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1. 发明申请

US20130328310A1 Systems and Methods for Combined Flow Control and Electricity Generation 失效
标题翻译：组合流量控制和发电系统与方法
公开(公告)号：US20130328310A1
公开(公告)日：2013-12-12
申请号：US13489708
申请日：2012-06-06
申请人： Timothy Dyer , Mark Richter , Rafael Andres Bañados Contreras , Chester L. Sandberg
发明人： Timothy Dyer , Mark Richter , Rafael Andres Bañados Contreras , Chester L. Sandberg
IPC分类号： F01D15/10
CPC分类号： F01D15/10 , F01K13/02
摘要： Systems and methods for combined flow control and electricity generation are described. Various embodiments may comprise an energy recovery device adapted to produce an electric current. At least a portion of the electric current may be used to power a pump. A control system may be adapted to adjust operating parameters of the system to stabilize or maximize the efficiency of the energy recovery device.
摘要翻译：描述了用于组合流量控制和发电的系统和方法。各种实施例可以包括适于产生电流的能量回收装置。可以使用至少一部分电流来为泵供电。控制系统可以适于调整系统的操作参数以稳定或最大化能量回收装置的效率。

2. 发明申请

US20080233403A1 Method of Making Ceramic Reactor Components and Ceramic Reactor Component Made Therefrom 审中-公开
标题翻译：制造陶瓷反应器部件和陶瓷反应器部件的方法
公开(公告)号：US20080233403A1
公开(公告)日：2008-09-25
申请号：US12026806
申请日：2008-02-06
申请人： Timothy Dyer , Ho Ouk , Louis Everett Jensen
发明人： Timothy Dyer , Ho Ouk , Louis Everett Jensen
IPC分类号： B32B3/00 , B28B11/08 , B29C59/14 , B32B18/00
CPC分类号： C04B41/53 , B28B11/0818 , C04B35/111 , C04B35/486 , C04B41/009 , C04B41/5031 , C04B41/5042 , C04B41/52 , C04B41/87 , C04B41/90 , C04B41/91 , C04B2235/604 , C04B2235/612 , C23C4/02 , C23C4/08 , C23C4/18 , C23C16/4404 , C23C28/322 , C23C28/3455 , H01J37/32431 , Y10T428/31 , C04B41/4578 , C04B41/4539 , C04B41/522 , C04B41/4527 , C04B41/5155 , C04B41/4529 , C04B41/5133 , C04B35/10 , C04B35/48
摘要： A method of improving the adhesion of processing materials on a ceramic component is described. The method includes the steps of forming a green ceramic component and texturing the surface of the green ceramic component. The as-textured component is then fired to harden the ceramic material. In an alternative embodiment of the method, a coating is applied to the surface of the as-fired ceramic component to provide a secondary adhesion layer. A ceramic component for use in an etching or deposition reactor chamber is also described. The ceramic component includes a substrate formed of a ceramic material and has a textured surface formed thereon such that the textured surface has a roughness of about 100 to 1000 μin Ra.
摘要翻译：描述了一种提高加工材料在陶瓷部件上的附着力的方法。该方法包括形成生陶瓷组分并使生陶瓷组分的表面纹理化的步骤。然后烧结该织构的组分以使陶瓷材料硬化。在该方法的替代实施例中，将涂层施加到烧制陶瓷部件的表面以提供第二粘合层。还描述了用于蚀刻或沉积反应器室的陶瓷部件。陶瓷部件包括由陶瓷材料形成并具有形成在其上的织纹表面的基底，使得纹理化表面的粗糙度为约100至1000μmol。

3. 发明申请

US20060114957A1 Line narrowing module 有权
公开(公告)号：US20060114957A1
公开(公告)日：2006-06-01
申请号：US11000684
申请日：2004-11-30
申请人： J. Martin Algots , Robert Bergstedt , Walter Gillespie , Vladimir Kulgeyko , William Partlo , German Rylov , Richard Sandstrom , Brian Strate , Timothy Dyer
发明人： J. Martin Algots , Robert Bergstedt , Walter Gillespie , Vladimir Kulgeyko , William Partlo , German Rylov , Richard Sandstrom , Brian Strate , Timothy Dyer
IPC分类号： H01S3/22
CPC分类号： H01S3/1055 , G03F7/70025 , G03F7/70041 , H01S3/005 , H01S3/036 , H01S3/08 , H01S3/08004 , H01S3/08059 , H01S3/097 , H01S3/106 , H01S3/2251
摘要： A line narrowing method and module for a narrow band DUV high power high repetition rate gas discharge laser producing output laser light pulse beam pulses in bursts of pulses, the module having a nominal optical path are disclosed which may comprise: a dispersive center wavelength selection optic moveably mounted within an optical path of the line narrowing module, selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the laser light pulse beam containing the respective pulse on the dispersive wavelength selection optic; a first tuning mechanism operative in part to select the angle of incidence of the laser light pulse beam containing the respective pulse upon the dispersive center wavelength selection optic, by selecting an angle of transmission of the laser light pulse beam containing the pulse toward the dispersive center wavelength selection optic; a second tuning mechanism operative in part to select the angle of incidence of the laser light pulse beam containing the respective pulse by changing the position of the dispersive center wavelength selection optic relative to the nominal optical path of the line narrowing module; wherein the second tuning mechanism coarsely selects a value for the center wavelength and the first tuning mechanism more finely selects the value for the center wavelength. The apparatus and method may further comprise at least one beam expanding and redirecting prism in the optical path of the line narrowing module; the first tuning mechanism selecting an angle of incidence of the at least a first spatially defined portion of the laser light pulse beam by changing the position of the at least one beam expanding prism relative to the nominal optical path of the line narrowing module. The first and second tuning mechanisms may be controlled by a center wavelength controller during a burst based upon feedback from a center wavelength detector detecting the center wavelength of at least one other pulse in the burst of pulses and the controller providing the feedback based upon an algorithm employing the detected center wavelength for the at least one other pulse in the burst. The first tuning mechanism may comprise an electro-mechanical course positioning mechanism and a fine positioning mechanism comprising an actuatable material that changes position or shape when actuated.

4. 发明申请

US20050009452A1 ORBITING INDEXABLE BELT POLISHING STATION FOR CHEMICAL MECHANICAL POLISHING 失效
标题翻译：用于化学机械抛光的可索引的皮带抛光站
公开(公告)号：US20050009452A1
公开(公告)日：2005-01-13
申请号：US10711229
申请日：2004-09-02
申请人： Saket Chadda , Timothy Dyer , Clinton Fruitman
发明人： Saket Chadda , Timothy Dyer , Clinton Fruitman
IPC分类号： B24B21/04 , B24B37/10 , B24B1/00
CPC分类号： B24B37/105 , B24B21/04
摘要： An apparatus for planarizing a workpiece has a web with a face which is positioned adjacent the workpiece during planarization. At least one tension assembly is configured to maintain tension of the web. An orbiting assembly is configured to orbit the web relative to the workpiece. The apparatus for planarizing a workpiece may include first and second polishing surfaces where the first polishing surface has a substantially horizontal web with a face which is positioned adjacent the workpiece during the planarization process. The apparatus may also have a rotatable carousel and at least two workpiece carriers suspended from the carousel. Each of the carriers is configured to carry a workpiece and press the workpiece against one of the polishing surfaces while causing relative motion between the workpiece and the polishing surface. An apparatus for planarizing a workpiece which includes a plurality of polishing stations is also disclosed. At least one of the polishing stations has a web with a first face which is positioned adjacent the workpiece during planarization . The apparatus also includes an orbiting assembly configured to orbit the web relative to the workpiece.
摘要翻译：用于平坦化工件的装置具有在平坦化期间具有与工件相邻定位的面的腹板。至少一个张力组件被配置成保持卷材的张力。轨道组件被配置为相对于工件来绕轨道轨道。用于平坦化工件的设备可以包括第一和第二抛光表面，其中第一抛光表面具有基本上水平的腹板，其中在平坦化过程期间邻近工件定位面。该装置还可以具有可旋转的转盘和至少两个从转盘中悬挂的工件载体。每个载体构造成承载工件并将工件压靠在抛光表面之一上，同时引起工件和抛光表面之间的相对运动。还公开了一种用于平坦化包括多个抛光站的工件的设备。抛光站中的至少一个具有在平坦化期间具有与工件相邻定位的第一面的腹板。该装置还包括构造成相对于工件使幅材轨道运动的轨道组件。

5. 发明授权

US5720818A Conduits for flow of heat transfer fluid to the surface of an electrostatic chuck 失效
公开(公告)号：US5720818A
公开(公告)日：1998-02-24
申请号：US639596
申请日：1996-04-26
申请人： Arik Donde , Dan Maydan , Robert J. Steger , Edwin C. Weldon , Brian Lue , Timothy Dyer
发明人： Arik Donde , Dan Maydan , Robert J. Steger , Edwin C. Weldon , Brian Lue , Timothy Dyer
IPC分类号： B23Q3/15 , C23C16/458 , H01L21/683 , C23C16/00
CPC分类号： H01J37/321 , C23C16/4586 , H01L21/6831 , H01L21/6833 , H01J2237/2001 , Y10T29/49002 , Y10T29/49826 , Y10T29/49885
摘要： The present invention discloses a two basic structures (including multiple variations within one of the basic structures) and methods for fabrication of the structures which facilitate the flow of cooling gas or other heat transfer fluid to the surface of an electrostatic chuck. The basic structures address both the problem of breakdown of a heat transfer gas in an RF plasma environment and the problem of arcing between a semiconductor substrate and the conductive pedestal portion of the electrostatic chuck in such an RF plasma environment.

6. 发明授权

US10648148B2 Sheet for use in ground works 有权
公开(公告)号：US10648148B2
公开(公告)日：2020-05-12
申请号：US15765605
申请日：2016-10-06
申请人： Timothy Dyer
发明人： Timothy Dyer
IPC分类号： E01C5/20 , E02D17/20 , E02D31/02 , E01C3/00
摘要： A sheet for use in ground works, the sheet having an upper face with an plurality of openings therein, a lower face configured so as to permit liquid to drain through the sheet and a spacing arrangement to separate the upper face from the lower face and define a volume therebetween, where the volume is capable of receiving an infill material via the openings in the upper face. The lower face of the sheet is configured to be interengageably secured to an upper face of a similar further sheet.

7. 发明授权

US08742604B2 Systems and methods for combined flow control and electricity generation 失效
标题翻译：用于组合流量控制和发电的系统和方法
公开(公告)号：US08742604B2
公开(公告)日：2014-06-03
申请号：US13489708
申请日：2012-06-06
申请人： Timothy Dyer , Mark Richter , Rafael Andres Bañados Contreras , Chester L. Sandberg
发明人： Timothy Dyer , Mark Richter , Rafael Andres Bañados Contreras , Chester L. Sandberg
IPC分类号： F01K25/02
CPC分类号： F01D15/10 , F01K13/02
摘要： Systems and methods for combined flow control and electricity generation are described. Various embodiments may include an energy recovery device adapted to produce an electric current. At least a portion of the electric current may be used to power a pump. A control system may be adapted to adjust operating parameters of the system to stabilize or maximize the efficiency of the energy recovery device.
摘要翻译：描述了用于组合流量控制和发电的系统和方法。各种实施例可以包括适于产生电流的能量回收装置。可以使用至少一部分电流来为泵供电。控制系统可以适于调整系统的操作参数以稳定或最大化能量回收装置的效率。

8. 发明申请

US20080002752A1 Anodes for fluorine gas discharge lasers 有权
标题翻译：氟气放电激光器阳极
公开(公告)号：US20080002752A1
公开(公告)日：2008-01-03
申请号：US11818022
申请日：2007-06-11
申请人： Timothy Dyer , Richard Morton , Walter Gillespie , Thomas Steiger
发明人： Timothy Dyer , Richard Morton , Walter Gillespie , Thomas Steiger
IPC分类号： H01S3/097 , H01S3/03 , H01S3/22
CPC分类号： H01S3/038 , H01S3/036 , H01S3/0381 , H01S3/0382 , H01S3/0385 , H01S3/0388 , H01S3/097 , H01S3/09702 , H01S3/09713 , H01S3/225 , H01S3/2251 , H01S3/2256
摘要： Electrodes for a fluorine gas discharge laser are disclosed which may comprise a crown straddling the centerline axis between the pair of side walls and the pair of end walls, comprising a first material, forming at least a portion of the discharge region of the electrode; the crown in traverse cross section having the shape of the upper half of a canted ellipse rotated in the preionizer direction, such that a tangent to the short centerline axis of the ellipse forms an angle with the horizontal. Another embodiment may comprise an anode blade having a top portion and a first and second sidewall portion each intersecting the top portion; the anode blade being formed with the shape in cross section of the top portion being curvilinear and intersecting the generally straight potions of each of first and second sidewall portions along a radius of curvature and with the top portion beveled away from an asymmetric discharge side of the anode.
摘要翻译：公开了一种用于氟气体放电激光器的电极，其可以包括跨越所述一对侧壁和所述一对端壁之间的中心线轴线的冠，包括形成电极的放电区域的至少一部分的第一材料; 横截面的冠部具有以预旋转方向旋转的倾斜椭圆的上半部的形状，使得与椭圆形的短中心线轴线的切线与水平方向成一角度。另一实施例可以包括具有顶部部分和分别与顶部部分相交的第一和第二侧壁部分的阳极刀片; 阳极叶片形成为顶部部分的横截面形状为曲线形状，并且沿着曲率半径与第一和第二侧壁部分的每一个的大体上直的部分相交，并且顶部部分斜切远离第一和第二侧壁部分的不对称排出侧阳极。

9. 发明申请

US20070170378A1 EUV light source optical elements 审中-公开
公开(公告)号：US20070170378A1
公开(公告)日：2007-07-26
申请号：US11725940
申请日：2007-03-19
申请人： Norbert Bowering , Alexander Ershov , Timothy Dyer , Hugh Grinolds
发明人： Norbert Bowering , Alexander Ershov , Timothy Dyer , Hugh Grinolds
IPC分类号： G01J3/10
CPC分类号： G21K1/062 , B82Y10/00 , G03F7/70175 , G03F7/70916
摘要： Apparatus and methods are disclosed for forming plasma generated EUV light source optical elements, e.g., reflectors comprising MLM stacks employing various binary layer materials and capping layer(s) including single and binary capping layers for utilization in plasma generated EUV light source chambers, particularly where the plasma source material is reactive with one or more of the MLM materials.

10. 发明申请

US20050230645A1 Extreme ultraviolet light source 失效
公开(公告)号：US20050230645A1
公开(公告)日：2005-10-20
申请号：US11107535
申请日：2005-04-14
申请人： Stephan Melnychuk , William Partlo , Igor Fomenkov , I. Oliver , Richard Ness , Norbert Bowering , Oleh Khodykin , Curtis Rettig , Gerry Blumenstock , Timothy Dyer , Rodney Simmons , Jerzy Hoffman , R. Johnson
发明人： Stephan Melnychuk , William Partlo , Igor Fomenkov , I. Oliver , Richard Ness , Norbert Bowering , Oleh Khodykin , Curtis Rettig , Gerry Blumenstock , Timothy Dyer , Rodney Simmons , Jerzy Hoffman , R. Johnson
IPC分类号： G21K5/00 , G01J1/00 , G03F7/20 , G21K5/02 , H01L21/027 , H01S3/00 , H05G2/00 , H05H1/06 , H05H1/24
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70175 , G03F7/70916 , H01S3/005 , H05G2/005 , H05G2/008 , H05H1/06
摘要： The present invention provides a reliable, high-repetition rate, production line compatible high energy photon source. A very hot plasma containing an active material is produced in vacuum chamber. The active material is an atomic element having an emission line within a desired extreme ultraviolet (EUV) range. A pulse power source comprising a charging capacitor and a magnetic compression circuit comprising a pulse transformer, provides electrical pulses having sufficient energy and electrical potential sufficient to produce the EUV light at an intermediate focus at rates in excess of 5 Watts. In preferred embodiments designed by Applicants in-band, EUV light energy at the intermediate focus is 45 Watts extendable to 105.8 Watts.

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