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1. 发明授权

US08710473B2 Droplet generation and detection device, and droplet control device 有权
标题翻译：液滴生成和检测装置，以及液滴控制装置
公开(公告)号：US08710473B2
公开(公告)日：2014-04-29
申请号：US13283849
申请日：2011-10-28
申请人： Hakaru Mizoguchi , Kouji Kakizaki , Osamu Wakabayashi , Masahiro Inoue
发明人： Hakaru Mizoguchi , Kouji Kakizaki , Osamu Wakabayashi , Masahiro Inoue
IPC分类号： H05G2/00
CPC分类号： H05G2/006 , H05G2/008
摘要： A droplet generation and detection device may include: a droplet generation unit for outputting a charged droplet; at least one droplet sensor including a magnetic circuit including a coil configured of an electrically conductive material, the magnetic circuit being disposed such that the charged droplet passes around the magnetic circuit, and a current detection unit for detecting current flowing in the coil and outputting a detection signal; and a signal processing circuit for detecting the charged droplet based on the detection signal.
摘要翻译：液滴生成和检测装置可以包括：用于输出带电液滴的液滴产生单元; 至少一个液滴传感器，其包括包括由导电材料构成的线圈的磁路，所述磁路被布置成使得所述带电液滴绕过所述磁路;以及电流检测单元，用于检测在所述线圈中流动的电流并输出检测信号; 以及信号处理电路，用于根据检测信号检测带电液滴。

2. 发明申请

US20120104289A1 DROPLET GENERATION AND DETECTION DEVICE, AND DROPLET CONTROL DEVICE 有权
标题翻译：滴液发生和检测装置，以及喷射器控制装置
公开(公告)号：US20120104289A1
公开(公告)日：2012-05-03
申请号：US13283849
申请日：2011-10-28
申请人： Hakaru MIZOGUCHI , Kouji Kakizaki , Osamu Wakabayashi , Masahiro Inoue
发明人： Hakaru MIZOGUCHI , Kouji Kakizaki , Osamu Wakabayashi , Masahiro Inoue
IPC分类号： G01J3/10
CPC分类号： H05G2/006 , H05G2/008
摘要： A droplet generation and detection device may include: a droplet generation unit for outputting a charged droplet; at least one droplet sensor including a magnetic circuit including a coil configured of an electrically conductive material, the magnetic circuit being disposed such that the charged droplet passes around the magnetic circuit, and a current detection unit for detecting current flowing in the coil and outputting a detection signal; and a signal processing circuit for detecting the charged droplet based on the detection signal.
摘要翻译：液滴生成和检测装置可以包括：用于输出带电液滴的液滴产生单元; 至少一个液滴传感器，其包括包括由导电材料构成的线圈的磁路，所述磁路被布置成使得所述带电液滴绕过所述磁路;以及电流检测单元，用于检测在所述线圈中流动的电流并输出检测信号; 以及信号处理电路，用于根据检测信号检测带电液滴。

3. 发明授权

US08507883B2 Extreme ultraviolet light source apparatus 有权
标题翻译：极紫外光源设备
公开(公告)号：US08507883B2
公开(公告)日：2013-08-13
申请号：US12559977
申请日：2009-09-15
申请人： Akira Endo , Hideo Hoshino , Kouji Kakizaki , Tamotsu Abe , Akira Sumitani , Takanobu Ishihara , Shinji Nagai , Osamu Wakabayashi , Hakaru Mizoguchi
发明人： Akira Endo , Hideo Hoshino , Kouji Kakizaki , Tamotsu Abe , Akira Sumitani , Takanobu Ishihara , Shinji Nagai , Osamu Wakabayashi , Hakaru Mizoguchi
IPC分类号： G21G4/00
CPC分类号： H05G2/003 , H05G2/008
摘要： An extreme ultraviolet light source apparatus provided with a magnetic field forming unit having sufficient capability of protection against ions radiated from plasma while using a relatively small magnetic source. The apparatus includes: a target nozzle for injecting a target material; a driver laser for applying a laser beam to the target material to generate plasma; a collector mirror for collecting extreme ultraviolet light radiated from the plasma; and a magnetic field forming unit including at least one magnetic source and at least one magnetic material having two leading end parts projecting from the at least one magnetic source to face each other with a plasma emission point in between, and forming a magnetic field between a trajectory of the target material and the collector mirror.
摘要翻译：一种极紫外光源装置，其具有磁场形成单元，该磁场形成单元在使用相对较小的磁源时具有足够的抵抗从等离子体辐射的离子的能力。该装置包括：用于注射目标材料的目标喷嘴; 用于将激光束施加到目标材料以产生等离子体的驱动激光器; 用于收集从等离子体辐射的极紫外光的收集镜; 以及磁场形成单元，其包括至少一个磁源和至少一个磁性材料，所述至少一个磁性材料具有从所述至少一个磁源突出的两个前端部分，其间具有等离子体发射点，并在其之间形成磁场目标材料和收集镜的轨迹。

4. 发明授权

US09265136B2 System and method for generating extreme ultraviolet light 有权
公开(公告)号：US09265136B2
公开(公告)日：2016-02-16
申请号：US13572484
申请日：2012-08-10
申请人： Tsukasa Hori , Kouji Kakizaki , Tatsuya Yanagida , Osamu Wakabayashi , Hakaru Mizoguchi
发明人： Tsukasa Hori , Kouji Kakizaki , Tatsuya Yanagida , Osamu Wakabayashi , Hakaru Mizoguchi
IPC分类号： H05G2/00 , H01S3/102 , H01S3/104 , H01S3/16 , H01S3/223 , H01S3/23 , H01S3/00
CPC分类号： H05G2/008 , H01S3/005 , H01S3/0071 , H01S3/09 , H01S3/102 , H01S3/104 , H01S3/1106 , H01S3/1611 , H01S3/1643 , H01S3/1673 , H01S3/2232 , H01S3/2308 , H01S3/2366 , H01S3/2391 , H05G2/003 , H05G2/005
摘要： A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light.

5. 发明申请

US20100090132A1 EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS 有权
标题翻译：极光超光源光源装置
公开(公告)号：US20100090132A1
公开(公告)日：2010-04-15
申请号：US12559977
申请日：2009-09-15
申请人： Akira ENDO , Hideo Hoshino , Kouji Kakizaki , Tamotsu Abe , Akira Sumitani , Takanobu Ishihara , Shinji Nagai , Osamu Wakabayashi , Hakaru Mizoguchi
发明人： Akira ENDO , Hideo Hoshino , Kouji Kakizaki , Tamotsu Abe , Akira Sumitani , Takanobu Ishihara , Shinji Nagai , Osamu Wakabayashi , Hakaru Mizoguchi
IPC分类号： G21K5/00
CPC分类号： H05G2/003 , H05G2/008
摘要： An extreme ultraviolet light source apparatus provided with a magnetic field forming unit having sufficient capability of protection against ions radiated from plasma while using a relatively small magnetic source. The apparatus includes: a target nozzle for injecting a target material; a driver laser for applying a laser beam to the target material to generate plasma; a collector mirror for collecting extreme ultraviolet light radiated from the plasma; and a magnetic field forming unit including at least one magnetic source and at least one magnetic material having two leading end parts projecting from the at least one magnetic source to face each other with a plasma emission point in between, and forming a magnetic field between a trajectory of the target material and the collector mirror.
摘要翻译：一种极紫外光源装置，其具有磁场形成单元，该磁场形成单元在使用相对较小的磁源时具有足够的抵抗从等离子体辐射的离子的能力。该装置包括：用于注射目标材料的目标喷嘴; 用于将激光束施加到目标材料以产生等离子体的驱动器激光器; 用于收集从等离子体辐射的极紫外光的收集镜; 以及磁场形成单元，其包括至少一个磁源和至少一个磁性材料，所述至少一个磁性材料具有从所述至少一个磁源突出的两个前端部分，其间具有等离子体发射点，并在其之间形成磁场目标材料和收集镜的轨迹。

6. 发明申请

US20080095209A1 Laser device for exposure device 审中-公开
标题翻译：曝光装置用激光装置
公开(公告)号：US20080095209A1
公开(公告)日：2008-04-24
申请号：US11903111
申请日：2007-09-19
申请人： Osamu Wakabayashi , Tsukasa Hori , Takanobu Ishihara , Shinji Nagai , Hakaru Mizoguchi , Kouji Kakizaki
发明人： Osamu Wakabayashi , Tsukasa Hori , Takanobu Ishihara , Shinji Nagai , Hakaru Mizoguchi , Kouji Kakizaki
IPC分类号： H01S3/22
CPC分类号： H01S3/2333 , H01S3/005 , H01S3/036 , H01S3/0384 , H01S3/0385 , H01S3/073 , H01S3/08009 , H01S3/08045 , H01S3/09702 , H01S3/0971 , H01S3/1055 , H01S3/1305 , H01S3/225 , H01S3/2251 , H01S3/2316 , H01S3/2366
摘要： A high efficiency injection device 4, which injects oscillation stage laser light into an optical stable resonator of an amplification stage laser 20, is provided. A discharge electrode 1a is disposed in an oscillation stage laser 10, and is connected to a 12 kHz power supply 15 for discharging the discharge electrode 1a, and also a plurality of pairs of discharge electrodes 2a, 2b are disposed within the optical stable resonator of the amplification stage laser 20, and are connected to 6 kHz power supplies 25a, 25b for discharging the respective electrode pairs 2a, 2b. Discharge voltages are applied alternately to the two pairs of electrodes 2a, 2b in synchronization with the injected light to cause discharge.
摘要翻译：提供了将振荡级激光注入到放大级激光器20的光稳定谐振器中的高效率注入装置4。放电电极1a设置在振荡级激光器10中，并且连接到用于放电放电电极1a的12kHz电源15，并且多对放电电极2a，2b布置在放大级激光器20的光稳定谐振器，并且连接到用于对各个电极对2a，2b进行放电的6kHz电源25a，25b。与注入的光同步地将放电电压交替地施加到两对电极2a，2b，以引起放电。

7. 发明授权

US5373523A Excimer laser apparatus 失效
标题翻译：准分子激光装置
公开(公告)号：US5373523A
公开(公告)日：1994-12-13
申请号：US136448
申请日：1993-10-14
申请人： Junichi Fujimoto , Hakaru Mizoguchi , Yoshiho Amada , Osamu Wakabayashi
发明人： Junichi Fujimoto , Hakaru Mizoguchi , Yoshiho Amada , Osamu Wakabayashi
IPC分类号： H01S3/034 , H01S3/036 , H01S3/225 , H01S3/22
CPC分类号： H01S3/0346 , H01S3/036 , H01S3/225
摘要： An excimer laser apparatus is provided with a compact high efficiency dust particle removal means which is capable of maintaining the windows clean with only a small volume of purging gas, and which prevents deterioration of aperture masks without having to increase the cavity length or risking the possibility of leakage from piping connections. The excimer laser apparatus uses, as dust particle removal means, filters (13a and 13b) made of metal or ceramic which is non-reactive with fluorine. A ground potential dust collector can be provided at a downstream side of a static dust particle remover, having an anode and a cathode, for collecting any dust particles which have passed through the static dust particle remover. In addition, clean laser medium gas can be introduced into subchambers (14a and 14b) through gas introducing passages (11a and 11b) provided in the walls of the housing (1) and then into the laser chamber (12) through labyrinths (8a and 8b) without disturbing the clean gas which stays near the internal surfaces of the windows (6a and 6b).
摘要翻译：准分子激光装置设置有紧凑的高效除尘装置，其能够仅利用少量清洗气体来保持窗户清洁，并且防止孔径掩模的劣化，而不必增加空腔长度或冒着可能性从管道连接泄漏。准分子激光装置使用与氟反应的金属或陶瓷制成的过滤器（13a，13b）作为除尘装置。可以在具有阳极和阴极的静电除尘器的下游侧设置地电位集尘器，用于收集通过静电除尘器的任何灰尘颗粒。此外，可以通过设置在壳体（1）的壁中的气体引入通道（11a和11b）将干净的激光介质气体引入到子室（14a和14b）中，然后通过迷宫（8a和8a）进入激光室 8b），而不干扰保持在窗口（6a和6b）的内表面附近的清洁气体。

8. 发明申请

US20130208742A1 OPTICAL DEVICE, LASER APPARATUS, AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM 有权
标题翻译：光学装置，激光装置和超极紫外光发生系统
公开(公告)号：US20130208742A1
公开(公告)日：2013-08-15
申请号：US13817818
申请日：2012-02-17
申请人： Hakaru Mizoguchi , Takashi Suganuma , Hideo Hoshino , Osamu Wakabayashi
发明人： Hakaru Mizoguchi , Takashi Suganuma , Hideo Hoshino , Osamu Wakabayashi
IPC分类号： H01S3/10
CPC分类号： H01S3/0071 , H01S3/0014 , H01S3/10061 , H01S3/1305 , H05G2/008
摘要： An optical device may include: an optical module disposed in a beam delivery path of a laser beam; a beam adjusting unit disposed in the beam delivery path for adjusting the beam delivery path of the laser beam; a measuring unit disposed in the beam delivery path for detecting the beam delivery path; and a control unit for controlling the beam adjusting unit based on a detection result of the beam delivery path of the laser beam detected by the measuring unit.
摘要翻译：光学装置可以包括：设置在激光束的光束输送路径中的光学模块; 设置在所述光束传送路径中用于调节所述激光束的光束传送路径的光束调节单元; 设置在所述光束传送路径中用于检测所述光束传送路径的测量单元; 以及控制单元，用于基于由测量单元检测到的激光束的光束传递路径的检测结果来控制光束调节单元。

9. 发明授权

US06819699B1 Arf excimer laser device, scanning type exposure device and ultraviolet laser device 有权
标题翻译： Arf准分子激光装置，扫描型曝光装置和紫外线激光装置
公开(公告)号：US06819699B1
公开(公告)日：2004-11-16
申请号：US09518639
申请日：2000-03-03
申请人： Tatsuo Enami , Osamu Wakabayashi , Katsutomo Terashima , Kiwamu Takehisa , Tsukasa Hori , Hakaru Mizoguchi
发明人： Tatsuo Enami , Osamu Wakabayashi , Katsutomo Terashima , Kiwamu Takehisa , Tsukasa Hori , Hakaru Mizoguchi
IPC分类号： H01S322
CPC分类号： H01S3/225
摘要： A buffer gas contained in a laser gas used for an ArF excimer laser mainly consists of He, and Xe is preferably added to the laser gas. Mixture piping divided by valves is disposed on piping running from a chamber to an excimer laser gas cylinder, the mixture piping and a Xe gas cylinder are connected, gas exhaust by a gas exhaust module and opening and closing of the valves are controlled by a gas controller to add a trace quantity of xenon gas to the excimer laser gas. Thus, to remedy a burst characteristic and a spike characteristic of the ultraviolet laser device by adding a trace quantity of xenon gas, the xenon gas can be supplied efficiently into the chamber without modifying existing laser gas supply equipment.
摘要翻译：用于ArF准分子激光器的激光气体中所含的缓冲气体主要由He构成，优选将Xe添加到激光气体中。由阀门分隔的混合管道设置在从室到准分子激光气瓶的管道上，混合管道和Xe气瓶连接，气体排气模块排气和阀门的打开和关闭由气体控制器向准分子激光气体添加痕量的氙气。因此，为了通过添加痕量的氙气来补偿紫外激光装置的突发特性和尖峰特性，可以将氙气有效地供应到腔室中而不改变现有的激光气体供应装置。

10. 发明授权

US6008497A Laser appartus 失效
标题翻译：激光appartus
公开(公告)号：US6008497A
公开(公告)日：1999-12-28
申请号：US29218
申请日：1998-02-25
申请人： Hakaru Mizoguchi , Osamu Wakabayashi , Yukio Kobayashi , Yoshiho Amada , Tatsuo Mimura
发明人： Hakaru Mizoguchi , Osamu Wakabayashi , Yukio Kobayashi , Yoshiho Amada , Tatsuo Mimura
IPC分类号： B23K26/03 , B23K26/06 , B23K26/42 , G03F7/20 , H01S3/134 , H01S3/225 , B23K26/00
CPC分类号： G03F7/70041 , B23K26/03 , B23K26/06 , B23K26/702 , G03F7/70025 , H01S3/134 , H01S3/225
摘要： A laser apparatus comprises storage means for storing a power source voltage of each pulse at the time of continuous pulse oscillation for one cycle, with each voltage correlated with an identifier which specifies the respective pulse, and output control means for, when a pulse is generated, reading from the storage means the source voltage of a pulse having the same identifier, and performing pulse oscillation on the basis of the source voltage. Thus the influence of the spiking phenomenon during a burst mode operation is eliminated as much as possible, and thereby the accuracy of laser beam machining is still more improved.
摘要翻译： PCT No.PCT / JP96 / 02820 Sec。 371日期：1998年2月25日 102（e）1998年2月25日PCT PCT 1996年9月27日PCT公布。公开号WO97 / 11810PC。日期1997年04月3日激光装置包括存储装置，用于在连续脉冲振荡时存储每个脉冲的电源电压一个周期，其中每个电压与指定相应脉冲的标识符相关，以及输出控制装置，当产生脉冲时，从存储装置读取具有相同标识符的脉冲的源电压，并且基于源电压执行脉冲振荡。因此，尽可能地消除了在突发模式操作期间的尖峰现象的影响，从而仍然进一步提高了激光束加工的精度。

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