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1. 发明专利

JP2007048754A Inspection device with charged particle beam and device manufacturing method using inspection device 有权
标题翻译：具有充电颗粒光束的检查装置和使用检查装置的装置制造方法
公开(公告)号：JP2007048754A
公开(公告)日：2007-02-22
申请号：JP2006232088
申请日：2006-08-29
申请人： Ebara Corp , 株式会社荏原製作所
发明人： NAKASUJI MAMORU , NOMICHI SHINJI , SATAKE TORU , KANEUMA TOSHIFUMI , SOFUGAWA TAKUJI , YOSHIKAWA SEIJI , KARIMATA TSUTOMU , OWADA SHIN , NISHIFUJI MUTSUMI , HAMASHIMA MUNEKI , TAKAGI TORU
IPC分类号： H01J37/28 , G01N23/225 , H01J37/147 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To provide a flaw inspection method equipped with an enhanced throughput capable of precluding a crosstalk between a plurality of electron beams and leading the discharged secondary electrons efficiently to a detector. SOLUTION: The apparent angle on a specimen surface 1010 viewed from an objective lens is determined from the aperture angle and the magnification at the image surface 1005 of secondary electrons, and the receiving angle at the specimen surface is determined from the obtained apparent angle, the initial energy of the secondary electrons and the beam potential of the objective lens, followed by determining the yield of the secondary electrons on the basis of the obtained receiving angle, and on the basis of the resolution decided by the aperture angle, the spacing of irradiation with adjoining primary electron beams is separated to a distance or more which does not present a problem of crosstalk. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种具有能够排除多个电子束之间的串扰并且将放电的二次电子有效地引导到检测器的增强的吞吐量的缺陷检查方法。解决方案：从物镜观察的样品表面1010上的视角根据二次电子的图像表面1005的孔径角和倍率确定，并且从获得的表观上确定样品表面处的接收角度角度，二次电子的初始能量和物镜的光束电位，然后基于获得的接收角确定二次电子的产量，并且基于由孔径角决定的分辨率，相邻的一次电子束的照射间隔被分离到一定距离以上，这不会产生串扰的问题。版权所有（C）2007，JPO＆INPIT

2. 发明专利

JP2007147648A Defect inspection method and substrate inspection device 审中-公开
标题翻译：缺陷检查方法和基板检查装置
公开(公告)号：JP2007147648A
公开(公告)日：2007-06-14
申请号：JP2007031703
申请日：2007-02-13
申请人： Ebara Corp , 株式会社荏原製作所
发明人： KANEUMA TOSHIFUMI , SATAKE TORU , KARIMATA TSUTOMU , WATANABE KENJI , NOMICHI SHINJI , MURAKAMI TAKESHI , HATAKEYAMA MASAKI , NAKASUJI MAMORU , SOFUGAWA TAKUJI , YOSHIKAWA SEIJI , OWADA SHIN , NISHIFUJI MUTSUMI
IPC分类号： G01N23/225 , H01J37/18 , H01J37/20 , H01L21/66 , H01L21/677
摘要： PROBLEM TO BE SOLVED: To provide a substrate inspection device capable of inspecting defects of a sample with good throughput and high accuracy. SOLUTION: The substrate inspection device 1 comprises a working chamber 30 in vacuum state, an electron-optical device 70 equipped with an LaB 6 electron source, a loader housing 40, which carries out/in a wafer to/from the working chamber, and a mini-environment device 20, which is connected to the working chamber and in which atmosphere is controlled. A loader housing 40 comprises a first loading chamber connected to the mini-environment device 20, a second loading chamber connected to the working chamber, a first shutter device 27 that selectively prevents communication between the first and second loading chambers, and a second shutter device 45 that selectively prevents communication between the second loading chamber and the working chamber. A vacuum exhaust pipe and a vent pipe for inert gas are connected to the first and second loading chambers, respectively. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供能够以良好的生产量和高精度检查样品的缺陷的基板检查装置。解决方案：基板检查装置1包括处于真空状态的工作室30，装有LaB <6>电子源的电子 - 光学装置70，装载机壳体40，其执行/进入与工作室相连的晶片，以及连接到工作室并且控制大气的微型环境设备20。装载机壳体40包括连接到迷你环境装置20的第一装载室，连接到工作室的第二装载室，选择性地防止第一和第二装载室之间的连通的第一挡板装置27和第二挡板装置 45，其选择性地防止第二装载室和工作室之间的连通。真空排气管和惰性气体排放管分别连接到第一和第二装载室。版权所有（C）2007，JPO＆INPIT

3. 发明专利

JP2006253708A Electron beam apparatus and device manufacturing method using the same 审中-公开
标题翻译：电子束装置和使用该装置的装置制造方法
公开(公告)号：JP2006253708A
公开(公告)日：2006-09-21
申请号：JP2006121444
申请日：2006-04-26
申请人： Ebara Corp , 株式会社荏原製作所
发明人： NAKASUJI MAMORU , OWADA SHIN , SATAKE TORU
IPC分类号： H01L21/66 , G01N23/225
摘要： PROBLEM TO BE SOLVED: To provide an electron beam apparatus where installation of an optical microscope in an evacuated atmosphere is eliminated and alignment is realized, without having to conduct prealignment, and to provide an evaluating method.
SOLUTION: The size of X-direction or Y-direction of the field of vision 23 of SEM is set to become larger than the widths of dicing lines 21 and 22. Loading precision is set to be within a prescribed range, and alignment is conducted by using the dicing lines 21 and 22 or a pattern 26 near the dicing lines 21 and 22. A means for determining a region to be inspected is disposed based on SEM image, and a stage is moved in a direction of preventing the region to be inspected from going out of the field of vision of SEM.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种电子束装置，其中消除了在真空气氛中安装光学显微镜并实现了对准，而不必进行预对准，并提供了评估方法。解决方案：SEM的视野23的X方向或Y方向的大小被设定为大于切割线21和22的宽度。加载精度被设定在规定范围内，并且通过使用切割线21和22或切割线21和22附近的图案26进行对准。基于SEM图像布置用于确定被检查区域的装置，并且在防止要检查的区域将远离SEM的视野。版权所有（C）2006，JPO＆NCIPI

4. 发明专利

JP2012119704A Seat beam type inspection device 有权
标题翻译：座椅类型检测装置
公开(公告)号：JP2012119704A
公开(公告)日：2012-06-21
申请号：JP2012006612
申请日：2012-01-16
申请人： Ebara Corp , 株式会社荏原製作所
发明人： NAKASUJI MAMORU , NOMICHI SHINJI , SATAKE TORU , KANEUMA TOSHIFUMI , SOFUGAWA TAKUJI , KARIMATA TSUTOMU , OWADA SHIN , YOSHIKAWA SEIJI , NISHIFUJI MUTSUMI
IPC分类号： H01L21/683 , G01N23/225 , G03F1/76 , G03F1/78 , H01J37/06 , H01J37/073 , H01J37/18 , H01J37/20 , H01J37/22 , H01J37/244 , H01J37/28 , H01L21/66
CPC分类号： G01N23/225 , H01J37/06 , H01J37/073 , H01J37/185 , H01J37/20 , H01J37/222 , H01J37/244 , H01J37/28 , H01J2237/082 , H01J2237/202 , H01J2237/20228 , H01J2237/204 , H01J2237/22 , H01J2237/24564 , H01J2237/2806 , H01J2237/2816 , H01J2237/2817
摘要： PROBLEM TO BE SOLVED: To provide an electrostatic chuck capable of sucking and holding a wafer reliably.SOLUTION: An electrostatic chuck 1410, for electrostatically sucking and holding a wafer, is composed of a substrate 1405, an electrode plate 1412, and an insulating layer 1404 overlapped, and generates a suction force between the wafer and the chuck by applying to an electrode plate of the electrostatic chuck a voltage linked to a voltage applied to the wafer, increasing or decreasing from 0 volt to a prescribed voltage with time.
摘要翻译：要解决的问题：提供能够可靠地吸持和保持晶片的静电卡盘。解决方案：用于静电吸持和保持晶片的静电吸盘1410由重叠的基板1405，电极板1412和绝缘层1404组成，并通过施加在晶片和卡盘之间产生吸力到静电卡盘的电极板，与施加到晶片的电压相关联的电压随时间从0伏增加到规定电压。版权所有（C）2012，JPO＆INPIT

5. 发明专利

JP2008193119A Inspection system by charged particle beam and method of manufacturing devices using system 审中-公开
标题翻译：通过充电颗粒束检查系统和使用系统制造设备的方法
公开(公告)号：JP2008193119A
公开(公告)日：2008-08-21
申请号：JP2008112489
申请日：2008-04-23
申请人： Ebara Corp , 株式会社荏原製作所
发明人： NAKASUJI MAMORU , NOMICHI SHINJI , SATAKE TORU , KANEUMA TOSHIFUMI , SOFUGAWA TAKUJI , YOSHIKAWA SEIJI , KARIMATA TSUTOMU , OWADA SHIN , NISHIFUJI MUTSUMI , HAMASHIMA MUNEKI , TAKAGI TORU
IPC分类号： H01L21/66 , H01J37/29
摘要： PROBLEM TO BE SOLVED: To improve inspection process, which has required much time to inspect a whole sample, by means of moving the inspection surface (test piece) of a conventional apparatus intermittently. SOLUTION: The inspection apparatus includes: a primary electron optics system for irradiating a plurality of primary charged particles onto the sample; and a secondary electron optics system. The secondary electron optics system accelerates and focuses secondary charged particles by means of electric field applied across an objective lens and the sample surface, the secondary charged particles being respectively emitted from irradiation points which are formed on sample for irradiating the plurality of primary charged particles, separates the focused secondary charged particles from the primary electron optics system by means of a E×B separator arranged between the objective lens and a lens at beam generation means side of the objective lens, and introduces it to a secondary electron detection device (4000). In the primary electron optics system, the irradiation points for irradiating a plurality of primary charged particles are formed on the surface of the sample in two dimensions, and points projected in an axial direction of irradiating point are equally spaced. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：通过间歇地移动常规设备的检查表面（试件），改进检查过程需要大量时间来检查整个样品。解决方案：检查装置包括：用于将多个初级带电粒子照射到样品上的初级电子光学系统; 和二次电子光学系统。二次电子光学系统通过施加在物镜和样品表面上的电场加速并聚焦二次带电粒子，二次带电粒子分别从形成在用于照射多个初级带电粒子的样品上的照射点发射，通过布置在物镜和物镜的光束产生装置侧的透镜之间的E×B分离器将聚焦的二次带电粒子与初级电子光学系统分离，并将其引入二次电子检测装置（4000）。在初级电子光学系统中，用于照射多个初级带电粒子的照射点在两个维度上形成在样品的表面上，并且沿照射点的轴向突出的点相等间隔。版权所有（C）2008，JPO＆INPIT

6. 发明专利

JP2007206050A Substrate inspection method, substrate inspection device, and electron beam unit 审中-公开
标题翻译：基板检查方法，基板检查装置和电子束单元
公开(公告)号：JP2007206050A
公开(公告)日：2007-08-16
申请号：JP2006071948
申请日：2006-03-16
申请人： Ebara Corp , 株式会社荏原製作所
发明人： NAKASUJI MAMORU , NOMICHI SHINJI , SATAKE TORU , HAMASHIMA MUNEKI , KANEUMA TOSHIFUMI , HATAKEYAMA MASAKI , WATANABE KENJI , SOFUGAWA TAKUJI , KARIMATA TSUTOMU , YOSHIKAWA SEIJI , OWADA SHIN , NISHIFUJI MUTSUMI
IPC分类号： G01N23/225 , G01R31/302 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To provide a substrate inspection method, a substrate inspection device and an electron beam unit for inspection, capable of inspecting and evaluating highly reliably a sample with a high through-put. SOLUTION: The substrate inspection method/device of the present invention is provided with: a charged particle beam generating means 71 for generating a charged particle beam; a primary optical system 72 for irradiating a substrate with scan of the plurality of primary charged particle beams; a secondary optical system 74 introduced with a secondary charged particle beam emitted from the substrate by the irradiation of the charged electron beam; a detection system 76 having a detector for detecting the secondary charged particle beam introduced into the secondary optical system to be converted into electric signals; and a process control system 77 for evaluating the substrate, based on the electric signals. A coupling area in divided areas is selected to conduct evaluation, in the evaluation of a pattern forming face where the whole pattern is formed by dividing the pattern forming face into the plurality of areas and by forming a pattern for every area. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种基板检查方法，基板检查装置和用于检查的电子束单元，能够高可靠地检查和评估具有高通量的样品。解决方案：本发明的基板检查方法/装置设置有：用于产生带电粒子束的带电粒子束产生装置71; 用于对多个初级带电粒子束的扫描照射基板的主光学系统72; 二次光学系统74引入了通过照射带电电子束从衬底发射的二次带电粒子束; 检测系统76，具有检测器，用于检测引入二次光学系统的二次带电粒子束以转换成电信号; 以及用于基于电信号来评估衬底的过程控制系统77。选择分割区域中的耦合区域来评估通过将图案形成面分割成多个区域而形成整个图案的图案形成面，并且通过形成每个区域的图案。版权所有（C）2007，JPO＆INPIT

7. 发明专利

JP2007184283A Charged particle beam device and method 审中-公开
标题翻译：充电颗粒束装置和方法
公开(公告)号：JP2007184283A
公开(公告)日：2007-07-19
申请号：JP2007000925
申请日：2007-01-09
申请人： Ebara Corp , 株式会社荏原製作所
发明人： NAKASUJI MAMORU , SATAKE TORU , WATANABE KENJI , MURAKAMI TAKESHI , NOMICHI SHINJI , SOFUGAWA TAKUJI , KARIMATA TSUTOMU , YOSHIKAWA SEIJI , KANEUMA TOSHIFUMI , OWADA SHIN , NISHIFUJI MUTSUMI , HAMASHIMA MUNEKI , TAKAGI TORU , KIHARA NAOTO , NISHIMURA HIROSHI
IPC分类号： H01J37/147 , G01N23/225 , H01J37/28 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To provide an electron beam device which improves inspection throughput and detection accuracy. SOLUTION: The device irradiates primary charged particles to a region of a sample W to be measured and detects secondary charged particles emitted from the sample W. When the primary charged particles are irradiated to small unit areas of the divided measured region, it is controlled so that at least one or more adjacent areas R12 are skipped after one small area R11 is irradiated, and unirradiated areas R13 are irradiated. In this case, irradiation of each area is started from a side nearer to the area which is irradiated next and proceeded to a farther side. For example, in the case of the area R11, irradiation starts from the point P11 nearer to the area R13 which is irradiated next and when it reaches the farther point P12, irradiation of the area R13 is started from the point P13. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种提高检查吞吐量和检测精度的电子束装置。解决方案：该装置将一次带电粒子照射到要测量的样品W的区域，并检测从样品W发射的二次带电粒子。当初级带电粒子照射到被划分的测量区域的小单位面积时，被控制使得在照射一个小区域R11之后跳过至少一个或多个相邻区域R12，并且照射未照射区域R13。在这种情况下，每个区域的照射从更靠近下一个被照射的区域的一侧开始并进行到更远的一侧。例如，在区域R11的情况下，从接近照射区域R13的点P11开始照射，当到达更远点P12时，从点P13开始照射区域R13。版权所有（C）2007，JPO＆INPIT

8. 发明专利

JP2006153871A Substrate inspection method, substrate inspecting device, and electron beam system 审中-公开
标题翻译：基板检查方法，基板检查装置和电子束系统
公开(公告)号：JP2006153871A
公开(公告)日：2006-06-15
申请号：JP2005328590
申请日：2005-11-14
申请人： Ebara Corp , 株式会社荏原製作所
发明人： NAKASUJI MAMORU , NOMICHI SHINJI , SATAKE TORU , HAMASHIMA MUNEKI , KANEUMA TOSHIFUMI , HATAKEYAMA MASAKI , WATANABE KENJI , SOFUGAWA TAKUJI , KARIMATA TSUTOMU , YOSHIKAWA SEIJI , OWADA SHIN , NISHIFUJI MUTSUMI
IPC分类号： G01N23/225 , G01B15/04 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To provide test method and inspection device for achieving inspection and evaluation of sample data, and moreover with high throughput, as well as higher reliability. SOLUTION: This electron beam system comprises a charged particle beam generation means 71 for generating a charged particle beam, a primary optical system 72, which allows a plurality of the primary charged particle beams to be scanned and then irradiated on the substrate, a secondary optical system 74 into which the secondary charged particle beams, discharged from the substrate by the irradiation of the charged particle beam are injected, a detection system 76 for detecting the secondary charged particle beams injected into the secondary optical system for converting them into electrical signals, and a processing control system 77 for evaluating the substrate, based on the electrical signals. By dividing the pattern formation face into several areas and then select-joining the areas of the divided areas, evaluation of the pattern forming face where an entire pattern formation is made by forming patterns for each area is conducted. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供用于实现样本数据检查和评估的测试方法和检查装置，以及高吞吐量以及更高的可靠性。解决方案：该电子束系统包括用于产生带电粒子束的带电粒子束产生装置71，允许多个初级带电粒子束被扫描然后在基底上照射的主光学系统72，注入通过照射带电粒子束从基板排出的二次带电粒子束的二次光学系统74，用于检测注入二次光学系统中的二次带电粒子束的检测系统76，用于将其转换为电信号，以及用于基于电信号来评估衬底的处理控制系统77。通过将图案形成面分割成若干区域，然后选择连接分割区域的区域，进行通过形成每个区域的图案来进行整体图案形成的图案形成面的评价。版权所有（C）2006，JPO＆NCIPI

9. 发明专利

JP2013175781A Electrostatic chuck sucking and holding wafer 有权
标题翻译：静电卡盘吊架和保持架
公开(公告)号：JP2013175781A
公开(公告)日：2013-09-05
申请号：JP2013101200
申请日：2013-05-13
申请人： Ebara Corp , 株式会社荏原製作所
发明人： NAKASUJI MAMORU , NOMICHI SHINJI , SATAKE TORU , KANEUMA TOSHIFUMI , SOFUGAWA TAKUJI , KARIMATA TSUTOMU , OWADA SHIN , YOSHIKAWA SEIJI , NISHIFUJI MUTSUMI
IPC分类号： H01L21/683 , G01N23/223 , G01N23/225 , G03F1/76 , G03F1/78 , H01J37/06 , H01J37/073 , H01J37/18 , H01J37/20 , H01J37/22 , H01J37/244 , H01J37/28 , H01L21/66
CPC分类号： G01N23/225 , H01J37/06 , H01J37/073 , H01J37/185 , H01J37/20 , H01J37/222 , H01J37/244 , H01J37/28 , H01J2237/082 , H01J2237/202 , H01J2237/20228 , H01J2237/204 , H01J2237/22 , H01J2237/24564 , H01J2237/2806 , H01J2237/2816 , H01J2237/2817
摘要： PROBLEM TO BE SOLVED: To provide an electrostatic chuck that reliably sucks and holds a wafer.SOLUTION: An electrostatic chuck 1410 that electrostatically sucks and holds a wafer is formed by laminating a substrate 1405, an electrode plate 1412 having a first electrode plate 1401 and a second electrode plate 1402, and an insulating layer 1404. The electrode plate of the electrostatic chuck is applied with a voltage that changes in conjunction with an increase or a decrease of a voltage applied to the wafer over time from 0 volt to a predetermined voltage, and thereby suction force is generated between the wafer and the chuck.
摘要翻译：要解决的问题：提供可靠地吸收和保持晶片的静电卡盘。解决方案：静电吸持和保持晶片的静电卡盘1410通过层叠基板1405，具有第一电极板1401的电极板1412和第二电极板1402和绝缘层1404.静电卡盘的电极板被施加电压，其随着随时间从0伏到预定电压的施加到晶片的电压的增加或减小而变化，从而在晶片和卡盘之间产生吸力。

10. 发明专利

JP2008180721A Defect inspecting method and substrate inspecting apparatus 审中-公开
标题翻译：缺陷检查方法和基板检查装置
公开(公告)号：JP2008180721A
公开(公告)日：2008-08-07
申请号：JP2008023853
申请日：2008-02-04
申请人： Ebara Corp , 株式会社荏原製作所
发明人： KANEUMA TOSHIFUMI , SATAKE TORU , KARIMATA TSUTOMU , WATANABE KENJI , NOMICHI SHINJI , MURAKAMI TAKESHI , HATAKEYAMA MASAKI , NAKASUJI MAMORU , SOFUGAWA TAKUJI , YOSHIKAWA SEIJI , OWADA SHIN , NISHIFUJI MUTSUMI
IPC分类号： G01N23/225 , G01Q30/02 , G01R31/302 , H01J37/06 , H01J37/073 , H01J37/18 , H01J37/20 , H01J37/22 , H01J37/244 , H01J37/28 , H01L21/66
CPC分类号： H01J37/222 , G01N23/225 , G01N23/2251 , H01J37/06 , H01J37/073 , H01J37/185 , H01J37/20 , H01J37/244 , H01J37/28 , H01J2237/0216 , H01J2237/082 , H01J2237/2002 , H01J2237/2007 , H01J2237/202 , H01J2237/20228 , H01J2237/204 , H01J2237/22 , H01J2237/24564 , H01J2237/2806 , H01J2237/2813 , H01J2237/2816 , H01J2237/2817 , H01L2224/48227 , H01L2924/01019 , H01L2924/01025 , H01L2924/01057 , H01L2924/01067 , H01L2924/01078 , H01L2924/10253 , H01L2924/12032 , H01L2924/3025 , H01L2924/00
摘要： PROBLEM TO BE SOLVED: To provide a high-throughput substrate inspecting apparatus capable of detecting a defect of a sample precisely. SOLUTION: The substrate inspecting apparatus 1 comprises a working chamber 30 being made vacuum, an electron-optical device 70 equipped with a L a B 6 electron source, a loader housing 40 for loading a wafer to/from the working chamber, and a mini environment device 20 which is connected to the working chamber and keeps the inside controlled atmospherically. The loader housing 40 comprises a first loading chamber connected to the mini environment device 20, a second loading chamber connected to the working chamber, a first shutter device 27 for selectively shutting the communication between the first and second loading chambers, and a second shutter device 45 for selectively shutting the communication between the second loading chamber and the working chamber. A vacuum exhaust pipe and an inert gas-use vent pipe are connected to each of the first and second loading chambers. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供能够精确地检测样品的缺陷的高通量基板检查装置。＆lt; P＆gt;解决方案：基板检查装置1包括被制成真空的工作室30，配备有电子束的电子 - 光学装置70，B电子源，用于将晶片装载到工作室的加载器壳体40和连接到工作室并保持内部受到大气控制的微型环境装置20。装载机壳体40包括连接到迷你环境装置20的第一装载室，连接到工作室的第二装载室，用于选择性地关闭第一和第二装载室之间的连通的第一闸板装置27和第二闸板装置 45，用于选择性地关闭第二装载室和工作室之间的连通。真空排气管和惰性气体使用排气管连接到第一和第二装载室中的每一个。版权所有（C）2008，JPO＆INPIT

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