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1. 发明授权

US08181769B2 Workpiece transfer mechanism, workpiece transfer method and workpiece processing system 有权
标题翻译：工件传送机构，工件传送方式和工件加工系统
公开(公告)号：US08181769B2
公开(公告)日：2012-05-22
申请号：US12285778
申请日：2008-10-14
申请人： Katsuyuki Hishiya , Kiichi Takahashi , Haruoki Nakamura
发明人： Katsuyuki Hishiya , Kiichi Takahashi , Haruoki Nakamura
IPC分类号： B65G29/00 , B65G1/133 , B65G57/03 , G06F17/30
CPC分类号： H01L21/67303 , H01L21/67748 , H01L21/67754 , H01L21/67781 , H01L21/68707
摘要： A workpiece transfer mechanism 76 transfers workpieces W to a workpiece boat 40 having ringlike tables 86. The transfer mechanism 76 includes a fork main body 78 being movable forward and rearward with the workpiece W placed thereon; stopper members 94 provided at the end portion of the fork main body 78; clamp means 96 provided on the proximal end side of the fork main body 78 and having a pressing portion 102 coming into contact with the circumferential edge of the workpiece W and pressing the workpiece W toward the stopper member 94 for clamping; and fork elevating means 80 for lifting and lowering the fork main body 78. When the workpieces W are transferred to a workpiece boat 40, the pressing portion 102 of the clamp means 96 is controlled so as not to be inserted into a gap between tables 86. Thus, although the pitch between the tables 86 is small, the pressing portion 102 of the clamp means 96 does not interfere with the workpiece boat 40.
摘要翻译：工件传送机构76将工件W传送到具有环状台子86的工件舟皿40.传送机构76包括叉形主体78，叉主体78可随着放置在其上的工件W而向前和向后移动; 设置在叉主体78的端部的止动构件94; 夹持装置96设置在叉主体78的基端侧，并且具有与工件W的周缘接触的按压部102，并将工件W朝向止动构件94夹紧; 以及用于提升和降低叉主体78的叉升降装置80.当工件W被传送到工件舟皿40时，夹紧装置96的按压部分102被控制成不被插入台86之间的间隙因此，虽然台86之间的间距小，但是夹紧装置96的按压部分102不会干涉工件舟皿40。

2. 发明申请

US20090101472A1 Workpiece transfer mechanism, workpiece transfer method and workpiece processing system 有权
标题翻译：工件传送机构，工件传送方式和工件加工系统
公开(公告)号：US20090101472A1
公开(公告)日：2009-04-23
申请号：US12285778
申请日：2008-10-14
申请人： Katsuyuki Hishiya , Kiichi Takahashi , Haruoki Nakamura
发明人： Katsuyuki Hishiya , Kiichi Takahashi , Haruoki Nakamura
IPC分类号： B65G29/00 , B65G1/133 , B65G57/03 , G06F17/30
CPC分类号： H01L21/67303 , H01L21/67748 , H01L21/67754 , H01L21/67781 , H01L21/68707
摘要： A workpiece transfer mechanism 76 transfers workpieces W to a workpiece boat 40 having ringlike tables 86. The transfer mechanism 76 includes a fork main body 78 being movable forward and rearward with the workpiece W placed thereon; stopper members 94 provided at the end portion of the fork main body 78; clamp means 96 provided on the proximal end side of the fork main body 78 and having a pressing portion 102 coming into contact with the circumferential edge of the workpiece W and pressing the workpiece W toward the stopper member 94 for clamping; and fork elevating means 80 for lifting and lowering the fork main body 78. When the workpieces W are transferred to a workpiece boat 40, the pressing portion 102 of the clamp means 96 is controlled so as not to be inserted into a gap between tables 86. Thus, although the pitch between the tables 86 is small, the pressing portion 102 of the clamp means 96 does not interfere with the workpiece boat 40.
摘要翻译：工件传送机构76将工件W传送到具有环状台子86的工件舟皿40.传送机构76包括叉形主体78，叉主体78可随着放置在其上的工件W而向前和向后移动; 设置在叉主体78的端部的止动构件94; 夹持装置96设置在叉主体78的基端侧，并且具有与工件W的周缘接触的按压部102，并将工件W朝向止动构件94夹紧; 以及用于提升和降低叉主体78的叉升降装置80.当工件W被传送到工件舟皿40时，夹紧装置96的按压部分102被控制成不被插入台86之间的间隙因此，虽然台86之间的间距小，但是夹紧装置96的按压部分102不会干涉工件舟皿40。

3. 发明授权

US08231381B2 Processing system for process object and thermal processing method for process object 有权
标题翻译：过程对象处理系统和过程对象的热处理方法
公开(公告)号：US08231381B2
公开(公告)日：2012-07-31
申请号：US12285320
申请日：2008-10-01
申请人： Katsuyuki Hishiya , Kiichi Takahashi
发明人： Katsuyuki Hishiya , Kiichi Takahashi
IPC分类号： F27D5/00
CPC分类号： H01L21/67248 , H01L21/67109 , H01L21/67276 , H01L21/67754 , H01L21/67766 , Y10S414/138
摘要： To provide a processing system for a process object capable of preventing a transport arm mechanism from being thermally damaged, so as to effectively perform a transport operation of the process object. A processing system 2, which takes out a process object W from a storage box 6 for process object, and thermally process the process object, includes: a vertical processing unit 24; a process-object transport area 10 disposed below the processing unit; a plurality of process-object boats 20 configured to hold the process objects; a boat elevating means 68 configured to vertically move the process-object boat 20; a boat table for transport 52, on which the process-object boat can be placed; and a transport arm mechanism configured to transport the process objects between the storage box 6 and the process-object boat 20 placed on the boat table for transport 52. The transport arm mechanism 56 is vertically moved by an arm elevating means 58. A temperature measuring means 86 is disposed in an upper part in the process-object transport area. The transport arm mechanism 58 and the arm elevating means 58 are controlled by a transport control part 88 based on a measured value of the temperature measuring means 86, so that a transport operation of the transport arm mechanism is controlled.
摘要翻译：为了提供一种能够防止运输臂机构受热损伤的加工对象的处理系统，以有效地进行加工对象的搬运动作。处理系统2从处理对象的存储箱6取出处理对象W，并对处理对象进行热处理，包括：垂直处理单元24; 布置在处理单元下方的处理对象传送区域10; 配置成保持处理对象的多个处理对象船20; 构造成垂直移动处理对象船20的船升降装置68; 运输船52，可以放置过程对象船; 以及运送臂机构，其构造成在放置在船台上的储存箱6和处理对象船20之间输送处理物体以进行运输52.运送臂机构56通过臂提升装置58垂直移动。温度测量装置86设置在处理对象传送区域的上部。输送臂机构58和臂升降装置58由运送控制部88基于温度测量装置86的测量值进行控制，从而控制输送臂机构的输送动作。

4. 发明申请

US20090092940A1 Processing system for process object and thermal processing method for process object 有权
标题翻译：加工对象处理系统和加工对象的热处理方法
公开(公告)号：US20090092940A1
公开(公告)日：2009-04-09
申请号：US12285320
申请日：2008-10-01
申请人： Katsuyuki Hishiya , Kiichi Takahashi
发明人： Katsuyuki Hishiya , Kiichi Takahashi
IPC分类号： F27D19/00 , F27D3/00
CPC分类号： H01L21/67248 , H01L21/67109 , H01L21/67276 , H01L21/67754 , H01L21/67766 , Y10S414/138
摘要： To provide a processing system for a process object capable of preventing a transport arm mechanism from being thermally damaged, so as to effectively perform a transport operation of the process object. A processing system 2, which takes out a process object W from a storage box 6 for process object, and thermally process the process object, includes: a vertical processing unit 24; a process-object transport area 10 disposed below the processing unit; a plurality of process-object boats 20 configured to hold the process objects; a boat elevating means 68 configured to vertically move the process-object boat 20; a boat table for transport 52, on which the process-object boat can be placed; and a transport arm mechanism configured to transport the process objects between the storage box 6 and the process-object boat 20 placed on the boat table for transport 52. The transport arm mechanism 56 is vertically moved by an arm elevating means 58. A temperature measuring means 86 is disposed in an upper part in the process-object transport area. The transport arm mechanism 58 and the arm elevating means 58 are controlled by a transport control part 88 based on a measured value of the temperature measuring means 86, so that a transport operation of the transport arm mechanism is controlled.
摘要翻译：为了提供一种能够防止运输臂机构受热损伤的加工对象的处理系统，以有效地进行加工对象的搬运动作。处理系统2从处理对象的存储箱6取出处理对象W，并对处理对象进行热处理，包括：垂直处理单元24; 布置在处理单元下方的处理对象传送区域10; 配置成保持处理对象的多个处理对象船20; 构造成垂直移动处理对象船20的船升降装置68; 运输船52，可以放置过程对象船; 以及运送臂机构，其构造成在放置在船台上的储存箱6和处理对象船20之间输送处理物体用于运输52.运送臂机构56通过臂升降装置58垂直移动。温度测量装置86设置在处理对象传送区域的上部。输送臂机构58和手臂升降装置58由输送控制部88基于温度测量装置86的测量值来控制，从而控制输送臂机构的输送动作。

5. 发明授权

US09062373B2 Film deposition apparatus 有权
标题翻译：膜沉积装置
公开(公告)号：US09062373B2
公开(公告)日：2015-06-23
申请号：US13571546
申请日：2012-08-10
申请人： Hitoshi Kato , Shigehiro Ushikubo , Katsuyuki Hishiya
发明人： Hitoshi Kato , Shigehiro Ushikubo , Katsuyuki Hishiya
IPC分类号： C23C16/44 , C23C16/455 , H01L21/02
CPC分类号： C23C16/4412 , C23C16/45551 , C23C16/45578 , H01L21/02164 , H01L21/02211 , H01L21/0228
摘要： A film deposition apparatus includes a turntable including plural substrate placing areas in the circumferential direction; a gas nozzle provided to extend from an inner edge to an outer edge of the substrate placing area; a gas evacuation port provided outside of an outer edge of the turntable and downstream in a rotational direction of the turntable with respect to the gas nozzle for evacuating the gas; and a regulation member including a wall portion provided between the gas nozzle and the gas evacuation port for isolating the gas nozzle and the gas evacuation port at least at a part between the inner edge to the outer edge of the substrate placing area while having a space extending from the inner edge to the outer edge of the substrate placing area when a substrate is placed on the substrate placing area.
摘要翻译：一种成膜装置，包括在圆周方向上包括多个基板放置区域的转盘; 气体喷嘴，其设置成从所述基板放置区域的内边缘延伸到外边缘; 气体排出口，其设置在所述转台的外缘的外侧，并且相对于所述气体喷嘴排出所述转台，在所述转台的旋转方向的下游; 以及调节构件，其包括设置在所述气体喷嘴和所述气体排出口之间的壁部，用于至少在所述基板放置区域的内缘与外缘之间的部分处隔开所述气体喷嘴和所述排气口，同时具有空间当基板被放置在基板放置区域上时，从基板放置区域的内边缘延伸到外边缘。

6. 发明授权

US07896648B2 Vertical heat processing apparatus and heat processing method using the vertical heat processing apparatus 有权
标题翻译：立式热处理装置和使用立式热处理装置的热处理方法
公开(公告)号：US07896648B2
公开(公告)日：2011-03-01
申请号：US12010746
申请日：2008-01-29
申请人： Hiromi Nitadori , Katsuyuki Hishiya
发明人： Hiromi Nitadori , Katsuyuki Hishiya
IPC分类号： F27D3/12
CPC分类号： F27B17/0025 , H01L21/67303 , H01L21/67757 , Y10S414/14
摘要： The present invention is a vertical heat processing apparatus comprising: a heat processing furnace having a furnace opening; a lid member for closing the furnace opening of the heat processing furnace; a first substrate holder and a second substrate holder, each of which is capable of holding a plurality of substrates in a tier-like manner and of being alternately placed on the lid member through a heat retention tube; an elevating mechanism that vertically moves the lid member to load one of the substrate holders into the heat processing furnace, and to unload the one of the substrate holders from the heat processing furnace; a holder table configured to be placed thereon the other of the substrate holders for transfer of the substrates, when the one of the substrate holders is in the heat processing furnace; and a holder conveying mechanism configured to convey the respective substrate holders between the holder table and the heat retention tube; wherein the holder table is provided with a holder gripping mechanism for gripping the substrate holder to prevent turnover thereof.
摘要翻译：本发明是一种立式热处理装置，其特征在于：具有炉开口的热处理炉; 用于关闭热处理炉的炉开口的盖构件; 第一衬底保持器和第二衬底保持器，每个衬底保持器和第二衬底保持器能够以层状的方式保持多个衬底并且通过保温管交替地放置在盖构件上; 升降机构，其使所述盖部件垂直移动，将所述基板保持件中的一个载置到所述热处理炉中，并且从所述热处理炉中卸载所述一个所述基板保持件; 保持台，当所述基板保持件中的一个在所述热处理炉中时，所述保持台被配置为放置在所述基板保持器中的另一个用于转移所述基板的位置; 以及保持器输送机构，其构造成在保持台和保温管之间输送各个基板保持件; 其中，所述保持台具有用于夹持所述基板保持件以防止其切换的保持器夹持机构。

7. 发明申请

US20080199818A1 Vertical heat processing apparatus and heat processing method using the vertical heat processing apparatus 有权
标题翻译：立式热处理装置和使用立式热处理装置的热处理方法
公开(公告)号：US20080199818A1
公开(公告)日：2008-08-21
申请号：US12010746
申请日：2008-01-29
申请人： Hiromi Nitadori , Katsuyuki Hishiya
发明人： Hiromi Nitadori , Katsuyuki Hishiya
IPC分类号： F27D3/12 , F27D5/00
CPC分类号： F27B17/0025 , H01L21/67303 , H01L21/67757 , Y10S414/14
摘要： The present invention is a vertical heat processing apparatus comprising: a heat processing furnace having a furnace opening; a lid member for closing the furnace opening of the heat processing furnace; a first substrate holder and a second substrate holder, each of which is capable of holding a plurality of substrates in a tier-like manner and of being alternately placed on the lid member through a heat retention tube; an elevating mechanism that vertically moves the lid member to load one of the substrate holders into the heat processing furnace, and to unload the one of the substrate holders from the heat processing furnace; a holder table configured to be placed thereon the other of the substrate holders for transfer of the substrates, when the one of the substrate holders is in the heat processing furnace; and a holder conveying mechanism configured to convey the respective substrate holders between the holder table and the heat retention tube; wherein the holder table is provided with a holder gripping mechanism for gripping the substrate holder to prevent turnover thereof.
摘要翻译：本发明是一种立式热处理装置，其特征在于：具有炉开口的热处理炉; 用于关闭热处理炉的炉开口的盖构件; 第一衬底保持器和第二衬底保持器，每个衬底保持器和第二衬底保持器能够以层状的方式保持多个衬底并且通过保温管交替地放置在盖构件上; 升降机构，其使所述盖部件垂直移动，将所述基板保持件中的一个载置到所述热处理炉中，并且从所述热处理炉中卸载所述一个所述基板保持件; 保持台，当所述基板保持件中的一个在所述热处理炉中时，所述保持台被配置为放置在所述基板保持器中的另一个用于转移所述基板的位置; 以及保持器输送机构，其构造成在保持台和保温管之间输送各个基板保持件; 其中，所述保持台具有用于夹持所述基板保持件以防止其切换的保持器夹持机构。

8. 外观设计

USD655259S1 Top plate for reactor for manufacturing semiconductor 有权
公开(公告)号：USD655259S1
公开(公告)日：2012-03-06
申请号：US29389563
申请日：2011-04-13
申请人： Manabu Honma , Katsuyuki Hishiya
设计人： Manabu Honma , Katsuyuki Hishiya

9. 外观设计

USD655260S1 Gas-separating plate for reactor for manufacturing semiconductor 有权
公开(公告)号：USD655260S1
公开(公告)日：2012-03-06
申请号：US29389564
申请日：2011-04-13
申请人： Manabu Honma , Katsuyuki Hishiya
设计人： Manabu Honma , Katsuyuki Hishiya

10. 外观设计

USD654882S1 Gas-separating plate for reactor for manufacturing semiconductor 有权
标题翻译：用于制造半导体的反应堆用气体分离板
公开(公告)号：USD654882S1
公开(公告)日：2012-02-28
申请号：US29389555
申请日：2011-04-13
申请人： Manabu Honma , Katsuyuki Hishiya
设计人： Manabu Honma , Katsuyuki Hishiya

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