专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US06390394B1 Nozzle and adjust module 失效
标题翻译：喷嘴和调整模块
公开(公告)号：US06390394B1
公开(公告)日：2002-05-21
申请号：US09727494
申请日：2000-12-04
申请人： Fu-Ching Tung , Chia-Ming Chen , Jen-Rong Huang , Jonathan Wang , Peter L. Mahneke
发明人： Fu-Ching Tung , Chia-Ming Chen , Jen-Rong Huang , Jonathan Wang , Peter L. Mahneke
IPC分类号： B05B1508
CPC分类号： H01L21/6708 , B05B12/1472 , B05B15/654 , B05B15/68 , B05C11/08
摘要： The present invention relates to a nozzle and adjust module of chemicals when wafers are processed during the IC manufacturing process. After wafers are loaded on a chuck of a reaction chamber, five chemicals required for the manufacturing process are transported into the passages, and are sprayed on the surfaces of rotating wafers via different nozzles. The centrifugal effect due to the rotation of a main motor is exploited to coat the chemicals on the whole wafer quickly and uniformly. The present invention can apply to both closed and open reaction chambers. The spray head of the present invention has a specially designed angle, and has level adjusting and height adjusting functions so that high flexibility in the manufacturing process can be obtained.
摘要翻译：本发明涉及在IC制造过程中处理晶片时的化学品的喷嘴和调节模块。在将晶片装载在反应室的卡盘上之后，将制造过程所需的五种化学品输送到通道中，并通过不同的喷嘴喷射在旋转晶片的表面上。利用主电机的旋转引起的离心效应被快速且均匀地涂覆在整个晶片上的化学物质。本发明可应用于封闭和开放的反应室。本发明的喷头具有特别设计的角度，具有水平调节和高度调节功能，从而可以获得制造过程中的高柔性。

2. 发明授权

US06220771B1 Wafer backside protection apparatus 有权
标题翻译：晶片背面保护装置
公开(公告)号：US06220771B1
公开(公告)日：2001-04-24
申请号：US09461349
申请日：1999-12-15
申请人： Fu-Ching Tung , Hong-Ming Chen , Wu-Lang Lin , Chia-Ming Chen , Jen-Rong Huang , Peter L. Mahneke , Janathan Wang
发明人： Fu-Ching Tung , Hong-Ming Chen , Wu-Lang Lin , Chia-Ming Chen , Jen-Rong Huang , Peter L. Mahneke , Janathan Wang
IPC分类号： G03D500
CPC分类号： H01L21/6708 , G03F7/707 , G03F7/70916 , H01L21/67028
摘要： A wafer backside protection apparatus includes a motor, a vacuum chuck, an annular seat and a top cover. The motor has an output shaft upon which the chuck is mounted. The chuck has a front surface to suck and hold a wafer from its backside. The chuck has a backside in which a water guard ring and a plurality of slant bores are formed. The slant bores run from the water guard ring through the wafer front surface. The annular seat is located below the chuck and has two symmetrical slant nozzles projecting toward motor rotating direction for ejecting protection liquid to the water guard ring. Protection liquid may be spun and splashed out through the slant bores to form a protection liquid film between the chuck and the wafer backside due to centrifugal force resulting from chuck and wafer rotation driven by the motor. The protection liquid film may protect wafer backside from chemical erosion and contamination resulting from wafer production process.
摘要翻译：晶片背面保护装置包括电动机，真空吸盘，环形座和顶盖。马达具有输出轴，卡盘安装在该输出轴上。卡盘具有从其背面吸取并保持晶片的前表面。卡盘具有背面，其中形成有防水环和多个倾斜孔。倾斜的孔从防水环穿过晶片正面。环形座位于卡盘下方，并具有朝向马达旋转方向突出的两个对称倾斜喷嘴，用于将防护液喷射到防水环上。保护液体可以通过倾斜孔旋转溅出，由卡盘和由马达驱动的晶片旋转产生的离心力在卡盘和晶片背面之间形成保护液膜。保护液膜可以保护晶片背面免受晶片生产过程中的化学侵蚀和污染。

3. 发明申请

US20100123381A1 CATHODE DISCHARGE APPARATUS 有权
标题翻译：阴极放电装置
公开(公告)号：US20100123381A1
公开(公告)日：2010-05-20
申请号：US12411797
申请日：2009-03-26
申请人： FU-CHING TUNG , Tean-Mu Shen , Jung-Chen Ho , Pei-Shan Wu , Chia-Ming Chen , Kuan-Chou Chen , Jung-Chen Chien , Muh-Wang Liang
发明人： FU-CHING TUNG , Tean-Mu Shen , Jung-Chen Ho , Pei-Shan Wu , Chia-Ming Chen , Kuan-Chou Chen , Jung-Chen Chien , Muh-Wang Liang
IPC分类号： H01J17/26
CPC分类号： H01J37/32449 , H01J37/3244
摘要： A cathode discharge device is provided. The cathode discharge apparatus includes an anode, a cathode and plural cathode chambers. The cathode is located inside the anode, where the cathode has plural flow channels and at least one flow channel hole, and the plural flow channels are connected to one another through the flow channel hole. The plural cathode chambers are located inside the cathode, wherein each of the cathode chambers has a chamber outlet and a chamber inlet connected with at least one of the flow channels.
摘要翻译：提供阴极放电装置。阴极放电装置包括阳极，阴极和多个阴极室。阴极位于阳极的内部，其中阴极具有多个流动通道和至少一个流动通道孔，并且多个流动通道通过流动通道孔相互连接。多个阴极室位于阴极内，其中每个阴极室具有腔室出口和与至少一个流动通道连接的室入口。

4. 发明授权

US07238265B2 Electroplating apparatus with functions of voltage detection and flow rectification 有权
标题翻译：具有电压检测和流量整流功能的电镀设备
公开(公告)号：US07238265B2
公开(公告)日：2007-07-03
申请号：US10743496
申请日：2003-12-23
申请人： Chih-Cheng Wang , Chih-Yuan Tseng , Jen-Rong Huang , Sheng-Lang Lee , Chia-Ming Chen , Pang-Ming Chiang
发明人： Chih-Cheng Wang , Chih-Yuan Tseng , Jen-Rong Huang , Sheng-Lang Lee , Chia-Ming Chen , Pang-Ming Chiang
IPC分类号： C25B9/04 , C25F7/00
CPC分类号： C25D5/08 , C25D17/001 , C25D17/008 , C25D21/10
摘要： The present invention provides a fountain-type electroplating apparatus with functions of voltage detection and flow rectification, comprising: an electroplating tank, a rectification device, and an overflow tank, wherein the electroplating tank is positioned inside the overflow tank, and the rectification device is arranged under the electroplating tank, in addition, the electroplating tank is composed of a shell, a cathode electrode, and an mesh shaped anode. The apparatus of the present invention further comprises: a power supplier, a switcher, a plurality of detection circuits, and a plurality of connecting line, which is used for monitoring the same.
摘要翻译：本发明提供一种具有电压检测和整流功能的喷泉型电镀设备，包括：电镀槽，整流装置和溢流槽，其中电镀槽位于溢流槽内，整流装置为另外，电镀槽由电镀槽构成，由电解槽，阴极电极和网状阳极构成。本发明的装置还包括：电源，切换器，多个检测电路和多个连接线，用于对其进行监视。

5. 发明申请

US20110079963A1 VACUUM APPARATUS OF ROTARY MOTION ENTRY 有权
标题翻译：旋转运动入口的真空装置
公开(公告)号：US20110079963A1
公开(公告)日：2011-04-07
申请号：US12615811
申请日：2009-11-10
申请人： Kuan-Chou Chen , Fu-Ching Tung , Chia-Ming Chen , Pei-Shan Wu , Tean-Mu Shen , Jung-Chen Ho
发明人： Kuan-Chou Chen , Fu-Ching Tung , Chia-Ming Chen , Pei-Shan Wu , Tean-Mu Shen , Jung-Chen Ho
IPC分类号： F16C33/10 , F16J15/32
CPC分类号： F16C33/76 , F16C2300/62 , Y10S277/913
摘要： A vacuum apparatus of rotary motion entry is disclosed, which comprises: a shaft sleeve, disposed on a cavity wall of a vacuum system; a rotary shaft, ensheathed by the shaft sleeve; and a transmission set, connected to the rotary shaft for driving the same; wherein, the rotary shaft is disposed passing through a hole formed on the base of the shaft sleeve while there are a first bearing, a second bearing, a sealing ring and a shaft seal being arranged separately inside the hole. Moreover, the shaft seal has a flake-like lip flange formed extending toward the center of the hole, that is capable of being extended away from the vacuum system by the inserting of the rotary shaft into the hole, and thereby, enabling the lip flange to engage with the rotary shaft tightly by the atmospheric pressure and thus isolating the outside world from the vacuum system.
摘要翻译：公开了一种旋转运动进入的真空装置，其包括：设置在真空系统的空腔壁上的轴套; 旋转轴，由轴套套管; 以及与驱动该旋转轴的旋转轴连接的变速器组; 其特征在于，所述旋转轴设置成穿过形成在所述轴套的基部上的孔，同时在所述孔内分开设置有第一轴承，第二轴承，密封环和轴密封件。此外，轴密封件具有形成为朝向孔中心延伸的片状唇缘凸缘，其能够通过将旋转轴插入孔而远离真空系统延伸，从而使得唇缘凸缘与大气压力紧密地与旋转轴啮合，从而将外界与真空系统隔离开来。

6. 发明授权

US08198793B2 Cathode discharge apparatus 有权
标题翻译：阴极放电装置
公开(公告)号：US08198793B2
公开(公告)日：2012-06-12
申请号：US12411797
申请日：2009-03-26
申请人： Fu-Ching Tung , Tean-Mu Shen , Jung-Chen Ho , Pei-Shan Wu , Chia-Ming Chen , Kuan-Chou Chen , Jung-Chen Chien , Muh-Wang Liang
发明人： Fu-Ching Tung , Tean-Mu Shen , Jung-Chen Ho , Pei-Shan Wu , Chia-Ming Chen , Kuan-Chou Chen , Jung-Chen Chien , Muh-Wang Liang
IPC分类号： H01J17/26
CPC分类号： H01J37/32449 , H01J37/3244
摘要： A cathode discharge device is provided. The cathode discharge apparatus includes an anode, a cathode and plural cathode chambers. The cathode is located inside the anode, where the cathode has plural flow channels and at least one flow channel hole, and the plural flow channels are connected to one another through the flow channel hole. The plural cathode chambers are located inside the cathode, wherein each of the cathode chambers has a chamber outlet and a chamber inlet connected with at least one of the flow channels.
摘要翻译：提供阴极放电装置。阴极放电装置包括阳极，阴极和多个阴极室。阴极位于阳极的内部，其中阴极具有多个流动通道和至少一个流动通道孔，并且多个流动通道通过流动通道孔相互连接。多个阴极室位于阴极内，其中每个阴极室具有腔室出口和与至少一个流动通道连接的室入口。

7. 发明申请

US20120132366A1 PLASMA PROCESSING APPARATUS 审中-公开
标题翻译：等离子体加工设备
公开(公告)号：US20120132366A1
公开(公告)日：2012-05-31
申请号：US13157878
申请日：2011-06-10
申请人： Pei-Shan Wu , Fu-Ching Tung , Jung-Chen Ho , Tean-Mu Shen , Chia-Ming Chen
发明人： Pei-Shan Wu , Fu-Ching Tung , Jung-Chen Ho , Tean-Mu Shen , Chia-Ming Chen
IPC分类号： C23F1/08 , C23C16/50 , C23C16/455
CPC分类号： H01J37/3244 , C23C16/45565 , C23C16/45574 , C23C16/45578 , C23C16/50 , C23C16/513 , H01J37/32357
摘要： A plasma processing apparatus is disclosed, which includes: a cathode module comprising a plurality of first channels which generate plasma; an anode having a chamber which contains the cathode and having at least one plasma outlet corresponding to the first channels; an electrode connected to a high-frequency electrical power and the cathode; and a plurality of second channels penetrating through the anode; wherein each first channel and each second channel are disposed alternately. A first gas is introduced into the first channels ionized under high frequency electrical power. In the first channels, the free electrons collided brings high density of plasma. The generated plasma is expelled through the plasma outlet to form a plasma diffusion region. A second gas is introduced into the plasma diffusion region through the second channels to take part in the reaction of plasma.
摘要翻译：公开了一种等离子体处理装置，其包括：阴极模块，包括产生等离子体的多个第一通道; 阳极，其具有容纳阴极并具有至少一个对应于第一通道的等离子体出口的室; 连接到高频电源的电极和阴极; 和穿过阳极的多个第二通道; 其中每个第一通道和每个第二通道交替设置。将第一气体引入到在高频电力下离子化的第一通道。在第一个通道中，自由电子碰撞带来了高密度的等离子体。产生的等离子体通过等离子体出口排出以形成等离子体扩散区域。通过第二通道将第二气体引入等离子体扩散区域以参与等离子体的反应。

8. 发明授权

US08146923B2 Vacuum apparatus of rotary motion entry 有权
标题翻译：旋转运动进入真空装置
公开(公告)号：US08146923B2
公开(公告)日：2012-04-03
申请号：US12615811
申请日：2009-11-10
申请人： Kuan-Chou Chen , Fu-Ching Tung , Chia-Ming Chen , Pei-Shan Wu , Tean-Mu Shen , Jung-Chen Ho
发明人： Kuan-Chou Chen , Fu-Ching Tung , Chia-Ming Chen , Pei-Shan Wu , Tean-Mu Shen , Jung-Chen Ho
IPC分类号： F16J15/54
CPC分类号： F16C33/76 , F16C2300/62 , Y10S277/913
摘要： A vacuum apparatus of rotary motion entry is disclosed, which comprises: a shaft sleeve, disposed on a cavity wall of a vacuum system; a rotary shaft, ensheathed by the shaft sleeve; and a transmission set, connected to the rotary shaft for driving the same; wherein, the rotary shaft is disposed passing through a hole formed on the base of the shaft sleeve while there are a first bearing, a second bearing, a sealing ring and a shaft seal being arranged separately inside the hole. Moreover, the shaft seal has a flake-like lip flange formed extending toward the center of the hole, that is capable of being extended away from the vacuum system by the inserting of the rotary shaft into the hole, and thereby, enabling the lip flange to engage with the rotary shaft tightly by the atmospheric pressure and thus isolating the outside world from the vacuum system.
摘要翻译：公开了一种旋转运动进入的真空装置，其包括：设置在真空系统的空腔壁上的轴套; 旋转轴，由轴套套管; 以及与驱动该旋转轴的旋转轴连接的变速器组; 其特征在于，所述旋转轴设置成穿过形成在所述轴套的基部上的孔，同时在所述孔内分开设置有第一轴承，第二轴承，密封环和轴密封件。此外，轴密封件具有形成为朝向孔中心延伸的片状唇缘凸缘，其能够通过将旋转轴插入孔而远离真空系统延伸，从而使得唇缘凸缘与大气压力紧密地与旋转轴啮合，从而将外界与真空系统隔离开来。

9. 发明申请

US20050051425A1 Electroplating apparatus with functions of voltage detection and flow rectification 有权
标题翻译：具有电压检测和流量整流功能的电镀设备
公开(公告)号：US20050051425A1
公开(公告)日：2005-03-10
申请号：US10743496
申请日：2003-12-23
申请人： Chih-Cheng Wang , Chih-Yuan Tseng , Jen-Rong Huang , Sheng-Lang Lee , Chia-Ming Chen , Pang-Ming Chiang
发明人： Chih-Cheng Wang , Chih-Yuan Tseng , Jen-Rong Huang , Sheng-Lang Lee , Chia-Ming Chen , Pang-Ming Chiang
IPC分类号： C25C7/00 , C25D5/08 , C25D17/00 , C25D21/10 , G01R19/00
CPC分类号： C25D5/08 , C25D17/001 , C25D17/008 , C25D21/10
摘要： The present invention provides a fountain-type electroplating apparatus with functions of voltage detection and flow rectification, comprising: an electroplating tank, a rectification device, and an overflow tank, wherein the electroplating tank is positioned inside the overflow tank, and the rectification device is arranged under the electroplating tank, in addition, the electroplating tank is composed of a shell, a cathode electrode, and an mesh shaped anode. The apparatus of the present invention further comprises: a power supplier, a switcher, a plurality of detection circuits, and a plurality of connecting line, which is used for monitoring the same.
摘要翻译：本发明提供一种具有电压检测和整流功能的喷泉型电镀设备，包括：电镀槽，整流装置和溢流槽，其中电镀槽位于溢流槽内，整流装置为另外，电镀槽由电镀槽构成，由电解槽，阴极电极和网状阳极构成。本发明的装置还包括：电源，切换器，多个检测电路和多个连接线，用于对其进行监视。

10. 发明授权

US07612568B2 Open-circuit testing system and method 有权
标题翻译：开路测试系统及方法
公开(公告)号：US07612568B2
公开(公告)日：2009-11-03
申请号：US11743641
申请日：2007-05-02
申请人： Chien-Wei Chen , Chia-Ming Chen
发明人： Chien-Wei Chen , Chia-Ming Chen
IPC分类号： G01R31/00 , G01R31/02
CPC分类号： G01R31/046
摘要： The invention discloses a testing system and method suitable for determining the connection state of an electronic component in an electronic device assembly. In an embodiment, the testing system comprises a signal sensing unit configured to provide a sensed signal induced by capacitive coupling in response to the output of a testing signal passing through a tested pin, a signal processor unit configured to filter and over-sample the sensed signal to obtain a digital signal, and an analyzer unit configured to compute the digital signal for determining a connection state of the test pin.
摘要翻译：本发明公开了一种适用于确定电子设备组件中的电子部件的连接状态的测试系统和方法。在一个实施例中，测试系统包括信号感测单元，其被配置为响应于通过测试引脚的测试信号的输出来提供由电容耦合引起的感测信号，信号处理器单元被配置为对所感测的信号进行滤波和过采样信号以获得数字信号，以及分析器单元，被配置为计算用于确定测试引脚的连接状态的数字信号。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式