会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 1. 发明申请
    • Transistor or semiconductor device and method of fabricating the same
    • 晶体管或半导体器件及其制造方法
    • US20060105510A1
    • 2006-05-18
    • US11179971
    • 2005-07-11
    • Jae MunJong LimWoo ChangHong JiHo AhnHae Kim
    • Jae MunJong LimWoo ChangHong JiHo AhnHae Kim
    • H01L21/338
    • H01L29/66462H01L29/7785
    • Provided are a transistor of a semiconductor device and method of fabricating the same. The transistor includes: an epitaxy substrate disposed on a semi-insulating substrate and having a buffer layer, a first Si planar doping layer, a first conductive layer, a second Si planar doping layer, and a second conductive layer, which are sequentially stacked, the second Si planar doping layer having a doping concentration different from that of the first Si planar doping layer; a source electrode and a drain electrode diffusing into the first Si planar doping layer to a predetermined depth and disposed on both sides of the second conductive layer to form an ohmic contact; and a gate electrode disposed on the second conductive layer between the source and drain electrodes and being in contact with the second conductive layer. In this structure, both isolation and switching speed of the transistor can be increased. Also, the maximum voltage limit applied to the transistor is increased due to increases in gate turn-on voltage and threshold voltage and a reduction in parallel conduction element. As a result, the power handling capability of the transistor can be improved, thus improving a high-power low-distortion characteristic and an isolation characteristic.
    • 提供半导体器件的晶体管及其制造方法。 晶体管包括:设置在半绝缘衬底上并具有缓冲层的外延衬底,第一Si平面掺杂层,第一导电层,第二Si平面掺杂层和第二导电层, 所述第二Si平面掺杂层具有与所述第一Si平面掺杂层的掺杂浓度不同的掺杂浓度; 源极电极和漏电极,其扩散到所述第一Si平面掺杂层中至预定深度并且设置在所述第二导电层的两侧以形成欧姆接触; 以及设置在所述源极和漏极之间的所述第二导电层上并与所述第二导电层接触的栅电极。 在这种结构中,可以提高晶体管的隔离和开关速度。 此外,施加到晶体管的最大电压限制由于栅极导通电压和阈值电压的增加以及并联导通元件的减小而增加。 结果,可以提高晶体管的功率处理能力,从而提高高功率低失真特性和隔离特性。
    • 2. 发明申请
    • Transistor or semiconductor device and method of fabricating the same
    • 晶体管或半导体器件及其制造方法
    • US20070238232A9
    • 2007-10-11
    • US11179971
    • 2005-07-12
    • Jae MunJong LimWoo ChangHong JiHo AhnHae Kim
    • Jae MunJong LimWoo ChangHong JiHo AhnHae Kim
    • H01L21/338
    • H01L29/66462H01L29/7785
    • Provided are a transistor of a semiconductor device and method of fabricating the same. The transistor includes: an epitaxy substrate disposed on a semi-insulating substrate and having a buffer layer, a first Si planar doping layer, a first conductive layer, a second Si planar doping layer, and a second conductive layer, which are sequentially stacked, the second Si planar doping layer having a doping concentration different from that of the first Si planar doping layer; a source electrode and a drain electrode diffusing into the first Si planar doping layer to a predetermined depth and disposed on both sides of the second conductive layer to form an ohmic contact; and a gate electrode disposed on the second conductive layer between the source and drain electrodes and being in contact with the second conductive layer. In this structure, both isolation and switching speed of the transistor can be increased. Also, the maximum voltage limit applied to the transistor is increased due to increases in gate turn-on voltage and threshold voltage and a reduction in parallel conduction element. As a result, the power handling capability of the transistor can be improved, thus improving a high-power low-distortion characteristic and an isolation characteristic.
    • 提供半导体器件的晶体管及其制造方法。 晶体管包括:设置在半绝缘衬底上并具有缓冲层的外延衬底,第一Si平面掺杂层,第一导电层,第二Si平面掺杂层和第二导电层, 所述第二Si平面掺杂层具有与所述第一Si平面掺杂层的掺杂浓度不同的掺杂浓度; 源极电极和漏电极,其扩散到所述第一Si平面掺杂层中至预定深度并且设置在所述第二导电层的两侧以形成欧姆接触; 以及设置在所述源极和漏极之间的所述第二导电层上并与所述第二导电层接触的栅电极。 在这种结构中,可以提高晶体管的隔离和开关速度。 此外,施加到晶体管的最大电压限制由于栅极导通电压和阈值电压的增加以及并联导通元件的减小而增加。 结果,可以提高晶体管的功率处理能力,从而提高高功率低失真特性和隔离特性。
    • 3. 发明申请
    • Method of manufacturing field effect transistor
    • 制造场效应晶体管的方法
    • US20060121658A1
    • 2006-06-08
    • US11180726
    • 2005-07-14
    • Ho AhnJong LimHong JiWoo ChangJae MunHae Kim
    • Ho AhnJong LimHong JiWoo ChangJae MunHae Kim
    • H01L21/338
    • H01L29/66856H01L29/66462
    • Provided is a method of manufacturing a field effect transistor (FET). The method includes steps of: forming an ohmic metal layer on a substrate in source and drain regions; sequentially forming an insulating layer and a multilayered resist layer on the entire surface of the resultant structure and simultaneously forming resist patterns having respectively different shapes in both a first region excluding the ohmic metal layer and a second region excluding the ohmic metal layer, wherein a lowermost resist pattern is exposed in the first region, and the insulating layer is exposed in the second region; exposing the substrate and the insulating layer by simultaneously etching the exposed insulating layer and the exposed lowermost resist pattern using the resist patterns as etch masks, respectively; performing a recess process on the exposed substrate and etching the exposed insulating layer to expose the substrate; and forming gate recess regions having different etching depths from each other over the substrate, depositing a predetermined gate metal, and removing the resist patterns. In this method, transistors having different threshold voltages can be manufactured without additional mask patterns using the least number of processes, with the results that the cost of production can be reduced and the stability and productivity of semiconductor devices can be improved.
    • 提供了制造场效应晶体管(FET)的方法。 该方法包括以下步骤:在源极和漏极区域的衬底上形成欧姆金属层; 在所得结构的整个表面上顺序地形成绝缘层和多层抗蚀剂层,并且同时形成除了欧姆金属层以外的第一区域和不包括欧姆金属层的第二区域中具有不同形状的抗蚀剂图案,其中最下面 抗蚀剂图案在第一区域中暴露,并且绝缘层在第二区域中暴露; 通过分别使用抗蚀剂图案作为蚀刻掩模,同时蚀刻暴露的绝缘层和暴露的最下面的抗蚀剂图案来暴露衬底和绝缘层; 对曝光的衬底进行凹陷处理并蚀刻暴露的绝缘层以露出衬底; 以及在衬底上形成具有彼此不同蚀刻深度的栅极凹陷区域,沉积预定的栅极金属和去除抗蚀剂图案。 在该方法中,可以使用最少数量的工艺来制造具有不同阈值电压的晶体管,而不需要额外的掩模图案,结果可以降低生产成本,并且可以提高半导体器件的稳定性和生产率。
    • 6. 发明申请
    • Transistor of semiconductor device and method of fabricating the same
    • 半导体器件的晶体管及其制造方法
    • US20060124963A1
    • 2006-06-15
    • US11280608
    • 2005-11-15
    • Jae MunHung JiHo AhnHae Kim
    • Jae MunHung JiHo AhnHae Kim
    • H01L29/739
    • H01L29/7785H01L29/42316
    • Provided are a transistor of a semiconductor device and a method of fabricating the same. The transistor of a semiconductor device includes an epitaxial substrate having a buffer layer, a first silicon (Si) planar doped layer, a first conductive layer, a second Si planar doped layer having a different dopant concentration from the first Si planar doped layer, and a second conductive layer, which are sequentially formed on a semi-insulating substrate; a source electrode and a drain electrode formed on both sides of the second conductive layer to penetrate the first Si planar doped layer to a predetermined depth to form an ohmic contact; and a gate electrode formed on the second conductive layer between the source electrode and the drain electrode to form a contact with the second conductive layer, wherein the gate electrode, the source electrode and the drain electrode are electrically insulated by an insulating layer, and a predetermined part of an upper part of the gate electrode is formed to overlap at least one of the source electrode and the drain electrode. Therefore, a maximum voltage that can be applied to the switching device is increased due to increases of a gate turn-on voltage and a breakdown voltage, and decrease of a parallel conduction component. As a result of this improved power handling capability, high-power and low-distortion characteristics and high isolation can be expected from the switching device.
    • 提供半导体器件的晶体管及其制造方法。 半导体器件的晶体管包括具有缓冲层,第一硅(Si)平面掺杂层,第一导电层,具有与第一Si平面掺杂层不同的掺杂剂浓度的第二Si平面掺杂层的外延衬底,以及 第二导电层,其依次形成在半绝缘基板上; 源电极和漏电极,形成在第二导电层的两侧,以将第一Si平面掺杂层穿透到预定深度以形成欧姆接触; 以及形成在所述源电极和所述漏电极之间的所述第二导电层上的栅电极,以与所述第二导电层形成接触,其中所述栅电极,所述源电极和所述漏极由绝缘层电绝缘, 栅电极的上部的预定部分形成为与源电极和漏电极中的至少一个重叠。 因此,由于栅极导通电压和击穿电压的增加以及并联导通分量的降低,可以施加到开关器件的最大电压增加。 由于这种改进的功率处理能力,可以期望从开关器件获得高功率和低失真特性以及高隔离度。
    • 8. 发明申请
    • Light emitting diode lens and backlight apparatus having the same
    • 发光二极管透镜和具有相同的背光装置
    • US20060034097A1
    • 2006-02-16
    • US10953816
    • 2004-09-30
    • Hun HahmJung ParkYoung JeongYoung ParkHyung KimHo Ahn
    • Hun HahmJung ParkYoung JeongYoung ParkHyung KimHo Ahn
    • F21V7/04
    • H01L33/58H01L33/54H01L33/60
    • The present invention relates to an LED lens, in which a planar bottom has a pair of halves symmetrically connected with each other about a reference line and narrowed in the vicinity of the reference line. A pair of substantially semicircular reflecting surfaces are extended from both edges of the bottom connected with both ends of the reference line. A radiating surface is connected with remaining edges of the bottom and semicircular edges of the reflecting surfaces. The reflecting surfaces reflect light beams are introduced from the LED chip through the bottom toward the radiating surface. The radiating surface radiates the light beams to the outside when the light beams are introduced to the radiating surface through reflection from the reflecting surfaces and directly through the bottom, so that the light beams are radiated to the outside in a predetermined beam angle.
    • 本发明涉及一种LED透镜,其中平面底部具有围绕参考线彼此对称连接并在基准线附近变窄的一对半部。 一对基本上半圆形的反射表面从与参考线的两端连接的底部的两个边缘延伸。 辐射表面与反射表面的底部和半圆形边缘的剩余边缘连接。 反射面反射光束从LED芯片通过底部朝向辐射表面引入。 当光束通过反射表面反射而直接通过底部将光束引入辐射表面时,辐射表面将光束照射到外部,使得光束以预定的光束角度辐射到外部。