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1. 发明授权

US6156464A Scanning-type charged-particle beam exposure methods including scan-velocity error detection and correction 有权
标题翻译：扫描型带电粒子束曝光方法，包括扫描速度误差检测和校正
公开(公告)号：US6156464A
公开(公告)日：2000-12-05
申请号：US261059
申请日：1999-03-02
申请人： Kazunari Hada
发明人： Kazunari Hada
IPC分类号： H01L21/027 , G03F7/20 , G03F7/22 , H01J37/304 , H01J37/317 , G03F9/00
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/304 , H01J37/3174 , G03F7/2037 , H01J2237/31766 , Y10S430/143
摘要： Methods are disclosed for improving the yield of acceptable product from microlithography using a charged particle beam. According to the methods, exposure defects caused by an unsuitable stage velocity are reduced, and exposure-defect areas can be re-exposed after detection of an exposure defect. In preparation for exposure, pattern data are read. Next, stage position is read, and stage velocity is calculated. A determination is made of whether the stage velocity is greater than a specified value. If the stage velocity is greater than the specified value, the stage velocity is decreased to avoid exceeding a velocity limit at which continuous exposure is impossible. Exposure of the die commences. If exposure of all of the pattern portions of the die are successfully completed, then processing is terminated. If exposure of all the pattern portions were not successfully completed, processing returns to the step at which the error occurred and repeated.
摘要翻译：公开了用于使用带电粒子束从微光刻提高可接受产品的产率的方法。根据该方法，降低了由不合适的阶段速度引起的曝光缺陷，并且在检测到曝光缺陷之后可以重新曝光曝光缺陷区域。在准备曝光时，读取图案数据。接下来，读取舞台位置，并计算舞台速度。确定舞台速度是否大于指定值。如果舞台速度大于指定值，则舞台速度降低，以避免超过不可能连续曝光的速度限制。开始暴露如果模具的所有图案部分的曝光成功完成，则终止处理。如果所有图案部分的曝光未成功完成，则处理返回发生错误并重复的步骤。

2. 发明授权

US4589139A Apparatus for detecting defects in pattern 失效
标题翻译：用于检测图案中的缺陷的装置
公开(公告)号：US4589139A
公开(公告)日：1986-05-13
申请号：US462515
申请日：1983-01-31
申请人： Kazunari Hada , Norio Fujii , Toru Azuma , Kaoru Kikuchi , Junji Hazama
发明人： Kazunari Hada , Norio Fujii , Toru Azuma , Kaoru Kikuchi , Junji Hazama
IPC分类号： G01R31/308 , G06T7/00 , G06K9/46
CPC分类号： G06T7/0006 , G01R31/308 , G06T2207/20144 , G06T2207/30148
摘要： An apparatus for inspecting a pattern consisting of light and dark areas formed on a planar test specimen according to design information, comprising: an imaging device for viewing the pattern to generate image information; a detector for generating a first signal upon detection that, in response to the image information, a boundary line between the light and dark areas of the pattern is bent in a determined stepping form in the direction of the plane; a memory for generating and storing a second signal, upon detection that the boundary line of the pattern has a bend of stepping form according to the design information, corresponding to the position in the imaging area of the bend in the design information; and an inspecting device for discriminating, upon generation of the first signal, the presence or absence of the second signal in the memory corresponding to the position of the first signal in the image area.
摘要翻译：一种用于根据设计信息检查由平面测试样本上形成的由浅色和暗色区域组成的图案的设备，包括：用于观看图案以生成图像信息的成像装置; 检测器，用于在检测到时产生第一信号，响应于图像信息，图案的亮区和暗区之间的边界线以确定的步进形式沿平面的方向弯曲; 用于产生和存储第二信号的存储器，当检测到所述图案的边界线根据所述设计信息具有与所述设计信息中的所述弯曲部的所述成像区域中的位置相对应的步进形式的弯曲时; 以及检测装置，用于在产生第一信号时，在对应于图像区域中的第一信号的位置的存储器中存在或不存在第二信号。

3. 发明授权

US5912096A Charged-particle-beam exposure method with temperature-compensated exposure to offset expansion and contraction of substrate 失效
标题翻译：具有温度补偿曝光的带电粒子束曝光方法，以抵消衬底的膨胀和收缩
公开(公告)号：US5912096A
公开(公告)日：1999-06-15
申请号：US44395
申请日：1998-03-18
申请人： Kazunari Hada
发明人： Kazunari Hada
IPC分类号： G03F7/20 , H01J37/304 , H01J37/317 , H01L21/027 , G03F9/00 , G03C5/00
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/304 , H01J37/3174 , G03F7/2059 , H01J2237/30455
摘要： Apparatus and methods are disclosed for increasing the throughput and accuracy of a charged-particle-beam (CPB) exposure apparatus. The apparatus comprises a CPB optical system for exposing a pattern onto a sensitive substrate in a vacuum chamber. During exposure, the substrate is placed on a movable stage. If the substrate temperature is not equal to the exposure-environment temperature, calibrated data on a temperature-correction factor of the substrate is obtained and used to convert XY coordinates for an exposure-environment temperature exposure of the substrate into corrected XY coordinates for exposure at the actual substrate temperature. Exposure of the substrate is positionally accurate even if, after exposure, the substrate undergoes expansion or contraction as the substrate equilibrates with the exposure-environment temperature.
摘要翻译：公开了用于增加带电粒子束（CPB）曝光装置的生产量和精度的装置和方法。该装置包括用于将图案暴露于真空室中的敏感基板上的CPB光学系统。在曝光期间，将基板放置在可动台上。如果基板温度不等于曝光环境温度，则获得基板温度校正因子的校准数据，并将其用于将基板曝光环境温度曝光的XY坐标转换为修正的XY坐标以便曝光实际基板温度。即使在曝光后，当基板与曝光环境温度平衡时，基板的曝光位置准确。

4. 发明授权

US4479145A Apparatus for detecting the defect of pattern 失效
标题翻译：用于检测图案缺陷的装置
公开(公告)号：US4479145A
公开(公告)日：1984-10-23
申请号：US400681
申请日：1982-07-22
申请人： Toru Azuma , Junji Hazama , Atsushi Kawahara , Kazunari Hada , Norio Fujii
发明人： Toru Azuma , Junji Hazama , Atsushi Kawahara , Kazunari Hada , Norio Fujii
IPC分类号： G01N21/88 , G06T7/00 , H04N7/18
CPC分类号： G01N21/88 , G06T7/001 , G06T2207/30148
摘要： A pattern examining in which a pattern on an examined object such as reticle or mask is scanned to produce image binary signals of picture elements; binary information corresponding to a local area on the examined object is serially extracted from the image binary signals; and shape detection is effected for detecting by means of the binary information whether or not the pattern in the local area possesses a determined geometric shape or characteristics. The result of the shape detection is compared with the information on design relating to the geometric shape or characteristics which the pattern on the examined object should possess.
摘要翻译：模式检查，其中扫描诸如掩模版或掩模的被检查物体上的图案以产生图像元素的图像二进制信号; 对应于所检查对象上的局部区域的二进制信息从图像二进制信号中被串行提取; 并且通过二进制信息进行形状检测来检测局部区域中的图案是否具有确定的几何形状或特征。将形状检测的结果与关于检查对象的图案所具有的几何形状或特征的设计信息进行比较。

5. 发明授权

US4472738A Pattern testing apparatus 失效
标题翻译：图案检测仪
公开(公告)号：US4472738A
公开(公告)日：1984-09-18
申请号：US381469
申请日：1982-05-24
申请人： Kazunari Hada , Norio Fujii , Atsushi Kawahara , Toru Azuma , Junji Hazama
发明人： Kazunari Hada , Norio Fujii , Atsushi Kawahara , Toru Azuma , Junji Hazama
IPC分类号： G01N21/88 , G01N21/956 , G06T1/00 , G06T7/00 , H04N7/18
CPC分类号： G01N21/956 , G06T7/001 , G06T2207/10016 , G06T2207/30148
摘要： A pattern defect testing apparatus comprises a first detection circuit which defines a first detection area on a two-dimensional pattern and produces a first detection signal when all digital signals representative of densities of picture cells in the first detection area have the same logical value, a second detection circuit which defines a second detection area on the two-dimensional pattern and produces a second detection signal when at least one of digital signals representative of densities of picture cells in the second detection area has a logical value different from that of the digital signals to the first detection circuit, and a discriminating circuit for discriminating the presence of a defect in the second detection area when the first and second detection signals are produced.
摘要翻译：图案缺陷检测装置包括第一检测电路，其定义二维图案上的第一检测区域，并且当表示第一检测区域中的图像单元的密度的所有数字信号具有相同的逻辑值时，产生第一检测信号，第二检测电路，其限定二维图案上的第二检测区域，并且当表示第二检测区域中的图像单元的密度的数字信号中的至少一个具有与数字信号的逻辑值不同的逻辑值时，产生第二检测信号以及鉴别电路，用于在产生第一和第二检测信号时鉴别第二检测区域中的缺陷的存在。

6. 发明授权

US4506382A Apparatus for detecting two-dimensional pattern and method for transforming the pattern into binary image 失效
标题翻译：用于检测二维图案的装置和将图案转换成二进制图像的方法
公开(公告)号：US4506382A
公开(公告)日：1985-03-19
申请号：US370781
申请日：1982-04-21
申请人： Kazunari Hada , Norio Fujii , Atsushi Kawahara , Toru Azuma , Junji Hazama
发明人： Kazunari Hada , Norio Fujii , Atsushi Kawahara , Toru Azuma , Junji Hazama
IPC分类号： G06K9/56 , G06T5/00 , G06T5/30 , H04N1/409 , H04N5/21
CPC分类号： G06K9/56
摘要： Two-dimensional pattern detecting apparatus provided with register for serially receiving binary signals obtained from analog signals of a two-dimensional pattern and adapted to divide the pattern into pixels and to represent the density of bright and dark for pixels by the binary signals. The apparatus further includes a processing circuit adapted to compare with predetermined patterns a pattern composed of 8 peripheral pixels of a partial area of 3.times.3 pixels within the two-dimensional pattern, on the basis of the binary signals stored in the register. The processing circuit outputs a binary signal of a logic value stored in said register corresponding to a central pixel of the partial area when the pattern of the 8 pixels coincides with one of said predetermined patterns, and to outputs a binary signal of a logic value prevailing in 8 binary signals stored in the register corresponding to the 8 pixels when the pattern of the 8 pixels does not coincide with any of the predetermined patterns.
摘要翻译：二维图案检测装置设置有用于串行接收从二维图案的模拟信号获得的二进制信号的寄存器，并且适于将图案划分为像素并且通过二进制信号表示像素的亮和暗的密度。该装置还包括处理电路，其适于根据存储在寄存器中的二进制信号，与二维图案中的3×3像素的部分区域的8个周边像素组成的图案与预定图案进行比较。当8个像素的图案与所述预定图案中的一个一致时，处理电路输出存储在所述寄存器中的对应于该部分区域的中心像素的逻辑值的二进制信号，并输出主要的逻辑值的二进制信号当8像素的图案与任何预定图案不一致时，存储在对应于8个像素的寄存器中的8个二进制信号。

7. 发明授权

US06200710B1 Methods for producing segmented reticles 失效
标题翻译：生产分段标线的方法
公开(公告)号：US06200710B1
公开(公告)日：2001-03-13
申请号：US09272930
申请日：1999-03-18
申请人： Kazunari Hada
发明人： Kazunari Hada
IPC分类号： G03F900
CPC分类号： G03F1/20 , H01J37/3026 , H01J2237/30416 , H01J2237/31762
摘要： Methods are disclosed for making reticles for charged-particle-beam (CPB) microlithography and for using such reticle for making CPB microlithographic exposures using divided-pattern exposure. The reticles are made using data, generated from corresponding LSI design data by a “data generator” (e.g., computer), and stored as a reticle-pattern data file in a memory. Corresponding data for controlling a CPB microlithographic exposure apparatus (using the reticle) are stored in an exposure data file. Of the data stored in these files, the reticle-pattern data is routed to a host computer for a reticle-writing device. The reticle writing device produces a pattern on a segmented reticle according to the data. Exposure data corresponding to the reticle-pattern data are routed to a host computer of a CPB microlithographic exposure apparatus. The host computer of the CPB exposure apparatus utilizes the data to drive the CPB exposure apparatus to perform transfer of the pattern from the reticle to the substrate.
摘要翻译：公开了用于制造用于带电粒子束（CPB）微光刻的掩模版和使用这种掩模版使用分割图案曝光进行CPB微光刻曝光的方法。使用由“数据发生器”（例如，计算机）从相应的LSI设计数据生成的数据制作标线，并作为标线图案数据文件存储在存储器中。用于控制CPB微光刻曝光设备（使用掩模版）的相应数据被存储在曝光数据文件中。在这些文件中存储的数据中，标线图案数据被路由到用于标线书写装置的主计算机。掩模版写入装置根据数据在分段掩模版上产生图案。对应于标线图案数据的曝光数据被路由到CPB微光刻曝光设备的主计算机。 CPB曝光装置的主计算机利用该数据驱动CPB曝光装置，以将图案从掩模版转移到基板。

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