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    • 1. 发明授权
    • Process for synthesizing diamond in a vapor phase
    • 在气相中合成金刚石的方法
    • US5624719A
    • 1997-04-29
    • US279088
    • 1994-07-22
    • Keiichiro TanabeTakahiro ImaiNaoji Fujimori
    • Keiichiro TanabeTakahiro ImaiNaoji Fujimori
    • C23C16/27C30B25/02B01J3/06
    • C23C16/27C23C16/277C30B25/02C30B29/04
    • A method for synthesizing diamond by chemical vapor deposition (CVD) is described. The method produces diamond of high purity and high crystallizability having various uses at low cost and at high speed. In a first method, a mixture of oxygen gas and a carbon-containing compound gas, and optionally an inert gas, is introduced into a reaction vessel. In a second method, a mixture containing at least one of fluorine gas, chlorine gas, a nitrogen oxide gas, sulfur dioxide, an aforementioned mixture of oxygen gas and a carbon-containing compound gas, or a mixture thereof with an inert gas is introduced into the reaction vessel. A plasma is generated by use of an electromagnetic field, thereby producing diamond on a base material placed in the vessel.
    • 描述了通过化学气相沉积(CVD)合成金刚石的方法。 该方法以低成本和高速度生产具有各种用途的高纯度和高结晶度的金刚石。 在第一种方法中,将氧气和含碳化合物气体以及任选的惰性气体的混合物引入反应容器中。 在第二种方法中,引入含有氟气,氯气,氮氧化物气体,二氧化硫,上述氧气和含碳化合物气体的混合物或其与惰性气体的混合物中的至少一种的混合物 进入反应容器。 通过使用电磁场产生等离子体,从而在放置在容器中的基底材料上产生金刚石。
    • 3. 发明授权
    • Process for synthesizing diamond in a vapor phase
    • 在气相中合成金刚石的方法
    • US5380516A
    • 1995-01-10
    • US931494
    • 1992-08-21
    • Keiichiro TanabeTakahiro ImaiNaoji Fujimori
    • Keiichiro TanabeTakahiro ImaiNaoji Fujimori
    • C23C16/27C30B25/02C01B31/65
    • C23C16/27C23C16/277C30B25/02C30B29/04
    • The present invention relates to a method for synthesizing diamond by chemical vapor deposition (CVD) process, and specifically a chemical deposition process which allows production of diamond of high purity and high crystallizability having various uses at low cost and at high speed. In the first method for the present invention, a mixture of oxygen gas and a carbon-containing compound gas and optionally an inert gas is introduced into a reaction vessel and a plasma is generated by use of an electromagnetic field, thereby producing diamond on a substrate placed in the vessel. In the second method of the present invention, a mixture containing at least one of fluorine gas, chlorine gas, a nitrogen oxide gas and sulfur dioxide gas, or a mixture of the gas mixture with oxygen gas and a carbon-containing compound gas, or a mixture thereof with an inert gas is introduced into a reaction vessel, and a plasma is generated by use of an electromagnetic field, thereby producing diamond on a base material placed in the vessel.
    • PCT No.PCT / JP89 / 00531 Sec。 371 1990年1月24日第 102(e)日期1990年1月24日PCT提交1989年5月25日PCT公布。 出版物WO89 / 11556 日本特开1989年1月30日。本发明涉及通过化学气相沉积(CVD)方法合成金刚石的方法,具体地说涉及一种化学沉积方法,该方法允许以低成本生产具有各种用途的高纯度和高结晶度的金刚石, 高速 在本发明的第一种方法中,将氧气和含碳化合物气体和任选的惰性气体的混合物引入反应容器中,并且通过使用电磁场产生等离子体,由此在衬底上产生金刚石 放在船上 在本发明的第二种方法中,含有氟气,氯气,氮氧化物气体和二氧化硫气体中的至少一种的混合物,或气体混合物与氧气和含碳化合物气体的混合物,或 将其与惰性气体的混合物引入反应容器中,并且通过使用电磁场产生等离子体,从而在放置在容器中的基材上产生金刚石。
    • 8. 发明授权
    • Bonding tool having diamond head and method of manufacturing the same
    • 具有金刚石头的接合工具及其制造方法
    • US5370299A
    • 1994-12-06
    • US41545
    • 1993-04-02
    • Keiichiro TanabeToshiya TakahashiAkihiko IkegayaNaoji Fujimori
    • Keiichiro TanabeToshiya TakahashiAkihiko IkegayaNaoji Fujimori
    • B23K20/02C04B41/50C04B41/85H05K13/00H01L21/58
    • C04B41/009B23K20/025C04B41/5002C04B41/85H01L24/79H05K13/003
    • A bonding tool has a head portion made essentially of vapor-deposited diamond, wherein a principal diamond crystal plane forming a head face is a (111) plane. Such a head face has high hardness and a good wear resistance. In order to improve the toughness of a bonding head which is mainly made of vapor-deposited diamond, a portion or ply forming the head face consists essentially of high-purity diamond, and another portion or ply supporting the head face consists essentially of low-purity diamond. The head face has a high rigidity, while the portion supporting the head face has a high toughness. In order to provide a bonding head portion which is mainly made of vapor-deposited diamond with electrical conductivity, a first portion or ply forming a head face consists essentially of polycrystalline diamond containing a relatively small amount of dopant, and another portion or ply supporting the first portion or ply contains a large amount of dopant. The head portion having electrical conductivity can be heated by energization. In a tool employing a coating containing vapor-deposited diamond as a bonding head portion, the coating is formed by a compound of a metal or ceramics and vapor-deposited diamond, in order to improve the strength of the coating and adhesion to a tool substrate.
    • 接合工具具有基本上由气相沉积金刚石制成的头部,其中形成头部面的主要金刚石晶体平面是(111)面。 这种头面具有高硬度和良好的耐磨性。 为了提高主要由气相沉积金刚石制成的接合头的韧性,形成头部面的部分或层基本上由高纯度的金刚石组成,并且支撑头部面的另一部分或层基本上由低熔点金刚石构成, 纯度钻石。 头部表面具有高刚性,而支撑头部面的部分具有高韧性。 为了提供主要由具有导电性的气相沉积金刚石制成的接合头部分,形成头部面的第一部分或第一部分基本上由含有相对少量掺杂剂的多晶金刚石组成,另一部分或层叠支撑 第一部分或第二部分含有大量的掺杂剂。 可以通过通电来加热具有导电性的头部。 在使用包含气相沉积金刚石作为粘合头部分的涂层的工具中,涂层由金属或陶瓷和气相沉积金刚石的化合物形成,以便提高涂层的强度和对工具基材的粘附 。
    • 9. 发明授权
    • Wafer and method of producing same
    • 晶圆及其制造方法
    • US5964942A
    • 1999-10-12
    • US494719
    • 1995-06-26
    • Keiichiro TanabeYuichiro SekiAkihiko IkegayaNaoji FujimoriTakashi Tsuno
    • Keiichiro TanabeYuichiro SekiAkihiko IkegayaNaoji FujimoriTakashi Tsuno
    • C30B25/02C30B29/04
    • C30B25/02C30B29/04
    • No wide bulk diamond wafer exists at present. A wide diamond-coated wafer is proposed instead of the bulk diamond wafer. Diamond is heteroepitaxially deposited on a convex-distorted non-diamond single crystal substrate by a vapor phase deposition method. In an early step, a negative bias is applied to the substrate. In the case of a Si substrate, an intermediate layer of .beta.-SiC is first deposited on the Si substrate by supplying a low carbon concentration material gas. Then the carbon concentration is raised for making a diamond film. The convex-distorted wafer is stuck to a holder having a shaft which is capable of inclining to the holder. The wafer is pushed to a turn-table of a polishing machine. The convex diamond wafer can fully be polished by inclining the holder to the shaft. A wide distorted mirror wafer of diamond is produced. Fine wire patterns can be made on the diamond mirror wafer by the photolithography.
    • 目前没有宽的大块金刚石晶圆。 提出了宽金刚石涂层的晶片代替块状金刚石晶片。 通过气相沉积方法将金刚石异质外延沉积在凸变形的非金刚石单晶衬底上。 在早期的步骤中,向衬底施加负偏压。 在Si衬底的情况下,通过提供低碳浓度的材料气体,首先在Si衬底上沉积β-SiC的中间层。 然后提高碳浓度以制备金刚石膜。 凸起变形的晶片粘附到具有能够倾斜到保持器的轴的保持器上。 将晶片推到抛光机的转台上。 通过将支架倾斜到轴上,可以完全抛光凸面金刚石晶片。 产生了一个宽扭曲的金刚石镜面晶圆。 可以通过光刻在金刚石镜晶片上形成细线图案。