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1. 发明申请

US20120289129A1 POLISHING HEAD AND POLISHING APPARATUS 有权
标题翻译：抛光头和抛光装置
公开(公告)号：US20120289129A1
公开(公告)日：2012-11-15
申请号：US13522370
申请日：2011-01-20
申请人： Hiromasa Hashimoto , Kouji Morita , Takashi Aratani , Hiromi Kishida , Satoru Arakawa
发明人： Hiromasa Hashimoto , Kouji Morita , Takashi Aratani , Hiromi Kishida , Satoru Arakawa
IPC分类号： B24B41/06 , B24B37/10
CPC分类号： B24B37/30 , B24B37/32 , H01L21/02024
摘要： A polishing head including, below a polishing head body, a rubber film held by a disk-shaped mid plate and an annular guide ring disposed around the rubber film holding the back surface of the workpiece on a lower face portion of the rubber film. The polishing head also includes a base member that is coupled to a polishing head body through an elastic film and holds the guide ring and the mid plate such that the lower surface of the guide ring does not contact the polishing pad during polishing. The polishing head and polishing apparatus, are operable in both of the rough polishing process and final polishing process, that can stably achieve predetermined high flatness and high polishing stock removal uniformity in polishing of a workpiece and can obtain a workpiece with fewer fine particles having a diameter of 45 nm or more.
摘要翻译：一种抛光头，其包括在抛光头本体下面的由盘形中间板保持的橡胶膜和设置在橡胶膜周围的橡胶膜周围的环形引导环，橡胶膜在橡胶膜的下表面部分上保持工件的后表面。抛光头还包括通过弹性膜联接到抛光头本体并且保持引导环和中间板的基部构件，使得导向环的下表面在抛光期间不接触抛光垫。抛光头和抛光装置可以在粗抛光工艺和最终抛光工艺中操作，可以稳定地实现工件抛光中预定的高平整度和高抛光余料去除均匀性，并且可以获得具有更少的具有直径为45nm以上。

2. 发明授权

US09278425B2 Polishing head and polishing apparatus 有权
标题翻译：抛光头和抛光装置
公开(公告)号：US09278425B2
公开(公告)日：2016-03-08
申请号：US13522370
申请日：2011-01-20
申请人： Hiromasa Hashimoto , Kouji Morita , Takashi Aratani , Hiromi Kishida , Satoru Arakawa
发明人： Hiromasa Hashimoto , Kouji Morita , Takashi Aratani , Hiromi Kishida , Satoru Arakawa
IPC分类号： B24B37/30 , B24B37/32 , H01L21/02
CPC分类号： B24B37/30 , B24B37/32 , H01L21/02024
摘要： A polishing head including, below a polishing head body, a rubber film held by a disk-shaped mid plate and an annular guide ring disposed around the rubber film holding the back surface of the workpiece on a lower face portion of the rubber film. The polishing head also includes a base member that is coupled to a polishing head body through an elastic film and holds the guide ring and the mid plate such that the lower surface of the guide ring does not contact the polishing pad during polishing. The polishing head and polishing apparatus, are operable in both of the rough polishing process and final polishing process, that can stably achieve predetermined high flatness and high polishing stock removal uniformity in polishing of a workpiece and can obtain a workpiece with fewer fine particles having a diameter of 45 nm or more.
摘要翻译：一种抛光头，其包括在抛光头本体下面的由盘形中间板保持的橡胶膜和设置在橡胶膜周围的橡胶膜周围的环形引导环，橡胶膜在橡胶膜的下表面部分上保持工件的后表面。抛光头还包括通过弹性膜联接到抛光头本体并且保持引导环和中间板的基部构件，使得在抛光期间导向环的下表面不接触抛光垫。抛光头和抛光装置可以在粗抛光工艺和最终抛光工艺中操作，可以稳定地实现工件抛光中预定的高平整度和高抛光余料去除均匀性，并且可以获得具有更少的具有直径为45nm以上。

3. 发明授权

US08636561B2 Polishing head and polishing apparatus 有权
标题翻译：抛光头和抛光装置
公开(公告)号：US08636561B2
公开(公告)日：2014-01-28
申请号：US13056249
申请日：2009-08-07
申请人： Hisashi Masumura , Hiromasa Hashimoto , Kouji Morita , Hiromi Kishida , Satoru Arakawa
发明人： Hisashi Masumura , Hiromasa Hashimoto , Kouji Morita , Hiromi Kishida , Satoru Arakawa
IPC分类号： B24B37/04 , H01L21/304
CPC分类号： B24B37/30
摘要： A polishing head for holding a workpiece when a surface of the workpiece is polished and a polishing apparatus provided with the polishing head, and more particularly a polishing head for holding the workpiece on a rubber film and a polishing apparatus provided with the polishing head. The polishing head and the polishing apparatus provided with the polishing head that can adjust the polishing profile on the basis of the shape of the workpiece before polishing and can stably obtain good flatness.
摘要翻译：抛光工件的抛光头，抛光工件的表面和设置有抛光头的抛光装置，特别是用于将工件保持在橡胶膜上的抛光头和设置有抛光头的抛光装置。抛光头和抛光装置具有抛光头，该抛光头可以在研磨前基于工件的形状调节抛光轮廓并且可以稳定地获得良好的平坦度。

4. 发明申请

US20110136414A1 POLISHING HEAD AND POLISHING APPARATUS 有权
标题翻译：抛光头和抛光装置
公开(公告)号：US20110136414A1
公开(公告)日：2011-06-09
申请号：US13056249
申请日：2009-08-07
申请人： Hisashi Masumura , Hiromasa Hashimoto , Kouji Morita , Hiromi Kishida , Satoru Arakawa
发明人： Hisashi Masumura , Hiromasa Hashimoto , Kouji Morita , Hiromi Kishida , Satoru Arakawa
IPC分类号： B24B37/04 , H01L21/304 , B24B37/00
CPC分类号： B24B37/30
摘要： A polishing head for holding a workpiece when a surface of the workpiece is polished and a polishing apparatus provided with the polishing head, and more particularly a polishing head for holding the workpiece on a rubber film and a polishing apparatus provided with the polishing head. The polishing head and the polishing apparatus provided with the polishing head that can adjust the polishing profile on the basis of the shape of the workpiece before polishing and can stably obtain good flatness.
摘要翻译：抛光工件的抛光头，抛光工件的表面和设置有抛光头的抛光装置，特别是用于将工件保持在橡胶膜上的抛光头和设置有抛光头的抛光装置。抛光头和抛光装置具有抛光头，该抛光头可以在研磨前基于工件的形状调节抛光轮廓并且可以稳定地获得良好的平坦度。

5. 发明申请

US20100291838A1 POLISHING HEAD AND POLISHING APPARATUS HAVING THE SAME 有权
标题翻译：抛光头和抛光装置
公开(公告)号：US20100291838A1
公开(公告)日：2010-11-18
申请号：US12733535
申请日：2008-10-20
申请人： Hisashi Masumura , Kouji Morita , Hiromasa Hashimoto , Satoru Arakawa , Hiromi Kishida
发明人： Hisashi Masumura , Kouji Morita , Hiromasa Hashimoto , Satoru Arakawa , Hiromi Kishida
IPC分类号： B24B49/00 , B24B37/04 , B24B7/22 , B24B41/06
CPC分类号： B24B37/30 , B24B41/06
摘要： The present invention is a polishing head in which a rubber film is formed in a boot shape in such a manner that a position where the rubber film is held by a mid plate is distantly positioned from a work holding portion; an end portion of the boot shaped rubber film is formed in O-ring shape so that the rubber film is held by the mid plate with decreasing an area of contact between the mid plate and the rubber film as much as possible. As a result, there is provided a polishing head with rubber chuck method in which an occurrence of a surface defect, such as a scratch, on a surface of the work is suppressed as much as possible and the work can be uniformly and stably polished to the outer periphery.
摘要翻译：本发明是一种研磨头，其中橡胶膜形成为靴形，其中橡胶膜由中间板保持的位置远离工件保持部分; 靴形橡胶膜的端部形成为O形环，使得橡胶膜由中间板保持，尽可能地减小中间板和橡胶膜之间的接触面积。结果，提供了一种具有橡胶卡盘方法的抛光头，其中尽可能地抑制了在工件的表面上发生诸如划痕的表面缺陷，并且可以将工件均匀且稳定地抛光到外围。

6. 发明申请

US20110070813A1 METHOD FOR MANUFACTURING POLISHING HEAD AND POLISHING APPARATUS 审中-公开
标题翻译：制造抛光头和抛光装置的方法
公开(公告)号：US20110070813A1
公开(公告)日：2011-03-24
申请号：US12992782
申请日：2009-06-02
申请人： Hisashi Masumura , Hiromasa Hashimoto , Kouji Morita , Hiromi Kishida , Satoru Arakawa
发明人： Hisashi Masumura , Hiromasa Hashimoto , Kouji Morita , Hiromi Kishida , Satoru Arakawa
IPC分类号： B24B41/00 , B24D18/00
CPC分类号： B24B37/32 , B24B37/042 , B24B37/24
摘要： A method for manufacturing a polishing head having an annular rigid ring; a rubber film bonded to the rigid ring with uniform tension; a mid plate joined to the rigid ring, forming a space together with the rubber film and the rigid ring; and a mechanism for changing pressure of the space, the method including performing a tensile test on the rubber film according to JIS K6251 before bonding the rubber film to the rigid ring, and selecting the rubber film having a value of 10 MPa or less of an inclination obtained by a linear approximation of a stress-strain curve within a strain value of 5%; and bonding the selected rubber film having a value of 10 MPa or less of the inclination to the rigid ring to manufacture the polishing head.
摘要翻译：一种用于制造具有环形刚性环的抛光头的方法; 橡胶膜与刚性环结合，张力均匀; 连接到刚性环的中间板，与橡胶膜和刚性环一起形成空间; 以及用于改变空间压力的机构，所述方法包括在将橡胶膜粘合到刚性环之前根据JIS K6251在橡胶膜上进行拉伸试验，并且选择值为10MPa以下的橡胶膜通过在应变值5％内的应力 - 应变曲线的线性近似获得的倾斜度; 并将所述倾斜度为10MPa以下的所选橡胶膜与所述刚性环接合，制造所述研磨头。

7. 发明授权

US08021210B2 Polishing head and polishing apparatus having the same 有权
标题翻译：具有相同的抛光头和抛光装置
公开(公告)号：US08021210B2
公开(公告)日：2011-09-20
申请号：US12733535
申请日：2008-10-20
申请人： Hisashi Masumura , Kouji Morita , Hiromasa Hashimoto , Satoru Arakawa , Hiromi Kishida
发明人： Hisashi Masumura , Kouji Morita , Hiromasa Hashimoto , Satoru Arakawa , Hiromi Kishida
IPC分类号： B24B49/00
CPC分类号： B24B37/30 , B24B41/06
摘要： The present invention is a polishing head in which a rubber film is formed in a boot shape in such a manner that a position where the rubber film is held by a mid plate is distantly positioned from a work holding portion; an end portion of the boot shaped rubber film is formed in O-ring shape so that the rubber film is held by the mid plate with decreasing an area of contact between the mid plate and the rubber film as much as possible. As a result, there is provided a polishing head with rubber chuck method in which an occurrence of a surface defect, such as a scratch, on a surface of the work is suppressed as much as possible and the work can be uniformly and stably polished to the outer periphery.
摘要翻译：本发明是一种研磨头，其中橡胶膜形成为靴形，其中橡胶膜由中间板保持的位置远离工件保持部分; 靴形橡胶膜的端部形成为O形环，使得橡胶膜由中间板保持，尽可能地减小中间板和橡胶膜之间的接触面积。结果，提供了一种具有橡胶卡盘方法的抛光头，其中尽可能地抑制了在工件的表面上发生诸如划痕的表面缺陷，并且可以将工件均匀且稳定地抛光到外围。

8. 发明授权

US08092281B2 Polishing head and polishing apparatus 有权
标题翻译：抛光头和抛光装置
公开(公告)号：US08092281B2
公开(公告)日：2012-01-10
申请号：US12311690
申请日：2007-10-18
申请人： Hisashi Masumura , Koji Kitagawa , Kouji Morita , Hiromi Kishida , Satoru Arakawa
发明人： Hisashi Masumura , Koji Kitagawa , Kouji Morita , Hiromi Kishida , Satoru Arakawa
IPC分类号： B24B5/35
CPC分类号： B24B37/30
摘要： The present invention is a polishing head provided with an annular rigid ring, a rubber film bonded to the rigid ring with a uniform tension, a mid plate joined to the rigid ring and forming a space portion together with the rubber film and the rigid ring, and an annular template provided concentrically with the rigid ring in a peripheral portion on a lower face part of the rubber film and having an outer diameter larger than an inner diameter of the rigid ring, in which a pressure of the space portion can be changed by a pressure adjustment mechanism, a back face of a work is held on the lower face part of the rubber film, and a surface of the work is brought into sliding contact with the polishing pad attached onto a turn table for performing polishing, and an inner diameter of the template is smaller than an inner diameter of the rigid ring, and a ratio between an inner diameter difference between the rigid ring and the template and a difference between the inner diameter and an outer diameter of the template is 26% or more and 45% or less. Thereby, a polishing head and the like that can obtain constant flatness stably can be provided.
摘要翻译：本发明是一种抛光头，其具有环形刚性环，橡胶膜以均匀的张力粘合到刚性环上，中间板与刚性环接合并与橡胶膜和刚性环一起形成空间部分，以及环形模板，其与所述刚性环同心地设置在所述橡胶膜的下表面部分上的周边部分中，并且具有大于所述刚性环的内径的外径，其中所述空间部分的压力可以通过压力调节机构，工件的背面被保持在橡胶膜的下表面部分上，并且工件的表面与附着在用于抛光的转台上的抛光垫滑动接触，并且内部模板的直径小于刚性环的内径，刚性环与模板之间的内径差与内径与外径之间的差模板的直径为26％以上且45％以下。由此，可以提供能够稳定地获得恒定的平坦度的抛光头等。

9. 发明申请

US20100233945A1 POLISHING HEAD, POLISHING APPARATUS AND METHOD FOR DEMOUNTING WORKPIECE 有权
标题翻译：抛光头，抛光装置及其工作方法
公开(公告)号：US20100233945A1
公开(公告)日：2010-09-16
申请号：US12734119
申请日：2007-11-21
申请人： Hisashi Masumura , Koji Kitagawa , Kouji Morita , Hiromi Kishida , Satoru Arakawa
发明人： Hisashi Masumura , Koji Kitagawa , Kouji Morita , Hiromi Kishida , Satoru Arakawa
IPC分类号： B24B41/06 , B23P11/00
CPC分类号： B24B37/30 , B24B37/345 , Y10T29/49826
摘要： A polishing head having a disklike carrier in which an annular projecting portion and a carrier-engagement portion are formed in a peripheral portion, a disklike head body in which a head-body-engagement portion is formed outside, a diaphragm for connecting the head body with the carrier, a spacer located between the carrier-engagement portion and the head-body-engagement portion in a part of the carrier-engagement portion and/or the head-body-engagement portion, in which the spacer abuts on the carrier-engagement portion and/or the head-body-engagement portion at the time of lifting the head body so that the workpiece is demounted from the polishing pad by lifting the carrier with it inclined. As a result, there is provided a polishing head in which the workpiece can be easily, safely and surely demounted from the polishing pad by lifting the polishing head holding the workpiece without overhanging the polishing head from the turn table and the like.
摘要翻译：一种抛光头，其具有圆盘状载体，其中环形突出部分和载体接合部分形成在周边部分中，盘状头体，其中头部体接合部分形成在外部;光阑，用于连接头部主体在载体接合部分和头部本体接合部分之间的间隔件位于载体接合部分和/或头部本体接合部分的一部分中，间隔件邻接在载体接合部分上，在抬起头部本体时使接合部和/或头体接合部通过使其倾斜地抬起托架而使抛光垫从抛光垫上拆下。结果，提供了一种研磨头，其中通过提起保持工件的抛光头而不会使抛光头从转台等悬垂，从而可以从抛光垫容易地，安全地和可靠地拆卸工件。

10. 发明申请

US20090291623A1 Polishing head and polishing apparatus 有权
标题翻译：抛光头和抛光装置
公开(公告)号：US20090291623A1
公开(公告)日：2009-11-26
申请号：US12311690
申请日：2007-10-18
申请人： Hisashi Masumura , Koji Kitagawa , Kouji Morita , Hiromi Kishida , Satoru Arakawa
发明人： Hisashi Masumura , Koji Kitagawa , Kouji Morita , Hiromi Kishida , Satoru Arakawa
IPC分类号： B24B37/04 , B24B41/06
CPC分类号： B24B37/30
摘要： The present invention is a polishing head provided with an annular rigid ring, a rubber film bonded to the rigid ring with a uniform tension, a mid plate joined to the rigid ring and forming a space portion together with the rubber film and the rigid ring, and an annular template provided concentrically with the rigid ring in a peripheral portion on a lower face part of the rubber film and having an outer diameter larger than an inner diameter of the rigid ring, in which a pressure of the space portion can be changed by a pressure adjustment mechanism, a back face of a work is held on the lower face part of the rubber film, and a surface of the work is brought into sliding contact with the polishing pad attached onto a turn table for performing polishing, and an inner diameter of the template is smaller than an inner diameter of the rigid ring, and a ratio between an inner diameter difference between the rigid ring and the template and a difference between the inner diameter and an outer diameter of the template is 26% or more and 45% or less. Thereby, a polishing head and the like that can obtain constant flatness stably can be provided.
摘要翻译：本发明是一种抛光头，其具有环形刚性环，橡胶膜以均匀的张力粘合到刚性环上，中间板与刚性环接合并与橡胶膜和刚性环一起形成空间部分，以及环形模板，其与所述刚性环同心地设置在所述橡胶膜的下表面部分上的周边部分中，并且具有大于所述刚性环的内径的外径，其中所述空间部分的压力可以通过压力调节机构，工件的背面被保持在橡胶膜的下表面部分上，并且工件的表面与附着在用于抛光的转台上的抛光垫滑动接触，并且内部模板的直径小于刚性环的内径，刚性环与模板之间的内径差与内径与外径之间的差模板的直径为26％以上且45％以下。由此，可以提供能够稳定地获得恒定的平坦度的抛光头等。

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