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1. 发明授权

US07064339B2 Charged-particle-beam mapping projection-optical systems and methods for adjusting same 有权
标题翻译：带电粒子束映射投影光学系统及其调整方法
公开(公告)号：US07064339B2
公开(公告)日：2006-06-20
申请号：US10816467
申请日：2004-03-31
申请人： Hiroshi Nishimura , Naoto Kihara , Kinya Kato , Toru Takagi , Akihiro Goto , Junji Ikeda , Kazuya Okamoto
发明人： Hiroshi Nishimura , Naoto Kihara , Kinya Kato , Toru Takagi , Akihiro Goto , Junji Ikeda , Kazuya Okamoto
IPC分类号： G01N21/00 , G21K7/00
CPC分类号： H01J37/26 , G01N23/225 , H01J37/1471 , H01J37/226 , H01J37/265 , H01J2237/0492 , H01J2237/057 , H01J2237/1501 , H01J2237/2482 , H01J2237/2538 , H01J2237/262 , H01J2237/2806 , H01J2237/2817 , H01J2237/282 , H01J2237/2823 , H01J2237/2826 , H01J2237/30438
摘要： Charged-particle-beam (CPB) mapping projection-optical systems and adjustment methods for such systems are disclosed that can be performed quickly and accurately. In a typical system, an irradiation beam is emitted from a source, passes through an irradiation-optical system, and enters a Wien filter (“E×B”). Upon passing through the E×B, the irradiation beam passes through an objective-optical system and is incident on an object surface. Such impingement generates an observation beam that returns through the objective-optical system and the E×B in a different direction to a detector via an imaging-optical system. An adjustment-beam source emits an adjustment beam used for adjusting and aligning the position of, e.g., the object surface and/or the Wien's condition of the E×B. The adjustment beam can be off-axis relative to the objective-optical system. For such adjusting and aligning, fiducial marks (situated, e.g., in the plane of the object surface) can be used that are optimized for the CPB-optical system and the off-axis optical system. Desirably, the image formed on the detector when electrical voltage and current are not applied to the E×B is in the same position as the image formed on the detector when electrical voltage and current are applied to the E×B. Also provided are “evaluation charts” for use in such alignments that do not require adjustment of the optical axis of the irradiation-optical system, and from which the kinetic-energy distribution of the emitted adjustment beam is stable.
摘要翻译：公开了可以快速且准确地执行这种系统的带电粒子束（CPB）映射投影光学系统和调整方法。在典型的系统中，照射光束从光源发出，通过照射光学系统，并进入维恩滤光片（“ExB”）。当通过ExB时，照射光束通过物镜光学系统并且入射到物体表面上。这种冲击产生观察光束，该观察光束经由成像光学系统通过物镜 - 光学系统和ExB以不同的方向返回到检测器。调整光束源发射用于调整和对准例如物体表面的位置和/或ExB的维恩状态的调节光束。调节光束可以相对于物镜光学系统偏轴。对于这种调整和对准，可以使用为CPB光学系统和离轴光学系统优化的基准标记（例如位于物体表面的平面中）。理想地，当电压和电流未施加到ExB时，在检测器上形成的图像与当将电压和电流施加到ExB时形成在检测器上的图像位于相同的位置。还提供了用于这种对准的“评估图”，其不需要调整照射光学系统的光轴，并且发射的调节光束的动能分布从该对准是稳定的。

2. 发明授权

US06765217B1 Charged-particle-beam mapping projection-optical systems and methods for adjusting same 有权
标题翻译：带电粒子束映射投影光学系统及其调整方法
公开(公告)号：US06765217B1
公开(公告)日：2004-07-20
申请号：US09302075
申请日：1999-04-28
申请人： Hiroshi Nishimura , Naoto Kihara , Kinya Kato , Toru Takagi , Akihiro Goto , Junji Ikeda , Kazuya Okamoto
发明人： Hiroshi Nishimura , Naoto Kihara , Kinya Kato , Toru Takagi , Akihiro Goto , Junji Ikeda , Kazuya Okamoto
IPC分类号： G01N2100
CPC分类号： H01J37/26 , G01N23/225 , H01J37/1471 , H01J37/226 , H01J37/265 , H01J2237/0492 , H01J2237/057 , H01J2237/1501 , H01J2237/2482 , H01J2237/2538 , H01J2237/262 , H01J2237/2806 , H01J2237/2817 , H01J2237/282 , H01J2237/2823 , H01J2237/2826 , H01J2237/30438
摘要： Charged-particle-beam (CPB) mapping projection-optical systems and adjustment methods for such systems are disclosed that can be performed quickly and accurately. In a typical system, an irradiation beam is emitted from a source, passes through an irradiation optical system, and enters a Wien filter (“E×B”). Upon passing through the E×B, the irradiation beam passes through an objective optical system and is incident on an object surface. Such impingement generates an observation beam that returns through the objective optical system and the E×B in a different direction to a detector via an imaging optical system. An adjustment-beam source emits an adjustment beam used for adjusting and aligning the position of, e.g., the object surface and/or the Wien's condition of the E×B. The adjustment beam can be off-axis relative to the objective-optical system. For such adjusting and aligning, fiducial marks (situated, e.g., in the plane of the object surface) can be used that are optimized for the CPB optical system and the off-axis optical system. Desirably, the image formed on the detector when electrical voltage and current are not applied to the E×B is in the same position as the image formed on the detector when electrical voltage and current are applied to the E×B. Also provided are “evaluation charts” for use in such alignments that do not require adjustment of the optical axis of the irradiation optical system, and from which the kinetic-energy distribution of the emitted adjustment beam is stable.
摘要翻译：公开了可以快速且准确地执行这种系统的带电粒子束（CPB）映射投影光学系统和调整方法。在典型的系统中，照射光束从光源发射，通过照射光学系统，并进入维恩滤光片（“ExB”）。当通过ExB时，照射光束通过物镜光学系统并入射到物体表面上。这种冲击产生观察光束，该观察光束经由成像光学系统通过物镜光学系统和ExB以不同的方向返回到检测器。调整光束源发射用于调整和对准例如物体表面的位置和/或ExB的维恩状态的调节光束。调节光束可以相对于物镜光学系统偏轴。对于这种调整和对准，可以使用为CPB光学系统和离轴光学系统优化的基准标记（例如位于物体表面的平面中）。理想地，当电压和电流未施加到ExB时，在检测器上形成的图像与当将电压和电流施加到ExB时形成在检测器上的图像位于相同的位置。还提供了用于这种对准的“评估图”，其不需要调整照射光学系统的光轴，并且发射的调节光束的动能分布从该距离稳定。

3. 发明授权

US07183562B2 Charged-particle-beam mapping projection-optical systems and methods for adjusting same 有权
标题翻译：带电粒子束映射投影光学系统及其调整方法
公开(公告)号：US07183562B2
公开(公告)日：2007-02-27
申请号：US11411349
申请日：2006-04-25
申请人： Hiroshi Nishimura , Naoto Kihara , Kinya Kato , Toru Takagi , Akihiro Goto , Junji Ikeda , Kazuya Okamoto
发明人： Hiroshi Nishimura , Naoto Kihara , Kinya Kato , Toru Takagi , Akihiro Goto , Junji Ikeda , Kazuya Okamoto
IPC分类号： G01N21/00 , G21K7/00
CPC分类号： H01J37/26 , G01N23/225 , H01J37/1471 , H01J37/226 , H01J37/265 , H01J2237/0492 , H01J2237/057 , H01J2237/1501 , H01J2237/2482 , H01J2237/2538 , H01J2237/262 , H01J2237/2806 , H01J2237/2817 , H01J2237/282 , H01J2237/2823 , H01J2237/2826 , H01J2237/30438
摘要： Charged-particle-beam (CPB) mapping projection-optical systems and adjustment methods for such systems are disclosed that can be performed quickly and accurately. In a typical system, an irradiation beam is emitted from a source, passes through an irradiation-optical system, and enters a Wien filter (“E×B”). Upon passing through the E×B, the irradiation beam passes through an objective-optical system and is incident on an object surface. Such impingement generates an observation beam that returns through the objective-optical system and the E×B in a different direction to a detector via an imaging-optical system. An adjustment-beam source emits an adjustment beam used for adjusting and aligning the position of, e.g., the object surface and/or the Wien's condition of the E×B. The adjustment beam can be off-axis relative to the objective-optical system. For such adjusting and aligning, fiducial marks (situated, e.g., in the plane of the object surface) can be used that are optimized for the CPB-optical system and the off-axis optical system. Desirably, the image formed on the detector when electrical voltage and current are not applied to the E×B is in the same position as the image formed on the detector when electrical voltage and current are applied to the E×B. Also provided are “evaluation charts” for use in such alignments that do not require adjustment of the optical axis of the irradiation-optical system, and from which the kinetic-energy distribution of the emitted adjustment beam is stable.
摘要翻译：公开了可以快速且准确地执行这种系统的带电粒子束（CPB）映射投影光学系统和调整方法。在典型的系统中，照射光束从光源发出，通过照射光学系统，并进入维恩滤光片（“ExB”）。当通过ExB时，照射光束通过物镜光学系统并且入射到物体表面上。这种冲击产生观察光束，该观察光束经由成像光学系统通过物镜 - 光学系统和ExB以不同的方向返回到检测器。调整光束源发射用于调整和对准例如物体表面的位置和/或ExB的维恩状态的调节光束。调节光束可以相对于物镜光学系统偏轴。对于这种调整和对准，可以使用为CPB光学系统和离轴光学系统优化的基准标记（例如位于物体表面的平面中）。理想地，当电压和电流未施加到ExB时，在检测器上形成的图像与当将电压和电流施加到ExB时形成在检测器上的图像位于相同的位置。还提供了用于这种对准的“评估图”，其不需要调整照射光学系统的光轴，并且发射的调节光束的动能分布从该对准是稳定的。

4. 发明申请

US20060192120A1 Charged-particle-beam mapping projection-optical systems and methods for adjusting same 有权
公开(公告)号：US20060192120A1
公开(公告)日：2006-08-31
申请号：US11411349
申请日：2006-04-25
申请人： Hiroshi Nishimura , Naoto Kihara , Kinya Kato , Toru Takagi , Akihiro Goto , Junji Ikeda , Kazuya Okamoto
发明人： Hiroshi Nishimura , Naoto Kihara , Kinya Kato , Toru Takagi , Akihiro Goto , Junji Ikeda , Kazuya Okamoto
IPC分类号： G21K7/00 , G01N23/00
CPC分类号： H01J37/26 , G01N23/225 , H01J37/1471 , H01J37/226 , H01J37/265 , H01J2237/0492 , H01J2237/057 , H01J2237/1501 , H01J2237/2482 , H01J2237/2538 , H01J2237/262 , H01J2237/2806 , H01J2237/2817 , H01J2237/282 , H01J2237/2823 , H01J2237/2826 , H01J2237/30438
摘要： Charged-particle-beam (CPB) mapping projection-optical systems and adjustment methods for such systems are disclosed that can be performed quickly and accurately. In a typical system, an irradiation beam is emitted from a source, passes through an irradiation-optical system, and enters a Wien filter (“E×B”). Upon passing through the E×B, the irradiation beam passes through an objective-optical system and is incident on an object surface. Such impingement generates an observation beam that returns through the objective-optical system and the E×B in a different direction to a detector via an imaging-optical system. An adjustment-beam source emits an adjustment beam used for adjusting and aligning the position of, e.g., the object surface and/or the Wien's condition of the E×B. The adjustment beam can be off-axis relative to the objective-optical system. For such adjusting and aligning, fiducial marks (situated, e.g., in the plane of the object surface) can be used that are optimized for the CPB-optical system and the off-axis optical system. Desirably, the image formed on the detector when electrical voltage and current are not applied to the E×B is in the same position as the image formed on the detector when electrical voltage and current are applied to the E×B. Also provided are “evaluation charts” for use in such alignments that do not require adjustment of the optical axis of the irradiation-optical system, and from which the kinetic-energy distribution of the emitted adjustment beam is stable.

5. 发明授权

US06661008B2 Electron-optical system and inspection method using the same 有权
标题翻译：电子光学系统及使用其的检验方法
公开(公告)号：US06661008B2
公开(公告)日：2003-12-09
申请号：US09337131
申请日：1999-06-21
申请人： Toru Takagi , Akihiro Goto
发明人： Toru Takagi , Akihiro Goto
IPC分类号： H01J490044
CPC分类号： G01N23/2251 , H01J37/28 , H01J2237/2448 , H01J2237/2817
摘要： An electron-optical system, including irradiation means which irradiates a surface of a sample with an irradiating electron beam and observation means which focuses an observational electron beam emitted from the surface of the sample as an image on electron beam detection means. The observation means includes a plurality of electrodes. The electron-optical system further includes an accelerating electric field disposed between the surface of the sample and at least one of the plurality of electrodes so that the sample is biased to a negative potential, and so that the velocity of the observational electron beam that has just been emitted from the surface of the sample increases monotonically to a positive potential. The velocity of the observational electron beam that has been accelerated to the positive potential is reduced to the ground potential by another of the plurality of electrodes which form the observation means.
摘要翻译：一种电子光学系统，包括用照射电子束照射样品表面的照射装置和将从样品表面发射的观测电子束聚焦成电子束检测装置的观察装置。观察装置包括多个电极。电子 - 光学系统还包括加速电场，其设置在样品的表面和多个电极中的至少一个之间，使得样品被偏压到负电位，并且使得观察电子束的速度具有刚刚从样品表面发射的单体增加到正电位。通过形成观察装置的多个电极中的另一个将已经加速到正电位的观测电子束的速度减小到接地电位。

6. 发明授权

US06365897B1 Electron beam type inspection device and method of making same 有权
标题翻译：电子束型检查装置及其制造方法
公开(公告)号：US06365897B1
公开(公告)日：2002-04-02
申请号：US09216598
申请日：1998-12-18
申请人： Muneki Hamashima , Akihiro Goto , Hiroshi Nishimura
发明人： Muneki Hamashima , Akihiro Goto , Hiroshi Nishimura
IPC分类号： H01J3726
CPC分类号： H01J37/28 , H01J37/265 , H01J2237/2813 , H01J2237/2817
摘要： Electron beam type inspection device for generating images of specimens (e.g., silicon wafers, etc.) includes an electron gun which emits an electron beam, an electron beam optical system which causes the electron beam to form an irradiation region on a surface of a specimen, a detector which detects at least one of second order electrons and reflected electrons reflected by the irradiation region, a projection optical system projecting the second order electrons and the reflected electrons onto a detection surface within the detector. The second order electrons and the reflected electrons correspond to an observation region within the irradiation region. The inspection device also includes a magnification controller which controls the size of the observation region and the magnification of the projection optical system, and an irradiation controller which controls the current density of the irradiation region based on the size of the observation region. Also provided is a method of making a corresponding inspection device which includes steps of providing and assembling the aforementioned component parts.
摘要翻译：用于产生试样（例如，硅片等）的图像的电子束型检查装置包括发射电子束的电子枪，使电子束在试样表面形成照射区域的电子束光学系统检测器，其检测由所述照射区反射的二次电子和反射电子中的至少一个;投影光学系统，将所述二次电子和所述反射的电子投射到所述检测器内的检测面上。二次电子和反射电子对应于照射区域内的观察区域。检查装置还包括控制观察区域的尺寸和投影光学系统的放大率的放大率控制器，以及基于观察区域的尺寸来控制照射区域的电流密度的照射控制器。还提供了制造相应的检查装置的方法，其包括提供和组装上述部件的步骤。

7. 发明授权

US09284647B2 Method for coating sliding surface of high-temperature member, high-temperature member and electrode for electro-discharge surface treatment 有权
公开(公告)号：US09284647B2
公开(公告)日：2016-03-15
申请号：US12558950
申请日：2009-09-14
申请人： Hiroyuki Ochiai , Mitsutoshi Watanabe , Mikiya Arai , Shigeru Saburi , Eiji Nakayama , Akihiro Goto , Masao Akiyoshi
发明人： Hiroyuki Ochiai , Mitsutoshi Watanabe , Mikiya Arai , Shigeru Saburi , Eiji Nakayama , Akihiro Goto , Masao Akiyoshi
IPC分类号： B32B15/04 , F01D5/28 , C23C26/00 , C23C4/06 , C22C19/07 , C23C30/00
CPC分类号： C23C26/00 , B32B15/04 , C22C19/07 , C23C4/06 , C23C30/00 , F01D5/288 , F05D2300/509 , Y02T50/67 , Y10T428/12937
摘要： A sliding surface of a high-temperature portion is subjected to an electro-discharge surface treatment with one or both of a high-temperature hard material (4) and a material having a lubricating property at a high temperature (6). The high-temperature hard material (4) is any or a mixture of cBN, TiC, TiN, TiAlN, TiB2, WC, Cr3C2, SiC, ZrC, VC, B4C, Si3N4, ZrO2, and Al2O3. The material having the lubricating property at the high temperature (6) contains chromium and/or chromium oxide (Cr2O3) and/or hexaboron nitride (hBN). An electrode formed by compression molding of the high-temperature hard material, and the high-temperature lubricating material containing at least one of Cr and hBN and having the lubricating property at the high temperature is used as the electrode for the electro-discharge surface treatment.

8. 发明申请

US20130319324A1 DISCHARGE SURFACE TREATMENT APPARATUS 有权
标题翻译：放电表面处理装置
公开(公告)号：US20130319324A1
公开(公告)日：2013-12-05
申请号：US13824867
申请日：2012-06-05
申请人： Yusuke Yasunaga , Akihiro Goto , Hiroyuki Teramoto , Nobuyuki Sumi
发明人： Yusuke Yasunaga , Akihiro Goto , Hiroyuki Teramoto , Nobuyuki Sumi
IPC分类号： B05C11/00
CPC分类号： B05C11/00 , H01J37/3255 , H01J37/32577 , H01J37/32614 , H01J37/32825 , H05H1/46 , H05H2001/4682
摘要： A discharge surface treatment apparatus generates a pulsed discharge between poles, that is, between a discharge electrode and a workpiece, and the discharge electrode is obtained by compression-molding of any one of a metal powder, a powder of a metal compound, and a powder of ceramics or a mixture thereof. The apparatus forms a film made of an electrode material or the like on a workpiece surface by thermal energy due to the discharge. The apparatus includes: a capacitor that is connected to any one of the discharge electrode and the workpiece at one end; and a parallel circuit of a resistor and a diode, which is provided between another one of the discharge electrode and the workpiece and another end of the capacitor via a connection line.
摘要翻译：放电表面处理装置在两极之间，即放电电极和工件之间产生脉冲放电，放电电极通过压缩成型金属粉末，金属化合物粉末和陶瓷粉或其混合物。该装置由于放电而通过热能在工件表面上形成由电极材料等制成的膜。该装置包括：在一端连接到放电电极和工件中的任何一个的电容器; 以及通过连接线设置在放电电极和工件的另一个和电容器的另一端之间的电阻器和二极管的并联电路。

9. 发明申请

US20130164496A1 SURFACE LAYER FORMING METHOD USING ELECTRICAL DISCHARGE MACHINING AND SURFACE LAYER 审中-公开
标题翻译：使用电子放电加工和表面层的表面层形成方法
公开(公告)号：US20130164496A1
公开(公告)日：2013-06-27
申请号：US13140576
申请日：2010-09-16
申请人： Akihiro Goto , Nobuyuki Sumi , Yoshikazu Nakano , Yusuke Yasunaga , Hiroyuki Teramoto
发明人： Akihiro Goto , Nobuyuki Sumi , Yoshikazu Nakano , Yusuke Yasunaga , Hiroyuki Teramoto
IPC分类号： B23K9/04
CPC分类号： B23K9/042 , C09D5/084 , C23C26/00 , C23C30/00 , Y10T428/24355 , Y10T428/265
摘要： Using electrical discharge surface treatment of moving an electrode material to a work piece by repeatedly generating pulsed electrical discharge between an electrode for electrical discharge surface treatment (1) containing Si as a main component and a work piece (2) surface in order to form a surface layer excellent in an anti-corrosion property and an anti-erosion property which is useful in applications to anti-corrosion and anti-erosion parts, a surface layer formed with an amorphous structure, in which an Si component is contained in a range of 3 to 11 wt % and which has a thickness of 5 to 10 μm, is formed on the work piece (2) surface.
摘要翻译：使用放电表面处理，通过在用于以Si为主要成分的放电表面处理用电极（1）和工件（2）表面之间重复产生脉冲放电，从而将电极材料移动到工件上，以便形成在抗腐蚀和抗腐蚀部件的应用中有抗腐蚀性和抗侵蚀性优异的表面层，形成有非晶结构的表面层，其中包含Si成分的范围 3〜11重量％，厚度为5〜10微米，形成在工件（2）面上。

10. 发明授权

US07918460B2 Rotating member and method for coating the same 有权
标题翻译：旋转构件及其涂敷方法
公开(公告)号：US07918460B2
公开(公告)日：2011-04-05
申请号：US12425717
申请日：2009-04-17
申请人： Hiroyuki Ochiai , Mitsutoshi Watanabe , Akihiro Goto , Masao Akiyoshi
发明人： Hiroyuki Ochiai , Mitsutoshi Watanabe , Akihiro Goto , Masao Akiyoshi
IPC分类号： F16J15/447
CPC分类号： C23C26/00 , C23C26/02 , F01D5/288 , F01D11/122 , Y02T50/67 , Y02T50/671
摘要： A pulsed discharge is generated between tip ends of a rotating member such as a blade and a discharge electrode including a hard material such as cBN in dielectric liquid or gas by a power supply for discharge to melt the discharge electrode, and a part of the discharge electrode is attached to the tip end of the rotating member to form an abrasive coating film including the hard materials such as cBN.
摘要翻译：在诸如叶片的旋转构件的顶端和在电介质液体中包含诸如cBN的硬质材料的放电电极或通过用于放电的电源的熔化放电电极的气体中产生脉冲放电，并且一部分放电电极附接到旋转构件的末端，以形成包括诸如cBN的硬质材料的研磨涂层膜。

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