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1. 发明授权

US08206075B2 Methods and apparatus for sealing a chamber 有权
标题翻译：用于密封腔室的方法和装置
公开(公告)号：US08206075B2
公开(公告)日：2012-06-26
申请号：US11145018
申请日：2005-06-02
申请人： John M. White , Shinichi Kurita , William N. Sterling , Yoshiaki Tanase
发明人： John M. White , Shinichi Kurita , William N. Sterling , Yoshiaki Tanase
IPC分类号： H01L21/67 , C23C16/00
CPC分类号： H01L21/67126 , H01L21/67201
摘要： In certain aspects, a load lock chamber is provided that includes a body having at least one sealing surface wall including a sealing surface. The sealing surface wall has an opening adjacent the sealing surface adapted to input or output a substrate. The body further includes a plurality of side walls. The load lock chamber also includes a top coupled to the body. The top includes one or more openings that divide the top into a first portion and a second portion. The load lock chamber further includes one or more top sealing members adapted to cover each opening of the top. Each top sealing member absorbs a movement of the first portion of the top relative to the second portion of the top. Numerous other aspects are provided.
摘要翻译：在某些方面，提供了一种装载锁定室，其包括具有包括密封表面的至少一个密封表面壁的主体。密封表面壁具有邻近密封表面的开口，适于输入或输出基底。身体还包括多个侧壁。负载锁定室还包括联接到主体的顶部。顶部包括将顶部分成第一部分和第二部分的一个或多个开口。负载锁定室还包括适于覆盖顶部的每个开口的一个或多个顶部密封构件。每个顶部密封构件吸收顶部相对于顶部的第二部分的第一部分的运动。提供了许多其他方面。

2. 发明申请

US20100282603A1 HEATED SUBSTRATE SUPPORT FOR CHEMICAL VAPOR DEPOSITION 审中-公开
标题翻译：用于化学蒸气沉积的加热基板支撑
公开(公告)号：US20100282603A1
公开(公告)日：2010-11-11
申请号：US12845563
申请日：2010-07-28
申请人： William N. Sterling , John M. White
发明人： William N. Sterling , John M. White
IPC分类号： C23C14/34 , C23F1/00 , C23C16/44 , B29C65/00
CPC分类号： C23C16/4586
摘要： A method and apparatus for making a heated substrate support assembly used in a processing chamber is provided. The processing chamber includes a substrate support assembly, having a first plate and a second plate with grooves disposed therein for receiving one or more heating elements, and a power source for heating the substrate support assembly. A first surface of the first plate and a second surface of the second plate include one or more matching structures disposed thereon, such that both plates can be compressed together by isostatic compression and form into a plate-like structure for supporting a substrate during substrate processing. In another embodiment, the first and second plates are compressed by applying pressure all around. In still another embodiment, compressing the first and second plates is performed at elevated temperature.
摘要翻译：提供了一种用于制造在处理室中使用的加热的衬底支撑组件的方法和装置。处理室包括基板支撑组件，其具有第一板和第二板，其中设置有用于接收一个或多个加热元件的槽，以及用于加热基板支撑组件的电源。第一板的第一表面和第二板的第二表面包括设置在其上的一个或多个匹配结构，使得两个板可以通过等静压压缩在一起，并形成用于在衬底处理期间支撑衬底的板状结构。在另一个实施例中，通过施加全部压力来压缩第一和第二板。在另一个实施例中，压缩第一和第二板在升高的温度下进行。

3. 发明授权

US08251009B2 Shadow frame having alignment inserts 有权
标题翻译：阴影框架具有对准插入
公开(公告)号：US08251009B2
公开(公告)日：2012-08-28
申请号：US12465037
申请日：2009-05-13
申请人： Lan Duong , William N. Sterling , John M. White
发明人： Lan Duong , William N. Sterling , John M. White
IPC分类号： B05C13/00
CPC分类号： H01L21/68 , C23C16/4401 , Y10T29/49895
摘要： The present invention generally includes a shadow frame with alignment inserts that may permit the shadow frame to be properly aligned on the susceptor. The shadow frame may have one or more alignment inserts. The alignment inserts may be coupled to a cavity formed in the bottom surface of the shadow frame. The alignment inserts may be shaped to receive an alignment button that may be present on the susceptor. Thus, as the susceptor raises to the processing position and retrieves the shadow frame, the shadow frame may align properly on the susceptor.
摘要翻译：本发明通常包括具有对准插入物的阴影框架，其可以允许阴影框架在基座上适当对准。阴影框架可以具有一个或多个对准插入件。对准插入件可以联接到形成在阴影框架的底表面中的空腔。对准插入件可以被成形为接收可能存在于基座上的对准按钮。因此，当感受体升高到处理位置并检索阴影框时，阴影框架可以在基座上适当地对准。

4. 发明申请

US20090283036A1 SHADOW FRAME HAVING ALIGNMENT INSERTS 有权
标题翻译：具有对准插入的下框
公开(公告)号：US20090283036A1
公开(公告)日：2009-11-19
申请号：US12465037
申请日：2009-05-13
申请人： Lan Duong , William N. Sterling , John M. White
发明人： Lan Duong , William N. Sterling , John M. White
IPC分类号： B05C13/00 , B23Q3/00 , B23P11/00
CPC分类号： H01L21/68 , C23C16/4401 , Y10T29/49895
摘要： The present invention generally includes a shadow frame with alignment inserts that may permit the shadow frame to be properly aligned on the susceptor. The shadow frame may have one or more alignment inserts. The alignment inserts may be coupled to a cavity formed in the bottom surface of the shadow frame. The alignment inserts may be shaped to receive an alignment button that may be present on the susceptor. Thus, as the susceptor raises to the processing position and retrieves the shadow frame, the shadow frame may align properly on the susceptor.
摘要翻译：本发明通常包括具有对准插入物的阴影框架，其可以允许阴影框架在基座上适当对准。阴影框架可以具有一个或多个对准插入件。对准插入件可以联接到形成在阴影框架的底表面中的空腔。对准插入件可以被成形为接收可能存在于基座上的对准按钮。因此，当感受体升高到处理位置并检索阴影框时，阴影框架可以在基座上适当地对准。

5. 发明授权

US09922854B2 Vertical inline CVD system 有权
公开(公告)号：US09922854B2
公开(公告)日：2018-03-20
申请号：US13098253
申请日：2011-04-29
申请人： Shinichi Kurita , Jozef Kudela , Suhail Anwar , John M. White , Dong-Kil Yim , Hans Georg Wolf , Dennis Zvalo , Makoto Inagawa , Ikuo Mori
发明人： Shinichi Kurita , Jozef Kudela , Suhail Anwar , John M. White , Dong-Kil Yim , Hans Georg Wolf , Dennis Zvalo , Makoto Inagawa , Ikuo Mori
IPC分类号： C23C16/458 , C23C16/46 , C23C16/511 , C23C16/54 , H01J37/32 , H01L21/67 , H01L21/677
CPC分类号： H01L21/67712 , C23C16/4587 , C23C16/46 , C23C16/463 , C23C16/511 , C23C16/54 , H01J37/32192 , H01J37/3222 , H01J37/32513 , H01J37/32522 , H01J37/32889 , H01J37/32899 , H01L21/67098 , H01L21/67126 , H01L21/67173 , H01L21/6719 , H01L21/67201
摘要： The present invention generally relates to a vertical CVD system having a processing chamber that is capable of processing multiple substrates. The multiple substrates are disposed on opposite sides of the processing source within the processing chamber, yet the processing environments are not isolated from each other. The processing source is a horizontally centered vertical plasma generator that permits multiple substrates to be processed simultaneously on either side of the plasma generator, yet independent of each other. The system is arranged as a twin system whereby two identical processing lines, each with their own processing chamber, are arranged adjacent to each other. Multiple robots are used to load and unload the substrates from the processing system. Each robot can access both processing lines within the system.

6. 发明授权

US09382621B2 Ground return for plasma processes 有权
标题翻译：等离子体工艺的接地回路
公开(公告)号：US09382621B2
公开(公告)日：2016-07-05
申请号：US12700484
申请日：2010-02-04
申请人： Soo Young Choi , Robin L. Tiner , Shinichi Kurita , John M. White , Carl A. Sorensen , Jeffrey A. Kho , Suhail Anwar , Makoto Inagawa , Gaku Furuta
发明人： Soo Young Choi , Robin L. Tiner , Shinichi Kurita , John M. White , Carl A. Sorensen , Jeffrey A. Kho , Suhail Anwar , Makoto Inagawa , Gaku Furuta
IPC分类号： C23C16/509 , C23C16/458 , H01J37/32 , H01L21/67
CPC分类号： C23C16/5096 , C23C16/4585 , H01J37/32091 , H01J37/32174 , H01J37/32568 , H01L21/67069
摘要： A method and apparatus for providing an electrically symmetrical ground or return path for electrical current between two electrodes is described. The apparatus includes at least on radio frequency (RF) device coupled to one of the electrodes and between a sidewall and/or a bottom of a processing chamber. The method includes moving one electrode relative to another and realizing a ground return path based on the position of the displaced electrode using one or both of a RF device coupled to a sidewall and the electrode, a RF device coupled to a bottom of the chamber and the electrode, or a combination thereof.
摘要翻译：描述了一种用于提供用于两个电极之间的电流的电对称接地或返回路径的方法和装置。该装置至少包括耦合到电极之一和处理室的侧壁和/或底部之间的射频（RF）装置。该方法包括相对于另一个电极移动一个电极，并且基于使用耦合到侧壁和电极的RF器件中的一个或两个的位移电极实现接地返回路径，耦合到腔室的底部的RF器件和电极或其组合。

7. 发明授权

US08877553B2 Floating slit valve for transfer chamber interface 有权
标题翻译：用于传送室接口的浮动狭缝阀
公开(公告)号：US08877553B2
公开(公告)日：2014-11-04
申请号：US13195592
申请日：2011-08-01
申请人： John M. White , Shinichi Kurita , Takayuki Matsumoto
发明人： John M. White , Shinichi Kurita , Takayuki Matsumoto
IPC分类号： H01L21/00 , F16K51/02
CPC分类号： F16K51/02 , Y10S438/905 , Y10T29/49412
摘要： The present invention generally comprises a floating slit valve for interfacing with a chamber. A floating slit valve moves or “floats” relative to another object such as a chamber. The slit valve may be coupled between two chambers. When a chamber coupled with the slit valve is heated, the slit valve may also be heated by conduction. As the slit valve is heated, it may thermally expand. When a vacuum is drawn in a chamber, the slit valve may deform due to vacuum deflection. By disposing a low friction material spacer between the chamber and the slit valve, the slit valve may not rub against the chamber during thermal expansion/contraction and/or vacuum deflection and thus, may not generate undesirable particle contaminants. Additionally, slots drilled through the chamber for coupling the slit valve to the chamber may be sized to accommodate thermal expansion/contraction and vacuum deflection of the slit valve.
摘要翻译：本发明通常包括用于与室连接的浮动狭缝阀。浮动狭缝阀相对于诸如室的另一物体移动或“浮动”。狭缝阀可以联接在两个腔室之间。当与狭缝阀联接的室被加热时，狭缝阀也可以通过传导加热。当狭缝阀被加热时，它可以热膨胀。当在室中抽真空时，狭缝阀可能由于真空偏转而变形。通过在室和狭缝阀之间设置低摩擦材料间隔件，狭缝阀在热膨胀/收缩和/或真空偏转期间可能不会摩擦室，因此不会产生不期望的颗粒污染物。此外，穿过腔室钻出的狭缝阀可以被定尺寸以适应狭缝阀的热膨胀/收缩和真空偏转。

8. 发明授权

US07637580B2 Methods and apparatus for a high resolution inkjet fire pulse generator 失效
标题翻译：高分辨率喷墨式脉冲发生器的方法和装置
公开(公告)号：US07637580B2
公开(公告)日：2009-12-29
申请号：US11238637
申请日：2005-09-29
申请人： Bassam Shamoun , Eugene Mirro , Janusz Jozwiak , Quanyuan Shang , Shinichi Kurita , John M. White
发明人： Bassam Shamoun , Eugene Mirro , Janusz Jozwiak , Quanyuan Shang , Shinichi Kurita , John M. White
IPC分类号： B41J29/38
CPC分类号： B41J3/407 , B41J2/04505 , B41J2/04541 , B41J2/04581 , B41J2/04588 , B41J2/0459 , B41J2/04593 , B41J2/125 , B41J3/28 , B41J3/543 , B41J25/001 , B41J25/003 , B41J25/005 , B41J29/15 , B41J29/393
摘要： The invention provides methods, systems, and drivers for controlling an inkjet printing system. The driver may include logic including a processor, memory coupled to the logic, and a fire pulse generator circuit coupled to the logic. The fire pulse generator may include a connector to facilitate coupling the driver to a print head. The fire pulse generator circuit may also include a fixed current source circuit adapted to generate a fire pulse with a constant slew rate that facilitates easy adjustment of ink drop size. The logic is adapted to receive an image and to convert the image to an image data file. The image data file is adapted to be used by the driver to trigger the print head to deposit ink into pixel wells on a substrate as the substrate is moved in a print direction. Numerous other aspects are disclosed.
摘要翻译：本发明提供了用于控制喷墨打印系统的方法，系统和驱动程序。驱动器可以包括逻辑，其包括处理器，耦合到逻辑的存储器和耦合到逻辑的触发脉冲发生器电路。火脉冲发生器可以包括用于便于将驱动器连接到打印头的连接器。火脉冲发生器电路还可以包括固定电流源电路，其适于产生具有恒定压摆率的发射脉冲，其有利于容易地调节墨滴尺寸。该逻辑适于接收图像并将图像转换为图像数据文件。图像数据文件适于由驱动器使用，以在基板沿着打印方向移动时触发打印头将墨水沉积在基板上的像素孔中。公开了许多其他方面。

9. 发明授权

US07611217B2 Methods and systems for inkjet drop positioning 失效
标题翻译：喷墨定位方法和系统
公开(公告)号：US07611217B2
公开(公告)日：2009-11-03
申请号：US11238636
申请日：2005-09-29
申请人： Bassam Shamoun , Janusz Jozwiak , Eugene Mirro , Quanyuan Shang , Shinichi Kurita , John M. White
发明人： Bassam Shamoun , Janusz Jozwiak , Eugene Mirro , Quanyuan Shang , Shinichi Kurita , John M. White
IPC分类号： B41J29/38
CPC分类号： B41J29/393
摘要： Methods and apparatus for inkjet inkjet drop positioning are provided. A first method includes determining an intended deposition location of an ink drop on a substrate, depositing the ink drop on the substrate using an inkjet printing system, detecting a deposited location of the deposited ink drop on the substrate, comparing the deposited location to the intended location, determining a difference between the deposited location and the intended location, and compensating for the difference between the deposited location and the intended location by adjusting a parameter of an inkjet printing system. Numerous other aspects are provided.
摘要翻译：提供喷墨喷墨滴定位的方法和装置。第一种方法包括确定墨滴在基底上的预期沉积位置，使用喷墨印刷系统将墨滴沉积在基底上，检测沉积的墨滴在基底上的沉积位置，将沉积位置与预期的位置进行比较确定存放位置与预期位置之间的差异，以及通过调整喷墨打印系统的参数来补偿存放位置与预期位置之间的差异。提供了许多其他方面。

10. 发明申请

US20090267975A1 METHODS AND APPARATUS FOR ALIGNING PRINT HEADS 审中-公开
标题翻译：用于校准打印头的方法和装置
公开(公告)号：US20090267975A1
公开(公告)日：2009-10-29
申请号：US12498322
申请日：2009-07-06
申请人： John M. White , Fan Cheung Sze , Quanyuan Shang , Shinichi Kurita , Hongbin Ji , Janusz Jozwiak , Inchen Huang , Emanual Beer
发明人： John M. White , Fan Cheung Sze , Quanyuan Shang , Shinichi Kurita , Hongbin Ji , Janusz Jozwiak , Inchen Huang , Emanual Beer
IPC分类号： B41J3/00 , B41J29/393 , B41J23/00
CPC分类号： B41J3/407 , B41J2/04505 , B41J2/04541 , B41J2/04581 , B41J2/04588 , B41J2/0459 , B41J2/04593 , B41J2/125 , B41J3/28 , B41J3/543 , B41J25/001 , B41J25/003 , B41J25/005 , B41J29/15 , B41J29/393
摘要： In a first aspect, a system is provided. The system includes (1) a stage adapted to move a substrate relative to print heads during printing; (2) at least one print head suspended from a support above the stage and adapted to be moveable in a plane above the stage; (3) a controller operable to rotate the print head about a center of the print head; and (4) an imaging system adapted to capture an image of the print head and to determine a center point of the print head based upon images of the print head captured as the print head is rotated. Numerous other aspects are provided.
摘要翻译：在第一方面，提供一种系统。该系统包括（1）适于在印刷期间相对于打印头移动基板的台阶; （2）至少一个打印头，其从所述平台上方的支撑件悬挂并适于在所述平台上方的平面中移动; （3）可操作以使打印头围绕打印头的中心旋转的控制器; 以及（4）成像系统，其适于捕获所述打印头的图像，并且基于当所述打印头旋转时捕获的打印头的图像来确定所述打印头的中心点。提供了许多其他方面。

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