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1. 发明申请

US20100002207A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：US20100002207A1
公开(公告)日：2010-01-07
申请号：US12483703
申请日：2009-06-12
申请人： Erik Roelof LOOPSTRA , Petrus Rutgerus Bartray , Leon Martin Levasier , Bernardus Antonius Johannes Luttikhuis , Josephus Jacobus Smits , Anthonie Aantjes , Maurice Willem Jozef Etienne Wijckmans , Johannes Bernardus Ridder , Andre Schreuder , Dennis Jozef Maria Paulussen , Peter Gerardus Jonkers , Hugues Poincelin , Fransiscus Theresia Noel Heusschen
发明人： Erik Roelof LOOPSTRA , Petrus Rutgerus Bartray , Leon Martin Levasier , Bernardus Antonius Johannes Luttikhuis , Josephus Jacobus Smits , Anthonie Aantjes , Maurice Willem Jozef Etienne Wijckmans , Johannes Bernardus Ridder , Andre Schreuder , Dennis Jozef Maria Paulussen , Peter Gerardus Jonkers , Hugues Poincelin , Fransiscus Theresia Noel Heusschen
IPC分类号： G03B27/52
CPC分类号： G03F7/709 , G03F7/70808
摘要： A lithographic apparatus includes a projection system configured to project an image onto a substrate, a substrate table configured to support the substrate, a first chamber that at least partially surrounds the projection system, and a second chamber that at least partially surrounds the substrate table and a first frame. The apparatus includes a base frame configured to support the second chamber, and an intermediate frame coupled to the base frame. The intermediate frame is configured to separate the first chamber and the second chamber. The apparatus includes a support coupled to the first frame. The support is configured to support the first chamber through a coupled opening in the intermediate frame and the second chamber.
摘要翻译：光刻设备包括：投影系统，被配置为将图像投影到基板上;衬底台，其被配置为支撑所述基板;第一室，其至少部分地围绕所述投影系统;以及第二室，其至少部分地围绕所述基板台; 第一帧。该装置包括被配置为支撑第二室的基座框架，以及耦合到该底座框架的中间框架。中间框架构造成分离第一室和第二室。该装置包括耦合到第一框架的支撑件。支撑构造成通过中间框架和第二室中的联接开口支撑第一室。

2. 发明授权

US08289498B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US08289498B2
公开(公告)日：2012-10-16
申请号：US12483703
申请日：2009-06-12
申请人： Erik Roelof Loopstra , Petrus Rutgerus Bartray , Leon Martin Levasier , Bernardus Antonius Johannes Luttikhuis , Josephus Jacobus Smits , Anthonie Aantjes , Maurice Willem Jozef Etiënne Wijckmans , Johannes Bernardus Ridder , Andre Schreuder , Dennis Jozef Maria Paulussen , Peter Gerardus Jonkers , Hugues Poincelin , Fransiscus Theresia Noel Heusschen
发明人： Erik Roelof Loopstra , Petrus Rutgerus Bartray , Leon Martin Levasier , Bernardus Antonius Johannes Luttikhuis , Josephus Jacobus Smits , Anthonie Aantjes , Maurice Willem Jozef Etiënne Wijckmans , Johannes Bernardus Ridder , Andre Schreuder , Dennis Jozef Maria Paulussen , Peter Gerardus Jonkers , Hugues Poincelin , Fransiscus Theresia Noel Heusschen
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F7/709 , G03F7/70808
摘要： A lithographic apparatus includes a projection system configured to project an image onto a substrate, a substrate table configured to support the substrate, a first chamber that at least partially surrounds the projection system, and a second chamber that at least partially surrounds the substrate table and a first frame. The apparatus includes a base frame configured to support the second chamber, and an intermediate frame coupled to the base frame. The intermediate frame is configured to separate the first chamber and the second chamber. The apparatus includes a support coupled to the first frame. The support is configured to support the first chamber through a coupled opening in the intermediate frame and the second chamber.
摘要翻译：光刻设备包括：投影系统，被配置为将图像投影到基板上;衬底台，其被配置为支撑所述基板;第一室，其至少部分地围绕所述投影系统;以及第二室，其至少部分地围绕所述基板台; 第一帧。该装置包括被配置为支撑第二室的基座框架，以及耦合到该底座框架的中间框架。中间框架构造成分离第一室和第二室。该装置包括耦合到第一框架的支撑件。支撑构造成通过中间框架和第二室中的联接开口支撑第一室。

3. 发明申请

US20110075154A1 LITHOGRAPHIC APPARATUS AND METHOD FOR CALIBRATING THE SAME 有权
标题翻译：平台设备及其校准方法
公开(公告)号：US20110075154A1
公开(公告)日：2011-03-31
申请号：US12964483
申请日：2010-12-09
申请人： Erik Roelof LOOPSTRA , Leon Martin Levasier , Rene Oesterholt
发明人： Erik Roelof LOOPSTRA , Leon Martin Levasier , Rene Oesterholt
IPC分类号： G01B11/02 , G01B11/14
CPC分类号： G03F7/70775 , G03F7/70458 , G03F7/70516 , G03F9/7011 , G03F9/7019
摘要： A method for calibrating an encoder in a lithographic apparatus, the encoder including a sensor and a grating, the encoder configured to measure a position of a moveable support of the lithographic apparatus, the method including measuring a position of the moveable support using an interferometer; and calibrating the encoder based on the position of the moveable support measured by the interferometer.
摘要翻译：一种用于校准光刻设备中的编码器的方法，所述编码器包括传感器和光栅，所述编码器被配置为测量所述光刻设备的可移动支撑件的位置，所述方法包括使用干涉仪测量所述可移动支撑件的位置; 并且基于由干涉仪测量的可移动支撑件的位置来校准编码器。

4. 发明授权

US07880901B2 Lithographic apparatus and method for calibrating the same 有权
标题翻译：平版印刷设备及其校准方法
公开(公告)号：US07880901B2
公开(公告)日：2011-02-01
申请号：US12781202
申请日：2010-05-17
申请人： Erik Roelof Loopstra , Leon Martin Levasier , Rene Oesterholt
发明人： Erik Roelof Loopstra , Leon Martin Levasier , Rene Oesterholt
IPC分类号： G01B11/14 , G01B11/02
CPC分类号： G03F7/70775 , G03F7/70458 , G03F7/70516 , G03F9/7011 , G03F9/7019
摘要： A method for calibrating an encoder in a lithographic apparatus, the encoder including a sensor and a grating, the encoder configured to measure a position of a moveable support of the lithographic apparatus, the method including measuring a position of the moveable support using an interferometer; and calibrating the encoder based on the position of the moveable support measured by the interferometer.
摘要翻译：一种用于校准光刻设备中的编码器的方法，所述编码器包括传感器和光栅，所述编码器被配置为测量所述光刻设备的可移动支撑件的位置，所述方法包括使用干涉仪测量所述可移动支撑件的位置; 并且基于由干涉仪测量的可移动支撑件的位置来校准编码器。

5. 发明申请

US20100231890A1 Device Manufacturing Method, Lithographic Apparatus and a Computer Program 有权
标题翻译：设备制造方法，平版印刷设备和计算机程序
公开(公告)号：US20100231890A1
公开(公告)日：2010-09-16
申请号：US12531230
申请日：2008-03-14
申请人： Alex Oudshoorn , Roland Blok , Erik Roelof Loopstra , Leon Martin Levasier
发明人： Alex Oudshoorn , Roland Blok , Erik Roelof Loopstra , Leon Martin Levasier
IPC分类号： G03B27/32
CPC分类号： G03F7/70725 , G03F9/7003 , G03F9/7026 , G03F9/7034
摘要： The invention relates to a device manufacturing method comprising exposing a substrate with a patterned beam of radiation formed by a reticle mounted on a displaceable reticle stage, wherein the method comprises the steps of determining a non-linear function for approximating a height and a tilt profile of a reticle surface with respect to the reticle stage and controlling a displacement of the reticle stage during exposure of the substrate in accordance with the non-linear function. The invention further relates to a lithographic apparatus and a computer program.
摘要翻译：本发明涉及一种器件制造方法，包括用安装在可移位标线片平台上的掩模版形成的图案化的辐射束暴露衬底，其中该方法包括以下步骤：确定近似高度和倾斜轮廓的非线性函数的标线片表面，并且根据非线性函数控制在衬底曝光期间标线片台的位移。本发明还涉及光刻设备和计算机程序。

6. 发明授权

US07542127B2 Lithographic apparatus and method for manufacturing a device 有权
标题翻译：光刻设备及其制造方法
公开(公告)号：US07542127B2
公开(公告)日：2009-06-02
申请号：US11312660
申请日：2005-12-21
申请人： Timotheus Franciscus Sengers , Nicolaas Antonius Allegondus Johannes Van Asten , Wilhelmus Josephus Box , Tjarko Adriaan Rudolf Van Empel , Leon Martin Levasier , Erik Roelof Loopstra , Marcel Johannus Elisabeth Hubertus Muitjens , Luberthus Ouwehand , Leon Joseph Marie Van Den Schoor , Marcel Beckers , Rob Jansen , Elke Van Loenhout
发明人： Timotheus Franciscus Sengers , Nicolaas Antonius Allegondus Johannes Van Asten , Wilhelmus Josephus Box , Tjarko Adriaan Rudolf Van Empel , Leon Martin Levasier , Erik Roelof Loopstra , Marcel Johannus Elisabeth Hubertus Muitjens , Luberthus Ouwehand , Leon Joseph Marie Van Den Schoor , Marcel Beckers , Rob Jansen , Elke Van Loenhout
IPC分类号： G03B27/52 , G03B27/54
CPC分类号： G03F7/70883 , G03F7/7075 , G03F7/70858 , G03F9/7011 , G03F9/7034
摘要： A lithographic apparatus is disclosed. The apparatus includes a substrate table constructed to hold a substrate. The substrate table is moveable to transfer the substrate between a substrate measuring position and a substrate processing position. The apparatus also includes a measuring system configured to measure at least one aspect or characteristic of the substrate when the substrate table holds the substrate in the measuring position. The measuring system is configured to direct at least one measuring beam and/or field towards a surface of the substrate. A projection system is configured to project a patterned radiation beam onto a target portion of the substrate when the substrate table holds the substrate in the substrate processing position, and a conditioning system is configured to supply a conditioning fluid to at least part of a path of the measuring beam and/or field of the measuring system to condition the part of the path.
摘要翻译：公开了一种光刻设备。该装置包括构造成保持基板的基板台。衬底台可移动以在衬底测量位置和衬底处理位置之间传送衬底。该装置还包括测量系统，其被配置为当衬底台将衬底保持在测量位置时，测量衬底的至少一个方面或特征。测量系统被配置为将至少一个测量光束和/或场朝向衬底的表面引导。投影系统被配置为当衬底台将衬底保持在衬底处理位置时将图案化的辐射束投射到衬底的目标部分上，并且调节系统被配置为将调节流体提供给至少部分路径测量系统的测量光束和/或场来调节路径的一部分。

7. 发明授权

US07408655B2 Lithographic apparatus and method for calibrating the same 有权
标题翻译：平版印刷设备及其校准方法
公开(公告)号：US07408655B2
公开(公告)日：2008-08-05
申请号：US11822633
申请日：2007-07-09
申请人： Erik Roelof Loopstra , Leon Martin Levasier , Rene Oesterholt
发明人： Erik Roelof Loopstra , Leon Martin Levasier , Rene Oesterholt
IPC分类号： G01B11/14
CPC分类号： G03F7/70775 , G03F7/70458 , G03F7/70516 , G03F9/7011 , G03F9/7019
摘要： Lithographic apparatus includes a substrate table and a motion control system for controlling a movement of the substrate table. The motion control system includes at least 3 position detectors constructed for detecting a position of the substrate table. For measuring a position and orientation of the substrate table, each position detector comprises an optical encoder of a single dimensional or multi dimensional type, the optical encoders being arranged for providing together at least 6 position values, at least one position value being provided for each of the 3 dimensions. 3 or more of the at least 3 optical encoders being connected to the substrate table at different locations in the 3 dimensional coordinate system. The motion control system is arranged to calculate the position of the substrate table in the 3 dimensional coordinate system from a subset of at least 3 of the 6 position values and to calculate an orientation of the substrate table with respect to the coordinate system from another subset of at least 3 of the 6 position values. Further, a method for calibrating the position detectors is described.
摘要翻译：光刻设备包括用于控制衬底台的移动的衬底台和运动控制系统。运动控制系统包括构造用于检测衬底台的位置的至少3个位置检测器。为了测量衬底台的位置和取向，每个位置检测器包括一维或多维类型的光学编码器，光学编码器被布置为一起提供至少6个位置值，为每个位置值提供至少一个位置值的三维。所述至少3个光学编码器中的3个或更多个在所述三维坐标系中的不同位置连接到所述基板台。运动控制系统被布置为从6个位置值中的至少3个的子集计算三维坐标系中的衬底台的位置，并且从另一个子集计算相对于坐标系的衬底台的取向至少6个位置值中的3个。此外，描述了用于校准位置检测器的方法。

8. 发明授权

US07292312B2 Lithographic apparatus and method for calibrating the same 有权
标题翻译：平版印刷设备及其校准方法
公开(公告)号：US07292312B2
公开(公告)日：2007-11-06
申请号：US11179665
申请日：2005-07-13
申请人： Erik Roelof Loopstra , Leon Martin Levasier , Rene Oesterholt
发明人： Erik Roelof Loopstra , Leon Martin Levasier , Rene Oesterholt
IPC分类号： G03B27/42 , G03B27/58 , G03B27/62
CPC分类号： G03F7/70775 , G03F7/70458 , G03F7/70516 , G03F9/7011 , G03F9/7019
摘要： Lithographic apparatus includes a substrate table and a motion control system for controlling a movement of the substrate table. The motion control system includes at least 3 position detectors constructed for detecting a position of the substrate table. For measuring a position and orientation of the substrate table, each position detector comprises an optical encoder of a single dimensional or multi dimensional type, the optical encoders being arranged for providing together at least 6 position values, at least one position value being provided for each of the 3 dimensions. Some of the optical encoders may be connected to the substrate table at different locations in the 3 dimensional coordinate system. The motion control system is arranged to calculate the position of the substrate table in the 3 dimensional coordinate system from a subset of at least 3 of the 6 position values and to calculate an orientation of the substrate table with respect to the coordinate system from another subset of at least 3 of the 6 position values. Further, a method for calibrating the position detectors is presented.
摘要翻译：光刻设备包括用于控制衬底台的移动的衬底台和运动控制系统。运动控制系统包括构造用于检测衬底台的位置的至少3个位置检测器。为了测量衬底台的位置和取向，每个位置检测器包括一维或多维类型的光学编码器，光学编码器被布置为一起提供至少6个位置值，为每个位置值提供至少一个位置值的三维。一些光学编码器可以在三维坐标系中的不同位置处连接到基板台。运动控制系统被布置为从6个位置值中的至少3个的子集计算三维坐标系中的衬底台的位置，并且从另一个子集计算相对于坐标系的衬底台的取向至少6个位置值中的3个。此外，提出了一种用于校准位置检测器的方法。

9. 发明授权

US07256871B2 Lithographic apparatus and method for calibrating the same 有权
公开(公告)号：US07256871B2
公开(公告)日：2007-08-14
申请号：US10899295
申请日：2004-07-27
申请人： Erik Roelof Loopstra , Leon Martin Levasier , Rene Oesterholt
发明人： Erik Roelof Loopstra , Leon Martin Levasier , Rene Oesterholt
IPC分类号： G03B27/58 , G03B27/42 , G03B27/52 , G03B27/32
CPC分类号： G03F7/70775 , G03F7/70458 , G03F7/70516 , G03F9/7011 , G03F9/7019
摘要： Lithographic apparatus includes a substrate table and a motion control system for controlling a movement of the substrate table. The motion control system includes at least 3 position detectors constructed for detecting a position of the substrate table. For measuring a position and orientation of the substrate table, each position detector comprises an optical encoder of a single dimensional or multi dimensional type, the optical encoders being arranged for providing together at least 6 position values, at least one position value being provided for each of the 3 dimensions. 3 or more of the at least 3 optical encoders being connected to the substrate table at different locations in the 3 dimensional coordinate system. The motion control system is arranged to calculate the position of the substrate table in the 3 dimensional coordinate system from a subset of at least 3 of the 6 position values and to calculate an orientation of the substrate table with respect to the coordinate system from another subset of at least 3 of the 6 position values. Further, a method for calibrating the position detectors is described.

10. 发明授权

US08477287B2 Device manufacturing method, lithographic apparatus and a computer program 有权
标题翻译：设备制造方法，光刻设备和计算机程序
公开(公告)号：US08477287B2
公开(公告)日：2013-07-02
申请号：US12531230
申请日：2008-03-14
申请人： Alex Oudshoorn , Leon Martin Levasier , Erik Roelof Loopstra , Roland Blok
发明人： Alex Oudshoorn , Leon Martin Levasier , Erik Roelof Loopstra , Roland Blok
IPC分类号： G03B27/42 , G03B27/52 , G03B27/58
CPC分类号： G03F7/70725 , G03F9/7003 , G03F9/7026 , G03F9/7034
摘要： The invention relates to a device manufacturing method comprising exposing a substrate with a patterned beam of radiation formed by a reticle mounted on a displaceable reticle stage, wherein the method comprises the steps of determining a non-linear function for approximating a height and a tilt profile of a reticle surface with respect to the reticle stage and controlling a displacement of the reticle stage during exposure of the substrate in accordance with the non-linear function. The invention further relates to a lithographic apparatus and a computer program.
摘要翻译：本发明涉及一种器件制造方法，包括用安装在可移位标线片平台上的掩模版形成的图案化的辐射束暴露衬底，其中该方法包括以下步骤：确定近似高度和倾斜轮廓的非线性函数的标线片表面，并且根据非线性函数控制在衬底曝光期间标线片台的位移。本发明还涉及光刻设备和计算机程序。

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