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1. 发明申请

US20090309042A1 ION SOURCES 有权
标题翻译：离子源
公开(公告)号：US20090309042A1
公开(公告)日：2009-12-17
申请号：US12309460
申请日：2007-07-12
申请人： Gary Proudfoot , Gordon Robert Green , Robert Kenneth Trowell
发明人： Gary Proudfoot , Gordon Robert Green , Robert Kenneth Trowell
IPC分类号： H01J27/00
CPC分类号： H01J27/18 , H01J27/024 , H01J37/04 , H01J37/08 , H01J2237/04735 , H01J2237/083
摘要： This invention relates to an Ion gun (10) which comprises of plasma generator (11) driven from an RF source (12), a plasma or source chamber (13), having an outlet (14), across which is mounted an accelerator grid (15). The accelerator grid (15) comprises four individual grids. The first grid (16), which is closest to the outlet (14), is maintained at a positive voltage by a DC source (16a), the second grid (17) is maintained strongly negative by DC source (17a). The third grid (18) is maintained at a negative voltage, which is much lower than that of the second grid (17), by DC source (18a) and the fourth grid is grounded. Means of mounting these grids are also described.
摘要翻译：本发明涉及一种离子枪（10），其包括从RF源（12）驱动的等离子体发生器（11），具有出口（14）的等离子体或源室（13），其上安装有加速器格栅（15）。加速器网格（15）包括四个单独的网格。最靠近出口（14）的第一栅极（16）通过直流源（16a）保持在正电压，第二栅极（17）被直流源（17a）强烈地保持为负。第三栅极（18）通过直流源（18a）保持在比第二栅极（17）的负电压低得多的负电压，第四栅极接地。还描述了安装这些网格的方法。

2. 发明授权

US4794298A Ion source 失效
标题翻译：离子源
公开(公告)号：US4794298A
公开(公告)日：1988-12-27
申请号：US904269
申请日：1986-09-08
申请人： Gary Proudfoot
发明人： Gary Proudfoot
IPC分类号： H01J27/02 , H01J27/16 , H01J37/08 , H01J37/317 , H01J39/34
CPC分类号： H01J37/08 , H01J27/022 , H01J27/16
摘要： An ion beam source adapted to provide a plurality of parallel planar ion beams the centers of which are superimposed and the planes of which are inclined at an angle to the line joining their centers such that a geometric projection of the ion beams in a direction orthogonal to that joining the centers of the ion beams is continuous.
摘要翻译：一种离子束源，其适于提供多个平行的平面离子束，它们的中心被叠加并且其平面与连接其中心的线成一定角度倾斜，使得离子束在垂直于连接离子束的中心是连续的。

3. 发明授权

US08425741B2 Ion deposition apparatus having rotatable carousel for supporting a plurality of targets 有权
标题翻译：离子沉积设备具有可旋转的转盘，用于支撑多个靶
公开(公告)号：US08425741B2
公开(公告)日：2013-04-23
申请号：US12309464
申请日：2007-07-06
申请人： Gary Proudfoot , Christopher David George , Paulo Edurado Lima , Gordon Robert Green , Robert Kenneth Trowell
发明人： Gary Proudfoot , Christopher David George , Paulo Edurado Lima , Gordon Robert Green , Robert Kenneth Trowell
IPC分类号： C25B9/00 , C25B13/00 , B05B5/025
CPC分类号： C23C14/46 , H01J27/18 , H01J37/20 , H01J37/3178 , H01J2237/024 , H01J2237/3146
摘要： This invention relates to a broad beam ion deposition apparatus (100) including an ion source (101), a target (102), a tillable substrate table (103) and an auxiliary port (104). The target (102) is in the form of a carousel which carries a number of targets and the ion source (101) is configured to produce a substantially rectangular section beam (105).
摘要翻译：本发明涉及一种包括离子源（101），靶（102），可耕化基板台（103）和辅助端口（104）的宽束离子沉积装置（100）。目标（102）是携带多个目标的转盘的形式，并且离子源（101）被配置为产生基本上矩形的截面梁（105）。

4. 发明授权

US08400063B2 Plasma sources 有权
标题翻译：等离子体源
公开(公告)号：US08400063B2
公开(公告)日：2013-03-19
申请号：US12309461
申请日：2007-07-06
申请人： Gary Proudfoot , Christopher David George , Paulo Eduardo Lima
发明人： Gary Proudfoot , Christopher David George , Paulo Eduardo Lima
IPC分类号： H01J7/24 , H05B31/26
CPC分类号： H01J37/32082 , H01J37/32623
摘要： This invention relates to a plasma source in the form of plasma generator (13) which utilizes an antenna (11) and an RF source (12). The generated plasma flows into a chamber (14) and ions are accelerated out of the chamber (14) by grid (15). A body 16 is located in the volume for creating local losses and thereby reducing local plasma density.
摘要翻译：本发明涉及利用天线（11）和RF源（12）的等离子体发生器（13）形式的等离子体源。所产生的等离子体流入腔室（14），离子通过格栅（15）被加速离开腔室（14）。主体16位于容积中，用于产生局部损失，从而降低局部等离子体密度。

5. 发明申请

US20100108905A1 PLASMA SOURCES 有权
标题翻译：等离子体来源
公开(公告)号：US20100108905A1
公开(公告)日：2010-05-06
申请号：US12309461
申请日：2007-07-06
申请人： Gary Proudfoot , Christopher David George , Paulo Eduardo Lima
发明人： Gary Proudfoot , Christopher David George , Paulo Eduardo Lima
IPC分类号： H05H1/00 , H01J27/00
CPC分类号： H01J37/32082 , H01J37/32623
摘要： This invention relates to a plasma source in the form of plasma generator (13) which utilises an antenna (11) and an RF source (12). The generated plasma flows into a chamber (14) and ions are accelerated out of the chamber (14) by grid (15). A body 16 is located in the volume for creating local losses and thereby reducing local plasma density.
摘要翻译：本发明涉及利用天线（11）和RF源（12）的等离子体发生器（13）形式的等离子体源。所产生的等离子体流入腔室（14），离子通过格栅（15）被加速离开腔室（14）。主体16位于容积中，用于产生局部损失，从而降低局部等离子体密度。

6. 发明授权

US5293134A Tandem accelerator 失效
标题翻译：串联加速器
公开(公告)号：US5293134A
公开(公告)日：1994-03-08
申请号：US848700
申请日：1992-03-09
申请人： Andrew J. T. Holmes , Gary Proudfoot
发明人： Andrew J. T. Holmes , Gary Proudfoot
IPC分类号： H05H5/06
CPC分类号： H05H5/06
摘要： A tandem accelerator for producing a beam of positively charged particles in which the positive ion producing and accelerating region of the apparatus is operated under vacuum conditions.
摘要翻译：用于产生带正电粒子的串联加速器，其中装置的正离子产生和加速区域在真空条件下运行。

7. 发明授权

US5198718A Filamentless ion source for thin film processing and surface modification 失效
标题翻译：用于薄膜加工和表面改性的无电离源
公开(公告)号：US5198718A
公开(公告)日：1993-03-30
申请号：US602254
申请日：1991-05-31
申请人： Mervyn H. Davis , Gary Proudfoot , Keith H. Bayliss
发明人： Mervyn H. Davis , Gary Proudfoot , Keith H. Bayliss
IPC分类号： C23C14/46 , C23C14/48 , H01J27/16 , H01J27/18 , H01J37/06 , H01J37/08 , H01J37/305 , H01J37/34 , H01L21/265 , H01L21/302 , H01L21/3065
CPC分类号： H01J27/16 , H01J37/08
摘要： A filamentless (without a heated cathode) ion source for thin film processing and surface modification. The ion source comprises a plasma chamber which includes a wall defining an evacuable chamber having a first end and a second end, with a dielectric member extending across the first end of the evacuable chamber. A gas inlet admits a plasma forming gas into the chamber. An RF emitter is positioned adjacent to the dielectric member for inductively generating a plasma in the gas in the plasma chamber during use of the ion source. A control grid structure is provided for extracting ions from plasma in the plasma chamber, and include a first grid connected to a positive voltage source and a second grid connected to a negative voltage source, to produce an acceleration field for accelerating ions towards and through the second grid of the control grid structure. An ion beam processing apparatus and an ion beam neutralizer incorporating such an ion source are also described.
摘要翻译： PCT No.PCT / GB90 / 00340 Sec。 371日期1991年5月31日 102（e）日期1991年5月31日PCT 1990年3月6日PCT PCT。出版物WO90 / 10945 1990年9月20日。用于薄膜加工和表面改性的无丝（无加热阴极）离子源。离子源包括等离子体室，其包括限定具有第一端和第二端的可抽空室的壁，电介质构件延伸穿过可抽空室的第一端。气体入口允许等离子体形成气体进入腔室。 RF发射器邻近电介质构件定位，用于在使用离子源期间在等离子体室中的气体中感应地产生等离子体。提供了一种用于从等离子体室中的等离子体提取离子的控制栅格结构，并且包括连接到正电压源的第一栅极和与负电压源连接的第二栅极，以产生用于加速离子朝向和穿过控制网格结构的第二格。还描述了并入这种离子源的离子束处理装置和离子束中和器。

8. 发明授权

US08354652B2 Ion source including separate support systems for accelerator grids 有权
标题翻译：离子源包括加速器网格的单独支撑系统
公开(公告)号：US08354652B2
公开(公告)日：2013-01-15
申请号：US12309460
申请日：2007-07-12
申请人： Gary Proudfoot , Gordon Robert Green , Robert Kenneth Trowell
发明人： Gary Proudfoot , Gordon Robert Green , Robert Kenneth Trowell
IPC分类号： G21K1/08 , H01J3/14 , H01J49/42 , F03H1/00
CPC分类号： H01J27/18 , H01J27/024 , H01J37/04 , H01J37/08 , H01J2237/04735 , H01J2237/083
摘要： This invention relates to an Ion gun (10) which comprises of plasma generator (11) driven from an RF source (12), a plasma or source chamber (13), having an outlet (14), across which is mounted an accelerator grid (15). The accelerator grid (15) comprises four individual grids. The first grid (16), which is closest to the outlet (14), is maintained at a positive voltage by a DC source (16a), the second grid (17) is maintained strongly negative by DC source (17a). The third grid (18) is maintained at a negative voltage, which is much lower than that of the second grid (17), by DC source (18a) and the fourth grid is grounded. Means of mounting these grids are also described.
摘要翻译：本发明涉及一种离子枪（10），其包括从RF源（12）驱动的等离子体发生器（11），具有出口（14）的等离子体或源室（13），其上安装有加速器格栅（15）。加速器网格（15）包括四个单独的网格。最靠近出口（14）的第一栅极（16）通过直流源（16a）保持在正电压，第二栅极（17）被直流源（17a）强烈地保持为负。第三栅极（18）通过直流源（18a）保持在比第二栅极（17）的负电压低得多的负电压，第四栅极接地。还描述了安装这些网格的方法。

9. 发明申请

US20100084569A1 ION DEPOSITION APPARATUS 有权
标题翻译：离子沉积装置
公开(公告)号：US20100084569A1
公开(公告)日：2010-04-08
申请号：US12309464
申请日：2007-07-06
申请人： Gary Proudfoot , Christopher David George , Paulo Edurado Lima , Gordon Robert Green , Robert Kenneth Trowell
发明人： Gary Proudfoot , Christopher David George , Paulo Edurado Lima , Gordon Robert Green , Robert Kenneth Trowell
IPC分类号： H01J37/30 , H01J27/02 , H01J37/20 , H01J37/08
CPC分类号： C23C14/46 , H01J27/18 , H01J37/20 , H01J37/3178 , H01J2237/024 , H01J2237/3146
摘要： This invention relates to a broad beam ion deposition apparatus (100) including an ion source (101), a target (102), a tillable substrate table (103) and an auxiliary port (104). The target (102) is in the form of a carousel which carries a number of targets and the ion source (101) is configured to produce a substantially rectangular section beam (105).
摘要翻译：本发明涉及一种包括离子源（101），靶（102），可耕化基板台（103）和辅助端口（104）的宽束离子沉积装置（100）。目标（102）是携带多个目标的转盘的形式，并且离子源（101）被配置为产生基本上矩形的截面梁（105）。

10. 发明授权

US06346768B1 Low energy ion gun having multiple multi-aperture electrode grids with specific spacing requirements 有权
标题翻译：低能离子枪具有多个具有特定间距要求的多孔电极网格
公开(公告)号：US06346768B1
公开(公告)日：2002-02-12
申请号：US09284929
申请日：1999-06-07
申请人： Gary Proudfoot
发明人： Gary Proudfoot
IPC分类号： H05B3126
CPC分类号： H01J27/024 , H01J27/18 , H01J37/08
摘要： A low energy ion gun for ion beam processing. The ion gun includes a plasma chamber having an open ended, conductive, non-magnetic body, a first end of which is closed by a flat or minimally dished dielectric member and with electrodes at a second end thereof opposite the first end. The ion gun also has primary magnets arranged around the body for trapping electrons adjacent the wall of the plasma chamber in use of the ion gun and an r.f. induction device. The electrodes include multi-aperture grids arranged for connection to respective positive potential sources and positioned to contact the plasma in the plasma chamber. The apertures of the grids are aligned so that particles emerging from an aperture of a first one of the grids are accelerated through corresponding apertures of the other grids in the form of a beamlet. A plurality of beamlets forms a beam.
摘要翻译：用于离子束处理的低能离子枪。离子枪包括具有开口的，导电的非磁性体的等离子体室，其第一端由平坦或最小的碟形电介质构件封闭，电极在与第一端相对的第二端处。离子枪还具有围绕身体设置的主磁体，用于在使用离子枪和r.f.中捕获邻近等离子体室壁的电子。感应装置。电极包括布置成连接到相应的正电位源并被定位成与等离子体室中的等离子体接触的多孔格栅。栅格的孔径对齐，使得从栅格中的第一栅极出射的颗粒通过子束形式的其它栅格的相应孔加速。多个子束形成一束。

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