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1. 发明授权

US08251009B2 Shadow frame having alignment inserts 有权
标题翻译：阴影框架具有对准插入
公开(公告)号：US08251009B2
公开(公告)日：2012-08-28
申请号：US12465037
申请日：2009-05-13
申请人： Lan Duong , William N. Sterling , John M. White
发明人： Lan Duong , William N. Sterling , John M. White
IPC分类号： B05C13/00
CPC分类号： H01L21/68 , C23C16/4401 , Y10T29/49895
摘要： The present invention generally includes a shadow frame with alignment inserts that may permit the shadow frame to be properly aligned on the susceptor. The shadow frame may have one or more alignment inserts. The alignment inserts may be coupled to a cavity formed in the bottom surface of the shadow frame. The alignment inserts may be shaped to receive an alignment button that may be present on the susceptor. Thus, as the susceptor raises to the processing position and retrieves the shadow frame, the shadow frame may align properly on the susceptor.
摘要翻译：本发明通常包括具有对准插入物的阴影框架，其可以允许阴影框架在基座上适当对准。阴影框架可以具有一个或多个对准插入件。对准插入件可以联接到形成在阴影框架的底表面中的空腔。对准插入件可以被成形为接收可能存在于基座上的对准按钮。因此，当感受体升高到处理位置并检索阴影框时，阴影框架可以在基座上适当地对准。

2. 发明申请

US20090283036A1 SHADOW FRAME HAVING ALIGNMENT INSERTS 有权
标题翻译：具有对准插入的下框
公开(公告)号：US20090283036A1
公开(公告)日：2009-11-19
申请号：US12465037
申请日：2009-05-13
申请人： Lan Duong , William N. Sterling , John M. White
发明人： Lan Duong , William N. Sterling , John M. White
IPC分类号： B05C13/00 , B23Q3/00 , B23P11/00
CPC分类号： H01L21/68 , C23C16/4401 , Y10T29/49895
摘要： The present invention generally includes a shadow frame with alignment inserts that may permit the shadow frame to be properly aligned on the susceptor. The shadow frame may have one or more alignment inserts. The alignment inserts may be coupled to a cavity formed in the bottom surface of the shadow frame. The alignment inserts may be shaped to receive an alignment button that may be present on the susceptor. Thus, as the susceptor raises to the processing position and retrieves the shadow frame, the shadow frame may align properly on the susceptor.
摘要翻译：本发明通常包括具有对准插入物的阴影框架，其可以允许阴影框架在基座上适当对准。阴影框架可以具有一个或多个对准插入件。对准插入件可以联接到形成在阴影框架的底表面中的空腔。对准插入件可以被成形为接收可能存在于基座上的对准按钮。因此，当感受体升高到处理位置并检索阴影框时，阴影框架可以在基座上适当地对准。

3. 发明授权

US07959735B2 Susceptor with insulative inserts 失效
标题翻译：具有绝缘插入物的受体
公开(公告)号：US07959735B2
公开(公告)日：2011-06-14
申请号：US11672955
申请日：2007-02-08
申请人： William N. Sterling , Lan Duong , Gaku Furuta
发明人： William N. Sterling , Lan Duong , Gaku Furuta
IPC分类号： C23C16/00 , H01L21/683 , H01T23/00
CPC分类号： H01L21/68757 , H01J2237/0206 , H01L21/68785
摘要： A method and apparatus for reducing arcing in a plasma processing system when processing large area substrates which contain one or more holes. In one embodiment of the invention, a substrate support member includes an electrically insulating insert located beneath a hole in an insulating, large area substrate. The insulating insert is made of aluminum oxide, and is located within a hole in the support member such that the insert is disposed beneath a hole in a glass substrate. The substrate support member is made of aluminum with an anodized surface.
摘要翻译：一种用于在处理包含一个或多个孔的大面积基板时减小等离子体处理系统中的电弧的方法和装置。在本发明的一个实施例中，衬底支撑构件包括位于绝缘的大面积衬底中的孔下方的电绝缘插入件。绝缘插件由氧化铝制成，并且位于支撑构件的孔内，使得插入件设置在玻璃基板的孔的下方。衬底支撑构件由具有阳极氧化表面的铝制成。

4. 发明申请

US20080194169A1 SUSCEPTOR WITH INSULATIVE INSERTS 失效
标题翻译：具有绝缘插件的SUSCEPTOR
公开(公告)号：US20080194169A1
公开(公告)日：2008-08-14
申请号：US11672955
申请日：2007-02-08
申请人： William N. Sterling , Lan Duong , Gaku Furuta
发明人： William N. Sterling , Lan Duong , Gaku Furuta
IPC分类号： H01J9/38
CPC分类号： H01L21/68757 , H01J2237/0206 , H01L21/68785
摘要： A method and apparatus for reducing arcing in a plasma processing system when processing large area substrates which contain one or more holes. In one embodiment of the invention, a substrate support member includes an electrically insulating insert located beneath a hole in an insulating, large area substrate. The insulating insert is made of aluminum oxide, and is located within a hole in the support member such that the insert is disposed beneath a hole in a glass substrate. The substrate support member is made of aluminum with an anodized surface.
摘要翻译：一种用于在处理包含一个或多个孔的大面积基板时减小等离子体处理系统中的电弧的方法和装置。在本发明的一个实施例中，衬底支撑构件包括位于绝缘的大面积衬底中的孔下方的电绝缘插入件。绝缘插件由氧化铝制成，并且位于支撑构件的孔内，使得插入件设置在玻璃基板的孔的下方。衬底支撑构件由具有阳极氧化表面的铝制成。

5. 发明授权

US08206075B2 Methods and apparatus for sealing a chamber 有权
标题翻译：用于密封腔室的方法和装置
公开(公告)号：US08206075B2
公开(公告)日：2012-06-26
申请号：US11145018
申请日：2005-06-02
申请人： John M. White , Shinichi Kurita , William N. Sterling , Yoshiaki Tanase
发明人： John M. White , Shinichi Kurita , William N. Sterling , Yoshiaki Tanase
IPC分类号： H01L21/67 , C23C16/00
CPC分类号： H01L21/67126 , H01L21/67201
摘要： In certain aspects, a load lock chamber is provided that includes a body having at least one sealing surface wall including a sealing surface. The sealing surface wall has an opening adjacent the sealing surface adapted to input or output a substrate. The body further includes a plurality of side walls. The load lock chamber also includes a top coupled to the body. The top includes one or more openings that divide the top into a first portion and a second portion. The load lock chamber further includes one or more top sealing members adapted to cover each opening of the top. Each top sealing member absorbs a movement of the first portion of the top relative to the second portion of the top. Numerous other aspects are provided.
摘要翻译：在某些方面，提供了一种装载锁定室，其包括具有包括密封表面的至少一个密封表面壁的主体。密封表面壁具有邻近密封表面的开口，适于输入或输出基底。身体还包括多个侧壁。负载锁定室还包括联接到主体的顶部。顶部包括将顶部分成第一部分和第二部分的一个或多个开口。负载锁定室还包括适于覆盖顶部的每个开口的一个或多个顶部密封构件。每个顶部密封构件吸收顶部相对于顶部的第二部分的第一部分的运动。提供了许多其他方面。

6. 发明申请

US20100282603A1 HEATED SUBSTRATE SUPPORT FOR CHEMICAL VAPOR DEPOSITION 审中-公开
标题翻译：用于化学蒸气沉积的加热基板支撑
公开(公告)号：US20100282603A1
公开(公告)日：2010-11-11
申请号：US12845563
申请日：2010-07-28
申请人： William N. Sterling , John M. White
发明人： William N. Sterling , John M. White
IPC分类号： C23C14/34 , C23F1/00 , C23C16/44 , B29C65/00
CPC分类号： C23C16/4586
摘要： A method and apparatus for making a heated substrate support assembly used in a processing chamber is provided. The processing chamber includes a substrate support assembly, having a first plate and a second plate with grooves disposed therein for receiving one or more heating elements, and a power source for heating the substrate support assembly. A first surface of the first plate and a second surface of the second plate include one or more matching structures disposed thereon, such that both plates can be compressed together by isostatic compression and form into a plate-like structure for supporting a substrate during substrate processing. In another embodiment, the first and second plates are compressed by applying pressure all around. In still another embodiment, compressing the first and second plates is performed at elevated temperature.
摘要翻译：提供了一种用于制造在处理室中使用的加热的衬底支撑组件的方法和装置。处理室包括基板支撑组件，其具有第一板和第二板，其中设置有用于接收一个或多个加热元件的槽，以及用于加热基板支撑组件的电源。第一板的第一表面和第二板的第二表面包括设置在其上的一个或多个匹配结构，使得两个板可以通过等静压压缩在一起，并形成用于在衬底处理期间支撑衬底的板状结构。在另一个实施例中，通过施加全部压力来压缩第一和第二板。在另一个实施例中，压缩第一和第二板在升高的温度下进行。

7. 发明授权

US07641247B2 End effector assembly for supporting a substrate 有权
标题翻译：用于支撑衬底的末端执行器组件
公开(公告)号：US07641247B2
公开(公告)日：2010-01-05
申请号：US10321826
申请日：2002-12-17
申请人： Wendell T. Blonigan , Takayuki Matsumoto , William N. Sterling , Billy C. Leung
发明人： Wendell T. Blonigan , Takayuki Matsumoto , William N. Sterling , Billy C. Leung
IPC分类号： B25J15/00 , B65G49/07
CPC分类号： H01L21/68707 , Y10S294/902 , Y10S414/141
摘要： Generally, an end effector assembly for a substrate transfer robot is provided. In one embodiment, an end effector assembly for supporting a quadrilateral substrate during substrate transfer includes an end effector having an inner edge support disposed on a first end and a first outer edge support disposed on a distal end. The first end of the end effector is adapted for coupling to a robot linkage. The first inner edge support has a face that is oriented parallel to and facing the face of the first outer edge support. This configuration of edge supports captures the substrate to the end effector thereby minimizing substrate slippage during transfer. In another embodiment, lateral guides may be utilized to further enhance capturing the substrate along the edges of the substrate open between the inner and outer edge supports.
摘要翻译：通常，提供了一种用于衬底传送机器人的端部执行器组件。在一个实施例中，用于在衬底传送期间支撑四边形衬底的端部执行器组件包括端部执行器，其具有设置在第一端上的内边缘支撑件和设置在远端上的第一外边缘支撑件。端部执行器的第一端适于联接到机器人联动装置。第一内边缘支撑件具有平行于并面向第一外边缘支撑件的面的面。边缘支撑件的这种构造将基板捕获到端部执行器，从而最小化转移期间的基板滑移。在另一个实施例中，可以使用横向引导件来进一步增强沿着在内边缘支撑件和外边缘支撑件之间打开的基板的边缘捕获基板。

8. 发明申请

US20120237682A1 IN-SITU MASK ALIGNMENT FOR DEPOSITION TOOLS 审中-公开
标题翻译：用于沉积工具的现场掩模对准
公开(公告)号：US20120237682A1
公开(公告)日：2012-09-20
申请号：US13414434
申请日：2012-03-07
申请人： Ilyoung Richard Hong , William N. Sterling , Dongsuh Lee
发明人： Ilyoung Richard Hong , William N. Sterling , Dongsuh Lee
IPC分类号： B05D1/32 , B05C11/00 , B23Q7/00 , B05C13/00
CPC分类号： C23C14/042 , H01L51/56 , Y10T29/49778
摘要： A system for handling masked substrates comprising a chamber having a pedestal for supporting a substrate, and a chuck for supporting a mask in relation to a substrate. The system may include an alignment system operable to confirm alignment of the mask and the substrate. A method of positioning a mask on a substrate in a chamber comprises supporting the mask with a chuck disposed in the chamber and supporting the substrate with a pedestal disposed in the chamber. The method may further comprise aligning one or more reference points on the mask with one or more reference points on the substrate and positioning the mask on the substrate using at least one of the chuck and the pedestal.
摘要翻译：一种用于处理掩模基板的系统，包括具有用于支撑基板的基座的室和用于相对于基板支撑掩模的卡盘。系统可以包括可操作以确认掩模和基底的对准的对准系统。将掩模定位在腔室中的基底上的方法包括用设置在腔室中的卡盘支撑掩模，并且用设置在腔室中的基座来支撑基底。该方法还可以包括将掩模上的一个或多个参考点与衬底上的一个或多个参考点对准，并使用卡盘和基座中的至少一个将掩模定位在衬底上。

9. 发明申请

US20120009347A1 PRECISE TEMPERATURE CONTROL FOR TEOS APPLICATION BY HEAT TRANSFER FLUID 审中-公开
标题翻译：通过热传递流体对TEOS应用的精密温度控制
公开(公告)号：US20120009347A1
公开(公告)日：2012-01-12
申请号：US12831731
申请日：2010-07-07
申请人： Dongsuh Lee , Weijie Wang , William N. Sterling , Sam H. Kim , Soo Young Choi , Beom Soo Park , Beom Soo Kim , Qunhua Wang
发明人： Dongsuh Lee , Weijie Wang , William N. Sterling , Sam H. Kim , Soo Young Choi , Beom Soo Park , Beom Soo Kim , Qunhua Wang
IPC分类号： C23C16/52 , B01F15/06 , C23C16/00 , B01F15/02
CPC分类号： B01F5/0077 , B01F5/0688 , B01F15/065 , B01F2015/061 , C23C16/45512
摘要： Embodiments of the invention generally provide a mixing block for mixing precursors and/or cleaning agent which has the advantage of maintaining the temperature and improving the mixing effect of the precursors, cleaning agent or the mixture thereof to eliminate the substrate-to-substrate variation, thereby providing improved process uniformity.
摘要翻译：本发明的实施方案通常提供用于混合前体和/或清洁剂的混合块，其具有保持温度并改善前体，清洁剂或其混合物的混合效果以消除基材对基底变化的优点，从而提供改进的工艺均匀性。

10. 发明授权

US07845618B2 Valve door with ball coupling 有权
标题翻译：阀门与球联轴器
公开(公告)号：US07845618B2
公开(公告)日：2010-12-07
申请号：US11767518
申请日：2007-06-24
申请人： Sam Hyungsam Kim , Jae-Chull Lee , William N. Sterling , Paul Brown
发明人： Sam Hyungsam Kim , Jae-Chull Lee , William N. Sterling , Paul Brown
IPC分类号： F16K1/16
CPC分类号： F16K51/02 , F16K1/2007 , F16K1/2021 , F16K1/2028 , F16K1/205 , F16K1/2078 , F16K1/24
摘要： Embodiments of an apparatus for sealing a substrate transfer passage in a chamber are provided. In one embodiment, an apparatus for sealing a substrate transfer passage in a chamber includes an elongated door member coupled to an actuator by a ball joint. The ball joint is configured to allow movement of the door member relative to the lever arm around a center of the ball joint. In one embodiment, a sealing face of the elongated door is curved. In another embodiment, the chamber is one of a chemical vapor deposition chamber, a load lock chamber, a metrology chamber, a thermal processing chamber, or a physical vapor disposition chamber, a load lock chamber, a substrate transfer chamber or a vacuum chamber.
摘要翻译：提供了用于密封腔室中的基底输送通道的装置的实施例。在一个实施例中，用于密封腔室中的衬底传送通道的设备包括通过球窝接头联接到致动器的细长门构件。球形接头构造成允许门构件相对于杠杆臂围绕球窝接头的中心移动。在一个实施例中，细长门的密封面是弯曲的。在另一个实施例中，该腔室是化学气相沉积室，负载锁定室，计量室，热处理室或物理蒸汽分配室，负载锁定室，衬底传送室或真空室之一。

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