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1. 发明申请

US20060131515A1 Collector for EUV light source 有权
标题翻译： EUV光源收集器
公开(公告)号：US20060131515A1
公开(公告)日：2006-06-22
申请号：US10798740
申请日：2004-03-10
申请人： William Partlo , John Algots , Gerry Blumenstock , Norbert Bowering , Alexander Ershov , Igor Fomenkov , Xiaojiang Pan
发明人： William Partlo , John Algots , Gerry Blumenstock , Norbert Bowering , Alexander Ershov , Igor Fomenkov , Xiaojiang Pan
IPC分类号： G01J1/00
CPC分类号： H05G2/001 , B82Y10/00 , G03F7/70033 , G03F7/70175 , G03F7/70916 , G21K1/062
摘要： A method and apparatus for debris removal from a reflecting surface of an EUV collector in an EUV light source is disclosed which may comprise the reflecting surface comprises a first material and the debris comprises a second material and/or compounds of the second material, the system and method may comprise a controlled sputtering ion source which may comprise a gas comprising the atoms of the sputtering ion material; and a stimulating mechanism exciting the atoms of the sputtering ion material into an ionized state, the ionized state being selected to have a distribution around a selected energy peak that has a high probability of sputtering the second material and a very low probability of sputtering the first material. The stimulating mechanism may comprise an RF or microwave induction mechanism.
摘要翻译：公开了一种用于从EUV光源中的EUV收集器的反射表面去除碎屑的方法和装置，其可以包括反射表面，其包括第一材料，并且所述碎屑包括第二材料和/或第二材料的化合物，所述系统并且方法可以包括受控的溅射离子源，其可以包括包含溅射离子材料的原子的气体; 以及将溅射离子材料的原子激发成离子化状态的刺激机构，所选择的离子化状态具有围绕选择的能量峰的分布，其具有溅射第二材料的可能性很高，并且溅射的可能性非常低材料。刺激机构可以包括RF或微波感应机构。

2. 发明申请

US20060289808A1 EUV LIGHT SOURCE COLLECTOR EROSION MITIGATION 有权
标题翻译： EUV光源收集器腐蚀减轻
公开(公告)号：US20060289808A1
公开(公告)日：2006-12-28
申请号：US11238828
申请日：2005-09-28
申请人： William Partlo , Alexander Ershov , Igor Fomenkov
发明人： William Partlo , Alexander Ershov , Igor Fomenkov
IPC分类号： H01J61/62
CPC分类号： G03F7/70916 , B82Y10/00 , G01J1/429 , G03F7/70033 , G03F7/70175 , G03F7/70983 , G21K1/062 , G21K2201/067 , H05G2/003
摘要： An EUV light source collector erosion mitigation system and method is disclosed which may comprise a collector comprising a multilayered mirror collector comprising a collector outer surface composed of a capping material subject to removal due to a removing interaction with materials created in an EUV light-creating plasma; a replacement material generator positioned to deliver replacement material comprising the capping material to the collector outer surface at a rate sufficient to replace the capping material removed due to the removing interaction. The replacement material generator may comprise a plurality of replacement material generators positioned to respectively deliver replacement material to a selected portion of the collector outer surface, which may comprise a sputtering mechanism sputtering replacement capping material onto the collector outer surface.
摘要翻译：公开了一种EUV光源收集器侵蚀缓解系统和方法，其可以包括收集器，其包括多层反射镜收集器，该多层反射镜收集器包括由封装材料构成的收集器外表面，该封盖材料由于与EUV发光等离子体中产生的材料的去除相互作用而被去除 ; 替代材料发生器定位成将包含封盖材料的替换材料以足以代替由于去除相互作用而去除的封盖材料的速率传送到收集器外表面。替代材料发生器可以包括多个替换材料发生器，其被定位成分别将替代材料递送到集电器外表面的选定部分，其可以包括溅射机构将溅射替换封盖材料涂覆到集电器外表面上。

3. 发明申请

US20050286598A1 Laser output beam wavefront splitter for bandwidth spectrum control 有权
公开(公告)号：US20050286598A1
公开(公告)日：2005-12-29
申请号：US10875662
申请日：2004-06-23
申请人： Richard Sandstrom , Daniel Brown , Alexander Ershov , Igor Fomenkov , William Partlo
发明人： Richard Sandstrom , Daniel Brown , Alexander Ershov , Igor Fomenkov , William Partlo
IPC分类号： G03F7/20 , H01S3/08 , H01S3/097 , H01S3/10 , H01S3/1055 , H01S3/13 , H01S3/22
CPC分类号： H01S3/0812 , G03F7/70025 , G03F7/70575 , H01S3/08059 , H01S3/097 , H01S3/1055 , H01S3/1305
摘要： An apparatus and method for providing bandwidth control in a narrow band short pulse duration gas discharge laser output light pulse beam producing system, producing a beam comprising laser output light pulses at a selected pulse repetition rate, is disclosed which may comprise a dispersive bandwidth selection optic selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the laser light pulse beam containing the respective pulse on the dispersive wavelength selection optic; a tuning mechanism operative to select at least one angle of incidence of the a laser light pulse beam containing the respective pulse upon the dispersive center wavelength selection optic; the tuning mechanism comprising a plurality of incidence angle selection elements each defining an angle of incidence for a different spatially separated but not temporally separated portion of the laser light pulse to return from the dispersive center wavelength selection optic a laser light pulse comprising a plurality of spatially separated but not temporally separated portions, each portion having one of at least two different selected center wavelengths. The tuning mechanism may comprise a temporal angle of incidence selection element defining an angle of incidence for different temporally separated portions of the pulse to return from the dispersive bandwidth selection optic a laser beam comprising a plurality of temporally separated portions of each pulse, each temporally separated portion of each pulse having one of at least two different selected center wavelengths. The tuning mechanism may comprise a plurality of spatial incidence angle selection elements each defining an angle of incidence for a spatially separated but not temporally separated portion of the laser light pulse, and a plurality of temporal angle of incidence selection elements each defining at least a first angle of incidence for at least a first temporally separated portion of each spatially separated but not temporally separated portion of the pulse and a second angle of incidence for a second temporally separated but not spatially separated portion of each spatially separated portion of the pulse.

4. 发明申请

US20050269529A1 Systems and methods for reducing the influence of plasma-generated debris on the internal components of an EUV light source 有权
标题翻译：用于减少等离子体产生的碎片对EUV光源的内部部件的影响的系统和方法
公开(公告)号：US20050269529A1
公开(公告)日：2005-12-08
申请号：US11174442
申请日：2005-06-29
申请人： Alexander Ershov , William Marx , Norbert Bowering , Bjorn Hansson , Oleh Khodykin , Igor Fomenkov , William Partlo
发明人： Alexander Ershov , William Marx , Norbert Bowering , Bjorn Hansson , Oleh Khodykin , Igor Fomenkov , William Partlo
IPC分类号： G03F7/20 , G01J1/00
CPC分类号： B82Y10/00 , G03F7/70033 , G03F7/70175 , G03F7/7085 , G03F7/70916 , G21K1/06 , G21K2201/06 , H05G2/001
摘要： Systems and methods are disclosed for reducing the influence of plasma generated debris on internal components of an EUV light source. In one aspect, an EUV metrology monitor is provided which may have a heater to heat an internal multi-layer filtering mirror to a temperature sufficient to remove deposited debris from the mirror. In another aspect, a device is disclosed for removing plasma generated debris from an EUV light source collector mirror having a different debris deposition rate at different zones on the collector mirror. In a particular aspect, an EUV collector mirror system may comprise a source of hydrogen to combine with Li debris to create LiH on a collector surface; and a sputtering system to sputter LiH from the collector surface. In another aspect, an apparatus for etching debris from a surface of a EUV light source collector mirror with a controlled plasma etch rate is disclosed.
摘要翻译：公开了用于减少等离子体产生的碎片对EUV光源的内部部件的影响的系统和方法。在一个方面，提供了一种EUV计量监测器，其可以具有加热器以将内部多层过滤镜加热到足以从反射镜去除沉积的碎屑的温度。在另一方面，公开了一种用于从收集器反射镜上的不同区域处具有不同碎屑沉积速率的EUV光源收集镜去除等离子体产生的碎屑的装置。在特定方面，EUV收集器镜系统可以包括氢源以与Li碎片结合以在收集器表面上产生LiH; 以及从收集器表面溅射LiH的溅射系统。在另一方面，公开了一种用于从具有受控等离子体蚀刻速率的EUV光源收集镜的表面蚀刻碎片的装置。

5. 发明申请

US20050205811A1 LPP EUV light source 失效
标题翻译： LPP EUV光源
公开(公告)号：US20050205811A1
公开(公告)日：2005-09-22
申请号：US10979919
申请日：2004-11-01
申请人： William Partlo , Daniel Brown , Igor Fomenkov , Norbert Bowering , Curtis Rettig , Joseph MacFarlane , Alexander Ershov , Bjorn Hansson
发明人： William Partlo , Daniel Brown , Igor Fomenkov , Norbert Bowering , Curtis Rettig , Joseph MacFarlane , Alexander Ershov , Bjorn Hansson
IPC分类号： G01J1/00 , G03F7/20 , H01J65/04 , H05G2/00
CPC分类号： B82Y10/00 , G03F7/70033 , H05G2/003 , H05G2/008
摘要： An apparatus and method is described for effectively and efficiently providing plasma irradiation laser light pulses in an LPP EUV light source which may comprise a laser initial target irradiation pulse generating mechanism irradiating a plasma initiation target with an initial target irradiation pulse to form an EUV generating plasma having an emission region emitting in-band EUV light; a laser plasma irradiation pulse generating mechanism irradiating the plasma with a plasma irradiation pulse after the initial target irradiation pulse so as to compress emission material in the plasma toward the emission region of the plasma. The plasma irradiation pulse may comprise a laser pulse having a wavelength that is sufficiently longer than a wavelength of the initial target irradiation pulse to have an associated lower critical density resulting in absorption occurring within the plasma in a region of the plasma defined by the wavelength of the plasma irradiation pulse sufficiently separated from an initial target irradiation site to achieve compression of the emission material, and the may compress the emission region. The laser plasma irradiation pulse may produce an aerial mass density in the ablating cloud of the plasma sufficient to confine the favorably emitting plasma for increased conversion efficiency. The deposition region for the plasma irradiation pulse may be is removed enough from the initial target surface so as to insure compression of the favorably emitting plasma. A high conversion efficiency laser produced plasma extreme ultraviolet (“EUV”) light source may comprise a laser initial target irradiation pulse generating mechanism irradiating a plasma initiation target with a target irradiation pulse to form an EUV generating plasma emitting in-band EUV light; a plasma tamper substantially surrounding the plasma to constrain the expansion of the plasma.
摘要翻译：描述了一种用于在LPP EUV光源中有效且有效地提供等离子体照射激光脉冲的装置和方法，其可以包括用初始目标照射脉冲照射等离子体引发目标的激光初始靶照射脉冲发生机构以形成产生EUV的等离子体具有发射带内EUV光的发射区域; 激光等离子体照射脉冲发生机构在初始目标照射脉冲之后用等离子体照射脉冲照射等离子体，以将等离子体中的发射材料压缩到等离子体的发射区域。等离子体照射脉冲可以包括具有足够长于初始靶照射脉冲的波长的波长的激光脉冲，以具有相关联的较低的临界密度，从而在由等离子体的波长定义的等离子体的区域内的等离子体内发生吸收等离子体照射脉冲从初始目标照射位置充分分离，以实现发射材料的压缩，并且可以压缩发射区域。激光等离子体照射脉冲可以在等离子体的消融云中产生足够的空气质量密度以限制有利的发射等离子体以提高转换效率。可以从初始目标表面去除等离子体照射脉冲的沉积区域，以确保有利地发射等离子体的压缩。高转换效率的激光产生的等离子体极紫外（“EUV”）光源可以包括激光初始靶照射脉冲发生机构，用目标照射脉冲照射等离子体引发目标，以形成产生EUV的发射等离子体的带内EUV光; 等离子体篡改基本上围绕等离子体以约束等离子体的膨胀。

6. 发明申请

US20060146906A1 LLP EUV drive laser 审中-公开
标题翻译： LLP EUV驱动激光
公开(公告)号：US20060146906A1
公开(公告)日：2006-07-06
申请号：US11324104
申请日：2005-12-29
申请人： Daniel Brown , Alexander Ershov , Vladimir Fleurov , Igor Fomenkov , William Partlo
发明人： Daniel Brown , Alexander Ershov , Vladimir Fleurov , Igor Fomenkov , William Partlo
IPC分类号： H01S3/22 , H01S3/223
CPC分类号： H01S3/225 , H01S3/094 , H01S3/10015 , H01S3/10023 , H01S3/109 , H01S3/1611 , H01S3/1653 , H01S3/2255 , H01S3/2308 , H01S3/2333 , H01S3/2366 , H01S3/2375 , H01S3/2383 , H05G2/003 , H05G2/005 , H05G2/008
摘要： An apparatus and method is disclosed which may comprise an EUV drive laser system comprising: a solid state seed laser master oscillator laser; a gas discharge excimer laser gain generator producing a drive laser output light beam. The solid state seed laser may comprise a third harmonic Nd:YLF laser, which may be tunable. The gas discharge excimer gain generator laser may comprise a XeF excimer laser power amplifier or power oscillator. The solid state laser may comprise a tunable laser tuned by changing the temperature of a laser crystal comprising the solid state laser, or by utilizing a wavelength selection element, e.g., a Lyot filter or an etalon.
摘要翻译：公开了一种可以包括EUV驱动激光系统的装置和方法，该系统包括：固态种子激光主振荡器激光器; 产生驱动激光输出光束的气体放电准分子激光增益发生器。固态种子激光器可以包括可调谐的三次谐波Nd：YLF激光器。气体放电准分子增益发生器激光器可以包括XeF准分子激光功率放大器或功率振荡器。固体激光器可以包括通过改变包括固态激光器的激光晶体的温度或通过利用波长选择元件例如Lyot滤光器或标准具来调节的可调谐激光器。

7. 发明申请

US20050271109A1 VERY NARROW BAND, TWO CHAMBER, HIGH REP-RATE GAS DISCHARGE LASER SYSTEM 有权
标题翻译：非常窄带，两个室，高倍率气体放电激光系统
公开(公告)号：US20050271109A1
公开(公告)日：2005-12-08
申请号：US11199691
申请日：2005-08-09
申请人： David Knowles , Daniel Brown , Herve Besaucele , David Myers , Alexander Ershov , William Partlo , Richard Sandstrom , Palash Das , Stuart Anderson , Igor Fomenkov , Richard Ujazdowski , Eckehard Onkels , Richard Ness , Scot Smith , William Hulburd , Jeffrey Oicles
发明人： David Knowles , Daniel Brown , Herve Besaucele , David Myers , Alexander Ershov , William Partlo , Richard Sandstrom , Palash Das , Stuart Anderson , Igor Fomenkov , Richard Ujazdowski , Eckehard Onkels , Richard Ness , Scot Smith , William Hulburd , Jeffrey Oicles
IPC分类号： H01S1/00 , G01J1/42 , G01J9/00 , G03F7/20 , H01S3/00 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/04 , H01S3/041 , H01S3/08 , H01S3/0943 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/102 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/11 , H01S3/13 , H01S3/131 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/223 , H01S3/225 , H01S3/23
CPC分类号： G01J1/4257 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70483 , G03F7/70575 , G03F7/70933 , H01S3/005 , H01S3/0057 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0387 , H01S3/0404 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/08036 , H01S3/0943 , H01S3/097 , H01S3/09702 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333 , H01S3/2366
摘要： An oscillator-amplifier gas discharge laser system and method is disclosed which may comprise a first laser unit which may comprise a first discharge region which may contain an excimer or molecular fluorine lasing gas medium; a first pair of electrodes defining the first discharge region containing the lasing gas medium, a line narrowing unit for narrowing a spectral bandwidth of output laser light pulse beam pulses produced in said first discharge region; a second laser unit which may comprise a second discharge chamber which may contain an excimer or molecular fluorine lasing gas medium; a second pair of electrodes defining the second discharge region containing the lasing gas medium; a pulse power system providing electrical pulses to the first pair of electrodes and to the second pair of electrodes producing gas discharges in the lasing gas medium between the respective first and second pair of electrodes, and laser parameter control mechanism modifying a selected parameter of a selected laser output light pulse beam pulse produced by said gas discharge laser system by controlling the timing of the occurrence of the gas discharge between the first pair of electrodes and the occurrence of the gas discharge between the second pair of electrodes.
摘要翻译：公开了一种振荡放大器气体放电激光器系统和方法，其可以包括第一激光器单元，该第一激光器单元可以包括可包含受激准分子或分子氟激光气体介质的第一放电区域; 限定含有激光气体介质的第一放电区域的第一对电极，用于使在所述第一放电区域中产生的输出激光脉冲光束脉冲的光谱带宽变窄的线窄化单元; 第二激光单元，其可以包括可包含受激准分子或分子氟激光气体介质的第二放电室; 限定包含所述激光气体介质的所述第二放电区域的第二对电极; 脉冲功率系统，其向所述第一对电极和所述第二对电极提供电脉冲，在所述相应的第一和第二对电极之间的所述激光气体介质中产生气体放电，以及激光参数控制机构修改所选择的所选择的参数通过控制第一对电极之间的气体放电的发生时间和第二对电极之间的气体放电的发生的时间，由所述气体放电激光系统产生的激光输出光脉冲束脉冲。

8. 发明申请

US20050199829A1 EUV light source 有权
公开(公告)号：US20050199829A1
公开(公告)日：2005-09-15
申请号：US10900839
申请日：2004-07-27
申请人： William Partlo , Norbert Bowering , Alexander Ershov , Igor Fomenkov , David Myers , Ian Oliver , John Viatella , Robert Jacques
发明人： William Partlo , Norbert Bowering , Alexander Ershov , Igor Fomenkov , David Myers , Ian Oliver , John Viatella , Robert Jacques
IPC分类号： G03F7/20 , G21K1/06 , H01J35/20 , H05G2/00 , H01J65/04
CPC分类号： G03F7/70033 , B82Y10/00 , G03F7/70175 , G03F7/70916 , G21K1/062 , G21K2201/061 , G21K2201/065 , G21K2201/067 , H05G2/003 , H05G2/005 , H05G2/006 , H05G2/008
摘要： An apparatus and method for EUV light production is disclosed which may comprise a laser produced plasma (“LPP”) extreme ultraviolet (“EUV”) light source control system comprising a target delivery system adapted to deliver moving plasma initiation targets and an EUV light collection optic having a focus defining a desired plasma initiation site, comprising: a target tracking and feedback system comprising: at least one imaging device providing as an output an image of a target stream track, wherein the target stream track results from the imaging speed of the camera being too slow to image individual plasma formation targets forming the target stream imaged as the target stream track; a stream track error detector detecting an error in the position of the target stream track in at least one axis generally perpendicular to the target stream track from a desired stream track intersecting the desired plasma initiation site. At least one target crossing detector may be aimed at the target track and detecting the passage of a plasma formation target through a selected point in the target track. A drive laser triggering mechanism utilizing an output of the target crossing detector to determine the timing of a drive laser trigger in order for a drive laser output pulse to intersect the plasma initiation target at a selected plasma initiation site along the target track at generally its closest approach to the desired plasma initiation site. A plasma initiation detector may be aimed at the target track and detecting the location along the target track of a plasma initiation site for a respective target. An intermediate focus illuminator may illuminate an aperture formed at the intermediate focus to image the aperture in the at least one imaging device. The at least one imaging device may be at least two imaging devices each providing an error signal related to the separation of the target track from the vertical centerline axis of the image of the intermediate focus based upon an analysis of the image in the respective one of the at least two imaging devices. A target delivery feedback and control system may comprise a target delivery unit; a target delivery displacement control mechanism displacing the target delivery mechanism at least in an axis corresponding to a first displacement error signal derived from the analysis of the image in the first imaging device and at least in an axis corresponding to a second displacement error signal derived from the analysis of the image in the second imaging device.

9. 发明申请

US20080179548A1 Laser produced plasma EUV light source 有权
标题翻译：激光产生等离子体EUV光源
公开(公告)号：US20080179548A1
公开(公告)日：2008-07-31
申请号：US11786145
申请日：2007-04-10
申请人： Alexander Bykanov , Norbert Bowering , Igor Fomenkov , David Brandt , Alexander Ershov , Oleh Khodykin , William Partlo
发明人： Alexander Bykanov , Norbert Bowering , Igor Fomenkov , David Brandt , Alexander Ershov , Oleh Khodykin , William Partlo
IPC分类号： H05H1/24
CPC分类号： G03F7/70916 , B82Y10/00 , G03F7/70033 , G03F7/70908 , G03F7/70983 , H05G2/003 , H05G2/008
摘要： A device is disclosed which may comprise a system generating a plasma at a plasma site, the plasma producing EUV radiation and ions exiting the plasma. The device may also include an optic, e.g., a multi-layer mirror, distanced from the site by a distance, d, and a flowing gas disposed between the plasma and optic, the gas establishing a gas pressure sufficient to operate over the distance, d, to reduce ion energy below a pre-selected value before the ions reach the optic. In one embodiment, the gas may comprise hydrogen and in a particular embodiment, the gas may comprise greater than 50 percent hydrogen by volume.
摘要翻译：公开了一种可以包括在等离子体位置处产生等离子体的系统，等离子体产生EUV辐射和离开等离子体的离子的装置。该装置还可以包括一个光学元件，例如多个远离现场的多层反射镜，以及设置在等离子体和光学元件之间的流动气体，该气体建立足以在该距离上操作的气体压力， d，在离子到达光学器件之前，将离子能量降低到预先选定的值以下。在一个实施方案中，气体可以包含氢气，并且在一个具体实施方案中，气体可以包含大于50体积％的氢气。

10. 发明申请

US20070114469A1 Collector for EUV light source 失效
公开(公告)号：US20070114469A1
公开(公告)日：2007-05-24
申请号：US11603670
申请日：2006-11-21
申请人： William Partlo , Norbert Bowering , Alexander Ershov , Igor Fomenkov
发明人： William Partlo , Norbert Bowering , Alexander Ershov , Igor Fomenkov
IPC分类号： G01J3/10
CPC分类号： H05G2/001 , B82Y10/00 , G03F7/70033 , G03F7/70175 , G03F7/70916 , G21K1/062
摘要： It will be understood that an apparatus and method is disclosed, which may comprise a multi-layer reflecting coating forming an EUV reflective surface which may comprise a spectral filter tuned to selectively highly reflect light in a band centered about at a first preferred wavelength and to significantly reduce the reflection of light at a band centered about a second wavelength, e.g., it may be tuned to reflect maximally or almost maximally, near the top of the reflectivity curve, e.g., at around 13.5 nm and at a significantly lower reflectivity at, e.g., around 11 nm, to discriminate against light near 11 nm and favor light at around 13.5 nm. The spectral filter may comprise a plurality of nested grazing angle of incidence shells comprising reflective surfaces comprising the multi-layer reflective coating. e.g. multilayer mirrors, e.g., with one or more reflecting surfaces per shell.

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