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1. 发明授权

US07525638B2 Lithographic apparatus and device manufacturing method 失效
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07525638B2
公开(公告)日：2009-04-28
申请号：US11086667
申请日：2005-03-23
申请人： Erik Petrus Buurman , Thomas Josephus Maria Castenmiller , Johannes Wilhelmus Maria Cornelis Teeuwsen , Bearrach Moest , Mare Antonius Maria Haast
发明人： Erik Petrus Buurman , Thomas Josephus Maria Castenmiller , Johannes Wilhelmus Maria Cornelis Teeuwsen , Bearrach Moest , Mare Antonius Maria Haast
IPC分类号： G03B27/52 , G03B27/42 , G03B27/54 , G03B27/74
CPC分类号： G03F7/70575 , G03F7/70641 , G03F9/7026
摘要： A method and apparatus make use of data representing changes in wavelength of a radiation source to provide control of focal plane position or to provide correction of sensor data. In the first aspect, the wavelength variation data is provided to control systems that control focus by moving apparatus components including, for example, the mask table, the substrate table or optical elements of the projection optical system. In the second aspect, variation data is used in correcting, e.g., focal plane position data measured by a transmitted image sensor. The two aspects may be combined in a single apparatus or may be used separately.
摘要翻译：一种方法和装置利用表示辐射源的波长变化的数据来提供焦平面位置的控制或提供传感器数据的校正。在第一方面中，波长变化数据被提供给通过移动包括例如掩模台，基板台或投影光学系统的光学元件的装置部件来控制焦点的控制系统。在第二方面，变化数据用于校正例如由透射图像传感器测量的焦平面位置数据。这两个方面可以组合在单个装置中或者可以单独使用。

2. 发明授权

US07655367B2 Lithographic apparatus and device manufacturing method 失效
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07655367B2
公开(公告)日：2010-02-02
申请号：US11384824
申请日：2006-03-21
申请人： Erik Petrus Buurman , Thomas Josephus Maria Castenmiller , Johannes Wilhelmus Maria Cornelis Teeuwsen , Bearrach Moest , Marc Antonius Maria Haast
发明人： Erik Petrus Buurman , Thomas Josephus Maria Castenmiller , Johannes Wilhelmus Maria Cornelis Teeuwsen , Bearrach Moest , Marc Antonius Maria Haast
IPC分类号： G03F9/00 , G03C5/00
CPC分类号： G03F7/70575 , G03F7/70641 , G03F9/7026
摘要： A method and apparatus make use of data representing changes in wavelength of a radiation source to provide control of focal plane position or to provide correction of sensor data. In the first aspect, the wavelength variation data is provided to control systems that control focus by moving apparatus components including, for example, the mask table, the substrate table or optical elements of the projection optical system. In the second aspect, variation data is used in correcting, e.g., focal plane position data measured by an inboard sensor, such as a transmitted image sensor. The two aspects may be combined in a single apparatus or may be used separately.
摘要翻译：一种方法和装置利用表示辐射源的波长变化的数据来提供焦平面位置的控制或提供传感器数据的校正。在第一方面中，波长变化数据被提供给通过移动包括例如掩模台，基板台或投影光学系统的光学元件的装置部件来控制焦点的控制系统。在第二方面，变化数据用于校正例如由诸如传输图像传感器的内部传感器测量的焦平面位置数据。这两个方面可以组合在单个装置中或者可以单独使用。

3. 发明申请

US20100091260A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：US20100091260A1
公开(公告)日：2010-04-15
申请号：US12644903
申请日：2009-12-22
申请人： Erik Petrus Buurman , Thomas Josephus Maria Castenmiller , Johannes Wilhelmus Maria Cornelis Teeuwsen , Bearrach Moest , Marc Antonius Maria Haast
发明人： Erik Petrus Buurman , Thomas Josephus Maria Castenmiller , Johannes Wilhelmus Maria Cornelis Teeuwsen , Bearrach Moest , Marc Antonius Maria Haast
IPC分类号： G03B27/54
CPC分类号： G03F7/70575 , G03F7/70641 , G03F9/7026
摘要： A method and apparatus make use of data representing changes in wavelength of a radiation source to provide control of focal plane position or to provide correction of sensor data. In the first aspect, the wavelength variation data is provided to control systems that control focus by moving apparatus components including, for example, the mask table, the substrate table or optical elements of the projection optical system. In the second aspect, variation data is used in correcting, e.g., focal plane position data measured by an inboard sensor, such as a transmitted image sensor. The two aspects may be combined in a single apparatus or may be used separately.
摘要翻译：一种方法和装置利用表示辐射源的波长变化的数据来提供焦平面位置的控制或提供传感器数据的校正。在第一方面中，波长变化数据被提供给通过移动包括例如掩模台，基板台或投影光学系统的光学元件的装置部件来控制焦点的控制系统。在第二方面，变化数据用于校正例如由诸如传输图像传感器的内部传感器测量的焦平面位置数据。这两个方面可以组合在单个装置中或者可以单独使用。

4. 发明授权

US08975599B2 Image sensor, lithographic apparatus comprising an image sensor and use of an image sensor in a lithographic apparatus 有权
标题翻译：图像传感器，包括图像传感器的光刻设备和光刻设备中的图像传感器的使用
公开(公告)号：US08975599B2
公开(公告)日：2015-03-10
申请号：US11797505
申请日：2007-05-03
申请人： Frank Staals , Joeri Lof , Erik Roelof Loopstra , Wim Tjibbo Tel , Bearrach Moest
发明人： Frank Staals , Joeri Lof , Erik Roelof Loopstra , Wim Tjibbo Tel , Bearrach Moest
IPC分类号： G01J1/04 , G21K5/10 , G03F7/20 , G03F9/00
CPC分类号： G03F7/7085 , G03F7/70341 , G03F7/70483 , G03F9/7088
摘要： The invention relates to an image sensor for detection of an aerial image formed by a beam of radiation in a lithographic projection apparatus for exposing a pattern onto a substrate held in a substrate plane by a substrate holder. The image sensor has an image detector and a lens. The lens is arranged to project at least part of the aerial image onto the image detector. The image sensor is positioned such within the substrate holder that the lens is positioned proximate the substrate plane.
摘要翻译：本发明涉及一种用于检测由光刻投影设备中的辐射束形成的空间图像的图像传感器，用于通过基板保持器将图案曝光在保持在基板平面中的基板上。图像传感器具有图像检测器和透镜。透镜布置成将至少一部分空间图像投影到图像检测器上。图像传感器被定位在衬底保持器内，透镜位于衬底平面附近。

5. 发明授权

US08426831B2 Radiation detector, method of manufacturing a radiation detector, and lithographic apparatus comprising a radiation detector 有权
标题翻译：放射线检测器，辐射检测器的制造方法以及包括放射线检测器的光刻设备
公开(公告)号：US08426831B2
公开(公告)日：2013-04-23
申请号：US13399560
申请日：2012-02-17
申请人： Stoyan Nihtianov , Arie Johan Van Der Sijs , Bearrach Moest , Petrus Wilhelmus Josephus Maria Kemper , Marc Antonius Maria Haast , Gerardus Wilhelmus Petrus Baas , Lis Karen Nanver , Francesco Sarubbi , Antonius Andreas Johannes Schuwer , Gregory Micha Gommeren , Martijn Pot , Thomas Ludovicus Maria Scholtes
发明人： Stoyan Nihtianov , Arie Johan Van Der Sijs , Bearrach Moest , Petrus Wilhelmus Josephus Maria Kemper , Marc Antonius Maria Haast , Gerardus Wilhelmus Petrus Baas , Lis Karen Nanver , Francesco Sarubbi , Antonius Andreas Johannes Schuwer , Gregory Micha Gommeren , Martijn Pot , Thomas Ludovicus Maria Scholtes
IPC分类号： G21K5/00
CPC分类号： G03F7/7085 , H01L21/67225 , H01L31/103
摘要： In one an embodiment, there is provided an assembly comprising at least one detector. Each of the at least one detector includes a substrate having a doped region of a first conduction type, a layer of dopant material of a second conduction type located on the substrate, a diffusion layer formed within the substrate and in contact with the layer of dopant material and the doped region of the substrate, wherein a doping profile, which is representative of a doping material concentration of the diffusion layer, increases from the doped region of the substrate to the layer of dopant material, a first electrode connected to the layer of dopant material, and a second electrode connected to the substrate. The diffusion layer is arranged to form a radiation sensitive surface.
摘要翻译：在一个实施例中，提供了一种包括至少一个检测器的组件。所述至少一个检测器中的每一个包括具有第一导电类型的掺杂区的衬底，位于衬底上的第二导电类型的掺杂剂材料层，形成在衬底内并与掺杂剂层接触的扩散层材料和衬底的掺杂区域，其中代表扩散层的掺杂材料浓度的掺杂分布从衬底的掺杂区域增加到掺杂剂材料层，第一电极连接到掺杂剂材料和连接到该衬底的第二电极。扩散层被布置成形成辐射敏感表面。

6. 发明申请

US20120019795A1 LITHOGRAPHIC APPARATUS, COMPUTER PROGRAM PRODUCT AND DEVICE MANUFACTURING METHOD 有权
标题翻译：计算机设备，计算机程序产品和设备制造方法
公开(公告)号：US20120019795A1
公开(公告)日：2012-01-26
申请号：US13174013
申请日：2011-06-30
申请人： Sytse POSTMA , Marcus Adrianus Van De Kerkhof , Bearrach Moest , Vasco Miguel Matias Serrao
发明人： Sytse POSTMA , Marcus Adrianus Van De Kerkhof , Bearrach Moest , Vasco Miguel Matias Serrao
IPC分类号： G03B27/54
CPC分类号： G03F9/7088 , G03F9/7046
摘要： Disclosed is a device manufacturing method and associated apparatus, the method comprising transferring a pattern from a patterning device onto a substrate. The method relates to the alignment of said patterning device and said substrate, and comprises imparting a radiation beam onto an alignment structure on said patterning device so as to obtain a resultant aerial image; scanning an image sensor in accordance with a scanning scheme, through a target volume containing said resultant aerial image, the relative positions of said image sensor and said substrate being known or subsequently determined; and measuring features of said image and thereby determining of the location of the alignment structure relative to the image sensor; wherein an alternative scanning scheme is used in which, for example two or more scans through the whole target volume are performed, having a total duration the same as a conventional single continuous scan.
摘要翻译：公开了一种器件制造方法和相关设备，该方法包括将图案从图案形成装置转移到衬底上。该方法涉及所述图案形成装置和所述基板的对准，并且包括将辐射束施加到所述图案形成装置上的对准结构上，以获得所得到的空间图像; 通过包含所述得到的空间图像的目标体积根据扫描方案扫描图像传感器，所述图像传感器和所述基板的相对位置是已知的或随后确定的; 并且测量所述图像的特征，从而确定所述对准结构相对于所述图像传感器的位置; 其中使用替代扫描方案，其中例如执行通过整个目标体积的两次或多次扫描，其具有与常规单次连续扫描相同的总持续时间。

7. 发明申请

US20100157271A1 LITHOGRAPHIC APPARATUS AND METHOD OF IRRADIATING AT LEAST TWO TARGET PORTIONS 有权
标题翻译：至少两个目标部分的照相装置和照射方法
公开(公告)号：US20100157271A1
公开(公告)日：2010-06-24
申请号：US12639744
申请日：2009-12-16
申请人： Cornelis Lambertus Maria VAN WEERT , Marcus Adrianus Van De Kerkhof , Bearrach Moest
发明人： Cornelis Lambertus Maria VAN WEERT , Marcus Adrianus Van De Kerkhof , Bearrach Moest
IPC分类号： G03B27/72 , G03B27/32 , G01B11/00
CPC分类号： G03F7/70341 , G03F7/70066
摘要： A lithographic apparatus is disclosed that includes a table, at least two target portions on the table or on an object on the table, and a surface material between the at least two target portions. The apparatus further includes an optical system configured to project a beam of radiation, along an optical path towards the table, with a cross-section to irradiate the at least two target portions at the same time. The apparatus further includes a shield moveable into the optical path to restrict the cross-section of the beam of radiation to restrict illumination between the at least two target portions, wherein the surface material between the at least two target portions would degrade when irradiated with radiation from the optical system.
摘要翻译：公开了一种光刻设备，其包括桌子，桌子上的至少两个目标部分或桌子上的物体上的至少两个目标部分以及该至少两个目标部分之间的表面材料。该装置还包括一个光学系统，该光学系统配置成沿着光学路径朝向桌子投射辐射束，同时具有同时照射至少两个目标部分的横截面。该装置还包括可移动到光路中的屏蔽物，以限制辐射束的横截面以限制至少两个目标部分之间的照明，其中当辐射照射时，至少两个目标部分之间的表面材料会降解从光学系统。

8. 发明申请

US20090002656A1 Device and method for transmission image detection, lithographic apparatus and mask for use in a lithographic apparatus 审中-公开
标题翻译：用于光刻设备的透射图像检测装置和方法，光刻设备和掩模
公开(公告)号：US20090002656A1
公开(公告)日：2009-01-01
申请号：US11819958
申请日：2007-06-29
申请人： Bearrach Moest
发明人： Bearrach Moest
IPC分类号： G03B27/52 , G01V8/10
CPC分类号： G03F7/70666 , G03F1/84
摘要： A device is provided for transmission image detection of an aerial image formed in a lithographic projection apparatus. The device has a structure provided with an object mark, an projection system and a detector. The object mark is arranged to form a object mark pattern upon illumination by radiation with a predetermined wavelength. The projection system is arranged to form an object mark aerial image of the object mark pattern at an image side of the projection system, where the image side has a numerical aperture larger than 1. The detector has a slit pattern and a photo-sensitive device. The slit pattern is positioned in a plane proximate to image plane of the projection system. The device can be configured to satisfy the following condition: d
摘要翻译：提供了一种用于在光刻投影设备中形成的空间图像的透射图像检测的装置。该装置具有设置有物体标记，投影系统和检测器的结构。对象标记被布置成在通过预定波长的辐射照射时形成对象标记图案。投影系统被布置成在投影系统的图像侧处形成物体标记图案的物体标记空间图像，其中像侧具有大于1的数值孔径。检测器具有狭缝图案和感光装置。狭缝图案位于靠近投影系统的图像平面的平面中。该设备可以配置为满足以下条件： $d其中d表示在像平面上的物体标记空间图像的关键维度，λ表示预定波长的辐射，NA表示数值孔径。$

9. 发明授权

US07675605B2 Device and method for transmission image sensing 有权
标题翻译：用于传输图像感测的装置和方法
公开(公告)号：US07675605B2
公开(公告)日：2010-03-09
申请号：US12155502
申请日：2008-06-05
申请人： Bearrach Moest
发明人： Bearrach Moest
IPC分类号： G03B27/54 , G03B27/32 , G03B27/42
CPC分类号： G03F7/70666 , G03F1/84
摘要： A device for transmission image sensing for sensing an aerial image in a lithographic exposure apparatus comprises a projection system arranged to form, at an image side of the projection system, an aerial image of an object mark. The device further comprises a detector comprising a slit pattern having features corresponding to at least a part of the aerial image. The slit pattern is arranged to be exposed to the aerial image. The detector is further being arranged to detect detection radiation transmitted by the slit pattern; wherein d
摘要翻译：用于感测平版印刷曝光设备中的空间图像的透射图像感测装置包括投影系统，其布置成在投影系统的像侧形成物体标记的空中图像。该装置还包括检测器，其包括具有对应于空中图像的至少一部分的特征的狭缝图案。狭缝图案布置成暴露于空中图像。检测器还被布置成检测由狭缝图案传输的检测辐射; 其中d <0.85·λNA，其中d表示狭缝图案的最小特征的尺寸，λ表示检测辐射的预期波长，并且大于1的NA表示图像侧的数值孔径。

10. 发明申请

US20090021717A1 Radiation Detector, Method of Manufacturing a Radiation Detector, and Lithographic Apparatus Comprising a Radiation Detector 有权
标题翻译：辐射检测器，辐射检测器的制造方法和包含辐射检测器的平版印刷设备
公开(公告)号：US20090021717A1
公开(公告)日：2009-01-22
申请号：US12144874
申请日：2008-06-24
申请人： Stoyan Nihtianov , Arie Johan Van Der Sijs , Bearrach Moest , Petrus Wilhelmus, Joshepus, Maria Kemper , Marc Antonius, Maria Haast , Gerardus Wilhelmus, Petrus, Baas , Lis Karen Nanver , Francesco Sarubbi , Antonius Andreas, Johannes Schuwer , Gregory Micha Gommeren , Martijn Pot , Thomas Ludovicus, Maria Scholtes
发明人： Stoyan Nihtianov , Arie Johan Van Der Sijs , Bearrach Moest , Petrus Wilhelmus, Joshepus, Maria Kemper , Marc Antonius, Maria Haast , Gerardus Wilhelmus, Petrus, Baas , Lis Karen Nanver , Francesco Sarubbi , Antonius Andreas, Johannes Schuwer , Gregory Micha Gommeren , Martijn Pot , Thomas Ludovicus, Maria Scholtes
IPC分类号： G03B27/80 , H01L31/00 , H01L21/00
CPC分类号： G03F7/7085 , H01L21/67225 , H01L31/103
摘要： A radiation detector, a method of manufacturing a radiation detector, and a lithographic apparatus comprising a radiation detector. The radiation detector has a radiation sensitive surface. The radiation sensitive surface is sensitive to radiation wavelengths between 10-200 nm and charged particles. The radiation detector has a silicon substrate, a dopant layer, a first electrode, and a second electrode. The silicon substrate is provided in a surface area at a first surface side with doping profile of a certain conduction type. The dopant layer is provided on the first surface side of the silicon substrate. The dopant layer has a first layer of dopant material and a second layer. The second layer is a diffusion layer in contact with the surface area at the first surface side of the silicon substrate. The first electrode is connected to dopant layer. The second electrode is connected to the silicon substrate.
摘要翻译：放射线检测器，制造放射线检测器的方法以及包括放射线检测器的光刻设备。辐射检测器具有辐射敏感表面。辐射敏感表面对10-200nm和带电粒子之间的辐射波长敏感。辐射检测器具有硅衬底，掺杂剂层，第一电极和第二电极。硅衬底在第一表面侧的表面区域设置有一定导电类型的掺杂分布。掺杂剂层设置在硅衬底的第一表面侧上。掺杂剂层具有掺杂剂材料的第一层和第二层。第二层是与硅衬底的第一表面侧的表面区域接触的扩散层。第一电极连接到掺杂剂层。第二电极连接到硅衬底。

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