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1. 发明申请

US20120019795A1 LITHOGRAPHIC APPARATUS, COMPUTER PROGRAM PRODUCT AND DEVICE MANUFACTURING METHOD 有权
标题翻译：计算机设备，计算机程序产品和设备制造方法
公开(公告)号：US20120019795A1
公开(公告)日：2012-01-26
申请号：US13174013
申请日：2011-06-30
申请人： Sytse POSTMA , Marcus Adrianus Van De Kerkhof , Bearrach Moest , Vasco Miguel Matias Serrao
发明人： Sytse POSTMA , Marcus Adrianus Van De Kerkhof , Bearrach Moest , Vasco Miguel Matias Serrao
IPC分类号： G03B27/54
CPC分类号： G03F9/7088 , G03F9/7046
摘要： Disclosed is a device manufacturing method and associated apparatus, the method comprising transferring a pattern from a patterning device onto a substrate. The method relates to the alignment of said patterning device and said substrate, and comprises imparting a radiation beam onto an alignment structure on said patterning device so as to obtain a resultant aerial image; scanning an image sensor in accordance with a scanning scheme, through a target volume containing said resultant aerial image, the relative positions of said image sensor and said substrate being known or subsequently determined; and measuring features of said image and thereby determining of the location of the alignment structure relative to the image sensor; wherein an alternative scanning scheme is used in which, for example two or more scans through the whole target volume are performed, having a total duration the same as a conventional single continuous scan.
摘要翻译：公开了一种器件制造方法和相关设备，该方法包括将图案从图案形成装置转移到衬底上。该方法涉及所述图案形成装置和所述基板的对准，并且包括将辐射束施加到所述图案形成装置上的对准结构上，以获得所得到的空间图像; 通过包含所述得到的空间图像的目标体积根据扫描方案扫描图像传感器，所述图像传感器和所述基板的相对位置是已知的或随后确定的; 并且测量所述图像的特征，从而确定所述对准结构相对于所述图像传感器的位置; 其中使用替代扫描方案，其中例如执行通过整个目标体积的两次或多次扫描，其具有与常规单次连续扫描相同的总持续时间。

2. 发明授权

US08860928B2 Lithographic apparatus, computer program product and device manufacturing method 有权
标题翻译：平版印刷设备，计算机程序产品和设备制造方法
公开(公告)号：US08860928B2
公开(公告)日：2014-10-14
申请号：US13174013
申请日：2011-06-30
申请人： Sytse Postma , Marcus Adrianus Van De Kerkhof , Bearrach Moest , Vasco Miguel Matias Serrao
发明人： Sytse Postma , Marcus Adrianus Van De Kerkhof , Bearrach Moest , Vasco Miguel Matias Serrao
IPC分类号： G03F9/00
CPC分类号： G03F9/7088 , G03F9/7046
摘要： Disclosed is a device manufacturing method and associated apparatus, the method comprising transferring a pattern from a patterning device onto a substrate. The method relates to the alignment of said patterning device and said substrate, and comprises imparting a radiation beam onto an alignment structure on said patterning device so as to obtain a resultant aerial image; scanning an image sensor in accordance with a scanning scheme, through a target volume containing said resultant aerial image, the relative positions of said image sensor and said substrate being known or subsequently determined; and measuring features of said image and thereby determining of the location of the alignment structure relative to the image sensor; wherein an alternative scanning scheme is used in which, for example two or more scans through the whole target volume are performed, having a total duration the same as a conventional single continuous scan.
摘要翻译：公开了一种器件制造方法和相关设备，该方法包括将图案从图案形成装置转移到衬底上。该方法涉及所述图案形成装置和所述基板的对准，并且包括将辐射束施加到所述图案形成装置上的对准结构上，以获得所得到的空间图像; 通过包含所述得到的空间图像的目标体积根据扫描方案扫描图像传感器，所述图像传感器和所述基板的相对位置是已知的或随后确定的; 并且测量所述图像的特征，从而确定所述对准结构相对于所述图像传感器的位置; 其中使用替代扫描方案，其中例如执行通过整个目标体积的两次或多次扫描，其具有与常规单次连续扫描相同的总持续时间。

3. 发明授权

US08773637B2 Lithographic apparatus and device manufacturing method of applying a pattern to a substrate using sensor and alignment mark 有权
标题翻译：平版印刷设备和使用传感器和对准标记将图案施加到基板的装置制造方法
公开(公告)号：US08773637B2
公开(公告)日：2014-07-08
申请号：US12908564
申请日：2010-10-20
申请人： Marcus Adrianus Van De Kerkhof , Willem Jurrianus Venema , Bearrach Moest , Vasco Miguel Matias Serrao , Cedran Bomhof
发明人： Marcus Adrianus Van De Kerkhof , Willem Jurrianus Venema , Bearrach Moest , Vasco Miguel Matias Serrao , Cedran Bomhof
IPC分类号： G03B27/52 , G03F9/00
CPC分类号： G03F7/70775 , B21B38/00 , G03F9/7011 , G03F9/7019 , G03F9/7026 , G03F9/7088 , G03F9/7092 , H01J2235/062
摘要： A lithographic apparatus includes at least one image alignment sensor for receiving radiation projected from an alignment mark on a reticle. Processor processes signals from the sensor(s) to resolve spatial information in the projected alignment mark to establish a reference for measuring positional relationships between a substrate support and the patterning location. Examples of the sensor include line arrays of photodetectors. A single array can resolve spatial information in a plane of the sensor (X, Y direction) and in a perpendicular (Z) direction. At least a final step in establishing the reference position is performed while holding the substrate support stationary. Errors and delays induced by mechanical scanning of prior art sensors are avoided. Alternatively (not illustrated) the sensor is moved for mechanical scanning relative to the substrate support, independently of the main positioning systems.
摘要翻译：光刻设备包括至少一个图像对准传感器，用于接收从掩模版上的对准标记投射的辐射。处理器处理来自传感器的信号以解决投影对准标记中的空间信息，以建立用于测量基板支撑件和图案化位置之间的位置关系的参考。传感器的示例包括光电检测器的线阵列。单个阵列可以解析传感器（X，Y方向）和垂直（Z）方向的平面内的空间信息。在保持基板支撑固定的同时执行建立基准位置的至少最后一步。避免了现有技术传感器的机械扫描引起的错误和延迟。或者（未示出），传感器相对于基板支撑件移动以进行机械扫描，而与主定位系统无关。

4. 发明申请

US20100157271A1 LITHOGRAPHIC APPARATUS AND METHOD OF IRRADIATING AT LEAST TWO TARGET PORTIONS 有权
标题翻译：至少两个目标部分的照相装置和照射方法
公开(公告)号：US20100157271A1
公开(公告)日：2010-06-24
申请号：US12639744
申请日：2009-12-16
申请人： Cornelis Lambertus Maria VAN WEERT , Marcus Adrianus Van De Kerkhof , Bearrach Moest
发明人： Cornelis Lambertus Maria VAN WEERT , Marcus Adrianus Van De Kerkhof , Bearrach Moest
IPC分类号： G03B27/72 , G03B27/32 , G01B11/00
CPC分类号： G03F7/70341 , G03F7/70066
摘要： A lithographic apparatus is disclosed that includes a table, at least two target portions on the table or on an object on the table, and a surface material between the at least two target portions. The apparatus further includes an optical system configured to project a beam of radiation, along an optical path towards the table, with a cross-section to irradiate the at least two target portions at the same time. The apparatus further includes a shield moveable into the optical path to restrict the cross-section of the beam of radiation to restrict illumination between the at least two target portions, wherein the surface material between the at least two target portions would degrade when irradiated with radiation from the optical system.
摘要翻译：公开了一种光刻设备，其包括桌子，桌子上的至少两个目标部分或桌子上的物体上的至少两个目标部分以及该至少两个目标部分之间的表面材料。该装置还包括一个光学系统，该光学系统配置成沿着光学路径朝向桌子投射辐射束，同时具有同时照射至少两个目标部分的横截面。该装置还包括可移动到光路中的屏蔽物，以限制辐射束的横截面以限制至少两个目标部分之间的照明，其中当辐射照射时，至少两个目标部分之间的表面材料会降解从光学系统。

5. 发明授权

US08896817B2 Lithographic projection apparatus, device manufacturing methods and mask with sensor and diffuser for use in a device manufacturing method 有权
标题翻译：光刻投影装置，装置制造方法以及用于装置制造方法的传感器和扩散器的掩模
公开(公告)号：US08896817B2
公开(公告)日：2014-11-25
申请号：US11545763
申请日：2006-10-11
申请人： Marcus Adrianus Van De Kerkhof , Bearrach Moest
发明人： Marcus Adrianus Van De Kerkhof , Bearrach Moest
IPC分类号： G03B27/72 , G03F7/20 , G03F9/00
CPC分类号： G03F7/706 , G03F7/70075 , G03F9/7069 , G03F9/7088
摘要： During an alignment calibration process in a lithographic apparatus using a sensor to detect a property of a projected image at substrate level, a diffuser is inserted into the illumination beam to increase the range of angles of radiation incident on the substrate. Thereby it can be ensured that sufficient radiation enters the sensor even when there is a mismatch between the illumination mode used and the acceptance NA of the sensor.
摘要翻译：在使用传感器检测投影图像在基板水平的特性的光刻设备中的对准校准过程中，将扩散器插入到照明光束中，以增加入射到基板上的辐射角度的范围。因此，即使当所使用的照明模式和传感器的接受NA之间存在不匹配时，也可以确保足够的辐射进入传感器。

6. 发明授权

US08629418B2 Lithographic apparatus and sensor therefor 有权
标题翻译：光刻设备及其传感器
公开(公告)号：US08629418B2
公开(公告)日：2014-01-14
申请号：US11591674
申请日：2006-11-02
申请人： Marcus Adrianus Van De Kerkhof , Haico Victor Kok , Borgert Kruizinga , Timotheus Franciscus Sengers , Bearrach Moest , Marc Antonius Maria Haast , Peter Werner Weissbrodt , Manfred Helmut Gustav Wilhelm Johannes Schrenk , Torsten Harzendorf
发明人： Marcus Adrianus Van De Kerkhof , Haico Victor Kok , Borgert Kruizinga , Timotheus Franciscus Sengers , Bearrach Moest , Marc Antonius Maria Haast , Peter Werner Weissbrodt , Manfred Helmut Gustav Wilhelm Johannes Schrenk , Torsten Harzendorf
IPC分类号： G01N15/06 , H01J3/14
CPC分类号： G03F7/7085
摘要： A sensor for use at substrate level in a high numerical aperture lithographic apparatus, the sensor having a transparent plate that covers a sensing element and includes elements that improve coupling of radiation into the sensing element. The improved coupling elements include a flowing liquid medium disposed between the transparent plate and the sensing element.
摘要翻译：一种用于高数值孔径光刻设备中的衬底级别的传感器，该传感器具有覆盖感测元件的透明板，并且包括改善辐射与感测元件的耦合的元件。改进的耦合元件包括设置在透明板和感测元件之间的流动液体介质。

7. 发明授权

US08436984B2 Lithographic apparatus and method of irradiating at least two target portions 有权
标题翻译：光刻设备和照射至少两个目标部分的方法
公开(公告)号：US08436984B2
公开(公告)日：2013-05-07
申请号：US12639744
申请日：2009-12-16
申请人： Cornelis Lambertus Maria Van Weert , Marcus Adrianus Van De Kerkhof , Bearrach Moest
发明人： Cornelis Lambertus Maria Van Weert , Marcus Adrianus Van De Kerkhof , Bearrach Moest
IPC分类号： G03B27/72 , G03B27/32
CPC分类号： G03F7/70341 , G03F7/70066
摘要： A lithographic apparatus is disclosed that includes a table, at least two target portions on the table or on an object on the table, and a surface material between the at least two target portions. The apparatus further includes an optical system configured to project a beam of radiation, along an optical path towards the table, with a cross-section to irradiate the at least two target portions at the same time. The apparatus further includes a shield moveable into the optical path to restrict the cross-section of the beam of radiation to restrict illumination between the at least two target portions, wherein the surface material between the at least two target portions would degrade when irradiated with radiation from the optical system.
摘要翻译：公开了一种光刻设备，其包括桌子，桌子上的至少两个目标部分或桌子上的物体上的至少两个目标部分以及该至少两个目标部分之间的表面材料。该装置还包括一个光学系统，该光学系统配置成沿着光学路径朝向桌子投射辐射束，同时具有同时照射至少两个目标部分的横截面。该装置还包括可移动到光路中的屏蔽物，以限制辐射束的横截面以限制至少两个目标部分之间的照明，其中当辐射照射时，至少两个目标部分之间的表面材料会降解从光学系统。

8. 发明授权

US07145630B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07145630B2
公开(公告)日：2006-12-05
申请号：US10995073
申请日：2004-11-23
申请人： Bearrach Moest , Marcus Adrianus Van De Kerkhof , Marc Antonius Maria Haast
发明人： Bearrach Moest , Marcus Adrianus Van De Kerkhof , Marc Antonius Maria Haast
IPC分类号： G03B27/52 , G03B27/32
CPC分类号： G03F7/70341
摘要： A method and lithographic apparatus in which a surface of a sensor is protected from dissolution in a liquid through application of a bias voltage to the surface with respect to one or more parts which are also exposed to the liquid.
摘要翻译：一种方法和光刻设备，其中通过相对于也暴露于液体的一个或多个部件向表面施加偏压来保护传感器的表面免于溶解在液体中。

9. 发明授权

US09482967B2 Lithographic apparatus, control system and device manufacturing method 有权
标题翻译：光刻设备，控制系统和器件制造方法
公开(公告)号：US09482967B2
公开(公告)日：2016-11-01
申请号：US13238861
申请日：2011-09-21
申请人： Marcus Adrianus Van De Kerkhof , Johannes Henricus Wilhelmus Jacobs , Tammo Uitterdijk , Nicolas Alban Lallemant
发明人： Marcus Adrianus Van De Kerkhof , Johannes Henricus Wilhelmus Jacobs , Tammo Uitterdijk , Nicolas Alban Lallemant
IPC分类号： G03B27/52 , G03B27/42 , G03F7/20
CPC分类号： G03F7/70858 , G03F7/70258 , G03F7/70341 , G03F7/705 , G03F7/70575 , G03F7/706
摘要： An immersion lithographic apparatus is disclosed that has a measurement system or a prediction system for measuring and/or predicting, respectively, an effect associated with a temperature fluctuation of the immersion liquid, and a control system for controlling the or another effect associated with the temperature of the immersion liquid, on the basis of the measurement and/or prediction obtained by the measurement system and/or prediction system, respectively. An associated control system and device manufacturing method is also disclosed.
摘要翻译：公开了一种浸没式光刻设备，其具有用于分别测量和/或预测与浸没液体的温度波动相关的影响的测量系统或预测系统，以及用于控制与温度相关的或另一效应的控制系统基于由测量系统和/或预测系统获得的测量和/或预测的浸没液体。还公开了一种相关的控制系统和设备制造方法。

10. 发明授权

US09229338B2 Substrate, a method of measuring a property, an inspection apparatus and a lithographic apparatus 有权
标题翻译：基板，测量属性的方法，检查装置和光刻设备
公开(公告)号：US09229338B2
公开(公告)日：2016-01-05
申请号：US13059405
申请日：2009-07-27
申请人： Marcus Adrianus Van De Kerkhof , Maurits Van Der Schaar , Hendrik Jan Hidde Smilde
发明人： Marcus Adrianus Van De Kerkhof , Maurits Van Der Schaar , Hendrik Jan Hidde Smilde
IPC分类号： G01B11/00 , G03B27/32 , G03B27/54 , G03B27/74 , H01L23/28 , G03F7/20 , G03F9/00 , H01L23/544
CPC分类号： G01N21/9501 , G01N21/4738 , G01N2201/06113 , G01N2201/10 , G02B5/1823 , G02B5/1861 , G03F7/70058 , G03F7/70633 , G03F7/70683 , G03F9/70 , G03F9/7046 , G03F9/7076 , H01L23/544 , H01L2924/0002 , Y10T428/24612 , H01L2924/00
摘要： Scatterometry for measuring overlay. A second set of superimposed gratings are superposed over a first set of superimposed gratings. The second set of gratings have a different periodicity from the first set of gratings or a different orientation. Consequently the first order diffraction pattern from the second set of superimposed gratings can be distinguished from the first order diffraction pattern from the first set of superimposed gratings.
摘要翻译：用于测量覆盖层的散射法。第二组叠加的光栅叠加在第一组叠加的光栅上。第二组光栅具有与第一组光栅不同的周期性或不同的取向。因此，来自第二组叠加光栅的一阶衍射图可以与来自第一组叠加光栅的一阶衍射图案区分开。

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