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1. 发明授权

US07499146B2 Lithographic apparatus and device manufacturing method, an integrated circuit, a flat panel display, and a method of compensating for cupping 有权
标题翻译：平版印刷设备和器件制造方法，集成电路，平板显示器以及补罐方法
公开(公告)号：US07499146B2
公开(公告)日：2009-03-03
申请号：US11252877
申请日：2005-10-19
申请人： Kars Zeger Troost , Johannes Jacobus Matheus Baselmans , Arno Jan Bleeker , Louis Markoya , Neal Callan , Nicholas K. Eib
发明人： Kars Zeger Troost , Johannes Jacobus Matheus Baselmans , Arno Jan Bleeker , Louis Markoya , Neal Callan , Nicholas K. Eib
IPC分类号： G03B27/54 , G03B27/42
CPC分类号： G03F7/70291 , G03F7/70275 , G03F7/70358
摘要： The tilt and position of individually controllable element are simultaneously adjusted to allow a greater range of contrasts to be achieved. This can also be used to compensate for cupping of individually controllable elements. Simultaneous adjustment of both the position and tilt of the individually controllable elements can be achieved by two electrodes operable over a range of values.
摘要翻译：同时调节独立可控元件的倾斜和位置，以实现更大范围的对比度。这也可以用于补偿单独可控元件的拔罐。可以通过在一定范围的值范围内可操作的两个电极来实现对独立可控元件的位置和倾斜的同时调节。

2. 发明授权

US07859647B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07859647B2
公开(公告)日：2010-12-28
申请号：US12020947
申请日：2008-01-28
申请人： Arno Jan Bleeker , Johannes Jacobus Matheus Baselmans , Marce Mathijs Theodore Marie Dierichs , Stanislav Smirnov , Christian Wagner , Lev Ryzhikov , Kars Zeger Troost
发明人： Arno Jan Bleeker , Johannes Jacobus Matheus Baselmans , Marce Mathijs Theodore Marie Dierichs , Stanislav Smirnov , Christian Wagner , Lev Ryzhikov , Kars Zeger Troost
IPC分类号： G03B27/54 , G03B27/42
CPC分类号： G03F7/702 , G03F7/70291
摘要： A system and method are used to direct a radiation beam to illuminate non-perpendicularly a patterning array of individually controllable elements used for patterning the radiation beam. The individually controllable elements can change a telecentricity of the radiation beam. Projection of the radiation beam onto the individually controllable elements can be by a concave mirror or use a folding mirror placed in an object field of the individually controllable elements. Alternatively, the individually controllable elements can change the optical axis of the radiation beam.
摘要翻译：系统和方法用于引导辐射束非垂直地照射用于图案化辐射束的单独可控元件的构图阵列。可单独控制的元件可以改变辐射束的远心性。将辐射束投射到可独立控制的元件上可以通过凹面镜或使用放置在单独可控元件的物场中的折叠镜。或者，独立可控元件可以改变辐射束的光轴。

3. 发明授权

US07304718B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07304718B2
公开(公告)日：2007-12-04
申请号：US10919530
申请日：2004-08-17
申请人： Johannes Jacobus Matheus Baselmans , Arno Jan Bleeker , Pieter Willem Herman De Jager , Kars Zeger Troost
发明人： Johannes Jacobus Matheus Baselmans , Arno Jan Bleeker , Pieter Willem Herman De Jager , Kars Zeger Troost
IPC分类号： G03B27/42 , G03B27/54
CPC分类号： G03F7/70383 , G03F7/70291
摘要： An array of individually controllable elements, comprising a plurality of control areas consisting of a plurality of rows of reflectors. Alternate rows of reflectors are actuated in a common manner such that the control areas function as a grating to provide a control element that can be used as a diffractive optical element.
摘要翻译：一组可独立控制的元件，包括由多排反射器组成的多个控制区域。交替的反射体行以常见的方式启动，使得控制区域用作光栅，以提供可用作衍射光学元件的控制元件。

4. 发明申请

US20080137053A1 Lithographic Apparatus and Device Manufacturing Method 有权
标题翻译：光刻设备和器件制造方法
公开(公告)号：US20080137053A1
公开(公告)日：2008-06-12
申请号：US12020947
申请日：2008-01-28
申请人： Arno Jan BLEEKER , Johannes Jacobus Matheus Baselmans , Marce Mathijs Theodore Marie Dierichs , Stanislav Smirnov , Christian Wagner , Lev Ryzhikov , Kars Zeger Troost
发明人： Arno Jan BLEEKER , Johannes Jacobus Matheus Baselmans , Marce Mathijs Theodore Marie Dierichs , Stanislav Smirnov , Christian Wagner , Lev Ryzhikov , Kars Zeger Troost
IPC分类号： G03B27/70
CPC分类号： G03F7/702 , G03F7/70291
摘要： A system and method are used to direct a radiation beam to illuminate non-perpendicularly a patterning array of individually controllable elements used for patterning the radiation beam. The individually controllable elements can change a telecentricity of the radiation beam. Projection of the radiation beam onto the individually controllable elements can be by a concave mirror or use a folding mirror placed in an object field of the individually controllable elements. Alternatively, the individually controllable elements can change the optical axis of the radiation beam.
摘要翻译：系统和方法用于引导辐射束非垂直地照射用于图案化辐射束的单独可控元件的构图阵列。可单独控制的元件可以改变辐射束的远心性。将辐射束投射到可独立控制的元件上可以通过凹面镜或使用放置在单独可控元件的物场中的折叠镜。或者，独立可控元件可以改变辐射束的光轴。

5. 发明授权

US07466394B2 Lithographic apparatus and device manufacturing method using a compensation scheme for a patterning array 有权
标题翻译：使用图案化阵列的补偿方案的光刻设备和器件制造方法
公开(公告)号：US07466394B2
公开(公告)日：2008-12-16
申请号：US11312638
申请日：2005-12-21
申请人： Kars Zeger Troost , Johannes Jacobus Matheus Baselmans
发明人： Kars Zeger Troost , Johannes Jacobus Matheus Baselmans
IPC分类号： G03B27/54
CPC分类号： G03F7/70291 , G02B26/0833
摘要： A lithographic apparatus comprising an array of individually controllable elements that modulates a beam of radiation and a projection system that projects the modulated beam onto the substrate. The individually controllable elements are provided with a compensation feature that is arranged to provide compensation radiation that substantially or at least partially cancels out unwanted radiation, such that the unwanted radiation is not projected by the projection system onto the substrate.
摘要翻译：一种光刻设备，包括调制辐射束的独立可控元件阵列和将调制光束投射到衬底上的投影系统。独立可控元件设置有补偿特征，该补偿特征被布置成提供基本上或至少部分地抵消不想要的辐射的补偿辐射，使得不需要的辐射不被投影系统投影到衬底上。

6. 发明授权

US08264667B2 Lithographic apparatus and device manufacturing method using interferometric and other exposure 有权
标题翻译：平版印刷设备和器件制造方法采用干涉式曝光等
公开(公告)号：US08264667B2
公开(公告)日：2012-09-11
申请号：US11417210
申请日：2006-05-04
申请人： Kars Zeger Troost , Johannes Jacobus Matheus Baselmans , James Sherwood Greeneich
发明人： Kars Zeger Troost , Johannes Jacobus Matheus Baselmans , James Sherwood Greeneich
IPC分类号： G03B27/54 , G03B27/42 , G02B27/00
CPC分类号： G03F7/70408
摘要： A lithographic apparatus including an exposure unit that exposes parallel lines on a target area of a substrate by projecting two beams of radiation onto the substrate. The two beams of radiation are projected such that they interfere with each other to form the parallel lines. An actuator continuously moves the substrate relative to the exposure unit, while the exposure unit exposes the parallel lines on the target areas on the substrate.
摘要翻译：一种光刻设备，包括曝光单元，该曝光单元通过将两束辐射投射到基板上而使基板的目标区域上的平行线曝光。两束辐射被投影使得它们彼此干涉以形成平行线。执行器相对于曝光单元连续移动基板，同时曝光单元将平行线暴露在基板上的目标区域上。

7. 发明授权

US07500218B2 Lithographic apparatus, method, and computer program product for generating a mask pattern and device manufacturing method using same 有权
标题翻译：用于产生掩模图案的平版印刷设备，方法和计算机程序产品以及使用其的设备制造方法
公开(公告)号：US07500218B2
公开(公告)日：2009-03-03
申请号：US10919532
申请日：2004-08-17
申请人： Kars Zeger Troost , Johannes Jacobus Matheus Baselmans , Karel Diederick Van Der Mast
发明人： Kars Zeger Troost , Johannes Jacobus Matheus Baselmans , Karel Diederick Van Der Mast
IPC分类号： G06F17/50
CPC分类号： G03F7/70283 , G03F1/36 , G03F7/70291 , G03F7/70441
摘要： Grayscale Optical Proximity Correction device features are added to a mask pattern by convoluting the device features with a two-dimensional correction kernel or two one-dimensional correction kernels to generate grayscale OPC features. The resulting pattern may be used in a projection lithography apparatus having a programmable patterning means that is adapted to generate three or more intensity levels. An iterative process of simulating an aerial image that would be produced by the pattern, comparing the simulation to the desired pattern, and adjusting the OPC features may be used to generate an optimum pattern for projection.
摘要翻译：灰度光学接近校正设备特征通过使用二维校正内核或两个一维校正内核卷积设备特征来添加到掩模图案中，以生成灰度OPC功能。所得到的图案可以用在具有适于产生三个或更多个强度水平的可编程图案形成装置的投影光刻设备中。可以使用模拟由图案产生的空间图像，将模拟与期望图案进行比较以及调整OPC特征的迭代过程来生成用于投影的最佳图案。

8. 发明申请

US20080309899A1 Lithographic Apparatus and Method 有权
标题翻译：平版印刷设备和方法
公开(公告)号：US20080309899A1
公开(公告)日：2008-12-18
申请号：US11763275
申请日：2007-06-14
申请人： Johannes Jacobus Matheus Baselmans , Arno Jan Bleeker
发明人： Johannes Jacobus Matheus Baselmans , Arno Jan Bleeker
IPC分类号： G03B27/68
CPC分类号： G03F7/70291 , G03F7/706
摘要： Systems and methods are provided for measuring aberration in a lithographic apparatus. A radiation beam is modulated using an array of individually controllable elements, and the modulated beam is projected using a projection system. A pattern is provided on the array of individually controllable elements to modulate the radiation beam, and the pattern comprises a repeating structure that is formed from a plurality of features that are dimensioned such that first order diffraction of the radiation beam substantially fills the pupil of the projection system. A sensor detects the projected radiation and measures interference in the radiation projected by the projection system. Aberration in the detected radiation beam is then measured.
摘要翻译：提供了用于测量光刻设备中的像差的系统和方法。使用单独可控元件的阵列来调制辐射束，并且使用投影系统投影调制束。在单独可控元件的阵列上提供图案以调制辐射束，并且图案包括由多个特征形成的重复结构，其尺寸使得辐射束的一阶衍射基本上填充了辐射束的瞳孔投影系统传感器检测投射的辐射并测量由投影系统投射的辐射的干扰。然后测量检测到的辐射束中的畸变。

9. 发明授权

US08189172B2 Lithographic apparatus and method 有权
标题翻译：平版印刷设备和方法
公开(公告)号：US08189172B2
公开(公告)日：2012-05-29
申请号：US11763275
申请日：2007-06-14
申请人： Johannes Jacobus Matheus Baselmans , Arno Jan Bleeker
发明人： Johannes Jacobus Matheus Baselmans , Arno Jan Bleeker
IPC分类号： G01B9/02 , G03B27/32 , G03B27/42 , G03B27/54
CPC分类号： G03F7/70291 , G03F7/706
摘要： Systems and methods are provided for measuring aberration in a lithographic apparatus. A radiation beam is modulated using an array of individually controllable elements, and the modulated beam is projected using a projection system. A pattern is provided on the array of individually controllable elements to modulate the radiation beam, and the pattern comprises a repeating structure that is formed from a plurality of features that are dimensioned such that first order diffraction of the radiation beam substantially fills the pupil of the projection system. A sensor detects the projected radiation and measures interference in the radiation projected by the projection system. Aberration in the detected radiation beam is then measured.
摘要翻译：提供了用于测量光刻设备中的像差的系统和方法。使用单独可控元件的阵列来调制辐射束，并且使用投影系统投影调制束。在单独可控元件的阵列上提供图案以调制辐射束，并且图案包括由多个特征形成的重复结构，其尺寸使得辐射束的一阶衍射基本上填充了辐射束的瞳孔投影系统传感器检测投射的辐射并测量由投影系统投射的辐射的干扰。然后测量检测到的辐射束中的畸变。

10. 发明授权

US07459710B2 Lithographic apparatus, method for calibrating and device manufacturing method 有权
标题翻译：光刻设备，校准方法及器件制造方法
公开(公告)号：US07459710B2
公开(公告)日：2008-12-02
申请号：US11705147
申请日：2007-02-12
申请人： Johannes Jacobus Matheus Baselmans , Arno Jan Bleeker
发明人： Johannes Jacobus Matheus Baselmans , Arno Jan Bleeker
IPC分类号： G01N21/86
CPC分类号： G03F7/70516 , G03F7/70291 , G03F7/70591
摘要： To calibrate a lithographic apparatus having a programmable patterning means, a sensor, such as a CCD, CMOS sensor or photo-diode array, having detector elements larger than the size of a spot corresponding to a single pixel of the programmable patterning means is used. Pixels are selectively activated singly or in groups.
摘要翻译：为了校准具有可编程图案形成装置的光刻设备，使用具有大于对应于可编程图案形成装置的单个像素的点的尺寸的检测器元件的诸如CCD，CMOS传感器或光电二极管阵列的传感器。像素被单独或分组选择性地激活。

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