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    • 4. 发明申请
    • ELECTRICAL DISCHARGE SURFACE TREATMENT METHOD
    • 电放电表面处理方法
    • US20130209705A1
    • 2013-08-15
    • US13140604
    • 2010-09-16
    • Akihiro GotoNobuyuki SumiYusuke YasunagaHiroyuki Teramoto
    • Akihiro GotoNobuyuki SumiYusuke YasunagaHiroyuki Teramoto
    • H01B13/00
    • H01B13/00C23C26/00C23C26/02
    • There is an electrical discharge surface treatment method of forming a surface layer on a work piece surface by making pulsed electrical discharge repeatedly occur between a work piece (2) and an electrode (1) for electrical discharge surface treatment, for which a compact formed by powder obtained by mixing 20 wt % or more of silicon with powder of a hard material or a solid body of silicon is used, so that the electrode material is moved to the work piece (2), including: a processing time decision step of observing an electrical discharge treatment surface formed on the work piece surface by the electrical discharge and deciding the electrical discharge surface treatment end time in a process where surface roughness formed by the electrical discharge on the electrical discharge treatment surface acquired from the observation result is increased and is then decreased. Electrical discharge surface treatment between the electrode and the work piece is executed for only the processing time set in the processing time decision step.
    • 存在通过在工件(2)和用于放电表面处理的电极(1)之间重复发生脉冲放电而在工件表面上形成表面层的放电表面处理方法,由此形成由 使用通过将20重量%以上的硅与硬质材料或硅固体粉末混合而获得的粉末,使得电极材料移动到工件(2),包括:处理时间决定步骤,观察 通过放电在工件表面上形成的放电处理表面,并且在从观察结果获得的放电处理表面上的放电形成的表面粗糙度增加的过程中决定放电表面处理结束时间,并且是 然后减少。 仅在处理时间决定步骤中设定的处理时间执行电极与工件之间的放电表面处理。
    • 10. 发明授权
    • Coating film and coating-film forming method
    • 涂膜和涂膜成型方法
    • US08287968B2
    • 2012-10-16
    • US12296179
    • 2006-04-05
    • Akihiro GotoMasahiro OkaneKazushi NakamuraHiroyuki TeramotoHiroyuki OchiaiMitsutoshi Watanabe
    • Akihiro GotoMasahiro OkaneKazushi NakamuraHiroyuki TeramotoHiroyuki OchiaiMitsutoshi Watanabe
    • H01T14/00B32B15/00
    • C23C26/02C23C8/80C23C26/00Y10T428/12493
    • To form a coating film having an excellent wear-resistant property in a temperature range from low temperature to high temperature a coating-film forming method includes a metal-powder producing step of producing a metal powder containing an element exhibiting a lubricating property when oxidized; an oxidizing step of oxidizing the metal powder so that an amount of oxygen contained in the metal powder is within 6 weight % to 14 weight %; and a coating-film forming step of forming a coating film on a material subject to a treatment, the coating film having such a composition that an area where an oxygen content is 3 weight % or less and an area where an oxygen content is 8 weight % or more are distributed in a unit area of the coating film when the metal powder is in a melted state or a semi-melted state, and an oxygen content of the entire coating film after the metal powder is melted or semi-melted being within 5 weight % to 9 weight %.
    • 为了形成在低温至高温的温度范围内具有优异的耐磨性的涂膜,涂膜形成方法包括:金属粉末的制造步骤,其制造含有氧化时具有润滑性的元素的金属粉末; 氧化金属粉末的氧化步骤,使得金属粉末中所含的氧含量在6重量%至14重量%之间; 以及在经受处理的材料上形成涂膜的涂膜形成步骤,所述涂膜具有氧含量为3重量%以下的面积和氧含量为8重量的区域的组成 当金属粉末处于熔融状态或半熔化状态时,涂膜的单位面积中分布有%以上,并且金属粉末后的整个涂膜的氧含量在内部熔融或半熔融 5重量%至9重量%。