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1. 发明申请

US20100002207A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：US20100002207A1
公开(公告)日：2010-01-07
申请号：US12483703
申请日：2009-06-12
申请人： Erik Roelof LOOPSTRA , Petrus Rutgerus Bartray , Leon Martin Levasier , Bernardus Antonius Johannes Luttikhuis , Josephus Jacobus Smits , Anthonie Aantjes , Maurice Willem Jozef Etienne Wijckmans , Johannes Bernardus Ridder , Andre Schreuder , Dennis Jozef Maria Paulussen , Peter Gerardus Jonkers , Hugues Poincelin , Fransiscus Theresia Noel Heusschen
发明人： Erik Roelof LOOPSTRA , Petrus Rutgerus Bartray , Leon Martin Levasier , Bernardus Antonius Johannes Luttikhuis , Josephus Jacobus Smits , Anthonie Aantjes , Maurice Willem Jozef Etienne Wijckmans , Johannes Bernardus Ridder , Andre Schreuder , Dennis Jozef Maria Paulussen , Peter Gerardus Jonkers , Hugues Poincelin , Fransiscus Theresia Noel Heusschen
IPC分类号： G03B27/52
CPC分类号： G03F7/709 , G03F7/70808
摘要： A lithographic apparatus includes a projection system configured to project an image onto a substrate, a substrate table configured to support the substrate, a first chamber that at least partially surrounds the projection system, and a second chamber that at least partially surrounds the substrate table and a first frame. The apparatus includes a base frame configured to support the second chamber, and an intermediate frame coupled to the base frame. The intermediate frame is configured to separate the first chamber and the second chamber. The apparatus includes a support coupled to the first frame. The support is configured to support the first chamber through a coupled opening in the intermediate frame and the second chamber.
摘要翻译：光刻设备包括：投影系统，被配置为将图像投影到基板上;衬底台，其被配置为支撑所述基板;第一室，其至少部分地围绕所述投影系统;以及第二室，其至少部分地围绕所述基板台; 第一帧。该装置包括被配置为支撑第二室的基座框架，以及耦合到该底座框架的中间框架。中间框架构造成分离第一室和第二室。该装置包括耦合到第一框架的支撑件。支撑构造成通过中间框架和第二室中的联接开口支撑第一室。

2. 发明申请

US20110075154A1 LITHOGRAPHIC APPARATUS AND METHOD FOR CALIBRATING THE SAME 有权
标题翻译：平台设备及其校准方法
公开(公告)号：US20110075154A1
公开(公告)日：2011-03-31
申请号：US12964483
申请日：2010-12-09
申请人： Erik Roelof LOOPSTRA , Leon Martin Levasier , Rene Oesterholt
发明人： Erik Roelof LOOPSTRA , Leon Martin Levasier , Rene Oesterholt
IPC分类号： G01B11/02 , G01B11/14
CPC分类号： G03F7/70775 , G03F7/70458 , G03F7/70516 , G03F9/7011 , G03F9/7019
摘要： A method for calibrating an encoder in a lithographic apparatus, the encoder including a sensor and a grating, the encoder configured to measure a position of a moveable support of the lithographic apparatus, the method including measuring a position of the moveable support using an interferometer; and calibrating the encoder based on the position of the moveable support measured by the interferometer.
摘要翻译：一种用于校准光刻设备中的编码器的方法，所述编码器包括传感器和光栅，所述编码器被配置为测量所述光刻设备的可移动支撑件的位置，所述方法包括使用干涉仪测量所述可移动支撑件的位置; 并且基于由干涉仪测量的可移动支撑件的位置来校准编码器。

3. 发明申请

US20100220335A1 LITHOGRAPHIC APPARATUS AND METHOD FOR CALIBRATING THE SAME 有权
标题翻译：平台设备及其校准方法
公开(公告)号：US20100220335A1
公开(公告)日：2010-09-02
申请号：US12781202
申请日：2010-05-17
申请人： Erik Roelof LOOPSTRA , Leon Martin Levasier , Rene Oesterholt
发明人： Erik Roelof LOOPSTRA , Leon Martin Levasier , Rene Oesterholt
IPC分类号： G01B9/02 , G01B11/02
CPC分类号： G03F7/70775 , G03F7/70458 , G03F7/70516 , G03F9/7011 , G03F9/7019
摘要： A method for calibrating an encoder in a lithographic apparatus, the encoder including a sensor and a grating, the encoder configured to measure a position of a moveable support of the lithographic apparatus, the method including measuring a position of the moveable support using an interferometer; and calibrating the encoder based on the position of the moveable support measured by the interferometer.
摘要翻译：一种用于校准光刻设备中的编码器的方法，所述编码器包括传感器和光栅，所述编码器被配置为测量所述光刻设备的可移动支撑件的位置，所述方法包括使用干涉仪测量所述可移动支撑件的位置; 并且基于由干涉仪测量的可移动支撑件的位置来校准编码器。

4. 发明申请

US20090207422A1 LITHOGRAPHIC APPARATUS AND METHOD FOR CALIBRATING THE SAME 有权
标题翻译：平台设备及其校准方法
公开(公告)号：US20090207422A1
公开(公告)日：2009-08-20
申请号：US12426713
申请日：2009-04-20
申请人： Erik Roelof LOOPSTRA , Leon Martin LEVASIER , Rene OESTERHOLT
发明人： Erik Roelof LOOPSTRA , Leon Martin LEVASIER , Rene OESTERHOLT
IPC分类号： G01B11/14
CPC分类号： G03F7/70775 , G03F7/70458 , G03F7/70516 , G03F9/7011 , G03F9/7019
摘要： A measurement system configured to measure a position of an object in a lithographic apparatus, includes at least three position detectors configured to detect the position of the object, the at least three position detectors each including a single or multi-dimensional optical encoder to provide at least six position values, the optical encoders being coupled to the object at different locations within a three dimensional coordinate system, wherein at least one position value is provided for each dimension of the three dimensional coordinate system, and wherein the measurement system is configured to calculate the position of the object within the three dimensional coordinate system from a subset of at least three of the six position values and to calculate an orientation of the object with respect to the three dimensional coordinate system from another subset of at least three of the six position values.
摘要翻译：被配置为测量光刻设备中的物体的位置的测量系统包括配置成检测物体的位置的至少三个位置检测器，所述至少三个位置检测器包括单个或多维光学编码器以提供在至少六个位置值，所述光学编码器在三维坐标系内的不同位置处耦合到所述对象，其中为所述三维坐标系的每个维度提供至少一个位置值，并且其中所述测量系统被配置为计算从六个位置值中的至少三个的子集的三维坐标系中的对象的位置，并且从六个位置中的至少三个的另一子集计算相对于三维坐标系的对象的取向价值观。

5. 发明申请

US20160282727A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
公开(公告)号：US20160282727A1
公开(公告)日：2016-09-29
申请号：US15178522
申请日：2016-06-09
申请人： Joeri LOF , Hans BUTLER , Sjoerd Nicolaas Lambertus DONDERS , Aleksey Yurievich KOLESNYCHENKO , Erik Roelof LOOPSTRA , Hendricus Johannes Maria MElJER , Jeroen Johannes Sophia Maria MERTENS , Johannes Catharinus Hubertu MULKENS , Roelof Aeilko Siebrand RITSEMA , Frank VAN SCHAIK , Timotheus Franciscus SENGERS , Klaus SIMON , Joannes Theodoor DE SMIT , Alexander STRAAIJER , Helmar VAN SANTEN
发明人： Joeri LOF , Hans BUTLER , Sjoerd Nicolaas Lambertus DONDERS , Aleksey Yurievich KOLESNYCHENKO , Erik Roelof LOOPSTRA , Hendricus Johannes Maria MElJER , Jeroen Johannes Sophia Maria MERTENS , Johannes Catharinus Hubertu MULKENS , Roelof Aeilko Siebrand RITSEMA , Frank VAN SCHAIK , Timotheus Franciscus SENGERS , Klaus SIMON , Joannes Theodoor DE SMIT , Alexander STRAAIJER , Helmar VAN SANTEN
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/707 , G03F7/7085 , G03F7/70866
摘要： A lithographic projection apparatus includes a support structure to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a projection system to project the patterned beam onto a target portion of a substrate; a substrate table configured to hold the substrate, the substrate table including a support surface to support an intermediary plate between the projection system and at least one of the substrate and an object positioned on the substrate table and not in contact with the at least one of the substrate and the object; and a liquid supply system to provide a liquid, through which the beam is to be projected, in a space between the projection system and the at least one of the substrate and the object.

6. 发明申请

US20110176121A1 LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD AND COMPUTER READABLE MEDIUM 失效
标题翻译：平面设备，设备制造方法和计算机可读介质
公开(公告)号：US20110176121A1
公开(公告)日：2011-07-21
申请号：US13004557
申请日：2011-01-11
申请人： Erik Roelof LOOPSTRA , Marius RAVENSBERGEN , Franciscus Johannes Joseph JANSSEN
发明人： Erik Roelof LOOPSTRA , Marius RAVENSBERGEN , Franciscus Johannes Joseph JANSSEN
IPC分类号： G03B27/52
CPC分类号： G03B27/52 , G03B27/54 , G03F7/70266 , G03F7/70891
摘要： In a lithographic apparatus, a part of a reflector is heated and cooled. The rate of heating and/or the rate of cooling is adjusted to adjust the temperature of the part. The change in temperature of the part exerts a force on the reflector, which changes its shape.
摘要翻译：在光刻设备中，反射器的一部分被加热和冷却。调节加热速率和/或冷却速率以调节部件的温度。部件的温度变化在反射器上施加力，其改变其形状。

7. 发明申请

US20110026002A1 EUV RADIATION GENERATION APPARATUS 有权
标题翻译： EUV辐射发生装置
公开(公告)号：US20110026002A1
公开(公告)日：2011-02-03
申请号：US12830777
申请日：2010-07-06
申请人： Erik Roelof LOOPSTRA , Gerardus Hubertus Petrus Maria Swinkels , Uwe Bruno Heini Stamm
发明人： Erik Roelof LOOPSTRA , Gerardus Hubertus Petrus Maria Swinkels , Uwe Bruno Heini Stamm
IPC分类号： G03F7/20 , H05G2/00
CPC分类号： G03F7/70941 , G03F7/70033 , G03F7/70575 , H05G2/003 , H05G2/005 , H05G2/008
摘要： An EUV radiation generation apparatus includes an optical gain medium configured to produce laser radiation for interaction with a target material to produce an EUV radiation-emitting plasma, and a structure defining an aperture through which the laser radiation may pass. The structure includes a radiation guide having an outer surface constructed and arranged to guide the laser radiation away from the optical gain medium.
摘要翻译： EUV辐射发生装置包括光学增益介质，该光学增益介质被配置为产生用于与目标材料相互作用的激光辐射以产生EUV辐射发射等离子体，以及限定激光辐射通过的孔径的结构。该结构包括具有构造和布置成将激光辐射远离光学增益介质的外表面的辐射导向器。

8. 发明申请

US20100053581A1 RADIATION SOURCE AND LITHOGRAPHIC APPARATUS 有权
标题翻译：辐射源和光刻设备
公开(公告)号：US20100053581A1
公开(公告)日：2010-03-04
申请号：US12543578
申请日：2009-08-19
申请人： Gerardus Hubertus Petrus Maria SWINKELS , Vadim Yevgenyevich BANINE , Erik Roelof LOOPSTRA , Johannes Hubertus Josephina MOORS
发明人： Gerardus Hubertus Petrus Maria SWINKELS , Vadim Yevgenyevich BANINE , Erik Roelof LOOPSTRA , Johannes Hubertus Josephina MOORS
IPC分类号： G03B27/42 , B01J19/12
CPC分类号： G03F7/70916 , G03F7/70033 , G03F7/70858 , G03F7/70983 , H05G2/003 , H05G2/005 , H05G2/006 , H05G2/008
摘要： A radiation source is configured to generate extreme ultraviolet radiation. The radiation source includes a droplet generator constructed and arranged to generate fuel droplets, a heater constructed and arranged to heat the fuel droplets following generation of the fuel droplets by the droplet generator, and reduce the mass of fuel present in the fuel droplets and/or reduce the density of the fuel droplets, and a radiation emitter constructed and arranged to direct radiation onto the fuel droplets that have been heated by the heater to generate the extreme ultraviolet radiation.
摘要翻译：辐射源被配置成产生极紫外辐射。辐射源包括构造和布置成产生燃料液滴的液滴发生器，被构造和布置成在液滴发生器产生燃料液滴之后加热燃料液滴的加热器，并且减少存在于燃料液滴中的燃料质量和/或降低燃料液滴的密度，以及被构造和布置成将辐射引导到已被加热器加热以产生极紫外辐射的燃料液滴上的辐射发射器。

9. 发明申请

US20090208878A1 Lithographic System, Lithographic Apparatus and Device Manufacturing Method 审中-公开
标题翻译：光刻系统，平版印刷设备和器件制造方法
公开(公告)号：US20090208878A1
公开(公告)日：2009-08-20
申请号：US12212163
申请日：2008-09-17
申请人： Erik Roelof LOOPSTRA , Donis George Flagello
发明人： Erik Roelof LOOPSTRA , Donis George Flagello
IPC分类号： G03B27/54 , G03F7/20
CPC分类号： G03F7/70408
摘要： A lithographic system includes two lithographic apparatus. A first lithographic apparatus is configured to project a patterned radiation beam onto a first target portion of a substrate. The second lithographic apparatus includes an interferometric arrangement configured to split the radiation beam and to recombine the split beams so as to produce an interference pattern. A masking arrangement is configured to selectively transmit a portion of the interference pattern and a projection system is configured to project the selectively transmitted portion of the interference pattern onto a second target portion of the substrate.
摘要翻译：光刻系统包括两个光刻设备。第一光刻设备被配置为将图案化的辐射束投影到衬底的第一目标部分上。第二光刻设备包括被配置为分离辐射束并且将分束束复合以产生干涉图案的干涉布置。掩模布置被配置为选择性地传送干涉图案的一部分，并且投影系统被配置为将干涉图案的选择性地发送的部分投影到基板的第二目标部分上。

10. 发明申请

US20080319569A1 Lithographic Projection Apparatus and Method for Controlling a Support Structure 有权
标题翻译：光刻投影装置及控制支撑结构的方法
公开(公告)号：US20080319569A1
公开(公告)日：2008-12-25
申请号：US12142271
申请日：2008-06-19
申请人： Erik Roelof LOOPSTRA , Emiel Jozef Melanie EUSSEN , Willem Herman Gertruda Anna KOENEN , Engelbertus Antonius Fransiscus VAN DER PASCH , Marc Wilhelmus Maria VAN DER WIJST
发明人： Erik Roelof LOOPSTRA , Emiel Jozef Melanie EUSSEN , Willem Herman Gertruda Anna KOENEN , Engelbertus Antonius Fransiscus VAN DER PASCH , Marc Wilhelmus Maria VAN DER WIJST
IPC分类号： G06F19/00
CPC分类号： G03F7/709 , G03F7/70775 , G03F7/70858 , G03F9/7096
摘要： A control system controls a support structure of a lithographic apparatus. A first measurement system measures the position of a substrate supported by the support structure, in a first coordinate system. A second measurement system measures the position of the support structure in a second coordinate system, the first measurement system having a presumed position in the second coordinate system. A controller controls the position of the support structure based on measurements by the second measurement system, to convert the measured position of the substrate into a converted position of the support structure in the second coordinate system, to position the support structure based on the converted position, to receive a position error signal indicative of a difference between the presumed position and an actual position of the first measurement system in the second coordinate system, and to position the support structure dependent upon the position error signal.
摘要翻译：控制系统控制光刻设备的支撑结构。第一测量系统在第一坐标系中测量由支撑结构支撑的基板的位置。第二测量系统测量支撑结构在第二坐标系中的位置，第一测量系统在第二坐标系中具有推测位置。控制器基于第二测量系统的测量来控制支撑结构的位置，将基板的测量位置转换成第二坐标系中的支撑结构的转换位置，以基于转换位置定位支撑结构以接收表示第二坐标系中的第一测量系统的推定位置与实际位置之间的差异的位置误差信号，并且依赖于位置误差信号定位支撑结构。

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