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1. 发明申请

US20090021717A1 Radiation Detector, Method of Manufacturing a Radiation Detector, and Lithographic Apparatus Comprising a Radiation Detector 有权
标题翻译：辐射检测器，辐射检测器的制造方法和包含辐射检测器的平版印刷设备
公开(公告)号：US20090021717A1
公开(公告)日：2009-01-22
申请号：US12144874
申请日：2008-06-24
申请人： Stoyan Nihtianov , Arie Johan Van Der Sijs , Bearrach Moest , Petrus Wilhelmus, Joshepus, Maria Kemper , Marc Antonius, Maria Haast , Gerardus Wilhelmus, Petrus, Baas , Lis Karen Nanver , Francesco Sarubbi , Antonius Andreas, Johannes Schuwer , Gregory Micha Gommeren , Martijn Pot , Thomas Ludovicus, Maria Scholtes
发明人： Stoyan Nihtianov , Arie Johan Van Der Sijs , Bearrach Moest , Petrus Wilhelmus, Joshepus, Maria Kemper , Marc Antonius, Maria Haast , Gerardus Wilhelmus, Petrus, Baas , Lis Karen Nanver , Francesco Sarubbi , Antonius Andreas, Johannes Schuwer , Gregory Micha Gommeren , Martijn Pot , Thomas Ludovicus, Maria Scholtes
IPC分类号： G03B27/80 , H01L31/00 , H01L21/00
CPC分类号： G03F7/7085 , H01L21/67225 , H01L31/103
摘要： A radiation detector, a method of manufacturing a radiation detector, and a lithographic apparatus comprising a radiation detector. The radiation detector has a radiation sensitive surface. The radiation sensitive surface is sensitive to radiation wavelengths between 10-200 nm and charged particles. The radiation detector has a silicon substrate, a dopant layer, a first electrode, and a second electrode. The silicon substrate is provided in a surface area at a first surface side with doping profile of a certain conduction type. The dopant layer is provided on the first surface side of the silicon substrate. The dopant layer has a first layer of dopant material and a second layer. The second layer is a diffusion layer in contact with the surface area at the first surface side of the silicon substrate. The first electrode is connected to dopant layer. The second electrode is connected to the silicon substrate.
摘要翻译：放射线检测器，制造放射线检测器的方法以及包括放射线检测器的光刻设备。辐射检测器具有辐射敏感表面。辐射敏感表面对10-200nm和带电粒子之间的辐射波长敏感。辐射检测器具有硅衬底，掺杂剂层，第一电极和第二电极。硅衬底在第一表面侧的表面区域设置有一定导电类型的掺杂分布。掺杂剂层设置在硅衬底的第一表面侧上。掺杂剂层具有掺杂剂材料的第一层和第二层。第二层是与硅衬底的第一表面侧的表面区域接触的扩散层。第一电极连接到掺杂剂层。第二电极连接到硅衬底。

2. 发明授权

US08426831B2 Radiation detector, method of manufacturing a radiation detector, and lithographic apparatus comprising a radiation detector 有权
标题翻译：放射线检测器，辐射检测器的制造方法以及包括放射线检测器的光刻设备
公开(公告)号：US08426831B2
公开(公告)日：2013-04-23
申请号：US13399560
申请日：2012-02-17
申请人： Stoyan Nihtianov , Arie Johan Van Der Sijs , Bearrach Moest , Petrus Wilhelmus Josephus Maria Kemper , Marc Antonius Maria Haast , Gerardus Wilhelmus Petrus Baas , Lis Karen Nanver , Francesco Sarubbi , Antonius Andreas Johannes Schuwer , Gregory Micha Gommeren , Martijn Pot , Thomas Ludovicus Maria Scholtes
发明人： Stoyan Nihtianov , Arie Johan Van Der Sijs , Bearrach Moest , Petrus Wilhelmus Josephus Maria Kemper , Marc Antonius Maria Haast , Gerardus Wilhelmus Petrus Baas , Lis Karen Nanver , Francesco Sarubbi , Antonius Andreas Johannes Schuwer , Gregory Micha Gommeren , Martijn Pot , Thomas Ludovicus Maria Scholtes
IPC分类号： G21K5/00
CPC分类号： G03F7/7085 , H01L21/67225 , H01L31/103
摘要： In one an embodiment, there is provided an assembly comprising at least one detector. Each of the at least one detector includes a substrate having a doped region of a first conduction type, a layer of dopant material of a second conduction type located on the substrate, a diffusion layer formed within the substrate and in contact with the layer of dopant material and the doped region of the substrate, wherein a doping profile, which is representative of a doping material concentration of the diffusion layer, increases from the doped region of the substrate to the layer of dopant material, a first electrode connected to the layer of dopant material, and a second electrode connected to the substrate. The diffusion layer is arranged to form a radiation sensitive surface.
摘要翻译：在一个实施例中，提供了一种包括至少一个检测器的组件。所述至少一个检测器中的每一个包括具有第一导电类型的掺杂区的衬底，位于衬底上的第二导电类型的掺杂剂材料层，形成在衬底内并与掺杂剂层接触的扩散层材料和衬底的掺杂区域，其中代表扩散层的掺杂材料浓度的掺杂分布从衬底的掺杂区域增加到掺杂剂材料层，第一电极连接到掺杂剂材料和连接到该衬底的第二电极。扩散层被布置成形成辐射敏感表面。

3. 发明授权

US07586108B2 Radiation detector, method of manufacturing a radiation detector and lithographic apparatus comprising a radiation detector 有权
标题翻译：辐射检测器，辐射检测器的制造方法和包括放射线检测器的光刻设备
公开(公告)号：US07586108B2
公开(公告)日：2009-09-08
申请号：US11819160
申请日：2007-06-25
申请人： Stoyan Nihtianov , Arie Johan Van Der Sijs , Bearrach Moest , Petrus Wilhelmus Josephus Maria Kemper , Marc Antonius Maria Haast , Gerardus Wilhelmus Petrus Baas , Lis Karen Nanver , Francesco Sarubbi , Antonius Andreas Johannes Schuwer , Gregory Micha Gommeren , Martijn Pot , Thomas Ludovicus Maria Scholtes
发明人： Stoyan Nihtianov , Arie Johan Van Der Sijs , Bearrach Moest , Petrus Wilhelmus Josephus Maria Kemper , Marc Antonius Maria Haast , Gerardus Wilhelmus Petrus Baas , Lis Karen Nanver , Francesco Sarubbi , Antonius Andreas Johannes Schuwer , Gregory Micha Gommeren , Martijn Pot , Thomas Ludovicus Maria Scholtes
IPC分类号： G21K5/00
CPC分类号： H01L31/103 , G03F7/7085 , G03F7/70958 , H01L31/02161 , H01L31/022408 , H01L31/022416 , H01L31/1185 , H01L31/1804 , Y02E10/547
摘要： The invention relates to a radiation detector, a method of manufacturing a radiation detector and a lithographic apparatus comprising a radiation detector. The radiation detector has a radiation-sensitive surface. The radiation-sensitive surface is sensitive for radiation with a wavelength between 10-200 nm. The radiation detector has a silicon substrate, a dopant layer, a first electrode and a second electrode. The silicon substrate is provided in a surface area at a first surface side with doping profile of a certain conduction type. The dopant layer is provided on the first surface side of the silicon substrate. The dopant layer has a first layer of dopant material and a second layer. The second layer is a diffusion layer which is in contact with the surface area at the first surface side of the silicon substrate. The first electrode is connected to dopant layer. The second electrode is connected to the Silicon substrate.
摘要翻译：本发明涉及一种辐射检测器，一种制造辐射探测器的方法和一种包括辐射探测器的光刻设备。辐射检测器具有辐射敏感表面。辐射敏感表面对波长在10-200nm之间的辐射敏感。辐射检测器具有硅衬底，掺杂剂层，第一电极和第二电极。硅衬底在第一表面侧的表面区域设置有一定导电类型的掺杂分布。掺杂剂层设置在硅衬底的第一表面侧上。掺杂剂层具有掺杂剂材料的第一层和第二层。第二层是与硅衬底的第一表面侧的表面区域接触的扩散层。第一电极连接到掺杂剂层。第二电极连接到硅衬底。

4. 发明申请

US20080315121A1 Radiation detector, method of manufacturing a radiation detector and lithographic apparatus comprising a radiation detector 有权
标题翻译：辐射检测器，辐射检测器的制造方法和包括放射线检测器的光刻设备
公开(公告)号：US20080315121A1
公开(公告)日：2008-12-25
申请号：US11819160
申请日：2007-06-25
申请人： Stoyan Nihtianov , Arie Johan Van Der Sijs , Bearrach Moest , Petrus Wilhelmus Josephus Maria Kemper , Marc Antonius Maria Haast , Gerardus Wilhelmus Petrus Baas , Lis Karen Nanver , Francesco Sarubbi , Antonius Andreas Johannes Schuwer , Gregory Micha Gommeren , Martijn Pot , Thomas Ludovicus Maria Scholtes
发明人： Stoyan Nihtianov , Arie Johan Van Der Sijs , Bearrach Moest , Petrus Wilhelmus Josephus Maria Kemper , Marc Antonius Maria Haast , Gerardus Wilhelmus Petrus Baas , Lis Karen Nanver , Francesco Sarubbi , Antonius Andreas Johannes Schuwer , Gregory Micha Gommeren , Martijn Pot , Thomas Ludovicus Maria Scholtes
IPC分类号： G21K5/00 , H01L31/028 , H01L31/18
CPC分类号： H01L31/103 , G03F7/7085 , G03F7/70958 , H01L31/02161 , H01L31/022408 , H01L31/022416 , H01L31/1185 , H01L31/1804 , Y02E10/547
摘要： The invention relates to a radiation detector, a method of manufacturing a radiation detector and a lithographic apparatus comprising a radiation detector. The radiation detector has a radiation-sensitive surface. The radiation-sensitive surface is sensitive for radiation with a wavelength between 10-200 nm. The radiation detector has a silicon substrate, a dopant layer, a first electrode and a second electrode. The silicon substrate is provided in a surface area at a first surface side with doping profile of a certain conduction type. The dopant layer is provided on the first surface side of the silicon substrate. The dopant layer has a first layer of dopant material and a second layer. The second layer is a diffusion layer which is in contact with the surface area at the first surface side of the silicon substrate. The first electrode is connected to dopant layer. The second electrode is connected to the Silicon substrate.
摘要翻译：本发明涉及一种辐射检测器，一种制造辐射探测器的方法和一种包括辐射探测器的光刻设备。辐射检测器具有辐射敏感表面。辐射敏感表面对波长在10-200nm之间的辐射敏感。辐射检测器具有硅衬底，掺杂剂层，第一电极和第二电极。硅衬底在第一表面侧的表面区域设置有一定导电类型的掺杂分布。掺杂剂层设置在硅衬底的第一表面侧上。掺杂剂层具有掺杂剂材料的第一层和第二层。第二层是与硅衬底的第一表面侧的表面区域接触的扩散层。第一电极连接到掺杂剂层。第二电极连接到硅衬底。

5. 发明授权

US08324598B2 Radiation detector, method of manufacturing a radiation detector, and lithographic apparatus comprising a radiation detector 有权
公开(公告)号：US08324598B2
公开(公告)日：2012-12-04
申请号：US13399560
申请日：2012-02-17
申请人： Stoyan Nihtianov , Arie Johan Van Der Sijs , Bearrach Moest , Petrus Wilhelmus Josephus Maria Kemper , Marc Antonius Maria Haast , Gerardus Wilhelmus Petrus Baas , Lis Karen Nanver , Francesco Sarubbi , Antonius Andreas Johannes Schuwer , Gregory Micha Gommeren , Martijn Pot , Thomas Ludovicus Maria Scholtes
发明人： Stoyan Nihtianov , Arie Johan Van Der Sijs , Bearrach Moest , Petrus Wilhelmus Josephus Maria Kemper , Marc Antonius Maria Haast , Gerardus Wilhelmus Petrus Baas , Lis Karen Nanver , Francesco Sarubbi , Antonius Andreas Johannes Schuwer , Gregory Micha Gommeren , Martijn Pot , Thomas Ludovicus Maria Scholtes
IPC分类号： G21K5/00
摘要： In one an embodiment, there is provided an assembly comprising at least one detector. Each of the at least one detector includes a substrate having a doped region of a first conduction type, a layer of dopant material of a second conduction type located on the substrate, a diffusion layer formed within the substrate and in contact with the layer of dopant material and the doped region of the substrate, wherein a doping profile, which is representative of a doping material concentration of the diffusion layer, increases from the doped region of the substrate to the layer of dopant material, a first electrode connected to the layer of dopant material, and a second electrode connected to the substrate. The diffusion layer is arranged to form a radiation sensitive surface.

6. 发明授权

US08138485B2 Radiation detector, method of manufacturing a radiation detector, and lithographic apparatus comprising a radiation detector 有权
标题翻译：放射线检测器，辐射检测器的制造方法以及包括放射线检测器的光刻设备
公开(公告)号：US08138485B2
公开(公告)日：2012-03-20
申请号：US12144874
申请日：2008-06-24
申请人： Stoyan Nihtianov , Arie Johan Van Der Sijs , Bearrach Moest , Petrus Wilhelmus Joseph Maria Kemper , Marc Antonius Maria Haast , Gerardus Wilhelmus Petrus Baas , Lis Karen Nanver , Francesco Sarubbi , Antonius Andreas Johannes Schuwer , Gregory Micha Gommeren , Martijn Pot , Thomas Ludovicus Maria Scholtes
发明人： Stoyan Nihtianov , Arie Johan Van Der Sijs , Bearrach Moest , Petrus Wilhelmus Joseph Maria Kemper , Marc Antonius Maria Haast , Gerardus Wilhelmus Petrus Baas , Lis Karen Nanver , Francesco Sarubbi , Antonius Andreas Johannes Schuwer , Gregory Micha Gommeren , Martijn Pot , Thomas Ludovicus Maria Scholtes
IPC分类号： G21K5/00
CPC分类号： G03F7/7085 , H01L21/67225 , H01L31/103
摘要： A radiation detector, a method of manufacturing a radiation detector, and a lithographic apparatus comprising a radiation detector. The radiation detector has a radiation sensitive surface. The radiation sensitive surface is sensitive to radiation wavelengths between 10-200 nm and charged particles. The radiation detector has a silicon substrate, a dopant layer, a first electrode, and a second electrode. The silicon substrate is provided in a surface area at a first surface side with doping profile of a certain conduction type. The dopant layer is provided on the first surface side of the silicon substrate. The dopant layer has a first layer of dopant material and a second layer. The second layer is a diffusion layer in contact with the surface area at the first surface side of the silicon substrate. The first electrode is connected to dopant layer. The second electrode is connected to the silicon substrate.
摘要翻译：放射线检测器，制造放射线检测器的方法以及包括放射线检测器的光刻设备。辐射检测器具有辐射敏感表面。辐射敏感表面对10-200nm和带电粒子之间的辐射波长敏感。辐射检测器具有硅衬底，掺杂剂层，第一电极和第二电极。硅衬底在第一表面侧的表面区域设置有一定导电类型的掺杂分布。掺杂剂层设置在硅衬底的第一表面侧上。掺杂剂层具有掺杂剂材料的第一层和第二层。第二层是与硅衬底的第一表面侧的表面区域接触的扩散层。第一电极连接到掺杂剂层。第二电极连接到硅衬底。

7. 发明授权

US07304715B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07304715B2
公开(公告)日：2007-12-04
申请号：US10917535
申请日：2004-08-13
申请人： Theodorus Petrus Maria Cadee , Joost Jeroen Ottens , Jeroen Johannes Sophia Maria Mertens , Frederick Eduard De Jong , Koen Goorman , Boris Menchtchikov , Marco Koert Stavenga , Martin Frans Pierre Smeets , Aschwin Lodewijk Hendricus Johannes Van Meer , Bart Leonard Peter Schoondermark , Patricius Aloysius Jacobus Tinnemans , Stoyan Nihtianov
发明人： Theodorus Petrus Maria Cadee , Joost Jeroen Ottens , Jeroen Johannes Sophia Maria Mertens , Frederick Eduard De Jong , Koen Goorman , Boris Menchtchikov , Marco Koert Stavenga , Martin Frans Pierre Smeets , Aschwin Lodewijk Hendricus Johannes Van Meer , Bart Leonard Peter Schoondermark , Patricius Aloysius Jacobus Tinnemans , Stoyan Nihtianov
IPC分类号： G03B27/52 , G03B27/42
CPC分类号： G03F7/70808 , G03F7/70341 , G03F7/70841 , G03F7/70875
摘要： A lithographic apparatus is disclosed. The apparatus includes an illumination system configured to condition a radiation beam, and a support constructed to support a patterning device. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The apparatus also includes a substrate table constructed to hold a substrate, a projection system configured to project the patterned radiation beam onto a target portion of the substrate, a liquid supply system configured to at least partly fill a space between the projection system and the substrate with liquid, a seal member arranged to substantially contain the liquid within the space, and elements to control and/or compensate for evaporation of immersion liquid from the substrate.
摘要翻译：公开了一种光刻设备。该装置包括配置成调节辐射束的照明系统和构造成支撑图案形成装置的支撑件。图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束。所述设备还包括被构造成保持基板的基板台，配置成将图案化的辐射束投影到基板的目标部分上的投影系统，配置成至少部分地填充投影系统和基板之间的空间的液体供应系统具有液体，被布置成基本上容纳空间内的液体的密封构件以及用于控制和/或补偿浸没液体从基底蒸发的元件。

8. 发明授权

US07190437B2 Wireless signaling in a lithographic apparatus 有权
标题翻译：光刻设备中的无线信令
公开(公告)号：US07190437B2
公开(公告)日：2007-03-13
申请号：US10747615
申请日：2003-12-30
申请人： Hans Butler , Stoyan Nihtianov , Petrus Wilhelmus Josephus Maria Kemper
发明人： Hans Butler , Stoyan Nihtianov , Petrus Wilhelmus Josephus Maria Kemper
IPC分类号： G03B27/72 , G03B27/42 , G03B27/32
CPC分类号： G03F7/709 , G03B27/72 , G03F7/70991
摘要： A lithographic apparatus capable of wirelessly communicating control and power signals, is presented herein. In one embodiment, the apparatus comprises an illumination system to provide a beam of radiation, a support structure configured to support a patterning device that imparts the beam of radiation with a pattern in its cross-section, a substrate holder configured to hold a substrate, a projection system to project the patterned beam radiation onto a target portion of the substrate, and a wireless signaling system configured to transmit and receive information-bearing electromagnetic radiation. The wireless system comprises at least a transmitter to transmit the electromagnetic radiation and a first transducer configured to receive and convert the electromagnetic radiation into a first electrical signal containing the information which is used to control at least a portion of the support structure, the substrate table, the projection system, and the illumination system.
摘要翻译：本文提供了能够无线地传送控制和功率信号的光刻设备。在一个实施例中，该装置包括用于提供辐射束的照明系统，被配置为支撑图案形成装置的支撑结构，所述图案形成装置以其横截面中的图案赋予辐射束;衬底保持器，其构造成保持衬底，投影系统，用于将图案化的束辐射投影到基板的目标部分上;以及无线信号系统，被配置为发送和接收带信息的电磁辐射。所述无线系统至少包括用于传输电磁辐射的发射器和被配置为接收并将电磁辐射转换成包含用于控制支撑结构的至少一部分的信息的第一电信号的第一换能器，所述衬底台，投影系统和照明系统。

9. 发明申请

US20100165310A1 EUV Mask Inspection 审中-公开
标题翻译： EUV面膜检查
公开(公告)号：US20100165310A1
公开(公告)日：2010-07-01
申请号：US12582825
申请日：2009-10-21
申请人： Harry SEWELL , Stoyan Nihtianov , Luigi Scaccabarozzi
发明人： Harry SEWELL , Stoyan Nihtianov , Luigi Scaccabarozzi
IPC分类号： G03B27/42
CPC分类号： G03B27/42 , G01N2021/95676
摘要： A system for inspecting an extreme ultra violet (EUV) mask. The system includes an array of sensors and an optical system. The array of sensors is configured to produce analog data corresponding to received optical energy. The optical system is configured to direct EUV light from an inspection area of an EUV patterning device onto the array of sensors, whereby the analog data is used to determine defects or to compensate for irregularities found on the EUV mask.
摘要翻译：用于检查极紫外（EUV）面罩的系统。该系统包括一组传感器和一个光学系统。传感器阵列被配置为产生对应于接收到的光能的模拟数据。光学系统被配置为将EUV光从EUV图案形成装置的检查区域引导到传感器阵列上，由此模拟数据用于确定缺陷或补偿在EUV掩模上发现的不规则。

10. 发明申请

US20060285094A1 Lithographic apparatus, device manufacturing method, device manufactured thereby, and controllable patterning device utilizing a spatial light modulator with distributed digital to analog conversion 有权
标题翻译：平版印刷设备，器件制造方法，由此制造的器件，以及利用具有分布式数模转换的空间光调制器的可控制的图案形成装置
公开(公告)号：US20060285094A1
公开(公告)日：2006-12-21
申请号：US11152849
申请日：2005-06-15
申请人： Martinus Reijnen , Andrej Makarovic , Lambertus Kessels , Stoyan Nihtianov , Petrus Wilhelmus Kemper , Kamen Chilov
发明人： Martinus Reijnen , Andrej Makarovic , Lambertus Kessels , Stoyan Nihtianov , Petrus Wilhelmus Kemper , Kamen Chilov
IPC分类号： G03B27/42
CPC分类号： G03F7/70291
摘要： The present invention comprises a lithographic apparatus and device manufacturing method method that uses a patterning device that increase a number of individually controllable elements that are programmed simultaneously to increase an update rate of an array of individually controllable elements. A number of required high speed analog inputs to the array is reduced. The complexity of the array is reduced and the maximum update speed of the array is increased. Furthermore, the number of elements within an array can be readily expanded. The patterning device can be divided into a plurality of groups of cells and the lithographic apparatus can comprise a plurality of supply channels. Each supply channel can be arranged to provide a voltage signal to each cell in a respective group of cells. This can reduce the number of required inputs to the patterning device for individually addressing each cell.
摘要翻译：本发明包括光刻设备和器件制造方法，其使用图案化装置，其增加同时编程的单独可控元件的数量，以增加单独可控元件阵列的更新速率。降低了阵列所需的高速模拟输入的数量。减少阵列的复杂性，并增加阵列的最大更新速度。此外，阵列中的元素的数量可以容易地扩展。图案形成装置可以分成多组单元，并且光刻设备可以包括多个供应通道。每个供应通道可以被布置成向相应的单元组中的每个单元提供电压信号。这可以减少用于单独寻址每个单元的图案形成装置的所需输入的数量。

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