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    • 1. 发明授权
    • Exposure apparatus and method
    • 曝光装置和方法
    • US5657130A
    • 1997-08-12
    • US408714
    • 1995-03-22
    • Hiroshi ShirasuKazuaki SaikiSeiji MiyazakiSusumu Mori
    • Hiroshi ShirasuKazuaki SaikiSeiji MiyazakiSusumu Mori
    • G03F7/20G03F7/207G03F9/00H01L21/027G01B11/00
    • G03F7/70216G03F7/70275G03F7/70358G03F7/70791G03F9/70
    • In an exposure apparatus and method, a mask and a substrate are scanned in synchronism with each other so that the pattern of the mask may be transferred onto the substrate through a projection optical system. First beams of light are irradiated to least two locations on the mask spaced apart in a direction intersecting the scanning direction of the mask. The reflected light thereof is received, and the positions of the points on the mask to which the beam of light has been irradiated are detected in the direction of the optical axis of the projection optical system. In addition, second beams of light are irradiated to at least two locations on the substrate spaced apart in the scanning direction, and the reflected light thereof is received. The positions of the points on the substrate to which the second beam of light has been irradiated are also detected in the direction of the optical axis of the projection optical system are detected. The posture of at least one of the mask and the substrate is adjusted on the basis of the positions detected with the first and second beams.
    • 在曝光装置和方法中,掩模和基板彼此同步地扫描,使得掩模的图案可以通过投影光学系统被转印到基板上。 第一光束照射在与掩模的扫描方向相交的方向间隔开的掩模上的至少两个位置。 在投影光学系统的光轴的方向上检测其反射光,并且在光束照射的掩模上的点的位置被检测。 此外,第二光束照射到沿扫描方向间隔开的基板上的至少两个位置,并且其反射光被接收。 检测到在投影光学系统的光轴的方向上检测到已经照射第二光束的基板上的点的位置。 基于由第一和第二光束检测到的位置来调整掩模和基板中的至少一个的姿势。
    • 3. 发明授权
    • Scanning exposure apparatus
    • 扫描曝光装置
    • US5715037A
    • 1998-02-03
    • US615853
    • 1996-03-12
    • Kazuaki SaikiSusumu MoriHiroshi Shirasu
    • Kazuaki SaikiSusumu MoriHiroshi Shirasu
    • G03F7/20G03F9/00H01L21/027
    • G03F7/70241G03F7/70275G03F7/70358G03F9/00G03F9/70
    • The present invention provides a scanning exposure apparatus for projecting an image of a pattern area of a mask having a first alignment mark onto a photosensitive substrate disposed on a substrate stage. A second alignment mark is provided on at least one of the photosensitive substrate and the substrate stage. The scanning exposure apparatus includes a plurality of projection optical systems disposed along a predetermined direction and adapted to receive the luminous fluxes passed through the mask and to project elected images of unchanged dimension of the plurality of illuminated regions of the mask onto the substrate. There is provided a mark detection system for detecting the first alignment mark on the mask and the second alignment mark, and at least one of the projection optical systems constitutes a part of the mark detection system.
    • 本发明提供了一种用于将具有第一对准标记的掩模的图案区域的图像投影到设置在基板台上的感光基板上的扫描曝光装置。 在感光基板和基板台的至少一个上设置第二对准标记。 扫描曝光装置包括沿着预定方向设置的多个投影光学系统,其适于接收通过掩模的光通量,并将掩模的多个照明区域的未改变尺寸的选定图像投影到基板上。 提供了一种用于检测掩模上的第一对准标记和第二对准标记的标记检测系统,并且至少一个投影光学系统构成标记检测系统的一部分。
    • 4. 发明授权
    • Scanning type exposure apparatus and exposure method
    • 扫描式曝光装置和曝光方法
    • US5625436A
    • 1997-04-29
    • US689691
    • 1996-08-13
    • Masamitsu YanagiharaSusumu MoriTsuyoshi NarakiMasami SekiSeiji MiyazakiTsuyoshi NarabeHiroshi Chiba
    • Masamitsu YanagiharaSusumu MoriTsuyoshi NarakiMasami SekiSeiji MiyazakiTsuyoshi NarabeHiroshi Chiba
    • G03F7/20G03F9/00H01L21/027
    • G03F7/70275G03F7/70241G03F7/70258G03F7/70358G03F7/70858G03F7/70883G03F9/70
    • In a scanning type exposure apparatus for exposing an entire surface of a pattern region on a mask to a substrate by scanning the mask and the substrate with respect to a projection optical system in a predetermined direction with a speed ratio in accordance with a magnification of the projection optical system, there are provided a plurality of illumination optical systems for illuminating respective areas of the pattern region on the mask with respective light fluxes from respective light source; a plurality of projection optical systems arranged so as to correspond to the respective illumination optical systems, the projection optical systems projecting respective images of the areas illuminated by the respective illumination optical systems onto respective projection areas on the substrate; a memory device for obtaining and storing a change of shape of the substrate; a magnification changing device for changing a magnification of at least one of the projection optical systems in accordance with the change of shape of the substrate; and an imaging position changing device for changing the position of said image projected via the at least one projection optical systems in accordance with the change in magnification.
    • 在扫描型曝光装置中,通过以与所述掩模和所述基板相对于所述投影光学系统的倍率相对于投影光学系统沿预定方向扫描所述掩模上的图案区域的整个表面, 提供了多个照明光学系统,用于利用来自各个光源的各个光束照射掩模上的图案区域的各个区域; 多个投影光学系统被布置为对应于各个照明光学系统,所述投影光学系统将由各个照明光学系统照射的区域的各个图像投射到所述基板上的相应的投影区域上; 用于获取和存储基板的形状变化的存储装置; 放大率改变装置,用于根据基板的形状变化来改变至少一个投影光学系统的放大率; 以及成像位置改变装置,用于根据放大率的变化改变经由至少一个投影光学系统投影的所述图像的位置。
    • 5. 再颁专利
    • Scanning type exposure apparatus and exposure method
    • USRE37361E1
    • 2001-09-11
    • US09300376
    • 1999-04-27
    • Masamitsu YanagiharaSusumu MoriTsuyoshi NarakiMasami SekiSeiji MiyazakiTsuyohsi NarabeHiroshi Chiba
    • Masamitsu YanagiharaSusumu MoriTsuyoshi NarakiMasami SekiSeiji MiyazakiTsuyohsi NarabeHiroshi Chiba
    • H01L21027
    • G03F7/70275G03F7/70241G03F7/70258G03F7/70358G03F7/70858G03F7/70883G03F9/70
    • In a scanning type exposure apparatus for exposing an entire surface of a pattern region on a mask to a substrate by scanning the mask and the substrate with respect to a projection optical system in a predetermined direction with a speed ratio in accordance with a magnification of the projection optical system, there are provided a plurality of illumination optical systems for illuminating respective areas of the pattern region on the mask with respective light fluxes from respective light source; a plurality of projection optical systems arranged so as to correspond to the respective illumination optical systems, the projection optical systems projecting respective images of the areas illuminated by the respective illumination optical systems onto respective projection areas on the substrate; a memory device for obtaining and storing a change of shape of the substrate; a magnification changing device for changing a magnification of at least one of the projection optical systems in accordance with the change of shape of the substrate; and an imaging position changing device for changing the position of said image projected via the at least one projection optical systems in accordance with the change in magnification. An exposure apparatus for exposing a pattern of a mask onto a substrate includes an image transfer system, an imaging characteristic adjusting mechanism and an exposure system. The image transfer system projects the pattern of the mask onto the substrate while moving the mask and the substrate synchronously during the projection of the pattern onto the substrate such that portions of the pattern overlap each other. The imaging characteristic adjusting mechanism is disposed in a space between the mask and the substrate, and adjusts imaging characteristics of a portion of the image transfer system that projects the pattern onto the substrate. The exposure system exposes the pattern during the synchronous movement of the mask and the substrate by the image transfer system.
    • 6. 发明授权
    • Automated fiber tracking of human brain white matter using diffusion tensor imaging
    • 使用扩散张量成像自动光纤跟踪人脑白质
    • US08593142B2
    • 2013-11-26
    • US12743169
    • 2009-01-05
    • Susumu MoriJiangyang ZhangKegang Hua
    • Susumu MoriJiangyang ZhangKegang Hua
    • G01V3/00
    • G01R33/56341A61B5/055G06T7/11G06T7/344G06T2207/10092G06T2207/30016
    • A magnetic resonance imaging (MRI) system, comprising: a MRI scanner; a signal processing system in communication with the magnetic resonance imaging scanner to receive magnetic resonance (MR) signals for forming magnetic resonance images of a subject under observations; a data storage unit in communication with the signal processing system, wherein the data storage unit contains database data corresponding to a soft tissue region of the subject under observation. The database data includes information identifying at least one soft tissue substructure encompassed by the soft tissue region of the subject under observation. The signal processing system is adapted to process MR signals received from the MRI scanner to automatically identify at least one soft tissue substructure encompassed by the soft tissue region of the subject under observation.
    • 一种磁共振成像(MRI)系统,包括:MRI扫描仪; 信号处理系统,其与所述磁共振成像扫描仪通信以接收用于形成观察对象的磁共振图像的磁共振(MR)信号; 与所述信号处理系统通信的数据存储单元,其中所述数据存储单元包含对应于所观察对象的软组织区域的数据库数据。 数据库数据包括识别被观察对象的软组织区域包围的至少一个软组织亚结构的信息。 所述信号处理系统适于处理从所述MRI扫描器接收的MR信号,以自动识别所观察的受试者的软组织区域所包围的至少一个软组织亚结构。
    • 7. 发明授权
    • MRI methods using diffusion tensor imaging techniques and MRI systems embodying same
    • 使用扩散张量成像技术和体现其的MRI系统的MRI方法
    • US08577112B2
    • 2013-11-05
    • US12489682
    • 2009-06-23
    • Susumu MoriHangyi JiangMing-Chung ChouYue Li
    • Susumu MoriHangyi JiangMing-Chung ChouYue Li
    • G06K9/00
    • G01R33/56341A61B5/055
    • Featured is a method for automatically evaluating acquired MRI data, determining the quality of the acquired images and removing the image data when it is determined that an image is corrupted so the imaged data for the corrupted image is removed from the subsequent tensor fitting. In further embodiments, such determining includes judging the quality of the image data to determine if the image data satisfies a quality threshold criteria and if determined not to be satisfied adjudging the image to be corrupted. Such methods include performing said evaluating, determining and removing in real time and in the case where an image is determined to be corrupted, such methods further includes re-acquiring additional image data corresponding to each of the one or more images removed as being corrupted. Also featured are MRI systems embodying such methods.
    • 特色是一种自动评估获取的MRI数据,确定所获取的图像的质量并确定图像已损坏时删除图像数据的方法,以便从后续的张量拟合中删除损坏的图像的成像数据。 在另外的实施例中,这种确定包括判断图像数据的质量,以确定图像数据是否满足质量阈值标准,并且如果确定不满足判断被破坏的图像。 这样的方法包括实时地执行所述评估,确定和移除,并且在确定图像被破坏的情况下,这种方法还包括重新获取对应于被删除的一个或多个图像中的每一个被损坏的附加图像数据。 还有体现这种方法的MRI系统。
    • 9. 发明授权
    • Method of fiber reconstruction employing data acquired by magnetic resonance imaging
    • 采用磁共振成像获取的数据进行纤维重建的方法
    • US06526305B1
    • 2003-02-25
    • US09444346
    • 1999-11-19
    • Susumu Mori
    • Susumu Mori
    • A61B5055
    • G01R33/56341Y10S128/92
    • A method of creating an image of brain fibers includes exposing the brain fibers to a magnetic resonance imaging process. The data acquisition from the magnetic resonance imaging includes the acquisition of diffusion-weighted, images that are later employed to calculate an apparent diffusion constant at each pixel along more than six axes. The data is introduced into a microprocessor which calculates six variable in a diffusion tensor and obtains a plurality of eigen values and eigen vectors. This may be accomplished by employing a diffusion sensor which is diagonalized to obtain three eigen values and three eigen vectors with the six values being subjected to further microprocessing to generate imaging information representing the properties of the fibers. The process in a preferred embodiment includes the initiation of fiber tracking by selecting a pixel for initiation of the same, connecting of pixels and effecting a judgement regarding termination of the pixel tracking in each direction based upon the randomness of the fiber orientation of the adjacent pixels.
    • 创建脑纤维图像的方法包括将脑纤维暴露于磁共振成像过程。 来自磁共振成像的数据采集包括获取扩散加权的图像,其随后用于计算沿着六个以上轴的每个像素处的表观扩散常数。 数据被引入微处理器中,该微处理器在扩散张量中计算六个变量并获得多个本征值和特征向量。 这可以通过使用扩散传感器来实现,扩散传感器被对角化以获得三个本征值和三个特征向量,其中六个值经受进一步的微处理以产生表示纤维的性质的成像信息。 优选实施例中的过程包括通过选择用于启动相同像素的像素并且基于相邻像素的光纤取向的随机性来实现关于每个方向上的像素跟踪的终止的判断来启动光纤跟踪 。
    • 10. 发明授权
    • Image sensor and imaging device
    • 图像传感器和成像装置
    • US09532033B2
    • 2016-12-27
    • US13305272
    • 2011-11-28
    • Kiyoshige ShibazakiMuneki HamashimaSusumu MoriSatoshi Suzuki
    • Kiyoshige ShibazakiMuneki HamashimaSusumu MoriSatoshi Suzuki
    • H04N13/02H01L27/146
    • H04N13/286H01L27/14621H01L27/14623H01L27/14629H04N13/225H04N13/257
    • An image capturing element comprising photoelectric converting elements that are arranged two-dimensionally and photoelectrically convert incident light into an electric signal; aperture masks that correspond one-to-one with the photoelectric converting elements; and color filters that correspond one-to-one with the photoelectric converting elements. Among n adjacent photoelectric converting elements, where n is an integer no less than three, apertures of the aperture masks corresponding to at least three of the photoelectric converting elements are included within each pattern of a color filter pattern formed from at least two types of the color filters that respectively pass different wavelength bands, and are positioned to respectively pass light from different partial regions within a cross-sectional region of the incident light, and photoelectric converting element groups that are each formed of the n photoelectric converting elements are arranged in series.
    • 一种图像拍摄元件,包括被二维布置并将入射光光电转换成电信号的光电转换元件; 与光电转换元件一一对应的孔径掩模; 以及与光电转换元件一一对应的滤色器。 在n个相邻的光电转换元件中,n是不小于3的整数,对应于至少三个光电转换元件的孔径掩模的孔径包括在由至少两种类型的光电转换元件形成的滤色器图案的每个图案内 分别通过不同波长带的滤色器,并且被定位成分别在入射光的横截面区域内传递来自不同部分区域的光,并且各自由n个光电转换元件形成的光电转换元件组被串联布置 。