the first convolutional encoder uses, as the outer code, a code with a minimum output distance greater than the maximum input distance at which the minimum-distance inner code is generated.
摘要翻译：数据发送/接收系统中的编码装置包括：对外部码进行编码的第一卷积编码器，对输入数据进行置换的交织器;对内部编码进行编码的第二卷积编码器;以及多电平调制映射电路，基于八相移键控的点映射。当编码装置使用具有两个或更多个存储器的第二卷积编码器时，第一卷积编码器使用具有大于产生最小距离内码的最大输入距离的最小输出距离的代码作为外码。

10. 发明授权

US06740590B1 AQUEOUS DISPERSION, AQUEOUS DISPERSION FOR CHEMICAL MECHANICAL POLISHING USED FOR MANUFACTURE OF SEMICONDUCTOR DEVICES, METHOD FOR MANUFACTURE OF SEMICONDUCTOR DEVICES, AND METHOD FOR FORMATION OF EMBEDDED WRITING 有权
标题翻译：用于制造半导体器件的化学机械抛光的水性分散体，用于制造半导体器件的方法和用于形成嵌入式布线的方法
公开(公告)号：US06740590B1
公开(公告)日：2004-05-25
申请号：US09531163
申请日：2000-03-17
申请人： Hiroyuki Yano , Gaku Minamihaba , Yukiteru Matsui , Katsuya Okumura , Akira Iio , Masayuki Hattori
发明人： Hiroyuki Yano , Gaku Minamihaba , Yukiteru Matsui , Katsuya Okumura , Akira Iio , Masayuki Hattori
IPC分类号： H01L21302
CPC分类号： C09K3/1463 , C09G1/02 , C09K3/1436 , H01L21/02074 , H01L21/3212 , H01L21/7684
摘要： The object of the present invention is to provide an aqueous dispersion that can give the required properties for a wide range of uses including electronic materials, magnetic materials, optical materials and polishing materials, and to provide an aqueous dispersion for chemical mechanical polishing (CMP slurry) that gives an adequate polishing rate without creating scratches in polishing surfaces. Another object of the present invention is, to provide a method for manufacture of semiconductor devices using a CMP slurry that can control progressive erosion due to scratches and the like during polishing and that can achieve efficient flattening of working films, and to provide a method for formation of embedded wiring. The aqueous dispersion or CMP slurry of the present invention contains polymer particles made of thermoplastic resins or the like, and inorganic particles made of alumina, silica or the like, wherein the zeta potentials of the polymer particles and inorganic particles are of opposite signs, and they are bonded by electrostatic force to form aggregates as composite particles. The aggregates are subjected to ultrasonic wave irradiation or shear stress with a homogenizer to give more uniformly dispersed composite particles.
摘要翻译：本发明的目的是提供一种水性分散体，其可以为包括电子材料，磁性材料，光学材料和抛光材料在内的广泛用途提供所需的性能，并提供用于化学机械抛光的水性分散体（CMP浆料），其提供足够的抛光速率，而不会在抛光表面中产生划痕。本发明的另一个目的是提供一种使用CMP浆料制造半导体器件的方法，所述CMP浆料可以在抛光期间控制由划痕等引起的逐渐侵蚀，并且可以实现工作膜的有效平坦化，并提供一种方法形成嵌入式布线。本发明的水性分散体或CMP浆料含有由热塑性树脂等构成的聚合物颗粒和由氧化铝，二氧化硅等制成的无机颗粒，其中聚合物颗粒和无机颗粒的ζ电位具有相反的标志，它们通过静电力结合以形成作为复合颗粒的聚集体。聚集体用均化器进行超声波照射或剪切应力，得到更均匀分散的复合颗粒。

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