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1. 发明授权

US08289498B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US08289498B2
公开(公告)日：2012-10-16
申请号：US12483703
申请日：2009-06-12
申请人： Erik Roelof Loopstra , Petrus Rutgerus Bartray , Leon Martin Levasier , Bernardus Antonius Johannes Luttikhuis , Josephus Jacobus Smits , Anthonie Aantjes , Maurice Willem Jozef Etiënne Wijckmans , Johannes Bernardus Ridder , Andre Schreuder , Dennis Jozef Maria Paulussen , Peter Gerardus Jonkers , Hugues Poincelin , Fransiscus Theresia Noel Heusschen
发明人： Erik Roelof Loopstra , Petrus Rutgerus Bartray , Leon Martin Levasier , Bernardus Antonius Johannes Luttikhuis , Josephus Jacobus Smits , Anthonie Aantjes , Maurice Willem Jozef Etiënne Wijckmans , Johannes Bernardus Ridder , Andre Schreuder , Dennis Jozef Maria Paulussen , Peter Gerardus Jonkers , Hugues Poincelin , Fransiscus Theresia Noel Heusschen
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F7/709 , G03F7/70808
摘要： A lithographic apparatus includes a projection system configured to project an image onto a substrate, a substrate table configured to support the substrate, a first chamber that at least partially surrounds the projection system, and a second chamber that at least partially surrounds the substrate table and a first frame. The apparatus includes a base frame configured to support the second chamber, and an intermediate frame coupled to the base frame. The intermediate frame is configured to separate the first chamber and the second chamber. The apparatus includes a support coupled to the first frame. The support is configured to support the first chamber through a coupled opening in the intermediate frame and the second chamber.
摘要翻译：光刻设备包括：投影系统，被配置为将图像投影到基板上;衬底台，其被配置为支撑所述基板;第一室，其至少部分地围绕所述投影系统;以及第二室，其至少部分地围绕所述基板台; 第一帧。该装置包括被配置为支撑第二室的基座框架，以及耦合到该底座框架的中间框架。中间框架构造成分离第一室和第二室。该装置包括耦合到第一框架的支撑件。支撑构造成通过中间框架和第二室中的联接开口支撑第一室。

2. 发明申请

US20100002207A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：US20100002207A1
公开(公告)日：2010-01-07
申请号：US12483703
申请日：2009-06-12
申请人： Erik Roelof LOOPSTRA , Petrus Rutgerus Bartray , Leon Martin Levasier , Bernardus Antonius Johannes Luttikhuis , Josephus Jacobus Smits , Anthonie Aantjes , Maurice Willem Jozef Etienne Wijckmans , Johannes Bernardus Ridder , Andre Schreuder , Dennis Jozef Maria Paulussen , Peter Gerardus Jonkers , Hugues Poincelin , Fransiscus Theresia Noel Heusschen
发明人： Erik Roelof LOOPSTRA , Petrus Rutgerus Bartray , Leon Martin Levasier , Bernardus Antonius Johannes Luttikhuis , Josephus Jacobus Smits , Anthonie Aantjes , Maurice Willem Jozef Etienne Wijckmans , Johannes Bernardus Ridder , Andre Schreuder , Dennis Jozef Maria Paulussen , Peter Gerardus Jonkers , Hugues Poincelin , Fransiscus Theresia Noel Heusschen
IPC分类号： G03B27/52
CPC分类号： G03F7/709 , G03F7/70808
摘要： A lithographic apparatus includes a projection system configured to project an image onto a substrate, a substrate table configured to support the substrate, a first chamber that at least partially surrounds the projection system, and a second chamber that at least partially surrounds the substrate table and a first frame. The apparatus includes a base frame configured to support the second chamber, and an intermediate frame coupled to the base frame. The intermediate frame is configured to separate the first chamber and the second chamber. The apparatus includes a support coupled to the first frame. The support is configured to support the first chamber through a coupled opening in the intermediate frame and the second chamber.
摘要翻译：光刻设备包括：投影系统，被配置为将图像投影到基板上;衬底台，其被配置为支撑所述基板;第一室，其至少部分地围绕所述投影系统;以及第二室，其至少部分地围绕所述基板台; 第一帧。该装置包括被配置为支撑第二室的基座框架，以及耦合到该底座框架的中间框架。中间框架构造成分离第一室和第二室。该装置包括耦合到第一框架的支撑件。支撑构造成通过中间框架和第二室中的联接开口支撑第一室。

3. 发明申请

US20130050675A1 Lithographic Apparatus, Device Manufacturing Method, and Method of Calibrating a Displacement Measuring System 有权
标题翻译：平版印刷设备，设备制造方法和校准位移测量系统的方法
公开(公告)号：US20130050675A1
公开(公告)日：2013-02-28
申请号：US13551361
申请日：2012-07-17
申请人： Maarten Jozef JANSEN , Andre Schreuder
发明人： Maarten Jozef JANSEN , Andre Schreuder
IPC分类号： G03B27/58 , G01B11/02
CPC分类号： G03F7/70516 , G03F7/70775
摘要： An interferometric displacement measuring system operable to measure displacements of a movable object of the lithographic apparatus in a first direction using a measurement beam of radiation and a reflector. The reflector being substantially planar and substantially perpendicular to the first direction. Calibration is obtained using a first set of measurements of the angular position movable object. A phase offset in the measurement beam is affected. A second set of measurements of the angular position of the movable object is obtained. The interferometric displacement measuring system is calibrated based on the first and second sets of measurements.
摘要翻译：一种干涉位移测量系统，其可操作以使用测量辐射束和反射器来测量所述光刻设备的可移动物体在第一方向上的位移。反射器基本上是平面的并且基本上垂直于第一方向。使用角位置可移动物体的第一组测量获得校准。测量光束中的相位偏移受到影响。获得可移动物体的角度位置的第二组测量结果。基于第一和第二组测量来校准干涉位移测量系统。

4. 发明申请

US20090180084A1 LITHOGRAPHIC APPARATUS WITH AN ENCODER ARRANGED FOR DEFINING A ZERO LEVEL 有权
标题翻译：具有编码器的LITHOGRAPHIC设备安排定义零水平
公开(公告)号：US20090180084A1
公开(公告)日：2009-07-16
申请号：US12351563
申请日：2009-01-09
申请人： Suzanne Johanna Antonetta Geertruda COSIJNS , Andre Schreuder
发明人： Suzanne Johanna Antonetta Geertruda COSIJNS , Andre Schreuder
IPC分类号： G03B27/00 , G01B11/14
CPC分类号： G03F7/70775
摘要： A lithographic apparatus includes a position measuring system configured to measure a position of a moveable object with respect to a reference frame of the lithographic apparatus, in at least one direction of an orthogonal x-y-z coordinate system of the moveable object. The position measuring system includes an optical x-z-encoder configured to measure a displacement of a radiation source, a first grating, and a detector with respect to a second grating of the encoder. The first grating includes an alignment marker. A controller is configured to define a zero level of the moveable object with respect to the reference frame in at least one of the x- and z-direction by performing the scanning along the first grating, the alignment marker during the scanning step causing changes in the phase of the response of both the first positive and negative orders.
摘要翻译：光刻设备包括位置测量系统，其配置成在可移动物体的正交x-y-z坐标系的至少一个方向上测量相对于光刻设备的参考系的可移动物体的位置。位置测量系统包括光学x-z编码器，其配置成相对于编码器的第二光栅测量辐射源的位移，第一光栅和检测器。第一光栅包括对准标记。控制器被配置为通过沿着第一光栅执行扫描来定义在x和z方向中的至少一个方面相对于参考帧的可移动物体的零电平，扫描步骤期间的对准标记引起变化第一个正负指令的反应阶段。

5. 发明授权

US08937707B2 Lithographic apparatus, device manufacturing method, and method of calibrating a displacement measuring system 有权
标题翻译：光刻设备，器件制造方法和校准位移测量系统的方法
公开(公告)号：US08937707B2
公开(公告)日：2015-01-20
申请号：US13551361
申请日：2012-07-17
申请人： Maarten Jozef Jansen , Andre Schreuder
发明人： Maarten Jozef Jansen , Andre Schreuder
IPC分类号： G03B27/52 , G03B27/54 , G03F7/20
CPC分类号： G03F7/70516 , G03F7/70775
摘要： An interferometric displacement measuring system operable to measure displacements of a movable object of the lithographic apparatus in a first direction using a measurement beam of radiation and a reflector. The reflector being substantially planar and substantially perpendicular to the first direction. Calibration is obtained using a first set of measurements of the angular position movable object. A phase offset in the measurement beam is affected. A second set of measurements of the angular position of the movable object is obtained. The interferometric displacement measuring system is calibrated based on the first and second sets of measurements.
摘要翻译：一种干涉位移测量系统，其可操作以使用测量辐射束和反射器来测量所述光刻设备的可移动物体在第一方向上的位移。反射器基本上是平面的并且基本上垂直于第一方向。使用角位置可移动物体的第一组测量获得校准。测量光束中的相位偏移受到影响。获得可移动物体的角度位置的第二组测量结果。基于第一和第二组测量来校准干涉位移测量系统。

6. 发明授权

US08111377B2 Lithographic apparatus with an encoder arranged for defining a zero level 有权
标题翻译：具有用于定义零电平的编码器的平版印刷设备
公开(公告)号：US08111377B2
公开(公告)日：2012-02-07
申请号：US12351563
申请日：2009-01-09
申请人： Suzanne Johanna Antonetta Geertruda Cosijns , Andre Schreuder
发明人： Suzanne Johanna Antonetta Geertruda Cosijns , Andre Schreuder
IPC分类号： G03B27/42
CPC分类号： G03F7/70775
摘要： A lithographic apparatus includes a position measuring system configured to measure a position of a moveable object with respect to a reference frame of the lithographic apparatus, in at least one direction of an orthogonal x-y-z coordinate system of the moveable object. The position measuring system includes an optical x-z-encoder configured to measure a displacement of a radiation source, a first grating, and a detector with respect to a second grating of the encoder. The first grating includes an alignment marker. A controller is configured to define a zero level of the moveable object with respect to the reference frame in at least one of the x- and z-direction by performing the scanning along the first grating, the alignment marker during the scanning step causing changes in the phase of the response of both the first positive and negative orders.
摘要翻译：光刻设备包括位置测量系统，其配置成在可移动物体的正交x-y-z坐标系的至少一个方向上测量相对于光刻设备的参考系的可移动物体的位置。位置测量系统包括光学x-z编码器，其配置成相对于编码器的第二光栅测量辐射源的位移，第一光栅和检测器。第一光栅包括对准标记。控制器被配置为通过沿着第一光栅执行扫描来定义在x和z方向中的至少一个方面相对于参考帧的可移动物体的零电平，扫描步骤期间的对准标记引起变化第一个正负指令的反应阶段。

7. 发明授权

US07417710B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07417710B2
公开(公告)日：2008-08-26
申请号：US11234393
申请日：2005-09-26
申请人： Andre Schreuder
发明人： Andre Schreuder
IPC分类号： G03B27/42 , G03B27/58
CPC分类号： G03F7/70341
摘要： A lithographic apparatus includes a liquid supply system to supply an immersion liquid between a downstream lens of a projection system of the lithographic apparatus and a substrate. The lithographic apparatus further includes a closing element to close an underside of the liquid supply system thus preventing leaking of the immersion liquid from the liquid supply system when the substrate is removed from the underside of the liquid supply system. According to an aspect of the invention, an inductive sensor may be used to measure a position of the closing element. The inductive sensor may include an eddy current sensor. A metal foil or other conductive layer may be applied to the closing element. According to an aspect of the invention, a fast return of the closing disc into the holder is now made possible making use of the position of the closing disc as established with the inductive sensor.
摘要翻译：光刻设备包括供应系统以在光刻设备的投影系统的下游透镜和基板之间提供浸没液体。光刻设备还包括一封闭元件，用于封闭液体供应系统的下侧，从而防止当液体供应系统的下侧移除基板时液体从液体供应系统泄漏。根据本发明的一个方面，电感式传感器可用于测量关闭元件的位置。感应传感器可以包括涡流传感器。可以将金属箔或其它导电层施加到闭合元件。根据本发明的一个方面，现在可以利用与电感式传感器建立的封闭盘的位置将封闭盘快速返回到保持器中。

8. 发明申请

US20070070312A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20070070312A1
公开(公告)日：2007-03-29
申请号：US11234393
申请日：2005-09-26
申请人： Andre Schreuder
发明人： Andre Schreuder
IPC分类号： G03B27/42
CPC分类号： G03F7/70341
摘要： A lithographic apparatus comprises a liquid supply system to supply an immersion liquid between a downstream lens of a projection system of the lithographic apparatus and a substrate. The lithographic apparatus further comprises a closing element to close an underside of the liquid supply system thus preventing a leaking away of the immersion liquid from the liquid supply system when the substrate is removed from the underside of the liquid supply system. According to an aspect of the invention, an inductive sensor may be used to measure a position of the closing element. The inductive sensor may comprise an eddy current sensor, a metal foil or other conductive layer may be applied to the closing element. According to an aspect of the invention, a fast bringing back of the closing disc into the holder is now made possible making use of the position of the closing disc as established with the inductive sensor.
摘要翻译：光刻设备包括供应系统以在光刻设备的投影系统的下游透镜和基板之间提供浸没液体。光刻设备还包括一个关闭元件，用于关闭液体供应系统的下侧，从而防止当液体供应系统的下侧移除基板时浸没液体从液体供应系统泄漏。根据本发明的一个方面，电感式传感器可用于测量关闭元件的位置。感应传感器可以包括涡流传感器，金属箔或其它导电层可以施加到闭合元件。根据本发明的一个方面，现在可以利用与电感式传感器建立的关闭盘的位置，将闭合盘快速回到保持器中。

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