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1. 发明公开

EP0730266A3 Apparatus for plasma-processing a disk substrate and method of manufacturing a magnetic disk 失效
标题翻译：用于制造磁盘用于磁盘基片的等离子体处理和方法的装置
公开(公告)号：EP0730266A3
公开(公告)日：1998-07-01
申请号：EP95105143
申请日：1995-04-05
申请人： HITACHI LTD
发明人： KOKAKU YUICHI , INABA HIROSHI , SASAKI SHINJI , KATAOKA HIROYUKI , HONDA YOSHINORI , TERAKADO MASATOMO , FURUSAWA KENJI
IPC分类号： C30B29/04 , C23C16/26 , C23C16/27 , C23C16/44 , C23C16/458 , C23C16/50 , C23C16/509 , C23C16/54 , G11B5/66 , G11B5/73 , G11B5/84
CPC分类号： H01J37/32082 , C23C16/26 , C23C16/4404 , C23C16/4412 , C23C16/4587 , C23C16/509 , C23C16/54 , G11B5/8404 , H01J37/32541
摘要： A continuous electrode (5) entirely held at substantially the same potential is disposed in a plasma processing chamber (4) to define the inner wall thereof. A disk substrate (1) is placed in the electrode, and a plasma is generated around the disk substrate in a uniform state. A cross-sectional area of the plasma extending over the upper and lower surfaces of the disk substrate is made larger than a combined area of the disk substrate and its holder (2). The plasma uniformly surrounds the outer periphery and a central hole of the disk substrate. Further, a gas exhaust system (10, 32, 33, 331) for exhausting a reactive gas from the plasma processing chamber is made up of a main exhaust path (10) and a bypass exhaust path (33) such that the bypass exhaust path is used to exhaust the reactive gas at a stroke from the plasma processing chamber after plasma processing has been performed on the disk substrate, thus reducing a time required to exhaust the reactive gas. This structure enables a diamond-like carbon (DLC) protective film (36) to be uniformly formed on both surfaces of the disk substrate while improving the productivity of magnetic disk substrates.
摘要翻译：的连续电极（5）在基本相同的电位完全保持在等离子体处理室（4）被布置成限定其内壁。一种磁盘基片（1）以均匀的状态被放置在电极上，并产生等离子体周围的盘基片。等离子体延伸过盘基片的上表面和下表面的截面积比所述盘基片的组合面积和其保持件变得更大（2）。等离子体均匀包围外周边和所述盘基片的中心孔。此外，排气系统（10，32，33，331），用于从该等离子体处理室排出的反应气体由主排气路径（10）和旁通排气通路（33）的检测所做的旁通排气通路用于在从所述等离子体处理室的行程以排出反应气体后等离子体处理已被执行的盘基片，从而减少以排出反应气体所需的时间。该结构使得类金刚石碳（DLC）保护膜（36），以均匀地形成在盘基片的两个表面上，同时提高磁盘用基板的生产率。

2. 发明专利

JP2003326453A Magnetic head, magnetic disk device, manufacturing method of magnetic head and polishing device 审中-公开
标题翻译：磁头，磁盘装置，磁头和抛光装置的制造方法
公开(公告)号：JP2003326453A
公开(公告)日：2003-11-18
申请号：JP2002129749
申请日：2002-05-01
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： CHIBA HIROSHI , INABA HIROSHI , SASAKI SHINJI , TAMURA TOSHIO , ISONO CHIHIRO
IPC分类号： B24B37/00 , B24B37/12 , G11B5/60 , G11B21/21 , B24B37/04
摘要： PROBLEM TO BE SOLVED: To manufacture a magnetic head in a reduced state of machining irregularity and surface roughness of a floating face side in polishing of a floating face. SOLUTION: The floating face of the magnetic head facing a recording medium face of a magnetic disk is integrally formed on a base material by the same material as the base material while it is fed with lubricant, and it is ground by a cutting edge (a base) 26 formed with a diamond thin film 27 on a surface. By this, a magnetic head with an extensively reduced floating amount with respect to a magnetic recording medium is provided and the magnetic disk device with significantly improved planar recording density of a magnetic disk is provided. COPYRIGHT: (C)2004,JPO
摘要翻译：要解决的问题：在浮动面的抛光中制造加工不平整度和浮动面侧的表面粗糙度的减小状态的磁头。解决方案：面向磁盘的记录介质面的磁头的浮动面通过与基材相同的材料一体地形成在基材上，同时供给润滑剂，并且通过切割将其研磨在表面上形成有金刚石薄膜27的边缘（基底）26。由此，提供了相对于磁记录介质具有大大降低的浮动量的磁头，并且提供了具有显着提高的磁盘的平面记录密度的磁盘装置。版权所有（C）2004，JPO

3. 发明专利

JP2000187806A DISK DRIVE ASSEMBLY USING MAGNETIC HEAD 失效
公开(公告)号：JP2000187806A
公开(公告)日：2000-07-04
申请号：JP36212798
申请日：1998-12-21
申请人： HITACHI LTD
发明人： INABA HIROSHI , TASAKA KENJI
IPC分类号： G11B5/60 , G11B5/255
摘要： PROBLEM TO BE SOLVED: To reduce the unevenness of lubricant film thickness due to contact with a magnetic disk surface which occurs more frequently because of the reduction of the flying height of a magnetic head and to enable replenishment of a lubricant lost by scattering due to the rotary motion of a magnetic disk. SOLUTION: At least one hole is formed in a head slider penetrating from the surface facing a magnetic medium to the back part, a lubricant supply source is provided at the slider back part, and the lubricant 9 is supplied to the surface of the slider facing the magnetic medium through the through hole 1. The amount of the lubricant which flows out toward the surface facing the magnetic disk is determined by the diameter of the through hole 1. The diameter of the through hole 1 is properly selected by calculating the amount of outflow per unit time and unit area from the pressure difference between the negative pressure produced directly below the magnetic head by the rotation of the magnetic disk and the atmospheric pressure above the magnetic head.

4. 发明专利

JPH10241116A PLANAR SILICON HEAD AND ITS MANUFACTURE 失效
公开(公告)号：JPH10241116A
公开(公告)日：1998-09-11
申请号：JP3882097
申请日：1997-02-24
申请人： HITACHI LTD
发明人： INABA HIROSHI , TASAKA KENJI , AZUMA KAZUFUMI
IPC分类号： G11B5/31 , G11B21/21
摘要： PROBLEM TO BE SOLVED: To form a planar silicon head slider surface having excellent resistance to sliding by separating out island-shaped diamond on a silicon wafer and a Permalloy interface, and then dissolving and removing a silicon substrate in planar silicon head forming process to expose the island-shaped diamond crystallite. SOLUTION: A silicon wafer 4, where Permalloy 3 composed of Ni-Fe alloy is formed beforehand, is introduced on an electrode, and methane is introduced for generating plasma. At this point, a part where lamination of diamond carbon film is not needed is treated by resists 10, and removed afterward. An upper magnetic layer 5, coils 6, etc., are formed sequentially, and finally unnecessary silicon wafer part 7 opposed to the Permalloy 3 is dissolved and removed. And island-shaped discontinuous thin film having diamond construction with protrusion height of 10-3000Å is formed on the Permalloy 3 surface. Afterward, an alumina layer is formed by a sputtering, and diamond-shaped carbon film 2 is formed on a slider uppermost surface.

5. 发明专利

JPH10140360A PLASMA TREATING METHOD AND DEVICE THEREFOR 失效
公开(公告)号：JPH10140360A
公开(公告)日：1998-05-26
申请号：JP29841696
申请日：1996-11-11
申请人： HITACHI LTD
发明人： ANAMI HIDETOSHI , SASAKI SHINJI , OTSUBO TORU , INABA HIROSHI , KOKADO YUICHI , KATAOKA HIROYUKI , HONDA YOSHINORI , FUJIMAKI SHIGEHIKO
IPC分类号： C23C14/02 , C23C16/27 , C23C16/50 , H01L21/203 , H01L21/205 , H01L21/302 , H01L21/3065
摘要： PROBLEM TO BE SOLVED: To provide a method for executing plasma treatment in which bias potentials are generated on a substrate even without directly applying bias voltage from the outside, even in the case the substrate is not particularly composed of an electric conductor, and ion incidence is utilized, and to provide a device therefor in the case plasma treatment such as thin film formation by bias sputtering or CVD, etching working, heating or the like is executed to the surface of a substrate. SOLUTION: An electrode 7 is provided oppositely to a substrate 4 placed in a vacuum device 1, the electrode 7 and the surface on the side of the electrode of the substrate 4 are made noncontact, also, they are placed at the interval in which plasma is not generated or below, and the substrate and a high-frequency circuit generating plasma lie in an electrically insulated state. It is possible that the electric field is generated on the surface of the substrate and ion incidence is allowed to occur without bringing the surface of the substrate with the electrode, by which the states in which electric current concentrates on the contact point of the electrode to the substrate, and the evaporation of the film, abnormal discharge caused thereby and the defect in the application of the bias are generated as in the conventional manner can be prevented.

6. 发明专利

JPH09228054A MAGNETIC RECORDING MEDIUM, ITS MANUFACTURE AND MANUFACTURING DEVICE THEREFOR 失效
公开(公告)号：JPH09228054A
公开(公告)日：1997-09-02
申请号：JP2940796
申请日：1996-02-16
申请人： HITACHI LTD , HITACHI MAXELL
发明人： INABA HIROSHI , KATAOKA HIROYUKI , FUJIMAKI SHIGEHIKO , YANO AKIRA , MIZUMURA TETSUO , KUSADA HIDEO , ASANO MICHIO
IPC分类号： C30B29/04 , C23C16/26 , C23C16/27 , C23C16/50 , G11B5/66 , G11B5/72 , G11B5/84
摘要： PROBLEM TO BE SOLVED: To eliminate the damage to the filmy base material at the time of subjecting the filmy base material to plasma treatment by enhancing the film formation rate at the time of forming a diamond-like carbon film on a filmy base material with a CVD (chemical vapor deposition) method in the manufacture of this recording medium. SOLUTION: In the manufacturing device of this recording medium, a plasma treatment device is provided with a vacuum vessel 6 having a plasma treatment vessel, a means for supplying a gaseous reactant 2 to the plasma treatment vessel and a mechanism for introducing a filmy base material 16 into the plasma treatment vessel and transferring the filmy base material 16 from the plasma treatment vessel. At this time, a high-frequency voltage 1 is applied to a counter electrode 3 placed opposite to the filmy base material 16 that is introduced onto an earth electrode 8, to retain a plasma in the plasma treatment vessel. By using the counter electrode 3 having a sufficiently larger area than that of the earth electrode 8 within the plasma treatment vessel, high energy ions are allowed to flow out to the surface to be treated of the filmy base material 16, and also, the capacitance of the device structure can be minimized by incorporating the counter electrode 3 into the vacuum vessel 6 as a part of the vessel 6, and further, a part of the surface of a magnetic layer formed on the other surface of the filmy base material 16 is electrically earthed with a >=100mm contact area.

7. 发明专利

JPH09202971A APPARATUS FOR PRODUCING MAGNETIC RECORDING MEDIUM AND ITS PRODUCTION 失效
公开(公告)号：JPH09202971A
公开(公告)日：1997-08-05
申请号：JP1206596
申请日：1996-01-26
申请人： HITACHI LTD
发明人： FUJIMAKI SHIGEHIKO , INABA HIROSHI , KATAOKA HIROYUKI
IPC分类号： H05H1/46 , C23C16/26 , C23C16/27 , C23C16/50 , C23C16/511
摘要： PROBLEM TO BE SOLVED: To provide a process for producing a magnetic recording medium having a highly durable protective film. SOLUTION: Plasma is generated from a plasma source 1 by a plasma treating apparatus having a high-frequency electrode 4 disposed in a position apart from the rear surface of a substrate 3 when the plasma source 1 consisting of ECR, HWP or ICP for generating the high-density plasma under a low gaseous pressure and the substrate 3 are electrically insulated. Bias is applied on the substrate by the high-frequency electrode 4 to supply the energy necessary for desorption of excess hydrogen, by which the diamond-like carbon protective film is formed on the substrate 3 on a holder 2 regardless of the kind of the substrate.

8. 发明专利

JPH06267063A MAGNETIC DISK AND MANUFACTURE THEREOF 失效
公开(公告)号：JPH06267063A
公开(公告)日：1994-09-22
申请号：JP5058593
申请日：1993-03-11
申请人： HITACHI LTD
发明人： MATSUMOTO HIROSHI , KOKADO YUICHI , FUJIMAKI SHIGEHIKO , INABA HIROSHI , MATSUNUMA SATORU , KITO MAKOTO , ISHIHARA HEIGO
IPC分类号： G11B5/72 , G11B5/64 , G11B5/66 , G11B5/73 , G11B5/738 , G11B5/82 , G11B5/84
摘要： PURPOSE:To obtain a magnetic disk having an improved durability and corresponding to a high recording density, by using an amorphous carbon film excellent in an abrasion resistance and an electric insulation property as a protective layer. CONSTITUTION:A slide resistance is improved by using as a protective carbon layer an amorphous hydrogenated carbon layer wherein, when a waveform of a Raman spectrum is separated into two Gaussian function type waveforms, a peak position of one waveform A is 1545cm or below, while the peak position of the other waveform B is 1320 to 1360cm , and an area ratio (B/A) at a half-width of these waveforms is 0.3 to 0.7. Thereby the durability of a magnetic disk is increased and the lifetime is prolonged. As the result, besides, execution of an operation at a low flying height or in a state of contact is possible and a recording density is improved.

9. 发明专利

JPH02243762A SPUTTERING DEVICE 失效
公开(公告)号：JPH02243762A
公开(公告)日：1990-09-27
申请号：JP6363289
申请日：1989-03-17
申请人： HITACHI LTD
发明人： KATAOKA HIROYUKI , INABA HIROSHI , FURUSAWA KENJI , ABE KATSUO
IPC分类号： C23C14/35
摘要： PURPOSE:To reduce equipment investment, running cost and space cost by controlling the percentage of energy impressed on each of plural clusters of plasma when the clusters are generated by glow discharge with sputtering electrodes and films are formed on substrates by sputtering. CONSTITUTION:An evacuating means, a vacuum vessel fitted with magnetron sputtering electrodes and a power source 7 for sputtering are set in a vacuum device. Each of the electrodes is composed of a target plate 1, permanent magnets 3 and a yoke 4 and the target plates 1 of the electrodes are connected to the single power source 7. When plural clusters of plasma 2 are generated by glow discharge with the electrodes and coating films are formed on substrates by sputtering, the percentage of energy impressed on each of the clusters of plasma 2 is controlled with a control unit 8. The yield of products can be enhanced.

10. 发明专利

JP2002117514A THIN FILM MAGNETIC HEAD AND MAGNETIC DISK RECORDING AND REPRODUCING DEVICE 失效
公开(公告)号：JP2002117514A
公开(公告)日：2002-04-19
申请号：JP2000311708
申请日：2000-10-05
申请人： HITACHI LTD
发明人： AZUMA KAZUFUMI , INABA HIROSHI , TASAKA KENJI
IPC分类号： G11B5/31 , G11B5/60 , G11B21/21
摘要： PROBLEM TO BE SOLVED: To realize a thin film magnetic head having satisfactory wear resistance and low tackiness. SOLUTION: Fluorine atom of 0.2-3 atom.% is introduced to the uppermost surface of a film of hydrogen containing amorphous carbon or hydrogen containing amorphous silicon carbide (having 5-50% hydrogen content) by treating the surface of a head protecting film in the plasma formed by using a fluorine based gas as a raw material.

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