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    • 6. 发明申请
    • MAGNETIC MEMORY AND METHOD OF FABRICATING THE SAME
    • 磁记忆及其制造方法
    • US20130249028A1
    • 2013-09-26
    • US13623306
    • 2012-09-20
    • Chikayoshi KAMATAMinoru AmanoTadaomi DaibouJunichi Ito
    • Chikayoshi KAMATAMinoru AmanoTadaomi DaibouJunichi Ito
    • H01L43/12H01L27/22
    • H01L43/10H01F10/1933H01F10/30H01F10/3286H01F41/302H01L27/228H01L43/08H01L43/12
    • A method of fabricating a magnetic memory according to an embodiment includes: forming a separation layer on a first substrate; sequentially forming a first ferromagnetic layer, a first nonmagnetic layer, and a second ferromagnetic layer on the separation layer, at least one of the first and the second ferromagnetic layers having a single crystal structure; forming a first conductive bonding layer on the second ferromagnetic layer; forming a second conductive bonding layer on a second substrate, on which a transistor and a wiring are formed, the second conductive bonding layer electrically connecting to the transistor; arranging the first and second substrate so that the first conductive bonding layer and the second conductive bonding layer are opposed to each other, and bonding the first and the second conductive bonding layers to each other; and separating the first substrate from the first ferromagnetic layer by using the separation layer.
    • 根据实施例的制造磁存储器的方法包括:在第一基板上形成分离层; 在分离层上顺序地形成第一铁磁层,第一非磁性层和第二铁磁层,第一和第二铁磁层中的至少一个具有单晶结构; 在所述第二铁磁层上形成第一导电接合层; 在其上形成有晶体管和布线的第二基板上形成第二导电接合层,所述第二导电接合层电连接到所述晶体管; 布置第一和第二基板,使得第一导电接合层和第二导电接合层彼此相对,并且将第一和第二导电接合层彼此接合; 以及通过使用所述分离层将所述第一基板与所述第一铁磁层分离。
    • 7. 发明授权
    • Magnetic memory and method of fabricating the same
    • 磁存储器及其制造方法
    • US08841139B2
    • 2014-09-23
    • US13623306
    • 2012-09-20
    • Chikayoshi KamataMinoru AmanoTadaomi DaibouJunichi Ito
    • Chikayoshi KamataMinoru AmanoTadaomi DaibouJunichi Ito
    • H01L21/00
    • H01L43/10H01F10/1933H01F10/30H01F10/3286H01F41/302H01L27/228H01L43/08H01L43/12
    • A method of fabricating a magnetic memory according to an embodiment includes: forming a separation layer on a first substrate; sequentially forming a first ferromagnetic layer, a first nonmagnetic layer, and a second ferromagnetic layer on the separation layer, at least one of the first and the second ferromagnetic layers having a single crystal structure; forming a first conductive bonding layer on the second ferromagnetic layer; forming a second conductive bonding layer on a second substrate, on which a transistor and a wiring are formed, the second conductive bonding layer electrically connecting to the transistor; arranging the first and second substrate so that the first conductive bonding layer and the second conductive bonding layer are opposed to each other, and bonding the first and the second conductive bonding layers to each other; and separating the first substrate from the first ferromagnetic layer by using the separation layer.
    • 根据实施例的制造磁存储器的方法包括:在第一基板上形成分离层; 在分离层上顺序地形成第一铁磁层,第一非磁性层和第二铁磁层,第一和第二铁磁层中的至少一个具有单晶结构; 在所述第二铁磁层上形成第一导电接合层; 在其上形成有晶体管和布线的第二基板上形成第二导电接合层,所述第二导电接合层电连接到所述晶体管; 布置第一和第二基板,使得第一导电接合层和第二导电接合层彼此相对,并且将第一和第二导电接合层彼此接合; 以及通过使用所述分离层将所述第一基板与所述第一铁磁层分离。