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    • 5. 发明授权
    • Variable-focus optical element and focus detecting device utilizing the
same
    • 可变焦光学元件和利用其的焦点检测装置
    • US4802746A
    • 1989-02-07
    • US832649
    • 1986-02-25
    • Takeshi BabaShigeyuki SudaNoriyuki NoseEigo KawakamiToshiyuki NakajimaNobuo Kushibiki
    • Takeshi BabaShigeyuki SudaNoriyuki NoseEigo KawakamiToshiyuki NakajimaNobuo Kushibiki
    • G02B3/14G02B7/36
    • G02B7/36G02B3/14
    • A variable focus optical element comprises plural elastic members superposed in the axial direction and a deforming member having an aperture to cause the elastic member to protrude therefrom or descend therein thereby deforming the surface of the elastic members, and the modulus of elasticity of an elastic member at the protruding side is selected larger than that of another elastic member adjacent to first-mentioned elastic member at the protruding side. A focus detecting device comprises an imaging optical system having a variable-focus optical element, an image sensor provided at a determined image plane of the imaging optical system or an optically equivalent position, a sharpness detecting device for detecting the sharpness of the image from image signals obtained from the image sensor, and a device for varying the refractive power of the variable-focus optical element, and the focus state of the image on the image sensor is detected by comparing the sharpnesses detected by the sharpness detecting device at plural refractive powers of the variable-focus optical element.
    • 可变焦距光学元件包括沿轴向重叠的多个弹性构件和具有孔的变形构件,以使弹性构件从其突出或下降,从而使弹性构件的表面变形,并且弹性构件的弹性模量 在突出侧的突出侧被选择为大于在突出侧与第一弹性构件相邻的另一个弹性构件的突出侧。 焦点检测装置包括具有可变焦点光学元件的成像光学系统,设置在成像光学系统的确定的图像平面上的图像传感器或光学等效位置,用于从图像中检测图像的清晰度的锐度检测装置 通过将由锐度检测装置检测的锐度与多个折射力进行比较来检测从图像传感器获得的信号和用于改变可变焦点光学元件的折射力的装置和图像在图像传感器上的聚焦状态 的可变焦光学元件。
    • 8. 发明授权
    • Exposure system
    • 曝光系统
    • US5276725A
    • 1994-01-04
    • US996508
    • 1992-12-14
    • Eigo KawakamiMinoru YoshiiShunichi Uzawa
    • Eigo KawakamiMinoru YoshiiShunichi Uzawa
    • G03F7/20G21K5/00
    • G03F7/702
    • An exposure apparatus usable with a mask having a pattern and a wafer having a radiation-sensitive surface layer, for transferring with a radiation energy beam the pattern of the mask to the wafer, is disclosed. The apparatus includes a mask supporting member for supporting the mask; a wafer supporting member for supporting the wafer; a reflective member having a reflection surface and an indication pattern, the reflective member being supported by one of the mask supporting member and the wafer supporting member; an arrangement for projecting a beam, which is thinner than the radiation energy beam and which advances along or about the axis of the radiation energy beam, upon the reflective member; a device for observing a positional relationship between the indication pattern and a spot formed by projection of the thinner beam upon the reflective member; and a device for correcting a relationship between the indication pattern and the spot, on the basis of the observation.
    • 公开了一种可用于具有图案的掩模和具有辐射敏感表面层的晶片的曝光装置,用于将辐射能量束将掩模的图案转印到晶片。 该装置包括用于支撑面罩的面罩支撑构件; 用于支撑晶片的晶片支撑构件; 反射构件,其具有反射面和指示图案,所述反射构件由所述面罩支撑构件和所述晶片支撑构件中的一个支撑; 用于投射比辐射能量束更薄并且沿辐射能量束的轴线或围绕辐射能量束的轴线前进的光束的反射构件的布置; 用于观察指示图案与通过将较薄光束投射在反射构件上形成的光斑之间的位置关系的装置; 以及用于基于观察来校正指示图案与斑点之间的关系的装置。
    • 10. 发明申请
    • IMPRINT APPARATUS AND METHOD OF MANUFACTURING ARTICLE
    • 印刷装置及其制造方法
    • US20100314798A1
    • 2010-12-16
    • US12816881
    • 2010-06-16
    • Eigo Kawakami
    • Eigo Kawakami
    • B29C59/02B28B11/08
    • G03F7/0002B82Y10/00B82Y40/00
    • An imprint apparatus, which performs an imprint process for forming a pattern of a mold on a resin coated on a substrate, includes an imaging unit configured to image the resin on which the pattern is formed, and a controller configured to control the imprint process. When the pattern is continuously formed on the substrate, the controller compares an image of at least a partial area imaged by the imaging unit and an image of a reference state, which is obtained in advance, and when patterns each having a difference, which falls outside an allowable range, between the images are continuously formed, it determines a transfer error.
    • 执行用于在涂覆在基板上的树脂上形成模具图案的压印工艺的压印装置包括:成像单元,被配置为对形成有图案的树脂进行成像;以及控制器,被配置为控制压印处理。 当在基板上连续地形成图案时,控制器将由成像单元成像的至少一部分区域和预先获得的基准状态的图像以及各自具有差异的图案进行比较 在允许范围之外,图像之间连续形成,确定传送错误。