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    • 3. 发明授权
    • Method for laser processing of wafer
    • 晶圆激光加工方法
    • US07396780B2
    • 2008-07-08
    • US11261600
    • 2005-10-31
    • Hitoshi HoshinoRyugo ObaKenji FurutaNoburu TakedaNobuyasu Kitahara
    • Hitoshi HoshinoRyugo ObaKenji FurutaNoburu TakedaNobuyasu Kitahara
    • H01L21/324
    • H01L21/67092B23K26/0853B23K26/702
    • A method of carrying out the laser processing of a wafer with a laser beam processing machine comprising a chuck table for holding a wafer, a laser beam application means for applying a laser beam to the wafer held on the chuck table and a processing-feed means for processing-feeding the chuck table and the laser beam application means relative to each other, comprising the steps of a wafer affixing step for putting the wafer on the surface of a protective tape mounted on an annular frame, a wafer holding step for holding the wafer put on the protective tape on the chuck table, and a laser beam application step for applying a laser beam having a predetermined wavelength from the laser beam application means to the wafer held on the chuck table and processing-feeding the wafer with the processing-feed means, wherein the protective tape is made of a material which transmits the laser beam having a predetermined wavelength applied from the laser beam application means.
    • 一种利用激光束处理机进行激光加工的方法,所述激光束处理机包括用于保持晶片的卡盘台,激光束施加装置,用于将激光束施加到保持在卡盘台上的晶片上,以及加工进给装置 用于将夹盘和激光束施加装置相对于彼此进行加工,包括以下步骤:将晶片放置在安装在环形框架上的保护带的表面上的晶片固定步骤,用于保持 晶片放在卡盘台上的保护带上,以及激光束施加步骤,用于将来自激光束施加装置的具有预定波长的激光束施加到保持在卡盘台上的晶片上, 馈送装置,其中保护带由透射从激光束施加装置施加的具有预定波长的激光束的材料制成。
    • 5. 发明授权
    • Wafer processing method
    • 晶圆加工方法
    • US07134942B2
    • 2006-11-14
    • US10936678
    • 2004-09-09
    • Yusuke NagaiMasashi AokiHitoshi Hoshino
    • Yusuke NagaiMasashi AokiHitoshi Hoshino
    • B24B1/00H01L21/463
    • B24B37/042B23K26/364B23K26/40B23K2101/40B23K2103/50H01L21/78
    • A wafer processing method for dividing a wafer having optical devices that are formed in a plurality of areas sectioned by dividing lines formed in a lattice pattern on the front surface, along the dividing lines, which comprises a laser beam application step of applying a laser beam to the wafer along the dividing lines from the side of the back surface thereof to form grooves having a predetermined depth in the back surface; a protective sheet affixing step of affixing a protective sheet to the front surface of the wafer having the grooves in the back surface; a dividing step of dividing the wafer having the protective sheet affixed to the front surface along the grooves; and a grinding step of grinding the back surface of the wafer divided along the grooves in a state of the protective sheet being affixed to the wafer, to remove the grooves.
    • 一种晶片处理方法,用于沿着分割线分割形成在由表面上形成为格子图案的分割线划分的多个区域中的光学器件的晶片,该分割线包括施加激光束的激光束施加步骤 沿着分割线从其背面的一侧到晶片,以形成在后表面中具有预定深度的凹槽; 保护片固定步骤,将保护片固定在具有后表面的凹槽的晶片的前表面; 分割步骤,沿着所述凹槽分割具有固定在所述前表面上的所述保护片的所述晶片; 以及磨削步骤,在保护片固定在晶片上的状态下研磨沿着槽划分的晶片的背面,以去除凹槽。
    • 6. 发明申请
    • Method for laser processing of wafer
    • 晶圆激光加工方法
    • US20060094260A1
    • 2006-05-04
    • US11261600
    • 2005-10-31
    • Hitoshi HoshinoRyugo ObaKenji FurutaNoburu TakedaNobuyasu Kitahara
    • Hitoshi HoshinoRyugo ObaKenji FurutaNoburu TakedaNobuyasu Kitahara
    • H01L21/324
    • H01L21/67092B23K26/0853B23K26/702
    • A method of carrying out the laser processing of a wafer with a laser beam processing machine comprising a chuck table for holding a wafer, a laser beam application means for applying a laser beam to the wafer held on the chuck table and a processing-feed means for processing-feeding the chuck table and the laser beam application means relative to each other, comprising the steps of a wafer affixing step for putting the wafer on the surface of a protective tape mounted on an annular frame, a wafer holding step for holding the wafer put on the protective tape on the chuck table, and a laser beam application step for applying a laser beam having a predetermined wavelength from the laser beam application means to the wafer held on the chuck table and processing-feeding the wafer with the processing-feed means, wherein the protective tape is made of a material which transmits the laser beam having a predetermined wavelength applied from the laser beam application means.
    • 一种利用激光束处理机进行激光加工的方法,所述激光束处理机包括用于保持晶片的卡盘台,激光束施加装置,用于将激光束施加到保持在卡盘台上的晶片上,以及加工进给装置 用于将夹盘和激光束施加装置相对于彼此进行加工,包括以下步骤:将晶片放置在安装在环形框架上的保护带的表面上的晶片固定步骤,用于保持 晶片放在卡盘台上的保护带上,以及激光束施加步骤,用于将来自激光束施加装置的具有预定波长的激光束施加到保持在卡盘台上的晶片上, 馈送装置,其中保护带由透射从激光束施加装置施加的具有预定波长的激光束的材料制成。
    • 7. 发明申请
    • SPLITTING METHOD FOR OPTICAL DEVICE WAFER
    • 光学器件波形分割方法
    • US20120289026A1
    • 2012-11-15
    • US13465186
    • 2012-05-07
    • Hiroumi UenoHitoshi Hoshino
    • Hiroumi UenoHitoshi Hoshino
    • H01L21/78
    • B23K26/38B23K26/0853B23K26/40B23K2103/50H01L33/0095
    • In a splitting method for an optical device wafer, the wafer having optical devices formed individually in regions partitioned by a plurality of crossing scheduled splitting lines provided on a front surface and having a reflective film formed on a reverse surface, a focal point of a laser beam is positioned to the inside of the optical device wafer and the laser beam is irradiated along the scheduled splitting lines from the reverse surface side of the wafer to form modification layers in the inside of the wafer. An external force is applied to the wafer to split the wafer along the scheduled splitting lines and form a plurality of optical device chips. The laser beam has a wavelength that produces transmittance through the reflective film equal to or higher than 80%.
    • 在用于光学器件晶片的分割方法中,具有光学器件的晶片分别形成在被设置在前表面上并具有形成在反面上的反射膜的多个交叉预定分割线分隔的区域中,激光焦点 光束位于光学器件晶片的内部,并且激光束沿着来自晶片的反面侧的预定分割线照射,以在晶片内部形成改性层。 将外力施加到晶片,以沿着调度的分割线分裂晶片并形成多个光学器件芯片。 激光束具有通过反射膜的透射率等于或高于80%的波长。
    • 8. 发明申请
    • METHOD OF PROCESSING OPTICAL DEVICE WAFER
    • 处理光学器件波形的方法
    • US20100041210A1
    • 2010-02-18
    • US12497877
    • 2009-07-06
    • Hitoshi HoshinoTakashi Yamaguchi
    • Hitoshi HoshinoTakashi Yamaguchi
    • H01L21/302
    • H01L21/67132B23K26/40B23K2103/50H01L21/67092H01L33/0095
    • A method of dividing an optical device wafer includes: a laser beam processing step of performing laser beam processing on the face side of an optical device wafer so as to form breakage starting points along streets; a protective plate bonding step of bonding the face side of the optical device wafer to a surface of a highly rigid protective plate with a bonding agent permitting peeling; a back side grinding step of grinding the back side of the optical device wafer so as to form the optical device wafer to a finished thickness of optical devices; a dicing tape adhering step of adhering the back-side surface of the optical device wafer to a dicing tape; a cut groove forming step of cutting the protective plate bonded to the optical device wafer along the streets so as to form cut grooves; and a wafer dividing step of exerting an external force on the optical device wafer through the protective plate, so as to break up the optical device wafer along the breakage starting points formed along the streets, thereby dividing the optical device wafer into the individual optical devices.
    • 光学元件晶片的分割方法包括:激光束处理步骤,在光学元件晶片的正面进行激光束处理,形成沿着街道的断裂起点; 保护板接合步骤,用粘合剂剥离光学器件晶片的表面与高度刚性的保护板的表面接合; 背面磨削步骤,研磨光学器件晶片的背面,以便将光学器件晶片形成为光学器件的成品厚度; 切割胶带粘合步骤,将光学装置晶片的背面粘接到切割胶带上; 切割槽形成步骤,沿着街道切割与光学器件晶片接合的保护板,以形成切割槽; 以及通过保护板在光学器件晶片上施加外力的晶片分割步骤,沿着沿着街道形成的断裂起点将光学器件晶片分裂,从而将光学器件晶片分成各个光学器件 。
    • 9. 发明申请
    • LASER PROCESSING MACHINE
    • 激光加工机
    • US20080290078A1
    • 2008-11-27
    • US12110916
    • 2008-04-28
    • Keiji NomaruHitoshi HoshinoKoji Yamaguchi
    • Keiji NomaruHitoshi HoshinoKoji Yamaguchi
    • B23K26/00
    • B23K26/0604B23K26/042B23K26/067B23K26/0676B23K26/0853B23K26/0884B23K26/38B23K26/40B23K2101/40B23K2103/50
    • A laser processing machine having a laser beam irradiation unit is provided. The laser beam irradiation unit includes: a laser beam oscillation section; a beam splitter adapted to split the laser beam emitted from the laser beam oscillation section into a first laser beam and a second laser beam; a condenser lens adapted to condense the first and second laser beams; a prism adapted to lead the first and second laser beams split by the beam splitter to the condenser lens; a first angle-changing mirror disposed on a first optical path adapted to lead the first laser beam split by the beam splitter; a second angle-changing mirror disposed on a second optical path adapted to lead the second laser beam split by the beam splitter to the prism; and a half-wave plate disposed in the first or second optical path to allow one of respective directions of the first and second polarization planes to be aligned with the other.
    • 提供具有激光束照射单元的激光加工机。 激光束照射单元包括:激光束振荡部; 分束器,适于将从激光束振荡部分发射的激光束分成第一激光束和第二激光束; 聚光透镜,适于冷凝第一和第二激光束; 棱镜,适于将由分束器分裂的第一和第二激光束引导到聚光透镜; 第一角度改变镜,设置在适于引导由分束器分裂的第一激光束的第一光路上; 第二角度改变镜,设置在第二光路上,适于将由分束器分裂的第二激光束引导到棱镜; 以及设置在第一或第二光路中的半波片,以允许第一和第二偏振面的各个方向之一与另一个对准。