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1. 发明申请

WO0237526A9 ELECTRON BEAM APPARATUS AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE COMPRISING THE APPARATUS 审中-公开
标题翻译：电子束装置及制造包含该装置的半导体装置的方法
公开(公告)号：WO0237526A9
公开(公告)日：2002-08-08
申请号：PCT/JP0109629
申请日：2001-11-02
申请人： EBARA CORP , NIPPON KOGAKU KK
发明人： NAKASUJI MAMORU , SATAKE TOHRU , WATANABE KENJI , MURAKAMI TAKESHI , NOJI NOBUHARU , SOBUKAWA HIROSI , KARIMATA TSUTOMU , YOSHIKAWA SHOJI , KIMBA TOSHIFUMI , OOWADA SHIN , SAITO MUTSUMI , HAMASHIMA MUNEKI , TAKAGI TORU , KIHARA NAOTO , NISHIMURA HIROSHI
IPC分类号： G01N23/225 , G01Q30/06 , H01J37/06 , H01J37/073 , H01J37/18 , H01J37/20 , H01J37/22 , H01J37/244 , H01J37/28 , H01J37/29 , H01L21/027 , H01L21/66
CPC分类号： H01J37/185 , G01N23/225 , G01N23/2251 , H01J37/06 , H01J37/073 , H01J37/20 , H01J37/222 , H01J37/244 , H01J37/28 , H01J2237/082 , H01J2237/202 , H01J2237/20228 , H01J2237/204 , H01J2237/22 , H01J2237/24564 , H01J2237/2806 , H01J2237/2816 , H01J2237/2817
摘要： An electron beam apparatus for evaluating a sample face which comprises a primary electro-optical system irradiating the sample with primary electron beams, a detection system, and a secondary electro-optical system directing the secondary electron beam generated from the sample face by irradiation with the primary electron beam to the detection system. The electron beam apparatus is characterized by comprising a multi-beam generator included in the primary electro-optical system to generate electrons emitted from an electron gun as primary electron beams, a scanning deflector included in the primary electro-optical system to scan the sample simultaneously with the primary electron beams, an objective lens included in common in the primary electro-optical system and the secondary electro-optical system to irradiate the sample with decelerated primary electron beams and to accelerate the secondary electron beams emitted from the irradiated point on the sample with the primary electron beams, a secondary electron beam separator included in the primary and secondary electro-optical systems to deflect the secondary electron beams passing through the objective lens from the primary electro-optical system to the secondary electro- optical system, a magnifying lens of at least one stage included in the secondary electro-optical lens to magnify the deflected secondary electron beams, and detectors included in the detection system and provided in accordance with the secondary electron beams for the secondary electro-optical system to detect secondary electron beams.
摘要翻译：一种电子束装置，用于评估样品面，该样品面包括用一次电子束照射样品的主电光系统，检测系统和二次电子光学系统，该样品面通过照射一次电子束到检测系统。电子束装置的特征在于包括：包含在主电光系统中的多束发生器，用于产生从电子枪发射的电子作为主电子束;包括在主电光系统中的扫描偏转器，用于同时扫描样品利用一次电子束在主电子光学系统和二次电子光学系统中共同包括的物镜照射具有减速的一次电子束的样品并且加速从样品上的照射点发射的二次电子束利用主电子束，包括在初级和次级电光系统中的次级电子束分离器，将通过物镜的次级电子束从初级电光系统偏转到次级电光系统，放大镜头包括在次级电光学透镜中的至少一个级的大小被偏转的二次电子束以及包括在检测系统中并且根据用于二次电子光学系统的二次电子束提供的检测器来检测二次电子束。

4. 发明专利

JP2007048754A Inspection device with charged particle beam and device manufacturing method using inspection device 有权
标题翻译：具有充电颗粒光束的检查装置和使用检查装置的装置制造方法
公开(公告)号：JP2007048754A
公开(公告)日：2007-02-22
申请号：JP2006232088
申请日：2006-08-29
申请人： Ebara Corp , 株式会社荏原製作所
发明人： NAKASUJI MAMORU , NOMICHI SHINJI , SATAKE TORU , KANEUMA TOSHIFUMI , SOFUGAWA TAKUJI , YOSHIKAWA SEIJI , KARIMATA TSUTOMU , OWADA SHIN , NISHIFUJI MUTSUMI , HAMASHIMA MUNEKI , TAKAGI TORU
IPC分类号： H01J37/28 , G01N23/225 , H01J37/147 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To provide a flaw inspection method equipped with an enhanced throughput capable of precluding a crosstalk between a plurality of electron beams and leading the discharged secondary electrons efficiently to a detector. SOLUTION: The apparent angle on a specimen surface 1010 viewed from an objective lens is determined from the aperture angle and the magnification at the image surface 1005 of secondary electrons, and the receiving angle at the specimen surface is determined from the obtained apparent angle, the initial energy of the secondary electrons and the beam potential of the objective lens, followed by determining the yield of the secondary electrons on the basis of the obtained receiving angle, and on the basis of the resolution decided by the aperture angle, the spacing of irradiation with adjoining primary electron beams is separated to a distance or more which does not present a problem of crosstalk. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种具有能够排除多个电子束之间的串扰并且将放电的二次电子有效地引导到检测器的增强的吞吐量的缺陷检查方法。解决方案：从物镜观察的样品表面1010上的视角根据二次电子的图像表面1005的孔径角和倍率确定，并且从获得的表观上确定样品表面处的接收角度角度，二次电子的初始能量和物镜的光束电位，然后基于获得的接收角确定二次电子的产量，并且基于由孔径角决定的分辨率，相邻的一次电子束的照射间隔被分离到一定距离以上，这不会产生串扰的问题。版权所有（C）2007，JPO＆INPIT

5. 发明专利

JP2002157969A SAMPLE EVALUATING DEVICE USING ELECTRON BEAM AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE BY USING THIS DEVICE 失效
公开(公告)号：JP2002157969A
公开(公告)日：2002-05-31
申请号：JP2000351413
申请日：2000-11-17
申请人： NIKON CORP , EBARA CORP
发明人： TAKAGI TORU , NISHIMURA HIROSHI , HAMASHIMA MUNEKI , NAKASUJI MAMORU , NOMICHI SHINJI , SATAKE TORU
IPC分类号： G01N23/225 , H01J37/12 , H01J37/28 , H01J37/29 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To improve an aberration even if a visual field is wide by improving an objective lens in a sample evaluating device of multibeams. SOLUTION: Electrodes 21, 23 and 25 for constituting the objective lens are grounded, and lens power is divided into a front stage and a rear stage by grounding of an intermediate electrode 23. Voltage is independently impressed between the electrodes 21 and 22, and between the electrodes 24 and 25, and the front stage and rear stage power can be independently adjusted. The front stage power is used for forming an image of a main electron beam on the optical axis in the central vicinity of the rear stage power, and the rear stage power is used for forming the final image on a surface of a wafer. A reducing lens of this sample evaluating device is adjusted so that an intermediate image forming surface M is positioned in the center of the front stage power. Since the rear stage power is used for forming the image and the front stage power is used to control a main beam of light to pass through the optical axis in the central vicinity of the rear stage power, the main beam of light is not diffused so that even when the visual field is widened, a distortion aberration can be reduced.

6. 发明专利

JP2002216689A CHARGED PARTICLE MAPPING/PROJECTING OPTICAL SYSTEM, CHARGED PARTICLE RAY DEFECT INSPECTING DEVICE COMPRISING IT, AND SEMICONDUCTOR DEVICE MANUFACTURED BY THE SAME 失效
公开(公告)号：JP2002216689A
公开(公告)日：2002-08-02
申请号：JP2001007764
申请日：2001-01-16
申请人： EBARA CORP , NIKON CORP
发明人： TAKAGI TORU
IPC分类号： G01N23/225 , G21K5/04 , H01J37/12 , H01J37/244 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To provide a charged particle mapping/projecting optical system, etc., of high optical performance from a low to high magnifications, with a large variable magnification ratio. SOLUTION: The charged particle mapping optical system comprises variable magnification optical systems La and Lb for changing magnification of a focused intermediate image by charged particles occurring from a sample S, and an extended projection optical system for projecting extended intermediate image. The extended projection optical system at least comprises a first electrostatic lens L1 of a first imaging magnification β1, a second electrostatic lens L2 of a second imaging magnification β2, and a lens switching part 7 for selectively switching between the first and second electrostatic lenses.

7. 发明专利

JP2008193119A Inspection system by charged particle beam and method of manufacturing devices using system 审中-公开
标题翻译：通过充电颗粒束检查系统和使用系统制造设备的方法
公开(公告)号：JP2008193119A
公开(公告)日：2008-08-21
申请号：JP2008112489
申请日：2008-04-23
申请人： Ebara Corp , 株式会社荏原製作所
发明人： NAKASUJI MAMORU , NOMICHI SHINJI , SATAKE TORU , KANEUMA TOSHIFUMI , SOFUGAWA TAKUJI , YOSHIKAWA SEIJI , KARIMATA TSUTOMU , OWADA SHIN , NISHIFUJI MUTSUMI , HAMASHIMA MUNEKI , TAKAGI TORU
IPC分类号： H01L21/66 , H01J37/29
摘要： PROBLEM TO BE SOLVED: To improve inspection process, which has required much time to inspect a whole sample, by means of moving the inspection surface (test piece) of a conventional apparatus intermittently. SOLUTION: The inspection apparatus includes: a primary electron optics system for irradiating a plurality of primary charged particles onto the sample; and a secondary electron optics system. The secondary electron optics system accelerates and focuses secondary charged particles by means of electric field applied across an objective lens and the sample surface, the secondary charged particles being respectively emitted from irradiation points which are formed on sample for irradiating the plurality of primary charged particles, separates the focused secondary charged particles from the primary electron optics system by means of a E×B separator arranged between the objective lens and a lens at beam generation means side of the objective lens, and introduces it to a secondary electron detection device (4000). In the primary electron optics system, the irradiation points for irradiating a plurality of primary charged particles are formed on the surface of the sample in two dimensions, and points projected in an axial direction of irradiating point are equally spaced. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：通过间歇地移动常规设备的检查表面（试件），改进检查过程需要大量时间来检查整个样品。解决方案：检查装置包括：用于将多个初级带电粒子照射到样品上的初级电子光学系统; 和二次电子光学系统。二次电子光学系统通过施加在物镜和样品表面上的电场加速并聚焦二次带电粒子，二次带电粒子分别从形成在用于照射多个初级带电粒子的样品上的照射点发射，通过布置在物镜和物镜的光束产生装置侧的透镜之间的E×B分离器将聚焦的二次带电粒子与初级电子光学系统分离，并将其引入二次电子检测装置（4000）。在初级电子光学系统中，用于照射多个初级带电粒子的照射点在两个维度上形成在样品的表面上，并且沿照射点的轴向突出的点相等间隔。版权所有（C）2008，JPO＆INPIT

8. 发明专利

JP2007184283A Charged particle beam device and method 审中-公开
标题翻译：充电颗粒束装置和方法
公开(公告)号：JP2007184283A
公开(公告)日：2007-07-19
申请号：JP2007000925
申请日：2007-01-09
申请人： Ebara Corp , 株式会社荏原製作所
发明人： NAKASUJI MAMORU , SATAKE TORU , WATANABE KENJI , MURAKAMI TAKESHI , NOMICHI SHINJI , SOFUGAWA TAKUJI , KARIMATA TSUTOMU , YOSHIKAWA SEIJI , KANEUMA TOSHIFUMI , OWADA SHIN , NISHIFUJI MUTSUMI , HAMASHIMA MUNEKI , TAKAGI TORU , KIHARA NAOTO , NISHIMURA HIROSHI
IPC分类号： H01J37/147 , G01N23/225 , H01J37/28 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To provide an electron beam device which improves inspection throughput and detection accuracy. SOLUTION: The device irradiates primary charged particles to a region of a sample W to be measured and detects secondary charged particles emitted from the sample W. When the primary charged particles are irradiated to small unit areas of the divided measured region, it is controlled so that at least one or more adjacent areas R12 are skipped after one small area R11 is irradiated, and unirradiated areas R13 are irradiated. In this case, irradiation of each area is started from a side nearer to the area which is irradiated next and proceeded to a farther side. For example, in the case of the area R11, irradiation starts from the point P11 nearer to the area R13 which is irradiated next and when it reaches the farther point P12, irradiation of the area R13 is started from the point P13. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种提高检查吞吐量和检测精度的电子束装置。解决方案：该装置将一次带电粒子照射到要测量的样品W的区域，并检测从样品W发射的二次带电粒子。当初级带电粒子照射到被划分的测量区域的小单位面积时，被控制使得在照射一个小区域R11之后跳过至少一个或多个相邻区域R12，并且照射未照射区域R13。在这种情况下，每个区域的照射从更靠近下一个被照射的区域的一侧开始并进行到更远的一侧。例如，在区域R11的情况下，从接近照射区域R13的点P11开始照射，当到达更远点P12时，从点P13开始照射区域R13。版权所有（C）2007，JPO＆INPIT

9. 发明专利

JP2003022772A Charged-particle-beam control device, charged-particle- beam optical device using it, and charged-particle-beam defection inspecting device 有权
标题翻译：充电粒子束控制装置，使用它的充电颗粒光束装置和充电颗粒光束缺陷检查装置
公开(公告)号：JP2003022772A
公开(公告)日：2003-01-24
申请号：JP2001205011
申请日：2001-07-05
申请人： Ebara Corp , Nikon Corp , 株式会社ニコン , 株式会社荏原製作所
发明人： TAKAGI TORU
IPC分类号： G21K1/08 , G21K5/04 , H01J37/05 , H01J37/147 , H01J37/29
摘要： PROBLEM TO BE SOLVED: To provide a charged-particle-beam control equipment, which can suppress temperature rise of pole elements, charged-particle-beam optical equipment using it, and charged-particle-beam defection inspecting equipment.
SOLUTION: In the Vienna filter A equipped with a vacuum chamber 11, in which charged particles pass through the inside, pole elements 12, 13, 14, and 15 consists of the pole element main parts 12a, 13a, 14a, and 15a, which are made to penetrate the vacuum chamber 11, and excitation coils 12b, 13b, 14b and 15b prepared in the pole bodies 12a, 13a, 14a, and 15a on the outside of the vacuum chain bar 11. Insulated parts 12e, 13e, 14e, and 15e are formed inserting them between the orbit side of the charged particles, and the excitation coils 12b, 13b, 14b, and 15b.
COPYRIGHT: (C)2003,JPO
摘要翻译：要解决的问题：提供一种可以抑制极元件的温度升高，使用它的带电粒子束光学设备和带电粒子束检测设备的带电粒子束控制设备。解决方案：在装有真空室11的维也纳过滤器A中，带电粒子通过内部，极元件12,13,14和15由极元件主要部分12a，13a，14a和15a组成，其中被制成穿透真空室11，以及制备在真空链条11的外侧上的极本体12a，13a，14a和15a中的励磁线圈12b，13b，14b和15b。绝缘部分12e，13e，14e， 15e形成为将它们插入带电粒子的轨道侧和励磁线圈12b，13b，14b，15b之间。

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