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1. 发明申请

US20090051280A1 LIGHT-EMITTING DEVICE, METHOD FOR MANUFACTURING LIGHT-EMITTING DEVICE, AND SUBSTRATE PROCESSING APPARATUS 审中-公开
标题翻译：发光装置，制造发光装置的方法和基板处理装置
公开(公告)号：US20090051280A1
公开(公告)日：2009-02-26
申请号：US12279405
申请日：2007-02-13
申请人： Kazuki Moyama , Yasushi Yagi , Shingo Watanabe , Chuichi Kawamura , Kimihiko Yoshino , Tadahiro Ohmi
发明人： Kazuki Moyama , Yasushi Yagi , Shingo Watanabe , Chuichi Kawamura , Kimihiko Yoshino , Tadahiro Ohmi
IPC分类号： H01J1/62 , H01L21/00 , H05B33/10
CPC分类号： H05B33/26 , H01L51/5221 , H05B33/22
摘要： Disclosed is a light-emitting device including a first electrode; a second electrode opposite to the first electrode; and an organic layer that is formed between the first electrode and the second electrode and includes a light-emitting layer. The second electrode includes a conductive protection layer that is formed on the organic layer so as to protect the organic layer and a conductive main electrode layer that is formed on the protection layer.
摘要翻译：公开了一种发光装置，其包括第一电极; 与所述第一电极相对的第二电极; 以及形成在第一电极和第二电极之间并且包括发光层的有机层。第二电极包括形成在有机层上以便保护有机层的导电保护层和形成在保护层上的导电主电极层。

2. 发明授权

US08263174B2 Light emitting device and method for manufacturing light emitting device 有权
标题翻译：发光装置及其制造方法
公开(公告)号：US08263174B2
公开(公告)日：2012-09-11
申请号：US12304316
申请日：2007-06-13
申请人： Yasushi Yagi , Shingo Watanabe , Toshihisa Nozawa , Chuichi Kawamura , Kimihiko Yoshino , Tadahiro Ohmi
发明人： Yasushi Yagi , Shingo Watanabe , Toshihisa Nozawa , Chuichi Kawamura , Kimihiko Yoshino , Tadahiro Ohmi
IPC分类号： B05D5/06 , B05D5/12 , C23C16/00 , H01J9/00
CPC分类号： H01L51/001 , C23C14/12 , C23C14/28 , H01L51/56
摘要： Disclosed is a light emitting device manufacturing apparatus including a plurality of processing chambers for performing a substrate processing for forming, on a target substrate, a light emitting device having multiple layers including an organic layer, wherein each of the plurality of processing chambers is configured to perform a substrate process on the target substrate while maintaining the target substrate such that its device forming surface, on which the light emitting device is to be formed, is oriented toward a direction opposite to a direction of gravity.
摘要翻译：公开了一种发光器件制造设备，包括：多个处理室，用于执行用于在目标衬底上形成包括有机层的多层的发光器件的衬底处理，其中，所述多个处理室中的每一个被配置为在目标衬底上执行衬底处理，同时保持目标衬底，使得要在其上形成发光器件的器件形成表面朝向与重力方向相反的方向。

3. 发明申请

US20090156084A1 LIGHT EMITTING DEVICE AND METHOD FOR MANUFACTURING LIGHT EMITTING DEVICE 有权
标题翻译：发光装置及制造发光装置的方法
公开(公告)号：US20090156084A1
公开(公告)日：2009-06-18
申请号：US12304316
申请日：2007-06-13
申请人： Yasushi Yagi , Shingo Watanabe , Toshihisa Nozawa , Chuichi Kawamura , Kimihiko Yoshino , Tadahiro Ohmi
发明人： Yasushi Yagi , Shingo Watanabe , Toshihisa Nozawa , Chuichi Kawamura , Kimihiko Yoshino , Tadahiro Ohmi
IPC分类号： H01J9/00 , H05B33/10
CPC分类号： H01L51/001 , C23C14/12 , C23C14/28 , H01L51/56
摘要： Disclosed is a light emitting device manufacturing apparatus including a plurality of processing chambers for performing a substrate processing for forming, on a target substrate, a light emitting device having multiple layers including an organic layer, wherein each of the plurality of processing chambers is configured to perform a substrate process on the target substrate while maintaining the target substrate such that its device forming surface, on which the light emitting device is to be formed, is oriented toward a direction opposite to a direction of gravity.
摘要翻译：公开了一种发光器件制造设备，包括：多个处理室，用于执行用于在目标衬底上形成包括有机层的多层的发光器件的衬底处理，其中，所述多个处理室中的每一个被配置为在目标衬底上执行衬底处理，同时保持目标衬底，使得要在其上形成发光器件的器件形成表面朝向与重力方向相反的方向。

4. 发明申请

US20120001102A1 HIGHLY CLEAN AND HOT VALVE 审中-公开
标题翻译：高清洁和高温阀
公开(公告)号：US20120001102A1
公开(公告)日：2012-01-05
申请号：US12864382
申请日：2009-01-21
申请人： Yasuhiro Chiba , Kohei Yamamoto , Hiroshi Takada , Kota Koizumi , Yasushi Yagi , Shingo Watanabe , Yuji Ono , Hiroshi Kaneko , Koyu Hasegawa
发明人： Yasuhiro Chiba , Kohei Yamamoto , Hiroshi Takada , Kota Koizumi , Yasushi Yagi , Shingo Watanabe , Yuji Ono , Hiroshi Kaneko , Koyu Hasegawa
IPC分类号： F16K31/122
CPC分类号： F16K41/10 , F16K31/126 , F16K31/1268
摘要： A highly clean and high temperature valve apparatus includes a valve driving unit and a valve casing connected to a bonnet supporting a valve stem slidably. A stem portion has one end positioned in a circumferential wall closed at its two ends by upper and lower covers, and supports one end of the valve stem with its other end extending through the lower cover. The stem portion has its ends supported respectively by first and second bellows for closing an axial through hole of the lower cover tightly. A first pipe communicates with a first space isolated by the first bellows, and a second pipe communicates with a second space isolated by the first bellows. The fluid quantities in the first and second spaces are increased or decreased relative to each other, thereby to drive the stem portion supported in a floating state by the first and second bellows.
摘要翻译：高度清洁和高温的阀门装置包括阀驱动单元和阀壳，其可滑动地连接到支撑阀杆的阀盖。杆部分具有位于周向壁的一端，其两端通过上盖和下盖封闭，并且支撑阀杆的一端，其另一端延伸穿过下盖。杆部分的端部分别由第一和第二波纹管支撑，用于紧密地封闭下盖的轴向通孔。第一管与由第一波纹管隔离的第一空间连通，第二管与由第一波纹管隔离的第二空间连通。第一和第二空间中的流体量相对于彼此增加或减小，从而驱动由第一和第二波纹管以浮动状态支撑的杆部。

5. 发明申请

US20100000469A1 DEPOSITION APPARATUS FOR ORGANIC EL AND EVAPORATING APPARATUS 审中-公开
标题翻译：有机EL和蒸发装置的沉积装置
公开(公告)号：US20100000469A1
公开(公告)日：2010-01-07
申请号：US12494453
申请日：2009-06-30
申请人： Yasushi Yagi , Shingo Watanabe , Yuji Ono , Hiroshi Kaneko , Koyu Hasegawa , Mitsuaki Komino
发明人： Yasushi Yagi , Shingo Watanabe , Yuji Ono , Hiroshi Kaneko , Koyu Hasegawa , Mitsuaki Komino
IPC分类号： C23C16/54
CPC分类号： C23C14/26 , C23C14/243 , H01L51/001
摘要： Provided is a deposition apparatus for organic EL capable of allowing vapor of a film forming material to be vapor deposited on a target object to be uniformly heated. A deposition apparatus, which performs a film forming process by vapor depositing a film forming material on a target object in a depressurized processing chamber, includes an evaporating head having a vapor discharge opening, disposed in the processing chamber, for discharging vapor of the film forming material. Inside the evaporating head, provided is a heater receiving member which is sealed with respect to an inside of the processing chamber, and installed is a communication path which allows the heater receiving member to communicate with an outside of the processing chamber. A power supply line for a heater received in the heater receiving member is disposed in the communication path and extended to the outside of the processing chamber.
摘要翻译：本发明提供一种能够使成膜材料的蒸气气相沉积在目标物体上以均匀加热的有机EL的沉积装置。通过在减压处理室中对目标物体上的成膜材料进行气相沉积而进行成膜处理的沉积装置包括具有蒸气排出口的蒸发头，设置在处理室中，用于排出成膜用蒸气材料。在蒸发头内部设置有相对于处理室的内部密封的加热器接收构件，并且设置有允许加热器接收构件与处理室的外部连通的连通路径。用于接收在加热器接收构件中的加热器的电源线设置在连通路径中并延伸到处理室的外部。

6. 发明申请

US20120162769A1 IMAGING LENS 有权
标题翻译：成像镜头
公开(公告)号：US20120162769A1
公开(公告)日：2012-06-28
申请号：US13316690
申请日：2011-12-12
申请人： Hisanori Suzuki , Shingo Watanabe , Kenichi Kamada , Kazuo Matsuoka
发明人： Hisanori Suzuki , Shingo Watanabe , Kenichi Kamada , Kazuo Matsuoka
IPC分类号： G02B13/18 , G02B27/42
CPC分类号： G02B13/0045 , G02B27/0037
摘要： An imaging lens with large aperture ratio, high-performance and low-cost is provided, which is applied to an imaging element of a small-size and high resolution, in which aberration is corrected satisfactorily and sufficient diffraction resolution is achieved. An imaging lens includes a first lens, a second lens, a third lens, a fourth lens, and a fifth lens arranged in sequence from an object side, wherein both surfaces of each lens are formed from aspheric surface, a diffraction optics surface exerting chromatic dispersion function is arranged on a surface on an image side of the second lens, each lens is configured from plastic material, and an aperture ratio is equal to or smaller than F/2.4.
摘要翻译：提供了一种具有大孔径比，高性能和低成本的成像透镜，其被应用于小尺寸和高分辨率的成像元件，其中像差被令人满意地校正并且实现了足够的衍射分辨率。成像透镜包括从物体侧依次排列的第一透镜，第二透镜，第三透镜，第四透镜和第五透镜，其中每个透镜的两个表面由非球面形成，衍射光学表面施加彩色色散功能被布置在第二透镜的像侧的表面上，每个透镜由塑料材料构成，孔径比等于或小于F / 2.4。

7. 发明申请

US20110255177A1 IMAGING LENS 有权
标题翻译：成像镜头
公开(公告)号：US20110255177A1
公开(公告)日：2011-10-20
申请号：US13168430
申请日：2011-06-24
申请人： Hisanori Suzuki , Shingo Watanabe , Ichiro Kurihara , Kazuo Matsuoka
发明人： Hisanori Suzuki , Shingo Watanabe , Ichiro Kurihara , Kazuo Matsuoka
IPC分类号： G02B13/18
CPC分类号： G02B13/0025 , G02B5/1895 , G02B13/18 , G02B27/0037 , G02B27/4211
摘要： A concave surface is formed on an object side of a plastic lens of a one-piece construction, and a convex surface is formed on an image-point side thereof. The concave and convex surfaces are aspherical. A diffractive optical surface that exerts a chromatic dispersion ability is formed on the convex surface, and conditional expressions (1) and (2) below are met. 0.45
摘要翻译：在一体结构的塑料透镜的物体侧形成凹面，在其像点侧形成凸面。凹凸表面是非球面的。在凸面上形成发挥色散能力的衍射光学面，满足下述条件式（1）和（2）。 0.45

8. 发明授权

US07989027B2 Metal gasket material plate and method for manufacturing the same 有权
标题翻译：金属垫片材料板及其制造方法
公开(公告)号：US07989027B2
公开(公告)日：2011-08-02
申请号：US11965910
申请日：2007-12-28
申请人： Tsunehiko Abe , Tomokazu Nakanishi , Shingo Watanabe , Yoshiharu Takada , Ichiro Goto , Shinsuke Mochizuki , Kenji Okubo , Yasuaki Nagai
发明人： Tsunehiko Abe , Tomokazu Nakanishi , Shingo Watanabe , Yoshiharu Takada , Ichiro Goto , Shinsuke Mochizuki , Kenji Okubo , Yasuaki Nagai
IPC分类号： F16J15/08
CPC分类号： F16J15/0818 , F16J15/0825 , F16J15/122 , F16J2015/085 , F16J2015/0856 , F16J2015/0868 , Y10T428/31678
摘要： The present invention is intended to provide a metal gasket material plate with which exfoliation of the coating or blister can be prevented even if it is used in the presence of an electrolyte aqueous solution and which can be manufactured through a process without use of hexavalent chromium in consideration of the environment, etc.The present, invention relates to a metal gasket material plate comprising a metal plate 1 having a rubber layer 4 on one side or both sides thereof through an adhesive layer 3, wherein a rust-resistant pigment is added to both of said adhesive layer 3 and said rubber layer 4.
摘要翻译：本发明旨在提供一种金属衬垫材料板，其即使在电解质水溶液存在下使用也可以防止涂层或泡罩的剥离，并且可以通过不使用六价铬的方法制造考虑环境等。本发明涉及一种金属垫片材料板，其包括通过粘合剂层3在其一侧或两侧上具有橡胶层4的金属板1，其中加入防锈颜料所述粘合剂层3和所述橡胶层4均为两者。

9. 发明授权

US07887692B2 Palladium plating solution 有权
标题翻译：钯镀液
公开(公告)号：US07887692B2
公开(公告)日：2011-02-15
申请号：US11711516
申请日：2007-02-27
申请人： Shingo Watanabe , Junji Ohnishi , Hiroshi Wachi , Takayuki Sone
发明人： Shingo Watanabe , Junji Ohnishi , Hiroshi Wachi , Takayuki Sone
IPC分类号： C25D3/50 , C25D3/60 , C25D3/56 , C23C16/00
CPC分类号： C25D3/50 , C25D3/567 , C25D5/12 , H05K3/244
摘要： The invention provides a plating solution capable of forming a palladium plating film which can further improve solder characteristics in surface treatment of a composition made of a nickel plating film, a palladium plating film and a gold plating film on a surface of a conductor formed from a metal such as copper. In a palladium plating solution of the invention containing a soluble palladium salt and an electrically conductive salt having a liquid composition containing germanium, the amount of the soluble palladium salt is 0.1 g/l to 50 g/l in terms of a reduced value of palladium metal, the amount of the electrically conductive salt is 10 g/l to 400 g/l and the amount of the germanium is 0.1 mg/l to 1000 mg/l.
摘要翻译：本发明提供一种能够形成钯电镀膜的电镀液，其可以进一步提高由镀镍膜，镀钯膜和镀金膜构成的组合物的表面处理中的焊料特性，金属如铜。在含有可溶性钯盐和含有锗的液体组合物的导电盐的本发明的钯电镀溶液中，根据钯的还原值，可溶性钯盐的量为0.1g / l至50g / l 金属，导电盐的量为10g / l至400g / l，锗的量为0.1mg / l至1000mg / l。

10. 发明申请

US20100071623A1 EVAPORATING APPARATUS 审中-公开
标题翻译：蒸气装置
公开(公告)号：US20100071623A1
公开(公告)日：2010-03-25
申请号：US12441934
申请日：2007-10-01
申请人： Shingo Watanabe , Yuji Ono , Koyu Hasegawa , Masahiro Ogawa , Kouichi Honda
发明人： Shingo Watanabe , Yuji Ono , Koyu Hasegawa , Masahiro Ogawa , Kouichi Honda
IPC分类号： C23C16/00
CPC分类号： C23C14/12 , C23C14/243
摘要： Disclosed is an evaporating apparatus for performing a film forming process on a target object to be processed by vapor deposition, wherein a processing chamber and a vapor generating chamber are disposed adjacent to each other, gas exhaust mechanisms for depressurizing an inside of the processing chamber and an inside of the vapor generating chamber are installed, a vapor discharge opening for discharging a vapor of the film forming material is disposed in the processing chamber, vapor generating units for vaporizing the film forming material and control valves for controlling a supply of the vapor of the film forming material are disposed in the vapor generating chamber, and flow paths, which are not exposed to an outside of the processing chamber and the vapor generating chamber, for supplying the vapor of the film forming material generated in the vapor generating units to the vapor discharge opening are installed.
摘要翻译：本发明公开了一种用于对通过气相沉积处理的目标物体进行成膜处理的蒸发装置，其中处理室和蒸汽发生室彼此相邻设置，用于对处理室内部进行减压的排气机构，蒸汽发生室内部安装有用于排出成膜材料的蒸汽的蒸汽排放口，用于蒸发成膜材料的蒸汽发生单元和用于控制成膜材料供应的控制阀成膜材料设置在蒸汽发生室中，并且没有暴露于处理室和蒸气发生室的外部的流路用于将在蒸汽发生单元中产生的成膜材料的蒸汽供应到安装蒸汽排放口。

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