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    • 2. 发明专利
    • Method for manufacturing semiconductor device
    • 制造半导体器件的方法
    • JP2008177279A
    • 2008-07-31
    • JP2007008107
    • 2007-01-17
    • Hitachi Ltd株式会社日立製作所
    • ODA TETSUOKOBAYASHI MASAYOSHIMATSUURA KATSUYATAKAYANAGI YUJIKAWASE DAISUKE
    • H01L29/78H01L21/336
    • PROBLEM TO BE SOLVED: To provide a method for stably manufacturing semiconductor device such as a trench gate type MOS transistor that is not easily affected by a defect resulting from variation in manufacturing processes and assures small variation in the threshold voltages among semiconductor devices.
      SOLUTION: In the method for manufacturing semiconductor device including a first conductive semiconductor layer, a second conductive channel region on the front surface of the same semiconductor layer, a first conductive source region on the front surface of the channel region, a trench region extended to the semiconductor layer from the source region through the channel region, a gate insulating film of the trench region, and a gate electrode, the channel region is formed by conducting the predetermined heat treatment after ion injection of an impurity, an acceleration voltage in the ion injection is in the range of 200 to 300 keV, and the predetermined heat treatment is continued for 30 to 600 minutes under the temperature range of 1,000 to 1,200°C in the non-oxidizing atmosphere.
      COPYRIGHT: (C)2008,JPO&INPIT
    • 要解决的问题:提供一种用于稳定地制造诸如沟槽栅型MOS晶体管的半导体器件的方法,其不容易受到由制造工艺的变化引起的缺陷的影响,并且确保半导体器件中的阈值电压的小的变化 。 解决方案:在包括第一导电半导体层的半导体器件的制造方法中,在同一半导体层的前表面上的第二导电沟道区,沟道区的前表面上的第一导电源区,沟槽 通过沟道区域从源极区域延伸到半导体层,沟槽区域的栅极绝缘膜和栅电极,通过在离子注入杂质之后进行预定热处理形成沟道区域,加速电压 离子注入的范围为200〜300keV,在非氧化性气氛中,在1000〜1200℃的温度范围内,进行规定的热处理持续30〜600分钟。 版权所有(C)2008,JPO&INPIT
    • 9. 发明专利
    • Semiconductor device
    • 半导体器件
    • JP2003068979A
    • 2003-03-07
    • JP2001258143
    • 2001-08-28
    • Hitachi Ltd株式会社日立製作所
    • KUSHIMA TADAOTSUYUNO ENJIYOUSUZUKI KAZUHIROKODAMA HIRONORIKAMOSHITA RIKUOBANDO AKIRAHIRAI TSUTOMUSAITO KATSUAKIKAWASE DAISUKE
    • H01L23/28H01L25/07H01L25/18
    • H01L2224/32225H01L2224/45124H01L2224/48091H01L2224/48227H01L2224/48472H01L2224/73265H01L2924/10253H01L2924/00014H01L2924/00
    • PROBLEM TO BE SOLVED: To provide a power semiconductor device which is kept high in dielectric strength, simple in structure, and inexpensive. SOLUTION: A case is composed of a case side wall 5 and a case bottom plate 4, an insulating board 1a provided with a front and a rear where a conductor 1b is formed respectively is bonded to the case bottom plate 4 with solder, and a Si chip 2 and an external extracting terminal 7 are bonded on one surface of the insulating board 1a by solder for the formation of a semiconductor device. The top surface of the case is sealed up with a sealing plate 8a which is provided with a gel agent inlet 8d and a protruding structure 8b which extracts out a external leading terminal 7. The protruding structure 8b is constituted extending downward to the sealing plate 8a. Gel agent 10 is made to fill up the case so as to reach the lower end of the projection of the structure 8B, and a cavity is formed extending from the top surface of the gel agent to the undersurface of the sealing plate 8a. A hole bored in the structure 8b is filled up with a hard resin so as to fix the external terminal, and the gel agent inlet 8d is filled up with a silicone rubber cap 13.
    • 要解决的问题:提供一种电介质强度高,结构简单,成本低廉的功率半导体器件。 解决方案:壳体由壳体侧壁5和壳体底板4构成,设置有导体1b的前后的绝缘板1a分别用焊料接合到壳体底板4,并且 Si芯片2和外部提取端子7通过用于形成半导体器件的焊料接合在绝缘板1a的一个表面上。 壳体的上表面用密封板8a密封,密封板8a设置有凝胶剂入口8d和从外部引出端子7抽出的突出结构8b。突出结构8b向下延伸到密封板8a 。 凝胶剂10被填充到壳体的下端,从而形成从凝胶剂的顶表面延伸到密封板8a的下表面的空腔。 在结构体8b中钻孔的孔用硬树脂填充以固定外部端子,并且凝胶剂入口8d填充有硅橡胶盖13。