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    • 1. 发明授权
    • Charge injection
    • 电荷注入
    • US06567303B1
    • 2003-05-20
    • US10050483
    • 2002-01-16
    • Darlene G. HamiltonJanet S. Y. WangNarbeh DerhacobianTim ThurgateMichael K. Han
    • Darlene G. HamiltonJanet S. Y. WangNarbeh DerhacobianTim ThurgateMichael K. Han
    • G11C1604
    • G11C16/3409G11C11/5671G11C16/0475G11C16/10G11C16/3404G11C16/3436G11C16/3445
    • A system and methodology is provided for programming first and second bits of a memory array of dual bit memory cells at a substantially high delta VT. The substantially higher VT assures that the memory array will maintain programmed data and erase data consistently after higher temperature stresses and/or customer operation over substantial periods of time. At a substantially higher delta VT, programming of the first bit of the memory cell causes the second bit to program harder and faster due to the shorter channel length. Therefore, the present invention employs selected gate and drain voltages and programming pulse widths during programming of the first and second bit that assures a controlled first bit VT and slows down programming of the second bit. Furthermore, the selected programming parameters keep the programming times short without degrading charge loss.
    • 提供了一种用于以基本上高的delta VT对双位存储器单元的存储器阵列的第一和第二位进行编程的系统和方法。 基本上更高的VT确保存储器阵列将维持编程数据并且在相当长的一段时间内在较高的温度应力和/或客户操作之后一致地擦除数据。 在基本上较高的增量VT下,存储器单元的第一位的编程使得第二位由于较短的通道长度而更硬更快地编程。 因此,本发明在第一和第二位的编程期间采用选择的栅极和漏极电压以及编程脉冲宽度,以确保受控的第一位VT并减慢第二位的编程。 此外,所选择的编程参数保持编程时间短而不降低电荷损耗。
    • 9. 发明授权
    • Method of programming a non-volatile memory cell using a drain bias
    • 使用漏极偏置来编程非易失性存储单元的方法
    • US06459618B1
    • 2002-10-01
    • US09880367
    • 2001-06-13
    • Janet S. Y. Wang
    • Janet S. Y. Wang
    • G11C1604
    • G11C11/5671G11C16/0475H01L29/7923
    • A method of programming a memory cell with a substrate that includes a first region and a second region with a channel therebetween and a gate above the channel, and a charge trapping region that contains a first amount of charge. The method includes applying a constant first voltage across the gate and applying a second constant voltage across the first region so as to generate a first charge injection region. The application of the second constant voltage is discontinued while simultaneously applying a third constant voltage across the first region so that a second charge injection region is generated that is larger than the first charge injection region.
    • 一种用衬底编程存储单元的方法,该衬底包括第一区域和具有通道的第二区域和沟道上方的栅极以及包含第一电荷量的电荷捕获区域。 该方法包括在栅极上施加恒定的第一电压并在第一区域上施加第二恒定电压,以产生第一电荷注入区域。 停止施加第二恒定电压,同时在第一区域上施加第三恒定电压,使得产生大于第一电荷注入区域的第二电荷注入区域。
    • 10. 发明授权
    • Method of drain avalanche programming of a non-volatile memory cell
    • 非易失性存储器单元的排水雪崩编程方法
    • US06456531B1
    • 2002-09-24
    • US09884402
    • 2001-06-19
    • Janet S. Y. WangSameer S. Haddad
    • Janet S. Y. WangSameer S. Haddad
    • G11C1604
    • G11C16/0475G11C11/5671G11C16/12
    • A method of programming a memory cell with a substrate that includes a first region and a second region with a channel therebetween and a gate above the channel, and a charge trapping region that contains a first amount of charge. The method includes applying a constant first voltage across the gate, applying a second constant voltage across the first region, and applying a third constant voltage across the second region that is near the avalanche breakdown voltage of the second region so that spillover electrons are significantly reduced in number within the channel when compared to if the third constant voltage is well below the avalanche breakdown voltage.
    • 一种用衬底编程存储单元的方法,该衬底包括第一区域和具有通道的第二区域和沟道上方的栅极以及包含第一电荷量的电荷捕获区域。 该方法包括跨越栅极施加恒定的第一电压,在第一区域上施加第二恒定电压,以及跨越第二区域施加第三恒定电压,该第二区域接近第二区域的雪崩击穿电压,使得溢出电子显着减少 与第三恒定电压远低于雪崩击穿电压相比,在通道内的数量。