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1. 发明授权

US09062373B2 Film deposition apparatus 有权
标题翻译：膜沉积装置
公开(公告)号：US09062373B2
公开(公告)日：2015-06-23
申请号：US13571546
申请日：2012-08-10
申请人： Hitoshi Kato , Shigehiro Ushikubo , Katsuyuki Hishiya
发明人： Hitoshi Kato , Shigehiro Ushikubo , Katsuyuki Hishiya
IPC分类号： C23C16/44 , C23C16/455 , H01L21/02
CPC分类号： C23C16/4412 , C23C16/45551 , C23C16/45578 , H01L21/02164 , H01L21/02211 , H01L21/0228
摘要： A film deposition apparatus includes a turntable including plural substrate placing areas in the circumferential direction; a gas nozzle provided to extend from an inner edge to an outer edge of the substrate placing area; a gas evacuation port provided outside of an outer edge of the turntable and downstream in a rotational direction of the turntable with respect to the gas nozzle for evacuating the gas; and a regulation member including a wall portion provided between the gas nozzle and the gas evacuation port for isolating the gas nozzle and the gas evacuation port at least at a part between the inner edge to the outer edge of the substrate placing area while having a space extending from the inner edge to the outer edge of the substrate placing area when a substrate is placed on the substrate placing area.
摘要翻译：一种成膜装置，包括在圆周方向上包括多个基板放置区域的转盘; 气体喷嘴，其设置成从所述基板放置区域的内边缘延伸到外边缘; 气体排出口，其设置在所述转台的外缘的外侧，并且相对于所述气体喷嘴排出所述转台，在所述转台的旋转方向的下游; 以及调节构件，其包括设置在所述气体喷嘴和所述气体排出口之间的壁部，用于至少在所述基板放置区域的内缘与外缘之间的部分处隔开所述气体喷嘴和所述排气口，同时具有空间当基板被放置在基板放置区域上时，从基板放置区域的内边缘延伸到外边缘。

2. 发明授权

US09932674B2 Film deposition apparatus, film deposition method, and computer-readable recording medium 有权
公开(公告)号：US09932674B2
公开(公告)日：2018-04-03
申请号：US13467324
申请日：2012-05-09
申请人： Hitoshi Kato , Katsuyuki Hishiya , Hiroyuki Kikuchi , Shigehiro Ushikubo , Shigenori Ozaki
发明人： Hitoshi Kato , Katsuyuki Hishiya , Hiroyuki Kikuchi , Shigehiro Ushikubo , Shigenori Ozaki
IPC分类号： C23C16/00 , H01L21/306 , C23C16/54 , H01J37/32 , C23C16/455
CPC分类号： C23C16/54 , C23C16/4554 , H01J37/321
摘要： A film deposition apparatus includes a vacuum chamber into which first and second gases are sequentially supplied for a plural times, a rotation table including a first surface having a receiving area and rotating the receiving area inside the vacuum chamber, a first part supplying the first gas to a first region, a second part supplying the second gas to a second region separated from the first region in a peripheral direction of the rotation table via a separation region, a plasma gas part supplying a plasma generation gas into a plasma region inside the vacuum chamber, an antenna facing the first surface of the rotation table and generating plasma from the plasma generation gas inside a plasma space by inductive coupling, and a faraday shield being grounded and provided between the antenna and the plasma space and including slits aligned in a direction perpendicularly intersecting the antenna.

3. 发明授权

US09453280B2 Film deposition apparatus, film deposition method and storage medium 有权
标题翻译：薄膜沉积装置，薄膜沉积方法和存储介质
公开(公告)号：US09453280B2
公开(公告)日：2016-09-27
申请号：US13602587
申请日：2012-09-04
申请人： Hitoshi Kato , Katsuyuki Hishiya , Shigehiro Ushikubo
发明人： Hitoshi Kato , Katsuyuki Hishiya , Shigehiro Ushikubo
IPC分类号： H01L21/306 , C23C16/00 , C23C16/455 , H01J37/32 , C23C16/34
CPC分类号： C23C16/45542 , C23C16/345 , C23C16/45551 , H01J37/321 , H01J37/32733
摘要： A film deposition apparatus includes a turntable having a substrate mounting area, a first plasma gas supplying part, a second plasma supplying part, a first plasma gas generating part to convert the first plasma generating gas to first plasma, and a second plasma generating part provided away from the first plasma generating part in a circumferential direction and to convert the second plasma generating gas to second plasma. The first plasma generating part includes an antenna facing the turntable so as to convert the first plasma generating gas to the first plasma, and a grounded Faraday shield between the antenna and an area where a plasma process is performed, and to include plural slits respectively extending in directions perpendicular to the antenna and arranged along an antenna extending direction to prevent an electric field from passing toward the substrate and to pass a magnetic field toward the substrate.
摘要翻译：一种成膜装置，包括具有基板安装区域的转台，第一等离子体气体供给部，第二等离子体供给部，将第一等离子体产生气体转换为第一等离子体的第一等离子体气体发生部，以及第二等离子体产生部，在圆周方向上离开第一等离子体产生部分并将第二等离子体产生气体转换成第二等离子体。第一等离子体产生部件包括面向转盘的天线，以将第一等离子体产生气体转换成第一等离子体，以及天线与执行等离子体处理的区域之间的接地法拉第屏蔽，并且包括分别延伸的多个狭缝在垂直于天线的方向上并沿着天线延伸方向布置，以防止电场通向衬底并使磁场朝向衬底。

4. 发明申请

US20130149467A1 FILM DEPOSITION APPARATUS, FILM DEPOSITION METHOD, AND COMPUTER-READABLE RECORDING MEDIUM 有权
标题翻译：薄膜沉积装置，薄膜沉积方法和计算机可读记录介质
公开(公告)号：US20130149467A1
公开(公告)日：2013-06-13
申请号：US13467324
申请日：2012-05-09
申请人： Hitoshi KATO , Katsuyuki Hishiya , Hiroyuki Kikuchi , Shigehiro Ushikubo , Shigenori Ozaki
发明人： Hitoshi KATO , Katsuyuki Hishiya , Hiroyuki Kikuchi , Shigehiro Ushikubo , Shigenori Ozaki
IPC分类号： C23C16/54
CPC分类号： C23C16/54 , C23C16/4554 , H01J37/321
摘要： A film deposition apparatus includes a vacuum chamber into which first and second gases are sequentially supplied for a plural times, a rotation table including a first surface having a receiving area and rotating the receiving area inside the vacuum chamber, a first part supplying the first gas to a first region, a second part supplying the second gas to a second region separated from the first region in a peripheral direction of the rotation table via a separation region, a plasma gas part supplying a plasma generation gas into a plasma region inside the vacuum chamber, an antenna facing the first surface of the rotation table and generating plasma from the plasma generation gas inside a plasma space by inductive coupling, and a faraday shield being grounded and provided between the antenna and the plasma space and including slits aligned in a direction perpendicularly intersecting the antenna.
摘要翻译：一种成膜装置包括：第一和第二气体依次供给多次的真空室，包括具有接收区域的第一表面和旋转真空室内部的接收区域的旋转台，第一部分供应第一气体在第一区域中，第二部分经由分离区域将第二气体供给到沿着旋转台的周向方向与第一区域分离的第二区域;等离子体气体部分，其将等离子体产生气体供应到真空中的等离子体区域中天线，面向旋转台的第一表面的天线，并通过电感耦合从等离子体空间内的等离子体产生气体产生等离子体，并且法拉第屏蔽层接地并设置在天线和等离子体空间之间，并且包括在方向垂直于天线相交。

5. 发明申请

US20130042813A1 FILM DEPOSITION APPARATUS 有权
标题翻译：胶片沉积装置
公开(公告)号：US20130042813A1
公开(公告)日：2013-02-21
申请号：US13571546
申请日：2012-08-10
申请人： Hitoshi KATO , Shigehiro Ushikubo , Katsuyuki Hishiya
发明人： Hitoshi KATO , Shigehiro Ushikubo , Katsuyuki Hishiya
IPC分类号： C23C16/458
CPC分类号： C23C16/4412 , C23C16/45551 , C23C16/45578 , H01L21/02164 , H01L21/02211 , H01L21/0228
摘要： A film deposition apparatus includes a turntable including plural substrate placing areas in the circumferential direction; a gas nozzle provided to extend from an inner edge to an outer edge of the substrate placing area; a gas evacuation port provided outside of an outer edge of the turntable and downstream in a rotational direction of the turntable with respect to the gas nozzle for evacuating the gas; and a regulation member including a wall portion provided between the gas nozzle and the gas evacuation port for isolating the gas nozzle and the gas evacuation port at least at a part between the inner edge to the outer edge of the substrate placing area while having a space extending from the inner edge to the outer edge of the substrate placing area when a substrate is placed on the substrate placing area.
摘要翻译：一种成膜装置，包括在圆周方向上包括多个基板放置区域的转盘; 气体喷嘴，其设置成从所述基板放置区域的内边缘延伸到外边缘; 气体排出口，其设置在所述转台的外缘的外侧，并且相对于所述气体喷嘴排出所述转台，在所述转台的旋转方向的下游; 以及调节构件，其包括设置在所述气体喷嘴和所述气体排出口之间的壁部，用于至少在所述基板放置区域的内缘与外缘之间的部分处隔开所述气体喷嘴和所述排气口，同时具有空间当基板被放置在基板放置区域上时，从基板放置区域的内边缘延伸到外边缘。

6. 发明授权

US08181769B2 Workpiece transfer mechanism, workpiece transfer method and workpiece processing system 有权
标题翻译：工件传送机构，工件传送方式和工件加工系统
公开(公告)号：US08181769B2
公开(公告)日：2012-05-22
申请号：US12285778
申请日：2008-10-14
申请人： Katsuyuki Hishiya , Kiichi Takahashi , Haruoki Nakamura
发明人： Katsuyuki Hishiya , Kiichi Takahashi , Haruoki Nakamura
IPC分类号： B65G29/00 , B65G1/133 , B65G57/03 , G06F17/30
CPC分类号： H01L21/67303 , H01L21/67748 , H01L21/67754 , H01L21/67781 , H01L21/68707
摘要： A workpiece transfer mechanism 76 transfers workpieces W to a workpiece boat 40 having ringlike tables 86. The transfer mechanism 76 includes a fork main body 78 being movable forward and rearward with the workpiece W placed thereon; stopper members 94 provided at the end portion of the fork main body 78; clamp means 96 provided on the proximal end side of the fork main body 78 and having a pressing portion 102 coming into contact with the circumferential edge of the workpiece W and pressing the workpiece W toward the stopper member 94 for clamping; and fork elevating means 80 for lifting and lowering the fork main body 78. When the workpieces W are transferred to a workpiece boat 40, the pressing portion 102 of the clamp means 96 is controlled so as not to be inserted into a gap between tables 86. Thus, although the pitch between the tables 86 is small, the pressing portion 102 of the clamp means 96 does not interfere with the workpiece boat 40.
摘要翻译：工件传送机构76将工件W传送到具有环状台子86的工件舟皿40.传送机构76包括叉形主体78，叉主体78可随着放置在其上的工件W而向前和向后移动; 设置在叉主体78的端部的止动构件94; 夹持装置96设置在叉主体78的基端侧，并且具有与工件W的周缘接触的按压部102，并将工件W朝向止动构件94夹紧; 以及用于提升和降低叉主体78的叉升降装置80.当工件W被传送到工件舟皿40时，夹紧装置96的按压部分102被控制成不被插入台86之间的间隙因此，虽然台86之间的间距小，但是夹紧装置96的按压部分102不会干涉工件舟皿40。

7. 发明授权

US07896648B2 Vertical heat processing apparatus and heat processing method using the vertical heat processing apparatus 有权
标题翻译：立式热处理装置和使用立式热处理装置的热处理方法
公开(公告)号：US07896648B2
公开(公告)日：2011-03-01
申请号：US12010746
申请日：2008-01-29
申请人： Hiromi Nitadori , Katsuyuki Hishiya
发明人： Hiromi Nitadori , Katsuyuki Hishiya
IPC分类号： F27D3/12
CPC分类号： F27B17/0025 , H01L21/67303 , H01L21/67757 , Y10S414/14
摘要： The present invention is a vertical heat processing apparatus comprising: a heat processing furnace having a furnace opening; a lid member for closing the furnace opening of the heat processing furnace; a first substrate holder and a second substrate holder, each of which is capable of holding a plurality of substrates in a tier-like manner and of being alternately placed on the lid member through a heat retention tube; an elevating mechanism that vertically moves the lid member to load one of the substrate holders into the heat processing furnace, and to unload the one of the substrate holders from the heat processing furnace; a holder table configured to be placed thereon the other of the substrate holders for transfer of the substrates, when the one of the substrate holders is in the heat processing furnace; and a holder conveying mechanism configured to convey the respective substrate holders between the holder table and the heat retention tube; wherein the holder table is provided with a holder gripping mechanism for gripping the substrate holder to prevent turnover thereof.
摘要翻译：本发明是一种立式热处理装置，其特征在于：具有炉开口的热处理炉; 用于关闭热处理炉的炉开口的盖构件; 第一衬底保持器和第二衬底保持器，每个衬底保持器和第二衬底保持器能够以层状的方式保持多个衬底并且通过保温管交替地放置在盖构件上; 升降机构，其使所述盖部件垂直移动，将所述基板保持件中的一个载置到所述热处理炉中，并且从所述热处理炉中卸载所述一个所述基板保持件; 保持台，当所述基板保持件中的一个在所述热处理炉中时，所述保持台被配置为放置在所述基板保持器中的另一个用于转移所述基板的位置; 以及保持器输送机构，其构造成在保持台和保温管之间输送各个基板保持件; 其中，所述保持台具有用于夹持所述基板保持件以防止其切换的保持器夹持机构。

8. 发明申请

US20080199818A1 Vertical heat processing apparatus and heat processing method using the vertical heat processing apparatus 有权
标题翻译：立式热处理装置和使用立式热处理装置的热处理方法
公开(公告)号：US20080199818A1
公开(公告)日：2008-08-21
申请号：US12010746
申请日：2008-01-29
申请人： Hiromi Nitadori , Katsuyuki Hishiya
发明人： Hiromi Nitadori , Katsuyuki Hishiya
IPC分类号： F27D3/12 , F27D5/00
CPC分类号： F27B17/0025 , H01L21/67303 , H01L21/67757 , Y10S414/14
摘要： The present invention is a vertical heat processing apparatus comprising: a heat processing furnace having a furnace opening; a lid member for closing the furnace opening of the heat processing furnace; a first substrate holder and a second substrate holder, each of which is capable of holding a plurality of substrates in a tier-like manner and of being alternately placed on the lid member through a heat retention tube; an elevating mechanism that vertically moves the lid member to load one of the substrate holders into the heat processing furnace, and to unload the one of the substrate holders from the heat processing furnace; a holder table configured to be placed thereon the other of the substrate holders for transfer of the substrates, when the one of the substrate holders is in the heat processing furnace; and a holder conveying mechanism configured to convey the respective substrate holders between the holder table and the heat retention tube; wherein the holder table is provided with a holder gripping mechanism for gripping the substrate holder to prevent turnover thereof.
摘要翻译：本发明是一种立式热处理装置，其特征在于：具有炉开口的热处理炉; 用于关闭热处理炉的炉开口的盖构件; 第一衬底保持器和第二衬底保持器，每个衬底保持器和第二衬底保持器能够以层状的方式保持多个衬底并且通过保温管交替地放置在盖构件上; 升降机构，其使所述盖部件垂直移动，将所述基板保持件中的一个载置到所述热处理炉中，并且从所述热处理炉中卸载所述一个所述基板保持件; 保持台，当所述基板保持件中的一个在所述热处理炉中时，所述保持台被配置为放置在所述基板保持器中的另一个用于转移所述基板的位置; 以及保持器输送机构，其构造成在保持台和保温管之间输送各个基板保持件; 其中，所述保持台具有用于夹持所述基板保持件以防止其切换的保持器夹持机构。

9. 外观设计

USD655259S1 Top plate for reactor for manufacturing semiconductor 有权
公开(公告)号：USD655259S1
公开(公告)日：2012-03-06
申请号：US29389563
申请日：2011-04-13
申请人： Manabu Honma , Katsuyuki Hishiya
设计人： Manabu Honma , Katsuyuki Hishiya

10. 发明申请

US20090101472A1 Workpiece transfer mechanism, workpiece transfer method and workpiece processing system 有权
标题翻译：工件传送机构，工件传送方式和工件加工系统
公开(公告)号：US20090101472A1
公开(公告)日：2009-04-23
申请号：US12285778
申请日：2008-10-14
申请人： Katsuyuki Hishiya , Kiichi Takahashi , Haruoki Nakamura
发明人： Katsuyuki Hishiya , Kiichi Takahashi , Haruoki Nakamura
IPC分类号： B65G29/00 , B65G1/133 , B65G57/03 , G06F17/30
CPC分类号： H01L21/67303 , H01L21/67748 , H01L21/67754 , H01L21/67781 , H01L21/68707
摘要： A workpiece transfer mechanism 76 transfers workpieces W to a workpiece boat 40 having ringlike tables 86. The transfer mechanism 76 includes a fork main body 78 being movable forward and rearward with the workpiece W placed thereon; stopper members 94 provided at the end portion of the fork main body 78; clamp means 96 provided on the proximal end side of the fork main body 78 and having a pressing portion 102 coming into contact with the circumferential edge of the workpiece W and pressing the workpiece W toward the stopper member 94 for clamping; and fork elevating means 80 for lifting and lowering the fork main body 78. When the workpieces W are transferred to a workpiece boat 40, the pressing portion 102 of the clamp means 96 is controlled so as not to be inserted into a gap between tables 86. Thus, although the pitch between the tables 86 is small, the pressing portion 102 of the clamp means 96 does not interfere with the workpiece boat 40.
摘要翻译：工件传送机构76将工件W传送到具有环状台子86的工件舟皿40.传送机构76包括叉形主体78，叉主体78可随着放置在其上的工件W而向前和向后移动; 设置在叉主体78的端部的止动构件94; 夹持装置96设置在叉主体78的基端侧，并且具有与工件W的周缘接触的按压部102，并将工件W朝向止动构件94夹紧; 以及用于提升和降低叉主体78的叉升降装置80.当工件W被传送到工件舟皿40时，夹紧装置96的按压部分102被控制成不被插入台86之间的间隙因此，虽然台86之间的间距小，但是夹紧装置96的按压部分102不会干涉工件舟皿40。

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