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1. 发明授权

US4506382A Apparatus for detecting two-dimensional pattern and method for transforming the pattern into binary image 失效
标题翻译：用于检测二维图案的装置和将图案转换成二进制图像的方法
公开(公告)号：US4506382A
公开(公告)日：1985-03-19
申请号：US370781
申请日：1982-04-21
申请人： Kazunari Hada , Norio Fujii , Atsushi Kawahara , Toru Azuma , Junji Hazama
发明人： Kazunari Hada , Norio Fujii , Atsushi Kawahara , Toru Azuma , Junji Hazama
IPC分类号： G06K9/56 , G06T5/00 , G06T5/30 , H04N1/409 , H04N5/21
CPC分类号： G06K9/56
摘要： Two-dimensional pattern detecting apparatus provided with register for serially receiving binary signals obtained from analog signals of a two-dimensional pattern and adapted to divide the pattern into pixels and to represent the density of bright and dark for pixels by the binary signals. The apparatus further includes a processing circuit adapted to compare with predetermined patterns a pattern composed of 8 peripheral pixels of a partial area of 3.times.3 pixels within the two-dimensional pattern, on the basis of the binary signals stored in the register. The processing circuit outputs a binary signal of a logic value stored in said register corresponding to a central pixel of the partial area when the pattern of the 8 pixels coincides with one of said predetermined patterns, and to outputs a binary signal of a logic value prevailing in 8 binary signals stored in the register corresponding to the 8 pixels when the pattern of the 8 pixels does not coincide with any of the predetermined patterns.
摘要翻译：二维图案检测装置设置有用于串行接收从二维图案的模拟信号获得的二进制信号的寄存器，并且适于将图案划分为像素并且通过二进制信号表示像素的亮和暗的密度。该装置还包括处理电路，其适于根据存储在寄存器中的二进制信号，与二维图案中的3×3像素的部分区域的8个周边像素组成的图案与预定图案进行比较。当8个像素的图案与所述预定图案中的一个一致时，处理电路输出存储在所述寄存器中的对应于该部分区域的中心像素的逻辑值的二进制信号，并输出主要的逻辑值的二进制信号当8像素的图案与任何预定图案不一致时，存储在对应于8个像素的寄存器中的8个二进制信号。

2. 发明授权

US4479145A Apparatus for detecting the defect of pattern 失效
标题翻译：用于检测图案缺陷的装置
公开(公告)号：US4479145A
公开(公告)日：1984-10-23
申请号：US400681
申请日：1982-07-22
申请人： Toru Azuma , Junji Hazama , Atsushi Kawahara , Kazunari Hada , Norio Fujii
发明人： Toru Azuma , Junji Hazama , Atsushi Kawahara , Kazunari Hada , Norio Fujii
IPC分类号： G01N21/88 , G06T7/00 , H04N7/18
CPC分类号： G01N21/88 , G06T7/001 , G06T2207/30148
摘要： A pattern examining in which a pattern on an examined object such as reticle or mask is scanned to produce image binary signals of picture elements; binary information corresponding to a local area on the examined object is serially extracted from the image binary signals; and shape detection is effected for detecting by means of the binary information whether or not the pattern in the local area possesses a determined geometric shape or characteristics. The result of the shape detection is compared with the information on design relating to the geometric shape or characteristics which the pattern on the examined object should possess.
摘要翻译：模式检查，其中扫描诸如掩模版或掩模的被检查物体上的图案以产生图像元素的图像二进制信号; 对应于所检查对象上的局部区域的二进制信息从图像二进制信号中被串行提取; 并且通过二进制信息进行形状检测来检测局部区域中的图案是否具有确定的几何形状或特征。将形状检测的结果与关于检查对象的图案所具有的几何形状或特征的设计信息进行比较。

3. 发明授权

US4472738A Pattern testing apparatus 失效
标题翻译：图案检测仪
公开(公告)号：US4472738A
公开(公告)日：1984-09-18
申请号：US381469
申请日：1982-05-24
申请人： Kazunari Hada , Norio Fujii , Atsushi Kawahara , Toru Azuma , Junji Hazama
发明人： Kazunari Hada , Norio Fujii , Atsushi Kawahara , Toru Azuma , Junji Hazama
IPC分类号： G01N21/88 , G01N21/956 , G06T1/00 , G06T7/00 , H04N7/18
CPC分类号： G01N21/956 , G06T7/001 , G06T2207/10016 , G06T2207/30148
摘要： A pattern defect testing apparatus comprises a first detection circuit which defines a first detection area on a two-dimensional pattern and produces a first detection signal when all digital signals representative of densities of picture cells in the first detection area have the same logical value, a second detection circuit which defines a second detection area on the two-dimensional pattern and produces a second detection signal when at least one of digital signals representative of densities of picture cells in the second detection area has a logical value different from that of the digital signals to the first detection circuit, and a discriminating circuit for discriminating the presence of a defect in the second detection area when the first and second detection signals are produced.
摘要翻译：图案缺陷检测装置包括第一检测电路，其定义二维图案上的第一检测区域，并且当表示第一检测区域中的图像单元的密度的所有数字信号具有相同的逻辑值时，产生第一检测信号，第二检测电路，其限定二维图案上的第二检测区域，并且当表示第二检测区域中的图像单元的密度的数字信号中的至少一个具有与数字信号的逻辑值不同的逻辑值时，产生第二检测信号以及鉴别电路，用于在产生第一和第二检测信号时鉴别第二检测区域中的缺陷的存在。

4. 发明授权

US4342905A Automatic focusing device of a microscope 失效
标题翻译：自动对焦装置的显微镜
公开(公告)号：US4342905A
公开(公告)日：1982-08-03
申请号：US180150
申请日：1980-08-21
申请人： Norio Fujii , Atsushi Kawahara , Masahiro Sawada
发明人： Norio Fujii , Atsushi Kawahara , Masahiro Sawada
IPC分类号： G02B21/24 , G01J1/20
CPC分类号： G02B21/244
摘要： An automatic focusing device of a microscope having an objective lens and a stage on which a specimen is placed comprises distance varying means for varying the relative distance between the objective lens and the stage, distance detecting means for producing a distance output corresponding to said distance, photoelectric detector means for photoelectrically detecting a high frequency component of the space frequency component of the image of the specimen on the stage by the objective lens, judging means for judging whether or not a predetermined peak smaller than a maximum peak exists in the output of the photoelectric detector means within a predetermined distance range from a first distance output of the distance detecting means when the output of the photoelectric detector means assumes said maximum peak and for producing an in-focus output when said predetermined peak exists, and means for determining said relative distance on the basis of said in-focus output.
摘要翻译：具有物镜的显微镜的自动聚焦装置和放置有试样的台架包括用于改变物镜与台架之间的相对距离的距离变化装置，用于产生对应于所述距离的距离输出的距离检测装置，光电检测装置，用于通过物镜光电检测载物台上的样本的空间频率分量的高频分量;判断装置，用于判断小于最大峰值的预定峰值是否存在于光电检测装置，当光电检测装置的输出呈现所述最大峰值时，距距离检测装置的第一距离输出预定距离范围内，并且当存在所述预定峰值时产生对焦输出，以及用于确定所述相对基于所述对焦输出的距离。

5. 发明授权

US4318886A Automatic HLA typing apparatus 失效
标题翻译：自动HLA打字机
公开(公告)号：US4318886A
公开(公告)日：1982-03-09
申请号：US206610
申请日：1980-11-13
申请人： Atsushi Kawahara , Masahiro Sawada , Norio Fujii
发明人： Atsushi Kawahara , Masahiro Sawada , Norio Fujii
IPC分类号： G01N33/569 , G01N35/00 , G01N35/02 , G06K9/00 , G06M11/04 , G01N33/80 , G01N33/50
CPC分类号： G06K9/00127 , G01N35/028 , G06M11/04 , G01N2035/00287 , G01N33/56977
摘要： Apparatus for automatically typing HLA (Human Leukocyte Antigen) is disclosed. An optical image of a sample containing lymphocytes is formed by a phase-contrast microscope. The optical image is transformed into electrical picture signal through a image pick-up unit which in turn is transformed into binary picture patterns for a predetermined area site in the image through a window circuit. The obtained binary picture patterns are compared with template patterns of predetermined features corresponding to reacted and non-reacted lymphocyte images to detect and type the lymphocyte image. With this typing apparatus, HLA typing test can be conducted automatically with high accuracy.
摘要翻译：公开了用于自动分型HLA（人类白细胞抗原）的装置。通过相差显微镜形成含有淋巴细胞的样品的光学图像。光学图像通过图像拾取单元变换成电子图像信号，该图像拾取单元又通过窗口电路转换成图像中的预定区域位置的二进制图案。将获得的二进制图案图案与对应于反应的和未反应的淋巴细胞图像的预定特征的模板图案进行比较，以检测和分型淋巴细胞图像。使用这种打字装置，可以高精度地自动进行HLA打字测试。

6. 发明申请

US20130033125A1 LINEAR MOTOR ARMATURE AND LINEAR MOTOR 审中-公开
标题翻译：线性电动机和线性电动机
公开(公告)号：US20130033125A1
公开(公告)日：2013-02-07
申请号：US13316561
申请日：2011-12-12
申请人： Seigo NAGAMATSU , Yasuaki Kamiki , Atsushi Kawahara , Kazuya Yugawa , Keiji Yanagi
发明人： Seigo NAGAMATSU , Yasuaki Kamiki , Atsushi Kawahara , Kazuya Yugawa , Keiji Yanagi
IPC分类号： H02K41/02
CPC分类号： H02K41/031 , H02K11/21
摘要： A linear motor armature according to embodiments includes an armature core, supporting teeth, and a detecting unit. The armature core includes main teeth. The supporting teeth are provided on stroke direction ends of the armature core. The detecting unit detects a position of the armature core. Moreover, the detecting unit is provided at a position overlapping with the supporting teeth in the stroke direction.
摘要翻译：根据实施例的线性电动机电枢包括电枢铁芯，支撑齿和检测单元。电枢铁芯包括主齿。支撑齿设置在电枢铁芯的冲程方向端。检测单元检测电枢铁芯的位置。此外，检测单元设置在与支撑齿在行程方向上重叠的位置。

7. 发明申请

US20080206427A1 W1/O/W2 TYPE COMPOSITE EMULSIFIED DRESSING AND METHOD FOR PREPARING THE SAME 有权
标题翻译： W1 / O / W2型复合纤维织物及其制备方法
公开(公告)号：US20080206427A1
公开(公告)日：2008-08-28
申请号：US12102443
申请日：2008-04-14
申请人： Jiro Taki , Takashi Isomura , Kazumichi Kanda , Atsushi Kawahara , Kentaro Maruyama , Soichiro Kusumoto
发明人： Jiro Taki , Takashi Isomura , Kazumichi Kanda , Atsushi Kawahara , Kentaro Maruyama , Soichiro Kusumoto
IPC分类号： A23L1/0524 , A23D7/00
CPC分类号： A23L35/10 , A23L27/60 , A23L29/10 , A23L29/231 , A23V2002/00 , A23V2200/222 , A23V2250/50722
摘要： The invention provides a W1/O/W2 type composite emulsified dressing characterized in that it comprises a polyglycerol polyricinoleate having a degree of esterification of 10-30% and a degree of ricinoleic acid-condensation of 5-8 and that it has a viscosity of 1,000-300,000 mPa·s, and a method for the preparation of the dressing which comprises the steps of 90-10 parts by mass of an aqueous phase (W1) is mixed with 10-90 parts by mass of an oily phase (O) to thus form a W1/O type emulsion and then 100 parts by mass of the resulting W1/O type emulsion is blended with 25-150 parts by mass of an aqueous phase (W2) to thus give a W1/O/W2 type composite emulsified dressing, wherein the dressing comprises a polyglycerol polyricinoleate having a degree of esterification of 10-30% and a degree of ricinoleic acid-condensation of 5-8, in an amount ranging from 0.01-5% by mass on the basis of the total mass of the W1/O/W2 type composite emulsified dressing. The dressing are quite excellent in their storage stability.
摘要翻译：本发明提供一种W1 / O / W2型复合乳化敷料，其特征在于，其包含酯化度为10-30％，蓖麻油酸缩合度为5-8的聚甘油聚蓖麻油酸酯，其粘度为 1000-300,000mPa.s和一种制备敷料的方法，该方法包括以下步骤：将90-10质量份水相（W1）与10-90质量份油相（O）混合，从而形成W1 / O型乳液，然后将100质量份所得W1 / O型乳液与25〜150质量份水相（W2）混合，得到W1 / O / W2型复合物乳化敷料，其中所述敷料包含基于总量为0.01-5质量％的酯化度为10-30％，蓖麻油酸缩合度为5-8的聚甘油聚蓖麻油酸酯质量的W1 / O / W2型复合乳化敷料。敷料相当优秀的储存稳定性。

8. 发明授权

US3980870A Device for measuring contour length of a two-dimensional pattern 失效
标题翻译：用于测量二维图案轮廓长度的装置
公开(公告)号：US3980870A
公开(公告)日：1976-09-14
申请号：US575718
申请日：1975-05-08
申请人： Atsushi Kawahara
发明人： Atsushi Kawahara
IPC分类号： G01B3/12 , G01B11/02 , G01B11/03 , G01B11/24 , G01B21/02 , G01B21/20 , G01B11/00 , G06K9/10
CPC分类号： G01B11/022 , G01B11/24
摘要： A device for measuring the contour length of a two-dimensional pattern comprises means for scanning the pattern and sampling each scanned line at a predetermined length to convert the pattern into digitally coded patterns. A rotary means rotates the two-dimensional pattern relative to the converting means to attain uniform spatial distribution of the two-dimensional pattern. A discriminating means discriminates that the digital coded patterns corresponding to the contour line segments placed between the neighboring scanning lines correspond to the number of times the length of the sample to classify the segments into a number of groups according to the result of the discrimination. A computer multiplies the outputs from the classifying means by predetermined weighting coefficients, respectively, at each rotated position of said two-dimensional pattern to obtain the average of the contour length of the two-dimensional pattern at every rotated position.
摘要翻译：用于测量二维图案的轮廓长度的装置包括用于扫描图案并以预定长度对每条扫描线进行采样的装置，以将图案转换成数字编码图案。旋转装置相对于转换装置旋转二维图案以获得二维图案的均匀的空间分布。鉴别装置鉴别出与相邻扫描线之间的轮廓线段相对应的数字编码图形，与根据鉴别结果将片段长度分类为多个组的样本长度相对应。计算机将分类装置的输出分别乘以在所述二维图形的每个旋转位置处的预定加权系数，以获得每个旋转位置处的二维图案的轮廓长度的平均值。

9. 发明授权

US08059269B2 Particle inspection apparatus, exposure apparatus, and device manufacturing method 有权
标题翻译：粒子检查装置，曝光装置及装置的制造方法
公开(公告)号：US08059269B2
公开(公告)日：2011-11-15
申请号：US12831103
申请日：2010-07-06
申请人： Atsushi Kawahara
发明人： Atsushi Kawahara
IPC分类号： G01N21/88
CPC分类号： G03F1/84
摘要： A particle inspection apparatus includes an irradiation unit configured to apply a light beam onto front and back surfaces of an object to be inspected, first and second detection units configured to detect scattering light from the surfaces, a calculation unit configured to conduct a particle inspection on the surfaces on the basis of outputs from the detection units, and a control unit configured to control the irradiation unit, the detection units, and the calculation unit. The irradiation unit can selectively apply the beam onto the front or back surface. The control unit causes the calculation unit to conduct the particle inspection on the inspection surface on which the light beam is selectively applied, on the basis of outputs made by the detection unit corresponding to simultaneous application and selective application of the light beam.
摘要翻译：一种粒子检查装置，包括：被配置为将被检测体的前后表面施加光束的照射部，配置为检测来自所述表面的散射光的第一检测部和第二检测部，基于来自检测单元的输出的表面，以及被配置为控制照射单元，检测单元和计算单元的控制单元。照射单元可以选择性地将光束施加到前表面或后表面上。控制单元使得计算单元基于对应于同时施加和选择性地施加光束的由检测单元产生的输出，在选择了光束的检查表面上进行粒子检查。

10. 发明申请

US20080218708A1 EXPOSURE APPARATUS AND METHOD OF MANUFACTURING DEVICE 有权
标题翻译：曝光装置及其制造方法
公开(公告)号：US20080218708A1
公开(公告)日：2008-09-11
申请号：US12038980
申请日：2008-02-28
申请人： Atsushi Kawahara
发明人： Atsushi Kawahara
IPC分类号： G03B27/52
CPC分类号： G03F7/70916 , G03F1/84 , G03F7/70533 , G03F7/70866
摘要： An exposure apparatus is configured to transfer a pattern to a substrate by exposing the substrate to light via a reticle. The apparatus comprises an inspection unit configured to inspect the reticle, an exposure unit configured to expose the substrate to light via the reticle inspected by the inspection unit, and a controller configured to control the inspection unit and the exposure unit. The controller (i) sets a partial region of the reticle, (ii) causes the inspection unit to inspect the reticle on which the partial region is set, and (iii) causes the exposure unit to expose the substrate to light via the partial region if the inspection unit finds no abnormality in the partial region.
摘要翻译：曝光装置被配置为通过经由掩模版曝光基板而将图案转印到基板。所述装置包括：检查单元，被配置为检查所述掩模版;曝光单元，被配置为经由所述检查单元检查的所述掩模版曝光所述基板;以及控制器，被配置为控制所述检查单元和所述曝光单元。控制器（i）设置掩模版的部分区域，（ii）使检查单元检查其上设置有部分区域的掩模版，以及（iii）使曝光单元通过部分区域曝光基板如果检查单元在部分区域中没有发现异常。

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