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    • 6. 发明授权
    • Integrated field emission array for ion desorption
    • 用于离子解吸的集成场发射阵列
    • US08536564B1
    • 2013-09-17
    • US13246985
    • 2011-09-28
    • Paul J. ResnickKristin L. HertzChristopher HollandDavid ChichesterPaul Schwoebel
    • Paul J. ResnickKristin L. HertzChristopher HollandDavid ChichesterPaul Schwoebel
    • H01L29/06
    • H01J9/02H01J3/04H01L21/31111
    • An integrated field emission array for ion desorption includes an electrically conductive substrate; a dielectric layer lying over the electrically conductive substrate comprising a plurality of laterally separated cavities extending through the dielectric layer; a like plurality of conically-shaped emitter tips on posts, each emitter tip/post disposed concentrically within a laterally separated cavity and electrically contacting the substrate; and a gate electrode structure lying over the dielectric layer, including a like plurality of circular gate apertures, each gate aperture disposed concentrically above an emitter tip/post to provide a like plurality of annular gate electrodes and wherein the lower edge of each annular gate electrode proximate the like emitter tip/post is rounded. Also disclosed herein are methods for fabricating an integrated field emission array.
    • 用于离子解吸的集成场致发射阵列包括导电基片; 位于所述导电衬底上方的介电层包括延伸穿过所述电介质层的多个横向隔开的空腔; 在柱上具有相似的多个锥形发射器尖端,每个发射极尖端/柱同心地设置在横向分离的空腔内并与衬底电接触; 以及位于电介质层上方的栅极电极结构,包括相似的多个圆形栅极孔,每个栅极孔同心地设置在发射极尖端/柱上方,以提供相似的多个环形栅电极,并且其中每个环形栅电极的下边缘 靠近相似的发射器尖端/柱是圆形的。 本文还公开了用于制造集成场致发射阵列的方法。