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1. 发明申请

US20060227839A1 Gas discharge laser output light beam parameter control 有权
标题翻译：气体放电激光输出光束参数控制
公开(公告)号：US20060227839A1
公开(公告)日：2006-10-12
申请号：US11095293
申请日：2005-03-31
申请人： Herve Besaucele , Igor Fomenkov , William Partlo , Fedor Trintchouk , Hao Ton That
发明人： Herve Besaucele , Igor Fomenkov , William Partlo , Fedor Trintchouk , Hao Ton That
IPC分类号： H01S3/22
CPC分类号： H01S3/036 , H01S3/038 , H01S3/097 , H01S3/09702 , H01S3/134
摘要： A line narrowed gas discharge laser system and method of operation are disclosed which may comprise: an oscillator cavity; a laser chamber comprising a chamber housing containing a lasing medium gas; at least one peaking capacitor electrically connected to the chamber housing and to a first one of a pair of electrodes; a second one of the pair of electrodes connected to an opposite terminal of the at least one peaking capacitor; a current return path connected to the chamber housing; the one terminal, the first one of the electrodes, the lasing medium gas, the second one of the electrodes, the current return path and the second terminal forming a head current inductive loop having an inductance unique to the particular head current inductive loo; a spectral quality tuning mechanism comprising a mechanism for changing the particular head current inductive loop inductance value for the particular head current inductance loop.
摘要翻译：公开了一种窄气体放电激光系统和操作方法，其可以包括：振荡器腔; 激光室，包括容纳激光介质气体的腔室; 至少一个峰值电容器电连接到所述腔室壳体和一对电极中的第一电极; 所述一对电极中的第二个连接到所述至少一个峰值电容器的相对端子; 连接到所述腔室壳体的电流返回路径; 一个端子，第一个电极，激光介质气体，第二个电极，电流返回路径和第二个端子，形成具有特定头电流电感槽独有的电感的头电流感应回路; 光谱质量调谐机构包括用于改变特定头电流电感回路的特定头电流感应环电感值的机构。

2. 发明申请

US20050271109A1 VERY NARROW BAND, TWO CHAMBER, HIGH REP-RATE GAS DISCHARGE LASER SYSTEM 有权
标题翻译：非常窄带，两个室，高倍率气体放电激光系统
公开(公告)号：US20050271109A1
公开(公告)日：2005-12-08
申请号：US11199691
申请日：2005-08-09
申请人： David Knowles , Daniel Brown , Herve Besaucele , David Myers , Alexander Ershov , William Partlo , Richard Sandstrom , Palash Das , Stuart Anderson , Igor Fomenkov , Richard Ujazdowski , Eckehard Onkels , Richard Ness , Scot Smith , William Hulburd , Jeffrey Oicles
发明人： David Knowles , Daniel Brown , Herve Besaucele , David Myers , Alexander Ershov , William Partlo , Richard Sandstrom , Palash Das , Stuart Anderson , Igor Fomenkov , Richard Ujazdowski , Eckehard Onkels , Richard Ness , Scot Smith , William Hulburd , Jeffrey Oicles
IPC分类号： H01S1/00 , G01J1/42 , G01J9/00 , G03F7/20 , H01S3/00 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/04 , H01S3/041 , H01S3/08 , H01S3/0943 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/102 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/11 , H01S3/13 , H01S3/131 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/223 , H01S3/225 , H01S3/23
CPC分类号： G01J1/4257 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70483 , G03F7/70575 , G03F7/70933 , H01S3/005 , H01S3/0057 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0387 , H01S3/0404 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/08036 , H01S3/0943 , H01S3/097 , H01S3/09702 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333 , H01S3/2366
摘要： An oscillator-amplifier gas discharge laser system and method is disclosed which may comprise a first laser unit which may comprise a first discharge region which may contain an excimer or molecular fluorine lasing gas medium; a first pair of electrodes defining the first discharge region containing the lasing gas medium, a line narrowing unit for narrowing a spectral bandwidth of output laser light pulse beam pulses produced in said first discharge region; a second laser unit which may comprise a second discharge chamber which may contain an excimer or molecular fluorine lasing gas medium; a second pair of electrodes defining the second discharge region containing the lasing gas medium; a pulse power system providing electrical pulses to the first pair of electrodes and to the second pair of electrodes producing gas discharges in the lasing gas medium between the respective first and second pair of electrodes, and laser parameter control mechanism modifying a selected parameter of a selected laser output light pulse beam pulse produced by said gas discharge laser system by controlling the timing of the occurrence of the gas discharge between the first pair of electrodes and the occurrence of the gas discharge between the second pair of electrodes.
摘要翻译：公开了一种振荡放大器气体放电激光器系统和方法，其可以包括第一激光器单元，该第一激光器单元可以包括可包含受激准分子或分子氟激光气体介质的第一放电区域; 限定含有激光气体介质的第一放电区域的第一对电极，用于使在所述第一放电区域中产生的输出激光脉冲光束脉冲的光谱带宽变窄的线窄化单元; 第二激光单元，其可以包括可包含受激准分子或分子氟激光气体介质的第二放电室; 限定包含所述激光气体介质的所述第二放电区域的第二对电极; 脉冲功率系统，其向所述第一对电极和所述第二对电极提供电脉冲，在所述相应的第一和第二对电极之间的所述激光气体介质中产生气体放电，以及激光参数控制机构修改所选择的所选择的参数通过控制第一对电极之间的气体放电的发生时间和第二对电极之间的气体放电的发生的时间，由所述气体放电激光系统产生的激光输出光脉冲束脉冲。

3. 发明申请

US20060126697A1 Very narrow band, two chamber, high rep-rate gas discharge laser system 有权
公开(公告)号：US20060126697A1
公开(公告)日：2006-06-15
申请号：US11346519
申请日：2006-02-01
申请人： David Knowles , Daniel Brown , Herve Besaucele , David Myers , Alexander Ershov , William Partlo , Richard Sandstrom , Palash Das , Stuart Anderson , Igor Fomenkov , Richard Ujazdowski , Eckehard Onkels , Richard Ness , Scott Smith , William Hulburd , Jeffrey Oicles
发明人： David Knowles , Daniel Brown , Herve Besaucele , David Myers , Alexander Ershov , William Partlo , Richard Sandstrom , Palash Das , Stuart Anderson , Igor Fomenkov , Richard Ujazdowski , Eckehard Onkels , Richard Ness , Scott Smith , William Hulburd , Jeffrey Oicles
IPC分类号： H01S3/22
CPC分类号： G01J1/4257 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70483 , G03F7/70575 , G03F7/70933 , H01S3/005 , H01S3/0057 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0387 , H01S3/0404 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/08036 , H01S3/0943 , H01S3/097 , H01S3/09702 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333 , H01S3/2366
摘要： An oscillator-amplifier gas discharge laser system and method is disclosed which may comprise a first laser unit which may comprise a first discharge region which may contain an excimer or molecular fluorine lasing gas medium; a first pair of electrodes defining the first discharge region containing the lasing gas medium, a line narrowing unit for narrowing a spectral bandwidth of output laser light pulse beam pulses produced in said first discharge region; a second laser unit which may comprise a second discharge chamber which may contain an excimer or molecular fluorine lasing gas medium; a second pair of electrodes defining the second discharge region containing the lasing gas medium; a pulse power system providing electrical pulses to the first pair of electrodes and to the second pair of electrodes producing gas discharges in the lasing gas medium between the respective first and second pair of electrodes, and laser parameter control mechanism modifying a selected parameter of a selected laser output light pulse beam pulse produced by said gas discharge laser system by controlling the timing of the occurrence of the gas discharge between the first pair of electrodes and the occurrence of the gas discharge between the second pair of electrodes.

4. 发明申请

US20050226301A1 Gas discharge laser chamber improvements 有权
公开(公告)号：US20050226301A1
公开(公告)日：2005-10-13
申请号：US10815387
申请日：2004-03-31
申请人： William Partlo , Yoshiho Amada , James Carmichael , Timothy Dyer , Walter Gillespie , Bryan Moosman , Richard Morton , Curtis Rettig , Brian Strate , Thomas Steiger , Fedor Trintchouk , Richard Ujazdowski
发明人： William Partlo , Yoshiho Amada , James Carmichael , Timothy Dyer , Walter Gillespie , Bryan Moosman , Richard Morton , Curtis Rettig , Brian Strate , Thomas Steiger , Fedor Trintchouk , Richard Ujazdowski
IPC分类号： H01S3/03 , H01S3/036 , H01S3/038 , H01S3/041 , H01S3/097 , H01S3/0971 , H01S3/22 , H01S3/225
CPC分类号： H01S3/036 , H01S3/0384 , H01S3/041 , H01S3/0971 , H01S3/225
摘要： A method and apparatus if disclosed which may comprise a high power high repetition rate gas discharge laser UV light source which may comprise: a gas discharge chamber comprising an interior wall comprising a vertical wall and an adjacent bottom wall; a gas circulation fan creating a gas flow path adjacent the interior vertical wall and the adjacent bottom wall; an in-chamber dust trap positioned a region of low gas flow, which may be along an interior wall and may comprise at least one meshed screen, e.g., a plurality of meshed screens, which may comprise at least two different gauge meshed screens. The dust trap may extend along the bottom interior wall of the chamber and/or a vertical portion of the interior wall. The dust trap may comprise a first meshed screen having a first gauge; a second meshed screen having a second gauge smaller than the first gauge; and the second meshed screen intermediate the first meshed screen and the interior wall. The chamber may comprise a plurality of dust collecting recesses in at least one of the vertical interior wall and the bottom wall of the chamber which may be selected from a group comprising a one-part recess and a multi-part recess, which may comprise two sections angled with respect to each other. The dust trap may comprise a pressure trap positioned between a portion of a main insulator and an interior wall of the chamber. The chamber may comprise a gas circulating fan comprising a cross-flow fan with a fan cutoff that may comprise a vortex control pocket. The chamber may comprise a preionization mechanism comprising a preionization tub containing a ground rod within an elongated opening in the preionization tube that may comprise a compliant member, an automatic preionization shut-off mechanism, a preionization onset control mechanism and/or a focusing element. The chamber may comprise an elongated baffle plate that may comprise a plurality of pyramidal structures including varying numbers of generally pyramidal elements and oriented in groups of varying numbers of generally pyramidal elements and oriented along and transverse to the longitudinal axis. Acoustic resonances within the chamber may also be reduced by introducing an artificial jitter into the timing of the laser discharges varying the inter-pulse period randomly or in a repeating pattern from pulse to pulse within a burst.

5. 发明申请

US20060114956A1 High power high pulse repetition rate gas discharge laser system bandwidth management 审中-公开
公开(公告)号：US20060114956A1
公开(公告)日：2006-06-01
申请号：US11000571
申请日：2004-11-30
申请人： Richard Sandstrom , William Partlo , Daniel Brown , J. Martin Algots , Fedor Trintchouk
发明人： Richard Sandstrom , William Partlo , Daniel Brown , J. Martin Algots , Fedor Trintchouk
IPC分类号： H01S3/22
CPC分类号： H01S3/08009 , H01S3/08031 , H01S3/08059 , H01S3/097 , H01S3/1055
摘要： A line narrowing apparatus and method for a narrow band DUV high power high repetition rate gas discharge laser producing output laser light pulse beam pulses in bursts of pulses is disclosed, which may comprise a dispersive center wavelength selection optic contained within a line narrowing module, selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the laser light pulse beam containing the respective pulse on a dispersive wavelength selection optic dispersive surface; a first dispersive optic bending mechanism operatively connected to the dispersive center wavelength selection optic and operative to change the curvature of the dispersive surface in a first manner; and, a second dispersive optic bending mechanism operatively connected to the dispersive center wavelength selection optic and operative to change the curvature of the dispersive surface in a second manner. The first manner may modify a first measure of bandwidth and the second manner may modify a second measure of bandwidth such that the ratio of the first measure to the second measure substantially changes. The first measure may be a spectrum width at a selected percentage of the spectrum peak value (FWX % M) and the second measure may be width within which some selected percentage of the spectral intensity is contained (EX %). The first dispersive optic bending mechanism may change the curvature of the dispersive surface in a first dimension and the second in a second dimension generally orthogonal to the first dimension. The laser system may comprise a beam path insert comprising a material having an different index of refraction and an index of refraction thermal gradient opposite from that of a neighboring optical element. The first dispersive optic bending mechanism may change the curvature of the dispersive surface in a first dimension and the second a second dimension generally parallel to the first dimension. An optical beam twisting element in the lasing cavity may optically twist the laser light pulse beam to present a twisted wavefront to the dispersive center wavelength selection optic. Bending may change the curvature and wavelength selection, e.g., in a burst may create two center wavelength peaks to select FWX % M and EX % independently.

6. 发明申请

US20060131515A1 Collector for EUV light source 有权
标题翻译： EUV光源收集器
公开(公告)号：US20060131515A1
公开(公告)日：2006-06-22
申请号：US10798740
申请日：2004-03-10
申请人： William Partlo , John Algots , Gerry Blumenstock , Norbert Bowering , Alexander Ershov , Igor Fomenkov , Xiaojiang Pan
发明人： William Partlo , John Algots , Gerry Blumenstock , Norbert Bowering , Alexander Ershov , Igor Fomenkov , Xiaojiang Pan
IPC分类号： G01J1/00
CPC分类号： H05G2/001 , B82Y10/00 , G03F7/70033 , G03F7/70175 , G03F7/70916 , G21K1/062
摘要： A method and apparatus for debris removal from a reflecting surface of an EUV collector in an EUV light source is disclosed which may comprise the reflecting surface comprises a first material and the debris comprises a second material and/or compounds of the second material, the system and method may comprise a controlled sputtering ion source which may comprise a gas comprising the atoms of the sputtering ion material; and a stimulating mechanism exciting the atoms of the sputtering ion material into an ionized state, the ionized state being selected to have a distribution around a selected energy peak that has a high probability of sputtering the second material and a very low probability of sputtering the first material. The stimulating mechanism may comprise an RF or microwave induction mechanism.
摘要翻译：公开了一种用于从EUV光源中的EUV收集器的反射表面去除碎屑的方法和装置，其可以包括反射表面，其包括第一材料，并且所述碎屑包括第二材料和/或第二材料的化合物，所述系统并且方法可以包括受控的溅射离子源，其可以包括包含溅射离子材料的原子的气体; 以及将溅射离子材料的原子激发成离子化状态的刺激机构，所选择的离子化状态具有围绕选择的能量峰的分布，其具有溅射第二材料的可能性很高，并且溅射的可能性非常低材料。刺激机构可以包括RF或微波感应机构。

7. 发明申请

US20060146906A1 LLP EUV drive laser 审中-公开
标题翻译： LLP EUV驱动激光
公开(公告)号：US20060146906A1
公开(公告)日：2006-07-06
申请号：US11324104
申请日：2005-12-29
申请人： Daniel Brown , Alexander Ershov , Vladimir Fleurov , Igor Fomenkov , William Partlo
发明人： Daniel Brown , Alexander Ershov , Vladimir Fleurov , Igor Fomenkov , William Partlo
IPC分类号： H01S3/22 , H01S3/223
CPC分类号： H01S3/225 , H01S3/094 , H01S3/10015 , H01S3/10023 , H01S3/109 , H01S3/1611 , H01S3/1653 , H01S3/2255 , H01S3/2308 , H01S3/2333 , H01S3/2366 , H01S3/2375 , H01S3/2383 , H05G2/003 , H05G2/005 , H05G2/008
摘要： An apparatus and method is disclosed which may comprise an EUV drive laser system comprising: a solid state seed laser master oscillator laser; a gas discharge excimer laser gain generator producing a drive laser output light beam. The solid state seed laser may comprise a third harmonic Nd:YLF laser, which may be tunable. The gas discharge excimer gain generator laser may comprise a XeF excimer laser power amplifier or power oscillator. The solid state laser may comprise a tunable laser tuned by changing the temperature of a laser crystal comprising the solid state laser, or by utilizing a wavelength selection element, e.g., a Lyot filter or an etalon.
摘要翻译：公开了一种可以包括EUV驱动激光系统的装置和方法，该系统包括：固态种子激光主振荡器激光器; 产生驱动激光输出光束的气体放电准分子激光增益发生器。固态种子激光器可以包括可调谐的三次谐波Nd：YLF激光器。气体放电准分子增益发生器激光器可以包括XeF准分子激光功率放大器或功率振荡器。固体激光器可以包括通过改变包括固态激光器的激光晶体的温度或通过利用波长选择元件例如Lyot滤光器或标准具来调节的可调谐激光器。

8. 发明申请

US20050199829A1 EUV light source 有权
公开(公告)号：US20050199829A1
公开(公告)日：2005-09-15
申请号：US10900839
申请日：2004-07-27
申请人： William Partlo , Norbert Bowering , Alexander Ershov , Igor Fomenkov , David Myers , Ian Oliver , John Viatella , Robert Jacques
发明人： William Partlo , Norbert Bowering , Alexander Ershov , Igor Fomenkov , David Myers , Ian Oliver , John Viatella , Robert Jacques
IPC分类号： G03F7/20 , G21K1/06 , H01J35/20 , H05G2/00 , H01J65/04
CPC分类号： G03F7/70033 , B82Y10/00 , G03F7/70175 , G03F7/70916 , G21K1/062 , G21K2201/061 , G21K2201/065 , G21K2201/067 , H05G2/003 , H05G2/005 , H05G2/006 , H05G2/008
摘要： An apparatus and method for EUV light production is disclosed which may comprise a laser produced plasma (“LPP”) extreme ultraviolet (“EUV”) light source control system comprising a target delivery system adapted to deliver moving plasma initiation targets and an EUV light collection optic having a focus defining a desired plasma initiation site, comprising: a target tracking and feedback system comprising: at least one imaging device providing as an output an image of a target stream track, wherein the target stream track results from the imaging speed of the camera being too slow to image individual plasma formation targets forming the target stream imaged as the target stream track; a stream track error detector detecting an error in the position of the target stream track in at least one axis generally perpendicular to the target stream track from a desired stream track intersecting the desired plasma initiation site. At least one target crossing detector may be aimed at the target track and detecting the passage of a plasma formation target through a selected point in the target track. A drive laser triggering mechanism utilizing an output of the target crossing detector to determine the timing of a drive laser trigger in order for a drive laser output pulse to intersect the plasma initiation target at a selected plasma initiation site along the target track at generally its closest approach to the desired plasma initiation site. A plasma initiation detector may be aimed at the target track and detecting the location along the target track of a plasma initiation site for a respective target. An intermediate focus illuminator may illuminate an aperture formed at the intermediate focus to image the aperture in the at least one imaging device. The at least one imaging device may be at least two imaging devices each providing an error signal related to the separation of the target track from the vertical centerline axis of the image of the intermediate focus based upon an analysis of the image in the respective one of the at least two imaging devices. A target delivery feedback and control system may comprise a target delivery unit; a target delivery displacement control mechanism displacing the target delivery mechanism at least in an axis corresponding to a first displacement error signal derived from the analysis of the image in the first imaging device and at least in an axis corresponding to a second displacement error signal derived from the analysis of the image in the second imaging device.

9. 发明申请

US20070023711A1 Discharge produced plasma EUV light source 失效
公开(公告)号：US20070023711A1
公开(公告)日：2007-02-01
申请号：US11493945
申请日：2006-07-26
申请人： Igor Fomenkov , William Partlo , Gerry Blumenstock , Nortbert Bowering , I. Oliver , Xiaojiang Pan , Rodney Simmons
发明人： Igor Fomenkov , William Partlo , Gerry Blumenstock , Nortbert Bowering , I. Oliver , Xiaojiang Pan , Rodney Simmons
IPC分类号： G01J3/10
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70175 , G03F7/70825 , G03F7/70891 , G03F7/70908 , G03F7/70916 , G21K1/06 , G21K2201/064 , G21K2201/067 , H01S3/005 , H01S3/225 , H05G2/005 , H05H1/06
摘要： An DPP EUV source is disclosed which may comprise a debris mitigation apparatus employing a metal halogen gas producing a metal halide from debris exiting the plasma. The EUV source may have a debris shield that may comprise a plurality of curvilinear shield members having inner and outer surfaces connected by light passages aligned to a focal point, which shield members may be alternated with open spaces between them and may have surfaces that form a circle in one axis of rotation and an ellipse in another. The electrodes may be supplied with a discharge pulse shaped to produce a modest current during the axial run out phase of the discharge and a peak occurring during the radial compression phase of the discharge. The light source may comprise a turbomolecular pump having an inlet connected to the generation chamber and operable to preferentially pump more of the source gas than the buffer gas from the chamber. The source may comprise a tuned electrically conductive electrode comprising: a differentially doped ceramic material doped in a first region to at least select electrical conductivity and in a second region at least to select thermal conductivity. The first region may be at or near the outer surface of the electrode structure and the ceramic material may be SiC or alumina and the dopant is BN or a metal oxide, including SiO or TiO2. The source may comprise a moveable electrode assembly mount operative to move the electrode assembly mount from a replacement position to an operating position, with the moveable mount on a bellows. The source may have a temperature control mechanism operatively connected to the collector and operative to regulate the temperature of the respective shell members to maintain a temperature related geometry optimizing the glancing angle of incidence reflections from the respective shell members, or a mechanical positioner to position the shell members. The shells may be biased with a voltage. The debris shield may be fabricated using off focus laser radiation. The anode may be cooled with a hollow interior defining two coolant passages or porous metal defining the passages. The debris shield may be formed of pluralities of large, intermediate and small fins attached either to a mounting ring or hub or to each other with interlocking tabs that provide uniform separation and strengthening and do not block any significant amount of light.

10. 发明申请

US20060289808A1 EUV LIGHT SOURCE COLLECTOR EROSION MITIGATION 有权
标题翻译： EUV光源收集器腐蚀减轻
公开(公告)号：US20060289808A1
公开(公告)日：2006-12-28
申请号：US11238828
申请日：2005-09-28
申请人： William Partlo , Alexander Ershov , Igor Fomenkov
发明人： William Partlo , Alexander Ershov , Igor Fomenkov
IPC分类号： H01J61/62
CPC分类号： G03F7/70916 , B82Y10/00 , G01J1/429 , G03F7/70033 , G03F7/70175 , G03F7/70983 , G21K1/062 , G21K2201/067 , H05G2/003
摘要： An EUV light source collector erosion mitigation system and method is disclosed which may comprise a collector comprising a multilayered mirror collector comprising a collector outer surface composed of a capping material subject to removal due to a removing interaction with materials created in an EUV light-creating plasma; a replacement material generator positioned to deliver replacement material comprising the capping material to the collector outer surface at a rate sufficient to replace the capping material removed due to the removing interaction. The replacement material generator may comprise a plurality of replacement material generators positioned to respectively deliver replacement material to a selected portion of the collector outer surface, which may comprise a sputtering mechanism sputtering replacement capping material onto the collector outer surface.
摘要翻译：公开了一种EUV光源收集器侵蚀缓解系统和方法，其可以包括收集器，其包括多层反射镜收集器，该多层反射镜收集器包括由封装材料构成的收集器外表面，该封盖材料由于与EUV发光等离子体中产生的材料的去除相互作用而被去除 ; 替代材料发生器定位成将包含封盖材料的替换材料以足以代替由于去除相互作用而去除的封盖材料的速率传送到收集器外表面。替代材料发生器可以包括多个替换材料发生器，其被定位成分别将替代材料递送到集电器外表面的选定部分，其可以包括溅射机构将溅射替换封盖材料涂覆到集电器外表面上。

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