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    • 5. 发明专利
    • SPEED COMMAND GENERATOR FOR ELEVATOR
    • CA1064177A
    • 1979-10-09
    • CA251707
    • 1976-05-04
    • HITACHI LTD
    • SUZUKI KAZUOKATAOKA HIROYUKI
    • B66B1/24B66B1/16B66B1/30B66B1/36G05B19/02
    • SPEED COMMAND GENERATOR FOR ELEVATOR A speed command voltage is generated which increases in proportion to the lapse of time so as to increase the speed of an elevator car at a constant acceleration after starting. Another speed command voltage is generated which decreases with the reduction in the distance between the position of the travelling elevator car and the target floor position so as to decrease the speed of the elevator car at a constant deceleration. The speed patterns provided by these speed command voltages are joined together to provide a continuous speed pattern for the elevator car instructed to travel to arrive at the target floor. In order to ensure shock-free operation of the elevator car at the joint between these speed command voltages, the speed command voltages in accordance with respective speed patterns for use in acceleration and deceleration are compared with each other, and the increase in the speed command voltage for acceleration is ceased when the difference therebetween attains a predetermined value. The speed command voltage is maintained constant at this level to provide a constant-speed command voltage. Then, the constant-speed command voltage and speed command voltage for deceleration are applied to a lower-level signal passing circuit, in which two input signals are compared with each other and the lower level signal of them only is passed, to obtain a completely continuous speed pattern for the elevator car. A reference command voltage is generated, which increases up to a predetermined level with the increase in the speed command voltage for acceleration, and the rate of increase of which decreases gradually upon attainment of such a level. This reference command voltage is used to maintain always constant the length of time of this constant-speed command voltage. The increase in the speed command voltage for acceleration is ceased to obtain the constantspeed command voltage when the difference between the speed command voltage for acceleration and the speed command voltage for deceleration is reduced to a value less than that of the reference command voltage.
    • 9. 发明专利
    • FLOOR CONTROLLER FOR AN ELEVATOR
    • CA1033085A
    • 1978-06-13
    • CA247056
    • 1976-03-03
    • HITACHI LTD
    • KATAOKA HIROYUKIYAHIRO SEINOSUKESUZUKI KAZUO
    • B66B1/46B66B1/30B66B1/52
    • An elevator system is provided with a floor controller for controlling the speed of a car. One typical form of floor controller is composed of a synchronizer operated on a reduced scale in synchronism with the movement of an elevator car, an advancer which moves in advance of the synchronizer and stops when it detects a call, and a difference detector which moves in accordance with the relative distance between the synchronizer and the advancer for controlling the running speed of the elevator car in accordance with its own position. When a call is generated, the advancer must be driven in advance of the synchronizer in the direction selected by a direction selector separately provided. For this purpose, an electric motor for driving the advancer is provided, but it need not drive the advancer directly. Since any one of the synchronizer, the advancer or the difference detector moves in accordance with the difference between the distances covered by the travelling of the others, the advancer can be moved indirectly by driving the difference detector. This simplifies both the construction of the elevator system and the control of the advance motor.
    • 10. 发明公开
    • Apparatus for plasma-processing a disk substrate and method of manufacturing a magnetic disk
    • 用于制造磁盘用于磁盘基片的等离子体处理和方法的装置
    • EP0730266A3
    • 1998-07-01
    • EP95105143
    • 1995-04-05
    • HITACHI LTD
    • KOKAKU YUICHIINABA HIROSHISASAKI SHINJIKATAOKA HIROYUKIHONDA YOSHINORITERAKADO MASATOMOFURUSAWA KENJI
    • C30B29/04C23C16/26C23C16/27C23C16/44C23C16/458C23C16/50C23C16/509C23C16/54G11B5/66G11B5/73G11B5/84
    • H01J37/32082C23C16/26C23C16/4404C23C16/4412C23C16/4587C23C16/509C23C16/54G11B5/8404H01J37/32541
    • A continuous electrode (5) entirely held at substantially the same potential is disposed in a plasma processing chamber (4) to define the inner wall thereof. A disk substrate (1) is placed in the electrode, and a plasma is generated around the disk substrate in a uniform state. A cross-sectional area of the plasma extending over the upper and lower surfaces of the disk substrate is made larger than a combined area of the disk substrate and its holder (2). The plasma uniformly surrounds the outer periphery and a central hole of the disk substrate. Further, a gas exhaust system (10, 32, 33, 331) for exhausting a reactive gas from the plasma processing chamber is made up of a main exhaust path (10) and a bypass exhaust path (33) such that the bypass exhaust path is used to exhaust the reactive gas at a stroke from the plasma processing chamber after plasma processing has been performed on the disk substrate, thus reducing a time required to exhaust the reactive gas. This structure enables a diamond-like carbon (DLC) protective film (36) to be uniformly formed on both surfaces of the disk substrate while improving the productivity of magnetic disk substrates.
    • 的连续电极(5)在基本相同的电位完全保持在等离子体处理室(4)被布置成限定其内壁。 一种磁盘基片(1)以均匀的状态被放置在电极上,并产生等离子体周围的盘基片。 等离子体延伸过盘基片的上表面和下表面的截面积比所述盘基片的组合面积和其保持件变得更大(2)。 等离子体均匀包围外周边和所述盘基片的中心孔。 此外,排气系统(10,32,33,331),用于从该等离子体处理室排出的反应气体由主排气路径(10)和旁通排气通路(33)的检测所做的旁通排气通路 用于在从所述等离子体处理室的行程以排出反应气体后等离子体处理已被执行的盘基片,从而减少以排出反应气体所需的时间。 该结构使得类金刚石碳(DLC)保护膜(36),以均匀地形成在盘基片的两个表面上,同时提高磁盘用基板的生产率。