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1. 发明授权

US5753133A Method and apparatus for etching film layers on large substrates 失效
标题翻译：用于在大基板上蚀刻薄膜层的方法和装置
公开(公告)号：US5753133A
公开(公告)日：1998-05-19
申请号：US273382
申请日：1994-07-11
申请人： Jerry Wong , Masato M. Toshima , Kam S. Law , Dan Maydan , Norman L. Turner
发明人： Jerry Wong , Masato M. Toshima , Kam S. Law , Dan Maydan , Norman L. Turner
IPC分类号： H01L21/302 , H01L21/3065 , H01L21/67 , H01L21/683 , H01L21/687 , H05H1/00
CPC分类号： H01L21/68742 , H01L21/68778 , Y10S414/136 , Y10S414/139 , Y10S414/141
摘要： A chamber for processing substrates includes a support member therein which is suspended from a sidewall of the chamber. The support member includes multiple planar faces for receiving substrates thereon, and is rotatable about a horizontal axis to position the multiple planar faces in a horizontal position to place the substrates on the planar faces or remove the substrates from the planar faces, and a second position to place the substrates in a non-horizontal position for processing. A clamping and lifting apparatus is provided on the support member. The clamping and lifting apparatus is positionable, with respect to the support member, in an extended position to permit a substrate to be positioned between the clamping and lifting assembly and the support member, and in a retracted position to clamp the substrate to the support member. A clamp actuator is disposed on the chamber wall to move the clamping and lifting assembly between the extended and retracted positions.
摘要翻译：用于处理衬底的室包括其中从室的侧壁悬挂的支撑构件。支撑构件包括用于在其上接收衬底的多个平面，并且可围绕水平轴线旋转，以将多个平面位置定位在水平位置，以将衬底放置在平面上或从平面上移除衬底，并且第二位置以将基板放置在非水平位置进行处理。夹持和提升装置设置在支撑构件上。夹紧和提升装置相对于支撑构件可定位在延伸位置，以允许基板定位在夹紧和提升组件和支撑构件之间，并且在缩回位置将基板夹持到支撑构件。夹紧致动器设置在室壁上以使夹紧和提升组件在延伸位置和缩回位置之间移动。

2. 发明授权

US5288645A Hydrogen evolution analyzer 失效
标题翻译：氢气分析仪
公开(公告)号：US5288645A
公开(公告)日：1994-02-22
申请号：US940687
申请日：1992-09-04
申请人： Masato Toshima , Jerry Wong
发明人： Masato Toshima , Jerry Wong
IPC分类号： G01N33/00 , G06N3/08
CPC分类号： G06N3/082 , G01N33/005 , Y10T436/20 , Y10T436/22
摘要： Method for determining temperature ranges at which a selected gas evolves from a specimen of a selected material, bulk or surface of a metal, semiconductor, or insulator, and the probable source of that gas in each such temperature range. A specimen is placed in an evacuated and baked-out tube, and the specimen temperature T is increased according to a selected time-dependent temperature pattern over a temperature range. As temperature T(t) increases, pressure p(t) of any gas evolving in the tube is measured for a sequence of times t. A total pressure derivative, dp/dT=(dp/dt)(dT/dt).sup.-1, is determined, identifying one or more peak temperatures, each having a peak temperature range corresponding to specimen emission of at least one gas by breaking a bond containing an atom or molecule of that emitted gas. Partial pressure rises in the tube at each peak temperature are monitored and converted to an equivalent gas concentration. In a second embodiment, two tubes, with only one containing a specimen, are used for analyzing the differential pressure .DELTA.p=p1- p2 and differential pressure derivative d(.DELTA.p)/dT. In a third embodiment, both tubes contain specimens, and one or more peak temperatures are identified. In each embodiment, composition, partial pressures and concentrations of gases evolved at a peak temperature are optionally determined by residual gas analysis of another specimen in another tube, heated to and held at a peak temperature.
摘要翻译：用于确定所选择的气体从所选择的材料，金属，半导体或绝缘体的本体或表面的样品以及在每个这样的温度范围内的可能的气体来源的温度范围的方法。将样品放置在抽真空的烘管管中，并且在温度范围内根据选定的时间依赖性温度模式增加样品温度T. 随着温度T（t）增加，在时间t的序列中测量管中放出的任何气体的压力p（t）。确定总压力导数dp / dT =（dp / dt）（dT / dt）-1，识别一个或多个峰值温度，每个峰值温度具有对应于至少一种气体的样品发射的峰值温度范围，含有该排放气体的原子或分子的键。在每个峰值温度下管中的部分压力升高被监测并转换为等效气体浓度。在第二实施例中，仅使用一个包含试样的管用于分析差压（Δ）p = p1-p2和压差导数d（（Δa）p）/ dT。在第三实施例中，两个管都包含试样，并且识别出一个或多个峰值温度。在每个实施例中，在峰值温度下放出的气体的组成，分压和浓度可任选地通过另一管中另一个试样的残余气体分析来确定，加热到并保持在峰值温度。

3. 发明授权

US08413882B1 Mobile application for customer feedback 有权
标题翻译：移动应用为客户反馈
公开(公告)号：US08413882B1
公开(公告)日：2013-04-09
申请号：US12978263
申请日：2010-12-23
申请人： Lakshmi S. Nidamarthi , Jerry Wong , Hardik B. Doshi , Charley Ames , Brock A. Judkins , Gregory D. Lewis , Chris H. Li
发明人： Lakshmi S. Nidamarthi , Jerry Wong , Hardik B. Doshi , Charley Ames , Brock A. Judkins , Gregory D. Lewis , Chris H. Li
IPC分类号： G06F17/00
CPC分类号： G06Q30/00 , G06Q10/00
摘要： An application executing on a mobile computing device retrieves encoded information from a physical package by invoking a scanning function of the mobile computing device. The encoded information associates the physical package with a transaction. The mobile computing device transmits, using the encoded information, an item of recipient reaction information to a server at a network location. The mobile computing device receives from the server an item of transaction information associated with the transaction. The item of transaction information is usable by the application to perform a user interaction function related to the transaction. The mobile computing device performs the user interaction function.
摘要翻译：在移动计算设备上执行的应用程序通过调用移动计算设备的扫描功能从物理包中检索编码信息。编码信息将物理包与事务相关联。移动计算设备使用经编码的信息将接收者反应信息的项目发送到网络位置处的服务器。移动计算设备从服务器接收与交易相关联的交易信息项。交易信息项可由应用程序使用，以执行与交易相关的用户交互功能。移动计算设备执行用户交互功能。

4. 发明授权

US5158644A Reactor chamber self-cleaning process 失效
标题翻译：反应室自清洁过程
公开(公告)号：US5158644A
公开(公告)日：1992-10-27
申请号：US777423
申请日：1991-10-10
申请人： David Cheung , Peter Keswick , Jerry Wong
发明人： David Cheung , Peter Keswick , Jerry Wong
IPC分类号： C23C16/40 , C23C16/44 , C23C16/455 , C23C16/509 , C23C16/54 , H01L21/00 , H01L21/314 , H01L21/316
CPC分类号： C23C16/45565 , C23C16/402 , C23C16/44 , C23C16/4405 , C23C16/455 , C23C16/45521 , C23C16/5096 , C23C16/54 , H01J37/32082 , H01J37/3244 , H01J37/32862 , H01L21/31604 , H01L21/67069 , Y02C20/30 , Y02P70/605 , Y10S438/905
摘要： A reactor chamber self-cleaning process is disclosed which uses a fluorocarbon-containing gas and, preferably, C.sub.2 F.sub.6 in combination with oxygen. The two-step process involves, first, a chamber-wide etch at relatively low pressure and with relatively large separation between the gas inlet manifold and the wafer supports which are the RF electrodes and, second, a local etch step which uses a relatively high chamber pressure and smaller electrode spacing, to complete the cleaning of the RF electrodes.
摘要翻译：公开了一种反应室自清洁方法，其使用含碳氟化合物的气体，优选地，C2F6与氧气组合。两步法首先涉及在相对较低的压力下进行腔室蚀刻，并且在气体入口歧管和作为RF电极的晶片支架之间具有相当大的间隔，其次，使用相对较高的局部蚀刻步骤室压力和较小的电极间距，以完成RF电极的清洁。

5. 发明申请

US20070265528A1 Method and apparatus for real-time tumor tracking 失效
标题翻译：用于实时肿瘤追踪的方法和装置
公开(公告)号：US20070265528A1
公开(公告)日：2007-11-15
申请号：US11786401
申请日：2007-04-10
申请人： Tong Xu , Jerry Wong , Sabee Molloi
发明人： Tong Xu , Jerry Wong , Sabee Molloi
IPC分类号： A61B5/05 , A61B6/00
CPC分类号： G01T1/2985 , A61B6/4258
摘要： Method and apparatus for real-time tracking of a target in a human body. In one embodiment of the invention, positron emission marker may be implanted into a target, the positron emission marker having a low activity positron isotope. In one embodiment, annihilation gamma rays associated with the low activity positron isotope may be detected using a plurality of position-sensitive detectors. In another embodiment, the target may be tracked in real-time based on a position of the positron emission marker.
摘要翻译：用于实时跟踪人体目标的方法和装置。在本发明的一个实施方案中，可以将正电子发射标记物植入目标物，正电子发射标记具有低活性正电子同位素。在一个实施例中，可以使用多个位置敏感检测器来检测与低活性正电子同位素相关联的湮灭伽马射线。在另一个实施例中，可以基于正电子发射标记的位置实时跟踪目标。

6. 发明授权

US6024826A Plasma reactor with heated source of a polymer-hardening precursor material 失效
公开(公告)号：US6024826A
公开(公告)日：2000-02-15
申请号：US734797
申请日：1996-10-23
申请人： Kenneth Collins , Michael Rice , David Groechel , Gerald Yin , Jon Mohn , Craig Roderick , Douglas Buchberger , Chan-Lon Yang , Jerry Wong , Jeffrey Marks , Peter Keswick
发明人： Kenneth Collins , Michael Rice , David Groechel , Gerald Yin , Jon Mohn , Craig Roderick , Douglas Buchberger , Chan-Lon Yang , Jerry Wong , Jeffrey Marks , Peter Keswick
IPC分类号： H01L21/302 , H01J37/32 , H01L21/02 , H01L21/3065 , H01L21/311 , C23F1/02 , C23C16/00
CPC分类号： H01J37/321 , H01J37/32082 , H01J37/32146 , H01J37/32165 , H01J37/32458 , H01J37/32467 , H01J37/32522 , H01J37/32688 , H01J37/32706 , H01J37/32871 , H01L21/31116 , H01F2029/143 , H01J2237/3343 , H01J2237/3345 , H01J2237/3346 , H01J2237/3382
摘要： A general method of the invention is to provide a polymer-hardening precursor piece (such as silicon, carbon, silicon carbide or silicon nitride, but preferably silicon) within the reactor chamber during an etch process with a fluoro-carbon or fluoro-hydrocarbon gas, and to heat the polymer-hardening precursor piece above the polymerization temperature sufficiently to achieve a desired increase in oxide-to-silicon etch selectivity. Generally, this polymer-hardening precursor or silicon piece may be an integral part of the reactor chamber walls and/or ceiling or a separate, expendable and quickly removable piece, and the heating/cooling apparatus may be of any suitable type including apparatus which conductively or remotely heats the silicon piece.

7. 发明授权

US5035751A Cleaning method for semiconductor wafer processing apparatus 失效
标题翻译：用于半导体波形处理装置的清洁方法
公开(公告)号：US5035751A
公开(公告)日：1991-07-30
申请号：US411433
申请日：1989-09-22
申请人： Makoto Nagashima , Naoaki Kobayashi , Jerry Wong
发明人： Makoto Nagashima , Naoaki Kobayashi , Jerry Wong
IPC分类号： C23C16/44 , C23G5/00 , H01L21/00 , H01L21/205 , H01L21/304 , H01L21/31
CPC分类号： H01L21/67028 , C23C16/4405 , C23G5/00
摘要： An improvement in a method for cleaning a CVD deposition chamber in a semiconductor wafer processing apparatus is described. The improvement comprises the treatment of fluorine residues in the CVD deposition chamber, left from a prior fluorine plasma cleaning step, by contacting such fluorine residues with one or more reducing gases which will react with the fluorine residues to form one or more gaseous or solid reaction products or a mixture of same.
摘要翻译：对半导体晶片处理装置中的CVD沉积室的清洗方法的改进进行了说明。改进之处在于通过将氟残余物与一种或多种与氟残留物反应形成一种或多种气态或固态反应的还原气体，从现有的氟等离子体清洗步骤中留下的CVD沉积室中的氟残留物的处理产品或其混合物。

8. 发明申请

US20130207109A1 SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE 审中-公开
标题翻译：半导体器件及制造半导体器件的方法
公开(公告)号：US20130207109A1
公开(公告)日：2013-08-15
申请号：US13372985
申请日：2012-02-14
申请人： Jerry Wong
发明人： Jerry Wong
IPC分类号： H01L29/04 , H01L31/18
CPC分类号： H01L31/03682 , H01L31/03921 , H01L31/182 , Y02E10/546 , Y02P70/521
摘要： A method for manufacturing a semiconductor device includes providing a substrate upon which the semiconductor device is to be disposed, heating the substrate to a first temperature that exceeds at least one of a softening point or glass transition temperature of the substrate, and depositing a polysilicon layer onto the substrate. A semiconductor device includes a substrate having at least one of a softening point, Ts, that is less than 600 degrees Celsius and a polysilicon layer disposed on an upper surface of the substrate such that the polysilicon layer abuts the substrate.
摘要翻译：一种半导体器件的制造方法，其特征在于，具备：设置半导体器件的基板，将基板加热到超过基板的软化点或玻璃化转变温度以上的至少一个的第一温度，以及沉积多晶硅层到基板上。半导体器件包括具有小于600摄氏度的软化点Ts和设置在衬底的上表面上的多晶硅层中的至少一个的衬底，使得多晶硅层邻接衬底。

9. 发明授权

US08444048B1 System and method for providing transaction-related communication using machine-readable encoded information 有权
标题翻译：使用机器可读编码信息提供与交易相关的通信的系统和方法
公开(公告)号：US08444048B1
公开(公告)日：2013-05-21
申请号：US12978264
申请日：2010-12-23
申请人： Lakshmi S. Nidamarthi , Jerry Wong , Hardik B. Doshi , Charley Ames , Brock A. Judkins , Gregory D. Lewis , Chris H. Li
发明人： Lakshmi S. Nidamarthi , Jerry Wong , Hardik B. Doshi , Charley Ames , Brock A. Judkins , Gregory D. Lewis , Chris H. Li
IPC分类号： G06K5/00
CPC分类号： G06Q30/016 , G06K19/06037
摘要： A computer generates encoded information to associate a physical package to a transaction. The transaction comprises an order for one or more items to be shipped in the package. The encoded information is provided for inclusion in a machine-readable representation of the encoded information for shipping with the physical package. Subsequent to delivery of the physical package to a recipient, recipient reaction information containing the encoded information obtained from the machine-readable representation is received over a network. The encoded information is used to associate the recipient reaction information to a record for the transaction.
摘要翻译：计算机生成编码信息以将物理包与交易相关联。交易包括一个或多个物品在包裹中发货的订单。经编码的信息被提供以包含在用于运送物理包的编码信息的机器可读表示中。在将物理包发送到接收者之后，通过网络接收包含从机器可读表示获得的编码信息的接收者反应信息。编码信息用于将接收者反应信息与交易记录相关联。

10. 发明授权

US5990017A Plasma reactor with heated source of a polymer-hardening precursor material 失效
公开(公告)号：US5990017A
公开(公告)日：1999-11-23
申请号：US104550
申请日：1998-06-25
申请人： Kenneth Collins , Michael Rice , David Groechel , Gerald Yin , Jon Mohn , Craig Roderick , Douglas Buchberger , Chan-Lon Yang , Jerry Wong , Jeffrey Marks , Peter Keswick
发明人： Kenneth Collins , Michael Rice , David Groechel , Gerald Yin , Jon Mohn , Craig Roderick , Douglas Buchberger , Chan-Lon Yang , Jerry Wong , Jeffrey Marks , Peter Keswick
IPC分类号： H01L21/302 , H01J37/32 , H01L21/02 , H01L21/3065 , H01L21/311 , H01L21/00
CPC分类号： H01J37/321 , H01J37/32082 , H01J37/32146 , H01J37/32165 , H01J37/32458 , H01J37/32467 , H01J37/32522 , H01J37/32688 , H01J37/32706 , H01J37/32871 , H01L21/31116 , H01F2029/143 , H01J2237/3343 , H01J2237/3345 , H01J2237/3346 , H01J2237/3382
摘要： A general method of the invention is to provide a polymer-hardening precursor piece (such as silicon, carbon, silicon carbide or silicon nitride, but preferably silicon) within the reactor chamber during an etch process with a fluoro-carbon or fluoro-hydrocarbon gas, and to heat the polymer-hardening precursor piece above the polymerization temperature sufficiently to achieve a desired increase in oxide-to-silicon etch selectivity. Generally, this polymer-hardening precursor or silicon piece may be an integral part of the reactor chamber walls and/or ceiling or a separate, expendable and quickly removable piece, and the heating/cooling apparatus may be of any suitable type including apparatus which conductively or remotely heats the silicon piece.

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