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    • 1. 发明授权
    • Apparatus and method for compressing high purity gas
    • 用于压缩高纯度气体的装置和方法
    • US5993170A
    • 1999-11-30
    • US57518
    • 1998-04-09
    • Joe StevensAllen ThompsonNorman CowanDavid Alvarez
    • Joe StevensAllen ThompsonNorman CowanDavid Alvarez
    • F04B35/00F04B39/00F04B39/04H05B1/00
    • F04B35/008F04B39/0005F04B39/04
    • An improved method and apparatus are disclosed for isolating product gas from compressor operating fluid. A portion of a piston rod directly exposed to the compressor's operating fluid (the oily portion of the piston rod) is atmospherically isolated from the remaining portion of the piston rod by providing the piston rod with a collar that separates the oily portion of the piston rod from the remainder of the piston rod. A first and a second flexible membrane are coupled to the collar to form a first isolation region, and a second isolation region; the first isolation region encases the oily portion of the piston rod and atmospherically isolates it from the second isolation region, and the second isolation region provides additional isolation from both the operating fluid and the ambient environment. A higher pressure is maintained along the backside of the piston that compresses the product gas than the pressure within the adjacent isolation region. Pairs of wipers with vents coupled therebetween additionally may be employed to further improve product gas isolation.
    • 公开了一种改进的方法和装置,用于从压缩机工作流体中分离产物气体。 直接暴露于压缩机的工作流体(活塞杆的油性部分)的活塞杆的一部分与活塞杆的剩余部分大气隔离,为活塞杆提供一个将活塞杆的油性部分分开的套环 从活塞杆的其余部分。 第一和第二柔性膜耦合到套环以形成第一隔离区域和第二隔离区域; 第一隔离区域包围活塞杆的油性部分并使其与第二隔离区域大气隔离,并且第二隔离区域提供与工作流体和周围环境的额外隔离。 沿着活塞的背面保持较高的压力,其压缩产品气体而不是相邻隔离区域内的压力。 可以采用具有连接在其上的通风口的擦拭器对以进一步改善产品气体隔离。
    • 5. 发明申请
    • Semiconductor ESD device and method of making same
    • 半导体ESD器件及其制造方法
    • US20080142849A1
    • 2008-06-19
    • US11638067
    • 2006-12-13
    • David AlvarezRichard LindsayManfred EllerCornelius Christian Russ
    • David AlvarezRichard LindsayManfred EllerCornelius Christian Russ
    • H01L29/76
    • H01L21/26513H01L27/027H01L29/0619H01L29/665H01L29/7833
    • An ESD protection device includes a semiconductor body, a gate formed over a channel in the semiconductor body, the channel being doped with a first concentration of dopants of a first conductivity type. A first source/drain region is formed on the surface of the semiconductor body adjacent to a first edge of the gate, wherein the first source/drain region is doped with a dopant of a second conductivity type opposite the first conductivity type, and at least a portion of the first source/drain region is doped with a dopant of the first conductivity type. The concentration of the second conductivity type dopant exceeds the concentration of the first conductivity type dopant, and the concentration of the first conductivity type dopant in the first source/drain exceeds the first concentration. A second source/drain region is also formed at the upper surface of the semiconductor body adjacent to a second edge of the gate, wherein the second source/drain region is doped with a dopant of the second conductivity type.
    • ESD保护器件包括半导体本体,形成在半导体本体中的沟道上的栅极,该沟道掺杂有第一导电类型的掺杂剂的第一浓度。 第一源极/漏极区域形成在与栅极的第一边缘相邻的半导体本体的表面上,其中第一源极/漏极区域掺杂有与第一导电类型相反的第二导电类型的掺杂物,并且至少 第一源/漏区的一部分掺杂有第一导电类型的掺杂剂。 第二导电型掺杂物的浓度超过第一导电型掺杂剂的浓度,并且第一源极/漏极中的第一导电类型掺杂剂的浓度超过第一浓度。 第二源极/漏极区域还形成在与栅极的第二边缘相邻的半导体本体的上表面处,其中第二源极/漏极区域掺杂有第二导电类型的掺杂物。