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1. 发明授权

US07859647B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07859647B2
公开(公告)日：2010-12-28
申请号：US12020947
申请日：2008-01-28
申请人： Arno Jan Bleeker , Johannes Jacobus Matheus Baselmans , Marce Mathijs Theodore Marie Dierichs , Stanislav Smirnov , Christian Wagner , Lev Ryzhikov , Kars Zeger Troost
发明人： Arno Jan Bleeker , Johannes Jacobus Matheus Baselmans , Marce Mathijs Theodore Marie Dierichs , Stanislav Smirnov , Christian Wagner , Lev Ryzhikov , Kars Zeger Troost
IPC分类号： G03B27/54 , G03B27/42
CPC分类号： G03F7/702 , G03F7/70291
摘要： A system and method are used to direct a radiation beam to illuminate non-perpendicularly a patterning array of individually controllable elements used for patterning the radiation beam. The individually controllable elements can change a telecentricity of the radiation beam. Projection of the radiation beam onto the individually controllable elements can be by a concave mirror or use a folding mirror placed in an object field of the individually controllable elements. Alternatively, the individually controllable elements can change the optical axis of the radiation beam.
摘要翻译：系统和方法用于引导辐射束非垂直地照射用于图案化辐射束的单独可控元件的构图阵列。可单独控制的元件可以改变辐射束的远心性。将辐射束投射到可独立控制的元件上可以通过凹面镜或使用放置在单独可控元件的物场中的折叠镜。或者，独立可控元件可以改变辐射束的光轴。

2. 发明申请

US20080137053A1 Lithographic Apparatus and Device Manufacturing Method 有权
标题翻译：光刻设备和器件制造方法
公开(公告)号：US20080137053A1
公开(公告)日：2008-06-12
申请号：US12020947
申请日：2008-01-28
申请人： Arno Jan BLEEKER , Johannes Jacobus Matheus Baselmans , Marce Mathijs Theodore Marie Dierichs , Stanislav Smirnov , Christian Wagner , Lev Ryzhikov , Kars Zeger Troost
发明人： Arno Jan BLEEKER , Johannes Jacobus Matheus Baselmans , Marce Mathijs Theodore Marie Dierichs , Stanislav Smirnov , Christian Wagner , Lev Ryzhikov , Kars Zeger Troost
IPC分类号： G03B27/70
CPC分类号： G03F7/702 , G03F7/70291
摘要： A system and method are used to direct a radiation beam to illuminate non-perpendicularly a patterning array of individually controllable elements used for patterning the radiation beam. The individually controllable elements can change a telecentricity of the radiation beam. Projection of the radiation beam onto the individually controllable elements can be by a concave mirror or use a folding mirror placed in an object field of the individually controllable elements. Alternatively, the individually controllable elements can change the optical axis of the radiation beam.
摘要翻译：系统和方法用于引导辐射束非垂直地照射用于图案化辐射束的单独可控元件的构图阵列。可单独控制的元件可以改变辐射束的远心性。将辐射束投射到可独立控制的元件上可以通过凹面镜或使用放置在单独可控元件的物场中的折叠镜。或者，独立可控元件可以改变辐射束的光轴。

3. 发明授权

US07023525B2 Imaging apparatus 有权
公开(公告)号：US07023525B2
公开(公告)日：2006-04-04
申请号：US10883791
申请日：2004-07-06
申请人： Arno Jan Bleeker , Pieter Willem Herman De Jager , Jason Douglas Hintersteiner , Borgert Kruizinga , Matthew Eugene McCarthy , Mark Oskotsky , Lev Ryzhikov , Lev Sakin , Stanislav Smirnov , Bart Snijders , Karel Diederick Van Der Mast , Huibert Visser
发明人： Arno Jan Bleeker , Pieter Willem Herman De Jager , Jason Douglas Hintersteiner , Borgert Kruizinga , Matthew Eugene McCarthy , Mark Oskotsky , Lev Ryzhikov , Lev Sakin , Stanislav Smirnov , Bart Snijders , Karel Diederick Van Der Mast , Huibert Visser
IPC分类号： G03B27/54 , G03B27/42 , G03B27/32 , G03B27/52
CPC分类号： G03F7/70283 , G03F7/70291
摘要： An imaging apparatus according to one embodiment of the invention includes a programmable patterning structure configured to pattern a projection beam of radiation according to a desired pattern. The programmable patterning structure includes a plurality of separate patterning sub-elements, each sub-element being configured to generate a patterned sub-beam. At least one of the separate patterning sub-elements is configured to generate a patterned sub-beam whose cross-section contains regions of different intensities. The imaging apparatus also includes a combining structure configured to combine the plurality of patterned sub-beams into a single patterned image, and a projection system configured to project the patterned image onto a target portion of a substrate.

4. 发明授权

US06778257B2 Imaging apparatus 有权
公开(公告)号：US06778257B2
公开(公告)日：2004-08-17
申请号：US10200577
申请日：2002-07-23
申请人： Arno Jan Bleeker , Pieter Willem Herman De Jager , Jason Douglas Hintersteiner , Borgert Kruizinga , Matthew Eugene McCarthy , Mark Oskotsky , Lev Ryzhikov , Lev Sakin , Stanislav Smirnov , Bart Snijders , Karel Diederick Van Der Mast , Huibert Visser
发明人： Arno Jan Bleeker , Pieter Willem Herman De Jager , Jason Douglas Hintersteiner , Borgert Kruizinga , Matthew Eugene McCarthy , Mark Oskotsky , Lev Ryzhikov , Lev Sakin , Stanislav Smirnov , Bart Snijders , Karel Diederick Van Der Mast , Huibert Visser
IPC分类号： G03B2754
CPC分类号： G03F7/70283 , G03F7/70291
摘要： An imaging apparatus according to one embodiment of the invention includes a programmable patterning structure configured to pattern a projection beam of radiation according to a desired pattern. The programmable patterning structure includes a plurality of separate patterning sub-elements, each sub-element being configured to generate a patterned sub-beam. At least one of the separate patterning sub-elements is configured to generate a patterned sub-beam whose cross-section contains regions of different intensities. The imaging apparatus also includes a combining structure configured to combine the plurality of patterned sub-beams into a single patterned image, and a projection system configured to project the patterned image onto a target portion of a substrate.

5. 发明申请

US20060138349A1 Lithographic apparatus and device manufacturing method 审中-公开
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20060138349A1
公开(公告)日：2006-06-29
申请号：US11020567
申请日：2004-12-27
申请人： Arno Bleeker , Johannes Jacobus Baselmans , Marce Mathijs Dierichs , Stanislav Smirnov , Christian Wagner , Lev Ryzhikov , Kars Troost
发明人： Arno Bleeker , Johannes Jacobus Baselmans , Marce Mathijs Dierichs , Stanislav Smirnov , Christian Wagner , Lev Ryzhikov , Kars Troost
IPC分类号： G03F7/20
CPC分类号： G03F7/702 , G03F7/70291
摘要： A system and method are used to direct a radiation beam to illuminate non-perpendicularly a patterning array of individually controllable elements used for patterning the radiation beam. The individually controllable elements can change a telecentricity of the radiation beam. Projection of the radiation beam onto the individually controllable elements can be by a concave mirror or use a folding mirror placed in an object field of the individually controllable elements. Alternatively, the individually controllable elements can change the optical axis of the radiation beam.
摘要翻译：系统和方法用于引导辐射束非垂直地照射用于图案化辐射束的单独可控元件的构图阵列。可单独控制的元件可以改变辐射束的远心性。将辐射束投射到可独立控制的元件上可以通过凹面镜或使用放置在单独可控元件的物场中的折叠镜。或者，独立可控元件可以改变辐射束的光轴。

6. 发明授权

US07289277B2 Relay lens used in an illumination system of a lithography system 有权
标题翻译：用于光刻系统的照明系统的中继透镜
公开(公告)号：US07289277B2
公开(公告)日：2007-10-30
申请号：US10607193
申请日：2003-06-27
申请人： Lev Ryzhikov , Stanislav Smirnov
发明人： Lev Ryzhikov , Stanislav Smirnov
IPC分类号： G02B9/08
CPC分类号： G03F7/70066 , G02B13/143 , G02B13/22 , G02B13/24
摘要： A relay lens is provided in an illumination system for use in microlithography. The relay lens can be used to uniformly illuminate a field at a reticle by telecentric light beams with variable aperture size. The relay lens can include first, second, and third lens groups. At least one of the second and third lens groups can include a single lens. This can reduce costs and increase transmission by requiring less CaF2 because fewer optical elements are used compared to prior systems.
摘要翻译：中继透镜设置在用于微光刻的照明系统中。中继透镜可以用于通过具有可变孔径尺寸的远心光束来均匀地照射光罩处的场。中继透镜可以包括第一，第二和第三透镜组。第二和第三透镜组中的至少一个可以包括单个透镜。这可以通过要求更少的CaF 2 2来降低成本并增加传输，因为与现有系统相比，使用较少的光学元件。

7. 发明申请

US20060245094A1 Method for improved optical design using deterministically defined surfaces 有权
标题翻译：使用确定性限定的表面改进光学设计的方法
公开(公告)号：US20060245094A1
公开(公告)日：2006-11-02
申请号：US11117490
申请日：2005-04-29
申请人： Nora-Jean Harned , Richard Gontin , Robert Harned , Azat Latypov , Stanislav Smirnov
发明人： Nora-Jean Harned , Richard Gontin , Robert Harned , Azat Latypov , Stanislav Smirnov
IPC分类号： G02B7/00
CPC分类号： G02B27/0012
摘要： An embodiment of the present invention provides a method for designing optical surfaces. According to this method, m optical surfaces are defined, such that each successive optical surface receives a wavefront from a previous optical surface. Wavefront aberrations caused by each optical surface are calculated. The changes at each respective optical surface required to compensate for the wavefront aberration caused by the respective optical surfaces are then calculated. A desired optical profile for each of the m optical surfaces is determined in accordance with the calculated changes to each respective optical surface.
摘要翻译：本发明的实施例提供了一种用于设计光学表面的方法。根据该方法，定义m个光学表面，使得每个连续的光学表面从先前的光学表面接收波前。计算由每个光学表面引起的波前像差。然后计算补偿由各个光学表面引起的波前像差所需的每个相应的光学表面的变化。根据对每个相应的光学表面的计算的改变来确定每个m个光学表面的期望的光学轮廓。

8. 发明授权

US06741362B2 Method, system, and computer program product for determining refractive index distribution 有权
$Method, system, and computer program product for determining refractive index distribution$
标题翻译：确定折射率分布的方法
公开(公告)号：US06741362B2
公开(公告)日：2004-05-25
申请号：US10138714
申请日：2002-05-06
申请人： Stanislav Smirnov , Mark L. Oskotsky , Lev Sakin , John D. Martin
发明人： Stanislav Smirnov , Mark L. Oskotsky , Lev Sakin , John D. Martin
IPC分类号： G01N2141
CPC分类号： G01N21/45
摘要： The present invention provides a method and system for determining three-dimensional refractive gradient index distribution. The method and system of the present invention determine inhomogeneity data and calculate index of refraction changes in three-dimensions (3D). The method and system provide 3D modeling of an optical object or system that determines the three-dimensional distribution of the refractive index in the object. In one embodiment, the optical object is a blank. In different embodiments, the optical system is more than one blank. In alternative embodiments, the optical system can be a projection optics system that can include optical components such as lenses, filters, plates, and prisms. The present invention also provides a method for selecting a plurality of preferred optical elements to assemble a composite optical system with predetermined parameters.
摘要翻译：本发明提供一种用于确定三维折射梯度指数分布的方法和系统。本发明的方法和系统确定不均匀性数据并计算三维（3D）中的折射变化指数。该方法和系统提供了确定物体中折射率的三维分布的光学对象或系统的3D建模。在一个实施例中，光学对象是空白的。在不同的实施例中，光学系统是多于一个空白的。在替代实施例中，光学系统可以是可以包括诸如透镜，滤光器，板和棱镜的光学部件的投影光学系统。本发明还提供一种用于选择多个优选光学元件以组合具有预定参数的复合光学系统的方法。

9. 发明授权

US07511798B2 Off-axis catadioptric projection optical system for lithography 有权
标题翻译：用于光刻的离轴反射折射投影光学系统
公开(公告)号：US07511798B2
公开(公告)日：2009-03-31
申请号：US10902469
申请日：2004-07-30
申请人： Stanislav Smirnov , Mark Oskotsky
发明人： Stanislav Smirnov , Mark Oskotsky
IPC分类号： G03B27/42 , G03B27/70
CPC分类号： G03B27/54 , G02B17/0812 , G03F7/70225
摘要： An off-axis catadioptric projection optical systems for use in lithography tools for processing modulated light used to form an image on a substrate is provided. In one embodiment the optical system includes an off-axis mirror segment, a fold mirror, a relay, an aperture stop and a refractive lens group. Modulated light is transmitted through the system to form an image on a substrate. In a second embodiment the projection system includes an off-axis mirror segment, an aperture stop and a refractive lens group. In a third embodiment the projection system includes an off-axis mirror segment, a negative refractive lens group, a concave mirror, a relay, an aperture stop, and a refractive lens group. A method to produce a device using a lithographic apparatus including a projection system with an off-axis mirror segment as the first element in a projection optics system is also provided.
摘要翻译：提供了用于光刻工具中用于处理用于在基板上形成图像的调制光的离轴反射折射投影光学系统。在一个实施例中，光学系统包括离轴镜片段，折叠镜，继电器，孔径光阑和折射透镜组。调制光通过系统透射以在基底上形成图像。在第二实施例中，投影系统包括离轴镜片段，孔径光阑和折射透镜组。在第三实施例中，投影系统包括离轴镜片段，负折射透镜组，凹面镜，继电器，孔径光阑和折射透镜组。还提供了使用包括具有离轴镜片段的投影系统作为投影光学系统中的第一元素的光刻设备的方法。

10. 发明授权

US07317583B2 High numerical aperture projection system and method for microlithography 失效
标题翻译：高数值孔径投影系统和微光刻法
公开(公告)号：US07317583B2
公开(公告)日：2008-01-08
申请号：US10224485
申请日：2002-08-21
申请人： Mark L Oskotsky , Stanislav Smirnov
发明人： Mark L Oskotsky , Stanislav Smirnov
IPC分类号： G02B17/08
CPC分类号： G03F7/70225 , G02B17/08 , G02B17/0892 , G03F7/70275
摘要： The present invention relates to a high numerical aperture exposure system having a wafer. The exposure system in the present invention includes a beam-splitter, a reticle, a reticle optical group, where the reticle optical group is placed between the reticle and the beam-splitter, a concave mirror, a concave mirror optical group, where the concave mirror optical group is placed between the concave mirror and the beam-splitter, a fold mirror, where the fold mirror is placed between the beam-splitter and the wafer, and a wafer optical group, where the wafer optical group is placed between the beam-splitter and the wafer. In the present invention, a beam of light is directed through the reticle and the reticle optical group to the beam-splitter, then it is reflected by the beam-splitter onto the concave mirror. Concave mirror reflects the light onto the fold mirror through the beam-splitter. Fold mirror reflects the light onto the wafer through the wafer optical group. The present invention forms an intermediate image between the fold mirror and the wafer optical group. Furthermore, in an embodiment an aperture stop can be placed between the concave mirror optical group and the concave mirror.
摘要翻译：本发明涉及具有晶片的高数值孔径曝光系统。本发明的曝光系统包括光束分离器，光罩，光罩光学组，其中标线片光学组置于光罩和分光器之间，凹面镜，凹面镜光学组，其中凹面反射镜光学组被放置在凹面镜和分光器之间，折叠镜放置在分束器和晶片之间的折叠镜和晶片光学组，其中晶片光学组被放置在光束分配器和晶圆。在本发明中，光束被引导通过光罩和光掩模光学组到分束器，然后被分束器反射到凹面镜上。凹面镜通过分光镜将光反射到折叠镜上。折叠镜通过晶片光学组将光反射到晶片上。本发明在折射镜和晶片光学组之间形成中间图像。此外，在一个实施例中，可以在凹面镜光学组和凹面镜之间设置孔径光阑。

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