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1. 发明授权

US09599891B2 Fabrication of silk fibroin photonic structures by nanocontact imprinting 有权
公开(公告)号：US09599891B2
公开(公告)日：2017-03-21
申请号：US12741066
申请日：2008-11-05
申请人： David L. Kaplan , Fiorenzo G. Omenetto , Luca Dal Negro
发明人： David L. Kaplan , Fiorenzo G. Omenetto , Luca Dal Negro
IPC分类号： G03F7/00 , B29D11/00 , G02B6/122 , C07K14/435 , B82Y10/00 , B82Y20/00 , B82Y40/00
CPC分类号： G03F7/0002 , B29D11/00 , B29D11/00346 , B82Y10/00 , B82Y20/00 , B82Y40/00 , C07K14/435 , G02B6/1225
摘要： A method of manufacturing a nanopatterned biophotonic structure includes forming a customized nanopattern mask on a substrate using E-beam lithography, providing a biopolymer matrix solution, depositing the biopolymer matrix solution on the substrate, and drying the biopolymer matrix solution to form a solidified biopolymer film. A surface of the film is formed with the nanopattern mask, or a nanopattern is machined directly on a surface of the film using E-beam lithograpy such that the biopolymer film exhibits a spectral signature corresponding to the E-beam lithograpy nanopattern. The resulting bio-compatible nanopatterned biophotonic structures may be made from silk, may be biodegradable, and may be bio-sensing devices. The biophotonic structures may employ nanopatterned masks based on non-periodic photonic lattices, and the biophotonic structures may be designed with specific spectral signatures for use in probing biological substances, including displaying optical activity in the form of opalescence.

2. 发明申请

US20110267614A1 ENGINEERED SERS SUBSTRATES EMPLOYING NANOPARTICLE CLUSTER ARRAYS WITH MULTISCALE SIGNAL ENHANCEMENT 有权
标题翻译：采用多尺度信号增强技术的纳米级聚类阵列工程基础
公开(公告)号：US20110267614A1
公开(公告)日：2011-11-03
申请号：US13142939
申请日：2010-01-11
申请人： Bjoern Markus Reinhard , Luca Dal Negro
发明人： Bjoern Markus Reinhard , Luca Dal Negro
IPC分类号： G01J3/44 , B05D5/06 , B05D5/02
CPC分类号： G02B5/008 , B82Y30/00 , C03C17/40 , C03C2217/255 , C03C2217/425 , G01N21/01 , G01N21/658 , G01N2201/02 , Y10T428/12104 , Y10T428/24909
摘要： Defined nanoparticle cluster arrays (NCAs) with total lateral dimensions of up to 25.4 μm by 25.4 μm have been fabricated on top of a 10 nm thin gold film using template guided self-assembly. This approach provides precise control of the structural parameters in the arrays allowing a systematic variation of the average number of nanoparticles in the clusters (n) and the edge to edge separation (Λ) between 1
摘要翻译：使用模板引导自组装，在10nm薄金膜的顶部上制造了总侧向尺寸高达25.4μm×25.4μm的定义的纳米颗粒簇阵列（NCAs）。该方法提供对阵列中的结构参数的精确控制，允许在1

3. 发明授权

US07738756B2 Energy coupled superlattice structures for silicon based lasers and modulators 有权
标题翻译：用于硅基激光器和调制器的能量耦合超晶格结构
公开(公告)号：US07738756B2
公开(公告)日：2010-06-15
申请号：US11490961
申请日：2006-07-21
申请人： Luca Dal Negro , Jae Hyung Yi , Lionel C. Kimerling
发明人： Luca Dal Negro , Jae Hyung Yi , Lionel C. Kimerling
IPC分类号： G02B6/10
CPC分类号： H01S3/0632 , G02B6/12004 , H01S3/0637 , H01S3/1603 , H01S3/1608 , H01S3/1628 , H01S3/17
摘要： A waveguide structure includes a SOI substrate. A core structure is formed on the SOI substrate comprising a plurality of multilayers having alternating or aperiodically distributed thin layers of either Si-rich oxide (SRO), Si-rich nitride (SRN) or Si-rich oxynitride (SRON). The multilayers are doped with a rare earth material so as to extend the emission range of the waveguide structure to the near infrared region. A low index cladding includes conductive oxides to act as electrodes.
摘要翻译：波导结构包括SOI衬底。在包括多个具有富Si氧化物（SRO），富Si的氮化物（SRN）或富Si氧氮化物（SRON）的交替或非周期分布的薄层的多层的SOI衬底上形成芯结构。多层掺杂有稀土材料，以将波导结构的发射范围扩展到近红外区域。低折射率包层包括用作电极的导电氧化物。

4. 发明申请

US20090093074A1 Light Emission From Silicon-Based Nanocrystals By Sequential Thermal Annealing Approaches 审中-公开
标题翻译：通过顺序热退火方法从硅基纳米晶体的光发射
公开(公告)号：US20090093074A1
公开(公告)日：2009-04-09
申请号：US12137224
申请日：2008-06-11
申请人： Jae Hyung Yi , Luca Dal Negro , Lionel C. Kimerling
发明人： Jae Hyung Yi , Luca Dal Negro , Lionel C. Kimerling
IPC分类号： H01L21/28
CPC分类号： H05B33/10 , B82Y30/00 , H01L31/1804 , Y02E10/547 , Y02P70/521
摘要： A method for enhancing photoluminescence includes providing a film disposed over a substrate, the film including at least one of a semiconductor and a dielectric material. Light emission may be activated by thermal annealing post growth treatments when thin film layers of SiO2 and SiNx or Si-rich oxide are used. A first annealing step is performed at a first temperature in a processing chamber or annealing furnace; and, thereafter, a second annealing step is performed at a second temperature in the processing chamber or annealing furnace. The second temperature is greater than the first temperature, and the photoluminescence of the film after the second annealing step is greater than the photoluminescence of the film without the first annealing step.
摘要翻译：一种用于增强光致发光的方法包括提供设置在衬底上的膜，所述膜包括半导体和电介质材料中的至少一种。当使用SiO 2和SiN x或富Si氧化物的薄膜层时，可以通过生长后处理热退火来激发发光。在处理室或退火炉中的第一温度下进行第一退火步骤; 之后，在处理室或退火炉中，在第二温度下进行第二退火工序。第二温度大于第一温度，第二退火步骤后的膜的光致发光比没有第一退火步骤的膜的光致发光大。

5. 发明申请

US20130330710A1 SILK BASED BIOPHOTONIC SENSORS 审中-公开
标题翻译：基于SILK的生物传感器
公开(公告)号：US20130330710A1
公开(公告)日：2013-12-12
申请号：US13813288
申请日：2011-07-30
申请人： Fiorenzo Omenetto , David Kaplan , Jason Amsden , Luca Dal Negro
发明人： Fiorenzo Omenetto , David Kaplan , Jason Amsden , Luca Dal Negro
IPC分类号： G01N21/25
CPC分类号： G01N21/25 , B82Y30/00 , G01N21/4788 , G01N33/54373
摘要： The present disclosure relates to biophotonic sensors. An example of a biophotonic sensor may be an apparatus for analyzing a sample. The apparatus may include a substrate, aperiodic nanostructured protrusions disposed on the substrate, and a silk material deposited between the protrusions.
摘要翻译：本发明涉及生物光子传感器。生物光子传感器的实例可以是用于分析样品的装置。该装置可以包括衬底，设置在衬底上的非周期纳米结构化突起和沉积在突起之间的丝材料。

6. 发明申请

US20090195879A1 DETERMINISTIC APERIODIC PATTERNED DIELECTRIC AND PLASMONIC MATERIALS FOR LOCALIZED ELECTROMAGNETIC FIELD ENHANCEMENT 有权
标题翻译：用于局部电磁场增强的确定性APERIODIC PATTERNED介电和等离子体材料
公开(公告)号：US20090195879A1
公开(公告)日：2009-08-06
申请号：US12423508
申请日：2009-04-14
申请人： Luca Dal Negro , Ashwin Gopinath , Ning-Ning Feng , Mark Luitzen Brongersma
发明人： Luca Dal Negro , Ashwin Gopinath , Ning-Ning Feng , Mark Luitzen Brongersma
IPC分类号： G02B1/10
CPC分类号： G02B5/008 , B82Y20/00 , G01N21/658 , G02B6/1225
摘要： A method is shown for the extension in higher spatial dimensions of deterministic, aperiodic structures which exhibit strong aperiodic effects and have overall compatibility with the planar technology of integrated optical circuits. Disclosed devices are operative in response to incident electromagnetic energy to create a distribution of electromagnetic energy having localized electromagnetic field enhancement, wherein the device includes a dielectric or plasmonic material having a region of interaction with the incident electromagnetic energy. The region of interaction has a deterministic, aperiodic patterning with an array of individual patterning elements of distinct refractive indices such that a variation of refractive index of the device occurs over distances comparable with a wavelength of the incident electromagnetic energy, the array being a multi-dimensional extension of a corresponding one-dimensional sequence such that a spectral response of the array is a multi-dimensional equivalent of a spectral response of the one-dimensional sequence. Specific examples employing so-called Rudin-Shapiro, Thue-Morse and Fibonacci sequences are shown.
摘要翻译：显示了一种在具有强非周期效应的确定性，非周期性结构的较高空间维度中延伸的方法，并且与集成光电路的平面技术具有整体兼容性。公开的装置响应于入射的电磁能而起作用以产生具有局部电磁场增强的电磁能的分布，其中该装置包括具有与入射的电磁能相互作用的区域的电介质或等离子体元素材料。相互作用区域具有确定性的非周期性图案化，其具有不同折射率的单个图案化元件的阵列，使得器件的折射率变化发生在与入射电磁能量的波长相当的距离上，相应的一维序列的三维扩展，使得阵列的光谱响应是一维序列的光谱响应的多维等价物。显示了使用所谓的Rudin-Shapiro，Thue-Morse和斐波那契序列的具体实例。

7. 发明授权

US07407896B2 CMOS-compatible light emitting aperiodic photonic structures 有权
标题翻译： CMOS兼容光发射非周期光子结构
公开(公告)号：US07407896B2
公开(公告)日：2008-08-05
申请号：US11113624
申请日：2005-04-25
申请人： Luca Dal Negro , Jae Hyung Yi , Jurgen Michel , Yasha Yi , Victor T. Nguyen , Lionel C. Kimerling
发明人： Luca Dal Negro , Jae Hyung Yi , Jurgen Michel , Yasha Yi , Victor T. Nguyen , Lionel C. Kimerling
IPC分类号： H01L21/31 , H01L21/469
CPC分类号： H01S3/0627 , B82Y10/00 , B82Y20/00 , G02B6/1225 , H01L21/3144 , H01L33/46 , H01S3/0604 , H01S3/0632 , H01S3/0637 , H01S3/083 , H01S3/0933 , H01S3/0941 , H01S3/16 , H01S3/1603 , H01S3/1628 , H01S3/169 , H01S5/105 , H01S5/183
摘要： A fabrication method and materials produce high quality aperiodic photonic structures. Light emission can be activated by thermal annealing post growth treatments when thin film layers of SiO2 and SiNx or Si-rich oxide are used. From these aperiodic structures, that can be obtained in different vertical and planar device geometries, the presence of aperiodic order in a photonic device provides strong group velocity reduction (slow photons), enhanced light-matter interaction, light emission enhancement, gain enhancement, and/or nonlinear optical properties enhancement.
摘要翻译：制造方法和材料产生高质量的非周期光子结构。当使用SiO 2和SiN x 3或富Si氧化物的薄膜层时，可以通过生长后处理进行热退火来激发发光。从这些非周期结构可以在不同的垂直和平面器件几何形状中获得，光子器件中非周期性顺序的存在提供了强的组速度降低（慢光子），增强的光物质相互作用，光发射增强，增益增强和 /或非线性光学性能增强。

8. 发明授权

US09013689B2 Engineered SERS substrates employing nanoparticle cluster arrays with multiscale signal enhancement 有权
标题翻译：采用具有多尺度信号增强的纳米颗粒簇阵列的工程SERS衬底
公开(公告)号：US09013689B2
公开(公告)日：2015-04-21
申请号：US13142939
申请日：2010-01-11
申请人： Bjoern Markus Reinhard , Luca Dal Negro
发明人： Bjoern Markus Reinhard , Luca Dal Negro
IPC分类号： G01J3/44 , G01N21/65 , B82Y30/00
CPC分类号： G02B5/008 , B82Y30/00 , C03C17/40 , C03C2217/255 , C03C2217/425 , G01N21/01 , G01N21/658 , G01N2201/02 , Y10T428/12104 , Y10T428/24909
摘要： Defined nanoparticle cluster arrays (NCAs) with total lateral dimensions of up to 25.4 μm by 25.4 μm have been fabricated on top of a 10 nm thin gold film using template guided self-assembly. This approach provides precise control of the structural parameters in the arrays allowing a systematic variation of the average number of nanoparticles in the clusters (n) and the edge to edge separation (Λ) between 1
摘要翻译：使用模板引导自组装，在10nm薄金膜的顶部上制造了总侧向尺寸高达25.4μm×25.4μm的定义的纳米颗粒簇阵列（NCAs）。该方法提供对阵列中的结构参数的精确控制，允许在1

9. 发明申请

US20120121820A1 FABRICATION OF SILK FIBROIN PHOTONIC STRUCTURES BY NANOCONTACT IMPRINTING 有权
标题翻译：通过纳米压印制造丝光纤光电结构
公开(公告)号：US20120121820A1
公开(公告)日：2012-05-17
申请号：US12741066
申请日：2008-11-05
申请人： David Kaplan , Fiorenzo Omenetto , Brian Lawrence , Mark Cronin-Golomb , Irene Georgakoudi , Luca Dal Negro
发明人： David Kaplan , Fiorenzo Omenetto , Brian Lawrence , Mark Cronin-Golomb , Irene Georgakoudi , Luca Dal Negro
IPC分类号： C08J7/18 , B29C59/16
CPC分类号： G03F7/0002 , B29D11/00 , B29D11/00346 , B82Y10/00 , B82Y20/00 , B82Y40/00 , C07K14/435 , G02B6/1225
摘要： A method of manufacturing a nanopatterned biophotonic structure includes forming a customized nanopattern mask on a substrate using E-beam lithography, providing a biopolymer matrix solution, depositing the biopolymer matrix solution on the substrate, and drying the biopolymer matrix solution to form a solidified biopolymer film. A surface of the film is formed with the nanopattern mask, or a nanopattern is machined directly on a surface of the film using E-beam lithograpy such that the biopolymer film exhibits a spectral signature corresponding to the E-beam lithograpy nanopattern. The resulting bio-compatible nanopatterned biophotonic structures may be made from silk, may be biodegradable, and may be bio-sensing devices. The biophotonic structures may employ nanopatterned masks based on non-periodic photonic lattices, and the biophotonic structures may be designed with specific spectral signatures for use in probing biological substances, including displaying optical activity in the form of opalescence.
摘要翻译：制造纳米图案生物光子结构的方法包括使用电子束光刻在基底上形成定制的纳米图案掩模，提供生物聚合物基质溶液，将生物聚合物基质溶液沉积在基材上，以及干燥生物聚合物基质溶液以形成固化的生物聚合物膜。用纳米图案掩模形成膜的表面，或者使用电子束光刻直接在膜的表面上加工纳米图案，使得生物聚合物膜显示对应于电子束光刻纳米图案的光谱特征。所得的生物相容纳米图案的生物光子结构可以由丝制成，可以是可生物降解的，并且可以是生物感测装置。生物光子结构可以使用基于非周期性光子晶格的纳米图案掩模，并且生物光子结构可以被设计成用于探测生物物质的特定光谱特征，包括以乳光的形式显示光学活性。

10. 发明申请

US20080139004A1 Light emission from silicon-based nanocrystals by sequential thermal annealing approaches 审中-公开
标题翻译：通过连续热退火方法从硅基纳米晶体发射光
公开(公告)号：US20080139004A1
公开(公告)日：2008-06-12
申请号：US11637405
申请日：2006-12-12
申请人： Jae Hyung Yi , Luca Dal Negro , Lionel C. Kimerling
发明人： Jae Hyung Yi , Luca Dal Negro , Lionel C. Kimerling
IPC分类号： H01L21/64
CPC分类号： H05B33/10
摘要： A method for enhancing photoluminescence includes providing a film disposed over a substrate, the film including at least one of a semiconductor and a dielectric material. A first annealing step is performed at a first temperature in a processing chamber or annealing furnace; and, thereafter, a second annealing step is performed at a second temperature in the processing chamber or annealing furnace. The second temperature is greater than the first temperature, and the photoluminescence of the film after the second annealing step is greater than the photoluminescence of the film without the first annealing step.
摘要翻译：一种用于增强光致发光的方法包括提供设置在衬底上的膜，所述膜包括半导体和电介质材料中的至少一种。在处理室或退火炉中的第一温度下进行第一退火步骤; 之后，在处理室或退火炉中，在第二温度下进行第二退火工序。第二温度大于第一温度，第二退火步骤后的膜的光致发光比没有第一退火步骤的膜的光致发光大。

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