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    • 3. 发明授权
    • Magnetic memory and method of manufacturing the same
    • 磁存储器及其制造方法
    • US08710605B2
    • 2014-04-29
    • US13231894
    • 2011-09-13
    • Shigeki TakahashiYuichi OhsawaJunichi ItoChikayoshi KamataSaori KashiwadaMinoru AmanoHiroaki Yoda
    • Shigeki TakahashiYuichi OhsawaJunichi ItoChikayoshi KamataSaori KashiwadaMinoru AmanoHiroaki Yoda
    • H01L29/72
    • H01L43/12H01L27/228H01L43/08H01L43/10
    • A magnetic memory according to an embodiment includes: at least one memory cell comprising a magnetoresistive element as a memory element, and first and second electrodes that energize the magnetoresistive element. The magnetoresistive element includes: a first magnetic layer having a variable magnetization direction perpendicular to a film plane; a tunnel barrier layer on the first magnetic layer; and a second magnetic layer on the tunnel barrier layer, and having a fixed magnetization direction perpendicular to the film plane. The first magnetic layer including: a first region; and a second region outside the first region so as to surround the first region, and having a smaller perpendicular magnetic anisotropy energy than that of the first region. The second magnetic layer including: a third region; and a fourth region outside the third region, and having a smaller perpendicular magnetic anisotropy energy than that of the third region.
    • 根据实施例的磁存储器包括:包括作为存储元件的磁阻元件的至少一个存储单元,以及激励磁阻元件的第一和第二电极。 磁阻元件包括:具有与膜平面垂直的可变磁化方向的第一磁性层; 在第一磁性层上的隧道阻挡层; 以及隧道势垒层上的第二磁性层,并且具有与膜平面垂直的固定的磁化方向。 所述第一磁性层包括:第一区域; 以及围绕第一区域的第一区域外的第二区域,并且具有比第一区域小的垂直磁各向异性能量。 第二磁性层包括:第三区域; 以及第三区域外的第四区域,并且具有比第三区域小的垂直磁各向异性能量。
    • 6. 发明申请
    • MAGNETIC MEMORY AND METHOD OF FABRICATING THE SAME
    • 磁记忆及其制造方法
    • US20130249028A1
    • 2013-09-26
    • US13623306
    • 2012-09-20
    • Chikayoshi KAMATAMinoru AmanoTadaomi DaibouJunichi Ito
    • Chikayoshi KAMATAMinoru AmanoTadaomi DaibouJunichi Ito
    • H01L43/12H01L27/22
    • H01L43/10H01F10/1933H01F10/30H01F10/3286H01F41/302H01L27/228H01L43/08H01L43/12
    • A method of fabricating a magnetic memory according to an embodiment includes: forming a separation layer on a first substrate; sequentially forming a first ferromagnetic layer, a first nonmagnetic layer, and a second ferromagnetic layer on the separation layer, at least one of the first and the second ferromagnetic layers having a single crystal structure; forming a first conductive bonding layer on the second ferromagnetic layer; forming a second conductive bonding layer on a second substrate, on which a transistor and a wiring are formed, the second conductive bonding layer electrically connecting to the transistor; arranging the first and second substrate so that the first conductive bonding layer and the second conductive bonding layer are opposed to each other, and bonding the first and the second conductive bonding layers to each other; and separating the first substrate from the first ferromagnetic layer by using the separation layer.
    • 根据实施例的制造磁存储器的方法包括:在第一基板上形成分离层; 在分离层上顺序地形成第一铁磁层,第一非磁性层和第二铁磁层,第一和第二铁磁层中的至少一个具有单晶结构; 在所述第二铁磁层上形成第一导电接合层; 在其上形成有晶体管和布线的第二基板上形成第二导电接合层,所述第二导电接合层电连接到所述晶体管; 布置第一和第二基板,使得第一导电接合层和第二导电接合层彼此相对,并且将第一和第二导电接合层彼此接合; 以及通过使用所述分离层将所述第一基板与所述第一铁磁层分离。
    • 9. 发明授权
    • Magnetic memory and method of fabricating the same
    • 磁存储器及其制造方法
    • US08841139B2
    • 2014-09-23
    • US13623306
    • 2012-09-20
    • Chikayoshi KamataMinoru AmanoTadaomi DaibouJunichi Ito
    • Chikayoshi KamataMinoru AmanoTadaomi DaibouJunichi Ito
    • H01L21/00
    • H01L43/10H01F10/1933H01F10/30H01F10/3286H01F41/302H01L27/228H01L43/08H01L43/12
    • A method of fabricating a magnetic memory according to an embodiment includes: forming a separation layer on a first substrate; sequentially forming a first ferromagnetic layer, a first nonmagnetic layer, and a second ferromagnetic layer on the separation layer, at least one of the first and the second ferromagnetic layers having a single crystal structure; forming a first conductive bonding layer on the second ferromagnetic layer; forming a second conductive bonding layer on a second substrate, on which a transistor and a wiring are formed, the second conductive bonding layer electrically connecting to the transistor; arranging the first and second substrate so that the first conductive bonding layer and the second conductive bonding layer are opposed to each other, and bonding the first and the second conductive bonding layers to each other; and separating the first substrate from the first ferromagnetic layer by using the separation layer.
    • 根据实施例的制造磁存储器的方法包括:在第一基板上形成分离层; 在分离层上顺序地形成第一铁磁层,第一非磁性层和第二铁磁层,第一和第二铁磁层中的至少一个具有单晶结构; 在所述第二铁磁层上形成第一导电接合层; 在其上形成有晶体管和布线的第二基板上形成第二导电接合层,所述第二导电接合层电连接到所述晶体管; 布置第一和第二基板,使得第一导电接合层和第二导电接合层彼此相对,并且将第一和第二导电接合层彼此接合; 以及通过使用所述分离层将所述第一基板与所述第一铁磁层分离。