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    • 1. 发明专利
    • Information processor and information processing system
    • 信息处理器和信息处理系统
    • JP2005084864A
    • 2005-03-31
    • JP2003315189
    • 2003-09-08
    • Junji IkedaTaiyo Denki Kkタイヨー電機株式会社順治 池田
    • FUKUI TOSHIAKIIKEDA JUNJI
    • B42D15/10G06K7/12G06K17/00G06K19/08G06K19/10
    • PROBLEM TO BE SOLVED: To secure the reliability of information by preventing falsification and modification of changeable information stored on an information carrier. SOLUTION: This information processor includes a fluorescence detection means 101 for applying an electromagnetic wave of a predetermined wavelength range to an information presenting material 91 included in materials composing the information carrier 90 to detect fluorescence radiated from the information presenting material 91; a second information reading means 104 for reading second information stored in an information storage part 92; and a writing means 108 for writing the created second information in the information storage part 92. First information is specified from information about the detection of the fluorescence so as to encrypt the second information using the first information as an encryption key. The writing information inputted is encrypted based on the first information to create the second information, which is then written. COPYRIGHT: (C)2005,JPO&NCIPI
    • 要解决的问题:通过防止信息载体上存储的可变信息的伪造和修改来确保信息的可靠性。 解决方案:该信息处理器包括:荧光检测装置101,用于将包括在构成信息载体90的材料中的信息呈现材料91施加预定波长范围的电磁波,以检测从信息呈现材料91辐射的荧光; 用于读取存储在信息存储部分92中的第二信息的第二信息读取装置104; 以及用于将所创建的第二信息写入信息存储部分92的写入装置108.第一信息是从关于荧光检测的信息中指定的,以便使用第一信息作为加密密钥加密第二信息。 输入的写入信息基于第一信息被加密以创建第二信息,然后写入。 版权所有(C)2005,JPO&NCIPI
    • 2. 发明专利
    • Welding aid material and welding method using this welding aid material
    • 焊接材料和焊接方法使用此焊接材料
    • JP2003311474A
    • 2003-11-05
    • JP2002120540
    • 2002-04-23
    • Junji Ikeda淳二 池田
    • IKEDA JUNJI
    • B23K37/06B23K33/00B23K35/36
    • PROBLEM TO BE SOLVED: To provide a welding aid material which can weld and join the inside surface at the end of a column and a backing strip when a clearance arises between the inside surface at the end of the column and the backing strip and a welding method using such welding aid material.
      SOLUTION: The welding aid material M is packed into the clearance A produced between the inside surface at the end of the column 11 and the backing strip 14 and the welding of the inside surface at the end of the column 11 and the backing strip 14 is performed in the state of filling the clearance A near the weld zone. The welding aid material M is thus packed into the clearance A, by which the clearance A can be filled up and the inside surface at the end of the column 11 and the backing strip 14 can be well welded and joined.
      COPYRIGHT: (C)2004,JPO
    • 要解决的问题:提供一种焊接辅助材料,其可以在柱的端部和背衬条的端部处焊接和接合内表面,当柱的端部的内表面与衬垫条之间出现间隙时 以及使用这种焊接辅助材料的焊接方法。 解决方案:将焊接辅助材料M填充到在柱11的端部和背衬条14的内表面之间产生的间隙A中,并且在柱11的端部和背衬 条带14在填充焊接区附近的间隙A的状态下进行。 因此,焊接辅助材料M被填充到间隙A中,通过该间隙可以填充间隙A,并且柱11的端部和背衬条14的内表面可以被良好地焊接和接合。 版权所有(C)2004,JPO
    • 3. 发明专利
    • Individual information management method and system in circulating production
    • 循环生产中的个人信息管理方法与系统
    • JP2004070931A
    • 2004-03-04
    • JP2003165053
    • 2003-06-10
    • Masaya FukuiJunji Ikeda池田 順治福井 眞彌
    • IKEDA JUNJIFUKUI MASAYA
    • G05B19/418B09B5/00G06Q50/00G06Q50/04G06F17/60
    • Y02P90/30
    • PROBLEM TO BE SOLVED: To provide an individual information management method and a system in a circulating production simply, surely, and centralizedly managing the individual information in the circulating production. SOLUTION: An information provision substance composed of one type or more elements or their compound and linked with the individual information such as the product and the like is attached to the product and the like in, at least, one base out of respective bases 1-5. A reference table which is so set that information linked with the information provision substance corresponds with the individual information is stored in a reference table storage part 96 of a management computer 9. The information provision substance is detected from the product in, at least, a base after the base attached with the information provision substance by a detector 8 and the detection result is transmitted to the management computer 9. The management computer 9 specifies the individual information based on the detection result of the information provision substance by referring to the reference table and stores it in a database storage part 97. COPYRIGHT: (C)2004,JPO
    • 要解决的问题:在流通生产中提供个人信息管理方法和系统,简单,可靠,集中管理循环生产中的个人信息。 解决方案:将由一种或多种元素组成的信息提供物质或其化合物与诸如产品等的个人信息相关联的信息提供物质在相应的至少一个碱基中的至少一个碱基中附着到产品等上 基地1-5。 将与信息提供物质相关联的信息与个人信息对应的参照表存储在管理计算机9的参照表存储部96中。信息提供物质从至少一个 在通过检测器8附加有信息提供物质的基底之后,检测结果被发送到管理计算机9.管理计算机9通过参考参考表基于信息提供物质的检测结果来指定个体信息 并将其存储在数据库存储部分97中。(P)版权所有(C)2004,JPO
    • 5. 发明申请
    • Semiconductor Light Emitting Device And Illuminating Device Using It
    • 半导体发光装置及照明装置
    • US20090001409A1
    • 2009-01-01
    • US11991418
    • 2006-09-04
    • Takayoshi TakanoYukihiro KondoJunji IkedaHideki Hirayama
    • Takayoshi TakanoYukihiro KondoJunji IkedaHideki Hirayama
    • H01L33/00
    • H01L33/12H01L33/06H01L33/22H01L33/32
    • The semiconductor light emitting device of the present invention comprises an n-type nitride semiconductor layer 3 formed on one surface side of a single-crystal substrate 1 for epitaxial growth through a first buffer layer 2, an emission layer 5 formed on a surface side of the n-type nitride semiconductor layer 3, and a p-type nitride semiconductor layer 6 formed on a surface side of the emission layer 5. The emission layer 5 has an AlGaInN quantum well structure, and a second buffer layer 4 having the same composition as a barrier layer 5a of the emission layer 5 is provided between the n-type nitride semiconductor layer 3 and the emission layer 5. In the semiconductor light emitting device, it is possible to increase emission intensity of the ultraviolet radiation as compared with a conventional configuration while using AlGaInN as a material of the emission layer.
    • 本发明的半导体发光器件包括在单晶衬底1的一个表面侧上形成的用于通过第一缓冲层2进行外延生长的n型氮化物半导体层3,形成在第一缓冲层2的表面侧的发射层5 n型氮化物半导体层3和形成在发光层5的表面侧的p型氮化物半导体层6.发光层5具有AlGaInN量子阱结构和具有相同组成的第二缓冲层4 作为发光层5的阻挡层5a设置在n型氮化物半导体层3和发光层5之间。在半导体发光器件中,与常规的相比,可以增加紫外线辐射的发射强度 使用AlGaInN作为发光层的材料。
    • 7. 发明授权
    • Charged-particle-beam mapping projection-optical systems and methods for adjusting same
    • 带电粒子束映射投影光学系统及其调整方法
    • US07064339B2
    • 2006-06-20
    • US10816467
    • 2004-03-31
    • Hiroshi NishimuraNaoto KiharaKinya KatoToru TakagiAkihiro GotoJunji IkedaKazuya Okamoto
    • Hiroshi NishimuraNaoto KiharaKinya KatoToru TakagiAkihiro GotoJunji IkedaKazuya Okamoto
    • G01N21/00G21K7/00
    • H01J37/26G01N23/225H01J37/1471H01J37/226H01J37/265H01J2237/0492H01J2237/057H01J2237/1501H01J2237/2482H01J2237/2538H01J2237/262H01J2237/2806H01J2237/2817H01J2237/282H01J2237/2823H01J2237/2826H01J2237/30438
    • Charged-particle-beam (CPB) mapping projection-optical systems and adjustment methods for such systems are disclosed that can be performed quickly and accurately. In a typical system, an irradiation beam is emitted from a source, passes through an irradiation-optical system, and enters a Wien filter (“E×B”). Upon passing through the E×B, the irradiation beam passes through an objective-optical system and is incident on an object surface. Such impingement generates an observation beam that returns through the objective-optical system and the E×B in a different direction to a detector via an imaging-optical system. An adjustment-beam source emits an adjustment beam used for adjusting and aligning the position of, e.g., the object surface and/or the Wien's condition of the E×B. The adjustment beam can be off-axis relative to the objective-optical system. For such adjusting and aligning, fiducial marks (situated, e.g., in the plane of the object surface) can be used that are optimized for the CPB-optical system and the off-axis optical system. Desirably, the image formed on the detector when electrical voltage and current are not applied to the E×B is in the same position as the image formed on the detector when electrical voltage and current are applied to the E×B. Also provided are “evaluation charts” for use in such alignments that do not require adjustment of the optical axis of the irradiation-optical system, and from which the kinetic-energy distribution of the emitted adjustment beam is stable.
    • 公开了可以快速且准确地执行这种系统的带电粒子束(CPB)映射投影光学系统和调整方法。 在典型的系统中,照射光束从光源发出,通过照射光学系统,并进入维恩滤光片(“ExB”)。 当通过ExB时,照射光束通过物镜光学系统并且入射到物体表面上。 这种冲击产生观察光束,该观察光束经由成像光学系统通过物镜 - 光学系统和ExB以不同的方向返回到检测器。 调整光束源发射用于调整和对准例如物体表面的位置和/或ExB的维恩状态的调节光束。 调节光束可以相对于物镜光学系统偏轴。 对于这种调整和对准,可以使用为CPB光学系统和离轴光学系统优化的基准标记(例如位于物体表面的平面中)。 理想地,当电压和电流未施加到ExB时,在检测器上形成的图像与当将电压和电流施加到ExB时形成在检测器上的图像位于相同的位置。 还提供了用于这种对准的“评估图”,其不需要调整照射光学系统的光轴,并且发射的调节光束的动能分布从该对准是稳定的。