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1. 发明专利

JP2003326453A Magnetic head, magnetic disk device, manufacturing method of magnetic head and polishing device 审中-公开
标题翻译：磁头，磁盘装置，磁头和抛光装置的制造方法
公开(公告)号：JP2003326453A
公开(公告)日：2003-11-18
申请号：JP2002129749
申请日：2002-05-01
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： CHIBA HIROSHI , INABA HIROSHI , SASAKI SHINJI , TAMURA TOSHIO , ISONO CHIHIRO
IPC分类号： B24B37/00 , B24B37/12 , G11B5/60 , G11B21/21 , B24B37/04
摘要： PROBLEM TO BE SOLVED: To manufacture a magnetic head in a reduced state of machining irregularity and surface roughness of a floating face side in polishing of a floating face. SOLUTION: The floating face of the magnetic head facing a recording medium face of a magnetic disk is integrally formed on a base material by the same material as the base material while it is fed with lubricant, and it is ground by a cutting edge (a base) 26 formed with a diamond thin film 27 on a surface. By this, a magnetic head with an extensively reduced floating amount with respect to a magnetic recording medium is provided and the magnetic disk device with significantly improved planar recording density of a magnetic disk is provided. COPYRIGHT: (C)2004,JPO
摘要翻译：要解决的问题：在浮动面的抛光中制造加工不平整度和浮动面侧的表面粗糙度的减小状态的磁头。解决方案：面向磁盘的记录介质面的磁头的浮动面通过与基材相同的材料一体地形成在基材上，同时供给润滑剂，并且通过切割将其研磨在表面上形成有金刚石薄膜27的边缘（基底）26。由此，提供了相对于磁记录介质具有大大降低的浮动量的磁头，并且提供了具有显着提高的磁盘的平面记录密度的磁盘装置。版权所有（C）2004，JPO

2. 发明专利

JP2005028470A Magnetic head manufacturing method, polishing tool for manufacture, and polishing tool manufacturing method 审中-公开
标题翻译：磁头制造方法，制造抛光工具和抛光工具制造方法
公开(公告)号：JP2005028470A
公开(公告)日：2005-02-03
申请号：JP2003193798
申请日：2003-07-08
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： CHIBA HIROSHI , SASAKI SHINJI , INABA HIROSHI , ISONO CHIHIRO
IPC分类号： B24B37/12 , B24B37/14 , G11B5/31 , B24B37/04
摘要： PROBLEM TO BE SOLVED: To satisfy characteristics required of a magnetic element part while obtaining a smooth levitation surface by reducing machining step difference on the levitation surface side in machining a magnetic head. SOLUTION: A surface table 30 for polishing a magnetic head levitation surface is provided with hard projecting parts 32 on the surface of an elastic support plate 31 formed of tin or its alloy, and the tip parts of the hard projecting parts 32 are formed as cutting edge parts 33 for polishing a workpiece (a raw bar of the magnetic head) 35. Insulating films formed of SiO 2 or the like are formed at portions excluding the hard projecting parts 32 on the surface of the elastic support plate 31. The density of the hard projecting parts 32 is set to at least 10 per μm 2 , and the cutting edge part 33 of each hard projecting part 32 is within the nearly same plane with a height within a range of 20 nm or less from the surface of the elastic support plate 31 or the surface of the insulating film 34. The levitation surface of the magnetic head is thereby finish-machined with high accuracy by polishing the workpiece 35. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：为了满足磁性元件部分所需的特性，同时通过减少在磁头加工中的悬浮表面侧上的加工阶差，同时获得平滑悬浮表面。解决方案：用于抛光磁头悬浮表面的表台30在由锡或其合金形成的弹性支撑板31的表面上设置有硬突出部分32，并且硬突出部分32的尖端部分形成为用于研磨工件（磁头的原料棒）的切削刃部33。35.由表面上的硬突出部32以外的部分形成由SiO 2 等形成的绝缘膜弹性支撑板31的密度。硬突出部32的密度设定为每μm 2 至少10，并且每个硬突出部32的切割边缘部33在几乎相同的平面内高度在距离弹性支撑板31的表面或绝缘膜34的表面20nm以下的范围内。因此，通过对工件35进行研磨，磁头的悬浮表面被高精度地精加工。版权所有（C）2005，JPO＆NCIPI

3. 发明专利

JP2003030808A Magnetic head, manufacturing method thereof and magnetic recorder 审中-公开
标题翻译：磁头及其制造方法及磁记录仪
公开(公告)号：JP2003030808A
公开(公告)日：2003-01-31
申请号：JP2001216072
申请日：2001-07-17
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： HIRANO SHINYA , INABA HIROSHI , SASAKI SHINJI , FURUSAWA KENJI
IPC分类号： G01R33/09 , G11B5/39 , H01F10/08 , H01L43/08
摘要： PROBLEM TO BE SOLVED: To evade the destruction of a gap film due to the pin hole and the static electricity.
SOLUTION: The magnetic head is provided with an electrode 5 arranged facing oppositely so as to hold a magnetic sensor film 4 between them, a 1st gap film 12 arranged on one surface of front/rear sides of the magnetic sensor film 4 and electrode 5, and a 2nd gap film 13 formed on another surface. The ratio Rg/Rgmr of a combined resistance Rg combining the resistance Rg
1 of the 1st gap film 12 and the resistance Rg
2 of the 2nd gap film 13 to the resistance Rgmr between the electrodes is formed to be 10
摘要翻译：要解决的问题：避免由于针孔和静电导致的间隙膜的破坏。解决方案：磁头设置有相对地布置以在其间保持磁传感器膜4的电极5，布置在磁传感器膜4的前/后侧的一个表面上的第一间隙膜12和电极5，以及形成在另一表面上的第二间隙膜13。将第一间隙膜12的电阻Rg1和第二间隙膜13的电阻Rg2与电极之间的电阻Rgmr组合的组合电阻Rg的比Rg / Rgmr形成为10

4. 发明专利

JP2013182640A Magnetic recording medium and method of manufacturing the same, and magnetic memory using the same 审中-公开
标题翻译：磁记录介质及其制造方法及使用其的磁记忆
公开(公告)号：JP2013182640A
公开(公告)日：2013-09-12
申请号：JP2012045613
申请日：2012-03-01
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： INABA HIROSHI , MATSUMURA TORU , NAKAKAWAJI TAKAYUKI
IPC分类号： G11B5/72 , G11B5/84
摘要： PROBLEM TO BE SOLVED: To provide a magnetic recording medium that includes a protective film with a thickness of less than 3 nm represented by a tetrahedral amorphous carbon film with a high sp3 bond ratio, and can secure head flying performance as a magnetic disk drive, and a method of manufacturing the same.SOLUTION: By ultraviolet irradiation or the like in the atmosphere, a carbon interatomic bond ratio sp3/(sp2+sp3) value at a depth of 0.5 nm from the outermost surface of a protective film mainly composed of carbon with a thickness of 1.0 nm or more and less than 3.0 nm is improved to 40% or more and less than 50%.
摘要翻译：要解决的问题：提供一种磁记录介质，其包括由具有高sp 3键比的四面体非晶碳膜表示的厚度小于3nm的保护膜，并且可以将头部飞行性能确保为磁盘驱动器，及其制造方法。解决方案：通过大气中的紫外线照射等，从主要由以下组成的保护膜的最外表面的0.5nm的深度处的碳原子间键合比sp3 /（sp2 + sp3）值厚度为1.0nm以上且小于3.0nm的碳被提高到40％以上且小于50％。

5. 发明专利

JP2007253308A Manufacturing method for polishing tool 审中-公开
标题翻译：抛光工具的制造方法
公开(公告)号：JP2007253308A
公开(公告)日：2007-10-04
申请号：JP2006084464
申请日：2006-03-27
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： CHIBA HIROSHI , INABA HIROSHI , SASAKI SHINJI , YASUI HIROTO , YO KIYOKUTO
IPC分类号： B24D3/00
摘要： PROBLEM TO BE SOLVED: To obtain a smooth polished surface in processing of an electronic device formed by various materials having different hardnesses, and to satisfy a specific characteristic required by the device.
SOLUTION: A polishing tool is manufactured through a substrate polishing process for smoothing the surface of a substrate, the process for forming a polishing grain layer used for polishing the surface of the electronic device on the substrate, and a surface processing process for making polishing grains project on the surface of the polishing grain layer. Thus, a smooth polishing of the device can be obtained so that the surface of the polishing tool and a polished section of the device are brought into contact with each other and slid with each other.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：为了在由具有不同硬度的各种材料形成的电子装置的加工中获得光滑的抛光表面，并且满足该装置所需的特定特性。解决方案：通过用于平滑基板的表面的基板抛光工艺制造抛光工具，用于形成用于抛光基板上的电子器件的表面的抛光晶粒层的工艺，以及用于使抛光颗粒在抛光颗粒层的表面上突出。因此，可以获得装置的平滑抛光，使得抛光工具的表面和装置的抛光部分彼此接触并相互滑动。版权所有（C）2008，JPO＆INPIT

6. 发明专利

JP2007152545A Grinding surface plate and its manufacturing method 有权
标题翻译：研磨面板及其制造方法
公开(公告)号：JP2007152545A
公开(公告)日：2007-06-21
申请号：JP2006258237
申请日：2006-09-25
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： SASAKI SHINJI , INABA HIROSHI , CHIBA HIROSHI , YO KIYOKUTO , YASUI HIROTO
IPC分类号： B24D3/00
CPC分类号： B24D18/0054 , B24B37/12
摘要： PROBLEM TO BE SOLVED: To reduce surface roughness occurring on a grinding portion, and thereby to reduce damage caused by machining and to improve grinding efficiency.
SOLUTION: Abrasive grains are pushed and fixed on the surface of the grinding surface plate with mechanical pressure, and then the surface of the grinding surface plate containing the abrasive grains is subjected to plasma treatment, thereby improving the adhesiveness between the abrasive grains and the surface plate, and reducing the number of rolling particles separating from the surface of the surface plate, so as to realize flat abrasive machining of the device surface consisting of a plurality of materials.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：为了减少在研磨部分上发生的表面粗糙度，从而减少由机械加工引起的损坏并提高研磨效率。解决方案：磨料颗粒以机械压力推压固定在研磨面板的表面上，然后对包含磨粒的研磨面板的表面进行等离子体处理，从而提高磨粒之间的粘附性和表面板，并且减少从表面板的表面分离的滚动颗粒的数量，以实现由多种材料组成的装置表面的平面磨料加工。版权所有（C）2007，JPO＆INPIT

7. 发明专利

JP2002373477A Magnetic head slider and manufacturing method therefor 审中-公开
标题翻译：磁头滑块及其制造方法
公开(公告)号：JP2002373477A
公开(公告)日：2002-12-26
申请号：JP2001181084
申请日：2001-06-15
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： INABA HIROSHI , SASAKI SHINJI , FURUSAWA KENJI , YAMASAKA MINORU
IPC分类号： G11B5/39 , G11B5/60 , G11B21/21
摘要： PROBLEM TO BE SOLVED: To provide a magnetic head slier where the product yield of the magnetic head slider is increased in the forming process of the magnetic head, and additionally its durability is improved significantly, and to provide its manu facturing method.
SOLUTION: In the magnetic head slider 31, having two or more steps 5, 6 in the depth direction from a magnetic floating surface 7, and the depth of the step closer to the floating surface 7 set to 300 nm or lower, protective film 11 is provided in the floating surface 7 and all the steps 5, 6. The surface of the protective film 1 will not deteriorate.
COPYRIGHT: (C)2003,JPO
摘要翻译：要解决的问题：提供一种磁头滑块，其中磁头滑块的产品产量在磁头的成形过程中增加，另外其耐久性显着提高，并提供其制造方法。解决方案：在磁头滑动器31中，在从磁浮动表面7的深度方向上具有两个或多个步骤5,6，并且更靠近浮动表面7的台阶的深度设定为300nm或更小，保护膜11 设置在浮动表面7和所有步骤5,6中。保护膜1的表面不会劣化。

8. 发明公开

EP0730266A3 Apparatus for plasma-processing a disk substrate and method of manufacturing a magnetic disk 失效
标题翻译：用于制造磁盘用于磁盘基片的等离子体处理和方法的装置
公开(公告)号：EP0730266A3
公开(公告)日：1998-07-01
申请号：EP95105143
申请日：1995-04-05
申请人： HITACHI LTD
发明人： KOKAKU YUICHI , INABA HIROSHI , SASAKI SHINJI , KATAOKA HIROYUKI , HONDA YOSHINORI , TERAKADO MASATOMO , FURUSAWA KENJI
IPC分类号： C30B29/04 , C23C16/26 , C23C16/27 , C23C16/44 , C23C16/458 , C23C16/50 , C23C16/509 , C23C16/54 , G11B5/66 , G11B5/73 , G11B5/84
CPC分类号： H01J37/32082 , C23C16/26 , C23C16/4404 , C23C16/4412 , C23C16/4587 , C23C16/509 , C23C16/54 , G11B5/8404 , H01J37/32541
摘要： A continuous electrode (5) entirely held at substantially the same potential is disposed in a plasma processing chamber (4) to define the inner wall thereof. A disk substrate (1) is placed in the electrode, and a plasma is generated around the disk substrate in a uniform state. A cross-sectional area of the plasma extending over the upper and lower surfaces of the disk substrate is made larger than a combined area of the disk substrate and its holder (2). The plasma uniformly surrounds the outer periphery and a central hole of the disk substrate. Further, a gas exhaust system (10, 32, 33, 331) for exhausting a reactive gas from the plasma processing chamber is made up of a main exhaust path (10) and a bypass exhaust path (33) such that the bypass exhaust path is used to exhaust the reactive gas at a stroke from the plasma processing chamber after plasma processing has been performed on the disk substrate, thus reducing a time required to exhaust the reactive gas. This structure enables a diamond-like carbon (DLC) protective film (36) to be uniformly formed on both surfaces of the disk substrate while improving the productivity of magnetic disk substrates.
摘要翻译：的连续电极（5）在基本相同的电位完全保持在等离子体处理室（4）被布置成限定其内壁。一种磁盘基片（1）以均匀的状态被放置在电极上，并产生等离子体周围的盘基片。等离子体延伸过盘基片的上表面和下表面的截面积比所述盘基片的组合面积和其保持件变得更大（2）。等离子体均匀包围外周边和所述盘基片的中心孔。此外，排气系统（10，32，33，331），用于从该等离子体处理室排出的反应气体由主排气路径（10）和旁通排气通路（33）的检测所做的旁通排气通路用于在从所述等离子体处理室的行程以排出反应气体后等离子体处理已被执行的盘基片，从而减少以排出反应气体所需的时间。该结构使得类金刚石碳（DLC）保护膜（36），以均匀地形成在盘基片的两个表面上，同时提高磁盘用基板的生产率。

9. 发明专利

JP2000187806A DISK DRIVE ASSEMBLY USING MAGNETIC HEAD 失效
公开(公告)号：JP2000187806A
公开(公告)日：2000-07-04
申请号：JP36212798
申请日：1998-12-21
申请人： HITACHI LTD
发明人： INABA HIROSHI , TASAKA KENJI
IPC分类号： G11B5/60 , G11B5/255
摘要： PROBLEM TO BE SOLVED: To reduce the unevenness of lubricant film thickness due to contact with a magnetic disk surface which occurs more frequently because of the reduction of the flying height of a magnetic head and to enable replenishment of a lubricant lost by scattering due to the rotary motion of a magnetic disk. SOLUTION: At least one hole is formed in a head slider penetrating from the surface facing a magnetic medium to the back part, a lubricant supply source is provided at the slider back part, and the lubricant 9 is supplied to the surface of the slider facing the magnetic medium through the through hole 1. The amount of the lubricant which flows out toward the surface facing the magnetic disk is determined by the diameter of the through hole 1. The diameter of the through hole 1 is properly selected by calculating the amount of outflow per unit time and unit area from the pressure difference between the negative pressure produced directly below the magnetic head by the rotation of the magnetic disk and the atmospheric pressure above the magnetic head.

10. 发明专利

JPH10241116A PLANAR SILICON HEAD AND ITS MANUFACTURE 失效
公开(公告)号：JPH10241116A
公开(公告)日：1998-09-11
申请号：JP3882097
申请日：1997-02-24
申请人： HITACHI LTD
发明人： INABA HIROSHI , TASAKA KENJI , AZUMA KAZUFUMI
IPC分类号： G11B5/31 , G11B21/21
摘要： PROBLEM TO BE SOLVED: To form a planar silicon head slider surface having excellent resistance to sliding by separating out island-shaped diamond on a silicon wafer and a Permalloy interface, and then dissolving and removing a silicon substrate in planar silicon head forming process to expose the island-shaped diamond crystallite. SOLUTION: A silicon wafer 4, where Permalloy 3 composed of Ni-Fe alloy is formed beforehand, is introduced on an electrode, and methane is introduced for generating plasma. At this point, a part where lamination of diamond carbon film is not needed is treated by resists 10, and removed afterward. An upper magnetic layer 5, coils 6, etc., are formed sequentially, and finally unnecessary silicon wafer part 7 opposed to the Permalloy 3 is dissolved and removed. And island-shaped discontinuous thin film having diamond construction with protrusion height of 10-3000Å is formed on the Permalloy 3 surface. Afterward, an alumina layer is formed by a sputtering, and diamond-shaped carbon film 2 is formed on a slider uppermost surface.

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