专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US08259285B2 Lithographic system, device manufacturing method, setpoint data optimization method, and apparatus for producing optimized setpoint data 有权
标题翻译：光刻系统，器件制造方法，设定点数据优化方法以及用于产生优化设定点数据的装置
公开(公告)号：US08259285B2
公开(公告)日：2012-09-04
申请号：US11638675
申请日：2006-12-14
申请人： Kars Zeger Troost , Jason Douglas Hintersteiner , Patricius Aloysius Jacobus Tinnemans , Wenceslao A. Cebuhar , Ronald P. Albright , Bernardo Kastrup
发明人： Kars Zeger Troost , Jason Douglas Hintersteiner , Patricius Aloysius Jacobus Tinnemans , Wenceslao A. Cebuhar , Ronald P. Albright , Bernardo Kastrup
IPC分类号： G03B27/42
CPC分类号： G03F7/70791 , G03F1/36 , G03F7/70283 , G03F7/70291 , G03F7/70441 , G03F7/705 , G03F7/70558
摘要： An iterative method of producing optimized setpoint data for controlling the actuation of elements of an array of individually controllable elements in a maskless system and systems therefore. The optimization is based on estimation of a device structure that can utilizes one or more of the following factors: the low-pass characteristics of the projection system, the configuration of the illumination system, and the process window properties.
摘要翻译：因此，产生用于控制无掩模系统和系统中的单独可控元件的阵列的元件的致动的优化设定点数据的迭代方法。优化是基于可以利用以下一个或多个因素的设备结构的估计：投影系统的低通特性，照明系统的配置以及处理窗口属性。

2. 发明授权

US07400382B2 Light patterning device using tilting mirrors in a superpixel form 有权
标题翻译：以超像素形式使用倾斜镜的光图案形成装置
公开(公告)号：US07400382B2
公开(公告)日：2008-07-15
申请号：US11116338
申请日：2005-04-28
申请人： Nabila Baba-Ali , Arno Jan Bleeker , Kars Zeger Troost
发明人： Nabila Baba-Ali , Arno Jan Bleeker , Kars Zeger Troost
IPC分类号： G03B27/54
CPC分类号： G03F7/70291 , G02B26/0833 , G03F7/70283 , G03F7/70308 , G09G3/346 , H04N5/7458
摘要： A light patterning system comprises an illumination system that supplies a beam of radiation having a certain wavelength (λ). An array of reflective pixels patterns the beam, wherein the array includes pixels having at least a first tilting mirror that is logically coupled to a second tilting mirror. In an embodiment, the first and second tilting mirrors are (i) substantially adjacent to each other; and (ii) offset in height from each other by a first mirror displacement. A projection system is included that projects the patterned beam onto a target. In alternate embodiment, the array of reflective pixels includes pixels having first through fourth tilting mirrors that are logically coupled to each other. The first through fourth tilting mirrors are (i) respectively offset in height from a reference plane by first through fourth mirror displacements, and (ii) are respectively arranged clockwise in a substantially square pattern.
摘要翻译：光图案化系统包括提供具有一定波长（λ）的辐射束的照明系统。反射像素阵列对光束进行图案化，其中阵列包括至少具有逻辑耦合到第二倾斜镜的第一倾斜镜的像素。在一个实施例中，第一和第二倾斜镜是（i）基本上彼此相邻; 和（ii）通过第一反射镜位移使高度彼此抵消。包括将图案化的光束投影到目标上的投影系统。在替代实施例中，反射像素阵列包括具有彼此逻辑耦合的第一至第四倾斜镜的像素。第一至第四倾斜镜（i）分别通过第一至第四反射镜位移而偏离参考平面，并且（ii）分别以基本上正方形的图案顺时针地布置。

3. 发明授权

US07209217B2 Lithographic apparatus and device manufacturing method utilizing plural patterning devices 有权
标题翻译：利用多个图案形成装置的平版印刷设备和装置制造方法
公开(公告)号：US07209217B2
公开(公告)日：2007-04-24
申请号：US11101635
申请日：2005-04-08
申请人： Kars Zeger Troost
发明人： Kars Zeger Troost
IPC分类号： G03B27/54 , G03B27/42
CPC分类号： G03F7/70291 , G03F7/70275 , G03F7/70283
摘要： A lithographic apparatus includes an illumination system, a patterning system, a projection system, and a combining system. The illumination system supplies a beam of radiation. The patterning system patterns the beam. The patterning system includes at least two arrays of individually controllable elements arranged to be illuminated by respective portions of the beam, each of the arrays pattering the respective portion of the beam. The combining system combines the patterned portions into the patterned beam. The projection system projects the patterned beam onto a target portion of a substrate.
摘要翻译：光刻设备包括照明系统，图案化系统，投影系统和组合系统。照明系统提供一束辐射。图案化系统模拟光束。图案形成系统包括至少两个独立可控元件的阵列，所述阵列布置成由梁的相应部分照射，每个阵列图示波束的相应部分。组合系统将图案化部分组合成图案化的束。投影系统将图案化的光束投射到基板的目标部分上。

4. 发明授权

US09417533B2 Method of operating a patterning device and lithographic apparatus 有权
标题翻译：操作图案形成装置和光刻装置的方法
公开(公告)号：US09417533B2
公开(公告)日：2016-08-16
申请号：US13306728
申请日：2011-11-29
申请人： Vitaliy Prosyentsov , Willem Jurrianus Venema , Kars Zeger Troost , Adrianus Martinus Van der Wielen
发明人： Vitaliy Prosyentsov , Willem Jurrianus Venema , Kars Zeger Troost , Adrianus Martinus Van der Wielen
IPC分类号： G03B27/42 , G03F7/20 , G03F1/44
CPC分类号： G03F7/705 , G03F1/44 , G03F7/70133 , G03F7/70783 , G03F7/70875
摘要： A lithographic reticle is illuminated to transfer a pattern to a substrate, inducing distortions due to heating. The distortions are calculated using reference marks in a peripheral portion of the reticle and measuring changes in their relative positions over time. A plurality of cells are defined for which a system of equations can be solved to calculate a dilation of each cell. In an embodiment, each equation relates positions of pairs of marks to dilations of the cells along a line (s, s1, s2) connecting each pair. Local positional deviations can be calculated for a position by combining calculated dilations for cells between at least one measured peripheral mark and the position. Corrections can be applied in accordance with the result of the calculation. Energy may be applied to the patterning device (for example by thermal input or mechanical actuators) to modify a distribution of the local positional deviations.
摘要翻译：光刻掩模版被照射以将图案转印到基板上，引起由于加热引起的变形。使用标线的周边部分中的参考标记计算变形，并测量其相对位置随时间的变化。定义了可以解决方程组的系统以计算每个单元的扩张的多个单元。在一个实施例中，每个方程将标记对对于沿着连接每对的线（s，s1，s2）的细胞的扩张的位置。可以通过组合至少一个测量的外围标记和位置之间的单元格的计算的扩张来计算位置的局部位置偏差。校正可以根据计算结果进行应用。可以将能量施加到图案形成装置（例如通过热输入或机械致动器）以修改局部位置偏差的分布。

5. 发明授权

US07538855B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07538855B2
公开(公告)日：2009-05-26
申请号：US10914633
申请日：2004-08-10
申请人： Kars Zeger Troost , Johan Christiaan Gerard Hoefnagels , Pieter Willem Herman de Jager
发明人： Kars Zeger Troost , Johan Christiaan Gerard Hoefnagels , Pieter Willem Herman de Jager
IPC分类号： G03B27/54 , G03B27/42
CPC分类号： G03F7/70791 , G03F7/70275
摘要： A system and method use a lithographic apparatus to direct a plurality of patterned beams onto a substrate supported on a substrate table. The patterned beams are projected onto target portions of the substrate and relative displacement between the substrate and the patterned beams causes the beams to be scanned across the substrate. A first projection device projects a first relatively large area patterned beam which extends across a substantial proportion of the substrate. At least one second relatively small area patterned beam is selectively positioned relative to the first projection device at least in a direction transverse to the predetermined direction. The second beam may be used to expose an elongate portion of the substrate which extends in the direction of relative displacement. At least one third patterned beam of relatively small area may be provided which is selectively displaceable relative to the substrate table during relative displacement between the substrate and the first beam. The third patterned beam may be used to expose an elongate portion of the substrate which extends transversely to the direction of relative displacement.
摘要翻译：系统和方法使用光刻设备将多个图案化的光束引导到支撑在衬底台上的衬底上。图案化的光束投影到基板的目标部分上，并且基板和图案化的光束之间的相对位移使得光束跨越基板被扫描。第一投影装置投射第一相对较大面积的图案化的束，其延伸穿过基本上相当大比例的衬底。至少一个第二相对小的区域图案化的光束至少在横向于预定方向的方向上相对于第一投影装置选择性地定位。可以使用第二梁来暴露沿相对位移方向延伸的衬底的细长部分。可以提供相对小面积的至少三分之一图案化的光束，其在衬底和第一光束之间的相对位移期间可相对于衬底台选择性地移位。第三图案化束可以用于暴露横向于相对位移方向延伸的衬底的细长部分。

6. 发明申请

US20080297747A1 Lithographic Apparatus and Device Manufacturing Method 有权
标题翻译：光刻设备和器件制造方法
公开(公告)号：US20080297747A1
公开(公告)日：2008-12-04
申请号：US12170120
申请日：2008-07-09
申请人： Arno Jan BLEEKER , Dominicus Jacobus Petrus Adrianus Franken , Peter C. Kochersperger , Kars Zeger Troost
发明人： Arno Jan BLEEKER , Dominicus Jacobus Petrus Adrianus Franken , Peter C. Kochersperger , Kars Zeger Troost
IPC分类号： G03B27/68 , G03B27/42
CPC分类号： G03F7/707 , G03F7/70283 , G03F7/70291 , G03F7/703 , G03F7/70783
摘要： One or more patterning arrays are mounted to a mounting plate via height adjustment structures that enable the flatness of the active surfaces of the patterning arrays to be controlled. The height adjustment structures may comprise an array of piezoelectric actuators or screws. Alternatively, the backside of the patterning means may be polished to optical flatness and bonded by crystal bonding to an optically flat surface of a rigid mounting body.
摘要翻译：一个或多个图形阵列通过高度调节结构安装到安装板，使得能够控制图案化阵列的有效表面的平坦度。高度调节结构可以包括压电致动器或螺钉的阵列。或者，可以将图案形成装置的背面抛光到光学平面度，并通过晶体结合键合到刚性安装体的光学平坦表面。

7. 发明申请

US20080224251A1 Optimal Rasterization for Maskless Lithography 有权
标题翻译：无掩模光刻的最佳光栅化
公开(公告)号：US20080224251A1
公开(公告)日：2008-09-18
申请号：US11686136
申请日：2007-03-14
申请人： Kars Zeger Troost , Jason Douglas Hintersteiner , Minne Cuperus , Kamen Hristov Chilov , Richard Carl Zimmerman , Ronnie Florentius Van T. Westeinde
发明人： Kars Zeger Troost , Jason Douglas Hintersteiner , Minne Cuperus , Kamen Hristov Chilov , Richard Carl Zimmerman , Ronnie Florentius Van T. Westeinde
IPC分类号： H01L29/00 , G03B27/54 , G03C1/00 , G06F3/038
CPC分类号： G03F7/70791 , G03F7/70291 , G03F7/70358 , G03F7/70475 , G03F7/70508
摘要： A lithographic system is provided in which an extent of overlap between pattern sections is adjusted in order to match a size of a pattern section to a size of a repeating portion of the pattern to be formed.
摘要翻译：提供了一种光刻系统，其中调整图案部分之间的重叠程度，以便将图案部分的尺寸与要形成的图案的重复部分的尺寸相匹配。

8. 发明授权

US07411652B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：光刻设备和器件制造方法
公开(公告)号：US07411652B2
公开(公告)日：2008-08-12
申请号：US10946333
申请日：2004-09-22
申请人： Arno Jan Bleeker , Dominicus Jacobus Petrus Adrianus Franken , Peter C. Kochersperger , Kars Zeger Troost
发明人： Arno Jan Bleeker , Dominicus Jacobus Petrus Adrianus Franken , Peter C. Kochersperger , Kars Zeger Troost
IPC分类号： G03B27/42 , G03B27/62
CPC分类号： G03F7/707 , G03F7/70283 , G03F7/70291 , G03F7/703 , G03F7/70783
摘要： One or more patterning arrays are mounted to a mounting plate via height adjustment structures that enable the flatness of the active surfaces of the patterning arrays to be controlled. The height adjustment structures may comprise an array of piezoelectric actuators or screws. Alternatively, the backside of the patterning means may be polished to optical flatness and bonded by crystal bonding to an optically flat surface of a rigid mounting body.
摘要翻译：一个或多个图形阵列通过高度调节结构安装到安装板，使得能够控制图案化阵列的有效表面的平坦度。高度调节结构可以包括压电致动器或螺钉的阵列。或者，可以将图案形成装置的背面抛光到光学平面度，并通过晶体结合键合到刚性安装体的光学平坦表面。

9. 发明授权

US07123348B2 Lithographic apparatus and method utilizing dose control 有权
标题翻译：利用剂量控制的平版印刷设备和方法
公开(公告)号：US07123348B2
公开(公告)日：2006-10-17
申请号：US10862876
申请日：2004-06-08
申请人： Kars Zeger Troost , Arno Jan Bleeker
发明人： Kars Zeger Troost , Arno Jan Bleeker
IPC分类号： G03B27/54 , G03B27/72
CPC分类号： G03F7/70058 , G03F7/70275 , G03F7/70291 , G03F7/70383 , G03F7/70425
摘要： A system and method are used to manufacture a device using at least one exposure step. Each exposure step projects a patterned beam of radiation onto a substrate. The patterned beam includes a plurality of pixels. Each pixel delivers a radiation dose no greater than a predetermined normal maximum dose to the target portion in the exposure step and/or at least one selected pixel delivers an increased radiation dose, greater than the normal maximum dose. The increased dose may be delivered to compensate for the effect of a defective element at a known position in the array on a pixel adjacent a selected pixel or compensate for underexposure of the target portion at the location of a selected pixel resulting from exposure of that location to a pixel affected by a known defective element in another exposure step.
摘要翻译：使用系统和方法来制造使用至少一个曝光步骤的装置。每个曝光步骤将图案化的辐射束投射到衬底上。图案化的波束包括多个像素。每个像素在曝光步骤中向目标部分提供不大于预定正常最大剂量的辐射剂量，和/或至少一个所选择的像素传递大于正常最大剂量的增加的辐射剂量。可以递送增加的剂量以补偿阵列中与已选择像素相邻的像素上的已知位置处的有缺陷元件的影响，或补偿由于该位置的曝光导致的所选像素位置处的目标部分的曝光不足涉及在另一曝光步骤中受已知缺陷元件影响的像素。

10. 发明申请

US20120133914A1 METHOD OF OPERATING A PATTERNING DEVICE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译：操作设备的方法，平面设备和设备制造方法
公开(公告)号：US20120133914A1
公开(公告)日：2012-05-31
申请号：US13306728
申请日：2011-11-29
申请人： Vitaliy Prosyentsov , Willem Jurrianus Venema , Kars Zeger Troost , Adrianus Martinus Van der Wielen
发明人： Vitaliy Prosyentsov , Willem Jurrianus Venema , Kars Zeger Troost , Adrianus Martinus Van der Wielen
IPC分类号： G03B27/42
CPC分类号： G03F7/705 , G03F1/44 , G03F7/70133 , G03F7/70783 , G03F7/70875
摘要： A lithographic reticle is illuminated to transfer a pattern to a substrate, inducing distortions due to heating. The distortions are calculated using reference marks in a peripheral portion of the reticle and measuring changes in their relative positions over time. A plurality of cells are defined for which a system of equations can be solved to calculate a dilation of each cell. In an embodiment, each equation relates positions of pairs of marks to dilations of the cells along a line (s, s1, s2) connecting each pair. Local positional deviations can be calculated for a position by combining calculated dilations for cells between at least one measured peripheral mark and the position. Corrections can be applied in accordance with the result of the calculation. Energy may be applied to the patterning device (for example by thermal input or mechanical actuators) to modify a distribution of the local positional deviations.
摘要翻译：光刻掩模版被照射以将图案转印到基板上，引起由于加热引起的变形。使用标线的周边部分中的参考标记计算变形，并测量其相对位置随时间的变化。定义了可以解决方程组的系统以计算每个单元的扩张的多个单元。在一个实施例中，每个方程将标记对对于沿着连接每对的线（s，s1，s2）的细胞的扩张的位置。可以通过组合至少一个测量的外围标记和位置之间的单元格的计算的扩张来计算位置的局部位置偏差。校正可以根据计算结果进行应用。可以将能量施加到图案形成装置（例如通过热输入或机械致动器）以修改局部位置偏差的分布。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式