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1. 发明授权

US07049033B2 EUV lithography reticles fabricated without the use of a patterned absorber 有权
标题翻译：在不使用图案化吸收体的情况下制造EUV光刻掩模版
公开(公告)号：US07049033B2
公开(公告)日：2006-05-23
申请号：US10631359
申请日：2003-07-31
申请人： Daniel G. Stearns , Donald W. Sweeney , Paul B. Mirkarimi
发明人： Daniel G. Stearns , Donald W. Sweeney , Paul B. Mirkarimi
IPC分类号： G03F9/00 , A61N5/00 , G03B27/00
CPC分类号： G03F1/34 , B82Y10/00 , B82Y40/00 , G03F1/24
摘要： Absorber material used in conventional EUVL reticles is eliminated by introducing a direct modulation in the complex-valued reflectance of the multilayer. A spatially localized energy source such as a focused electron or ion beam directly writes a reticle pattern onto the reflective multilayer coating. Interdiffusion is activated within the film by an energy source that causes the multilayer period to contract in the exposed regions. The contraction is accurately determined by the energy dose. A controllable variation in the phase and amplitude of the reflected field in the reticle plane is produced by the spatial modulation of the multilayer period. This method for patterning an EUVL reticle has the advantages (1) avoiding the process steps associated with depositing and patterning an absorber layer and (2) providing control of the phase and amplitude of the reflected field with high spatial resolution.
摘要翻译：通过在多层复数值的反射率中引入直接调制来消除用于常规EUVL标线的吸收材料。诸如聚焦电子或离子束的空间局部化能源直接将掩模版图案写到反射多层涂层上。相互扩散在膜内被能量源激活，导致多层周期在暴露区域中收缩。收缩准确地由能量剂量确定。通过多层周期的空间调制产生光罩平面中反射场的相位和幅度的可控变化。用于图案化EUVL掩模版的方法具有以下优点：（1）避免与沉积和图案化吸收层相关的工艺步骤，以及（2）以高空间分辨率提供对反射场的相位和幅度的控制。

2. 发明授权

US06635391B2 Method for fabricating reticles for EUV lithography without the use of a patterned absorber 有权
公开(公告)号：US06635391B2
公开(公告)日：2003-10-21
申请号：US09752887
申请日：2000-12-28
申请人： Daniel G. Stearns , Donald W. Sweeney , Paul B. Mirkarimi
发明人： Daniel G. Stearns , Donald W. Sweeney , Paul B. Mirkarimi
IPC分类号： G03F900
CPC分类号： G03F1/34 , B82Y10/00 , B82Y40/00 , G03F1/24
摘要： Absorber material used in conventional EUVL reticles is eliminated by introducing a direct modulation in the complex-valued reflectance of the multilayer. A spatially localized energy source such as a focused electron or ion beam directly writes a reticle pattern onto the reflective multilayer coating. Interdiffusion is activated within the film by an energy source that causes the multilayer period to contract in the exposed regions. The contraction is accurately determined by the energy dose. A controllable variation in the phase and amplitude of the reflected field in the reticle plane is produced by the spatial modulation of the multilayer period. This method for patterning an EUVL reticle has the advantages of (1) avoiding the process steps associated with depositing and patterning an absorber layer and (2) providing control of the phase and amplitude of the reflected field with high spatial resolution.

3. 发明授权

US07022435B2 Method for the manufacture of phase shifting masks for EUV lithography 有权
标题翻译：用于制造用于EUV光刻的相移掩模的方法
公开(公告)号：US07022435B2
公开(公告)日：2006-04-04
申请号：US10256454
申请日：2002-09-27
申请人： Daniel G. Stearns , Donald W. Sweeney , Paul B. Mirkarimi , Anton Barty
发明人： Daniel G. Stearns , Donald W. Sweeney , Paul B. Mirkarimi , Anton Barty
IPC分类号： G01F9/00
CPC分类号： G03F7/70283 , B82Y10/00 , B82Y40/00 , G03F1/24 , G03F1/30
摘要： A method for fabricating an EUV phase shift mask is provided that includes a substrate upon which is deposited a thin film multilayer coating that has a complex-valued reflectance. An absorber layer or a buffer layer is attached onto the thin film multilayer, and the thickness of the thin film multilayer coating is altered to introduce a direct modulation in the complex-valued reflectance to produce phase shifting features.
摘要翻译：提供了一种制造EUV相移掩模的方法，其包括在其上沉积具有复值反射率的薄膜多层涂层的基底。将吸收层或缓冲层附着到薄膜多层上，改变薄膜多层涂层的厚度，以便在复值反射率中引入直接调制以产生相移特征。

4. 发明授权

US06967168B2 Method to repair localized amplitude defects in a EUV lithography mask blank 有权
标题翻译：在EUV光刻掩模板中修复局部幅度缺陷的方法
公开(公告)号：US06967168B2
公开(公告)日：2005-11-22
申请号：US09896722
申请日：2001-06-29
申请人： Daniel G. Stearns , Donald W. Sweeney , Paul B. Mirkarimi , Henry N. Chapman
发明人： Daniel G. Stearns , Donald W. Sweeney , Paul B. Mirkarimi , Henry N. Chapman
IPC分类号： G21K1/06 , G01Q60/00 , G02B5/08 , G02B5/28 , G03F1/24 , G03F1/74 , H01L21/027 , H01L21/20
CPC分类号： G03F1/24 , B82Y10/00 , B82Y40/00 , G02B5/0891 , G02B5/285 , G03F1/74
摘要： A method and apparatus are provided for the repair of an amplitude defect in a multilayer coating. A significant number of layers underneath the amplitude defect are undamaged. The repair technique restores the local reflectivity of the coating by physically removing the defect and leaving a wide, shallow crater that exposes the underlying intact layers. The particle, pit or scratch is first removed the remaining damaged region is etched away without disturbing the intact underlying layers.
摘要翻译：提供了一种用于修复多层涂层中的振幅缺陷的方法和装置。振幅缺陷下方的相当数量的层没有损坏。修复技术通过物理去除缺陷并留下暴露下面完整层的宽而浅的凹坑来恢复涂层的局部反射率。首先去除颗粒，凹坑或划痕，剩余的损伤区域被蚀刻掉，而不会干扰完整的下层。

5. 发明授权

US06821682B1 Repair of localized defects in multilayer-coated reticle blanks for extreme ultraviolet lithography 有权
标题翻译：修复用于极紫外光刻的多层涂层掩模版坯料中的局部缺陷
公开(公告)号：US06821682B1
公开(公告)日：2004-11-23
申请号：US09669390
申请日：2000-09-26
申请人： Daniel G. Stearns , Donald W. Sweeney , Paul B. Mirkarimi
发明人： Daniel G. Stearns , Donald W. Sweeney , Paul B. Mirkarimi
IPC分类号： G03F900
CPC分类号： G02B5/285 , B82Y10/00 , B82Y40/00 , G02B5/0891 , G02B27/32 , G03F1/24 , G03F1/72 , G21K1/062 , G21K2201/067
摘要： A method is provided for repairing defects in a multilayer coating layered onto a reticle blank used in an extreme ultraviolet lithography (EUVL) system. Using high lateral spatial resolution, energy is deposited in the multilayer coating in the vicinity of the defect. This can be accomplished using a focused electron beam, focused ion beam or a focused electromagnetic radiation. The absorbed energy will cause a structural modification of the film, producing a localized change in the film thickness. The change in film thickness can be controlled with sub-nanometer accuracy by adjusting the energy dose. The lateral spatial resolution of the thickness modification is controlled by the localization of the energy deposition. The film thickness is adjusted locally to correct the perturbation of the reflected field. For example, when the structural modification is a localized film contraction, the repair of a defect consists of flattening a mound or spreading out the sides of a depression.
摘要翻译：提供了一种用于修复分层到用于极紫外光刻（EUVL）系统的掩模版坯料上的多层涂层中的缺陷的方法。使用高横向空间分辨率，能量沉积在缺陷附近的多层涂层中。这可以使用聚焦电子束，聚焦离子束或聚焦电磁辐射来实现。吸收的能量将导致膜的结构改性，产生膜厚度的局部变化。通过调节能量剂量可以以亚纳米精度控制膜厚的变化。厚度变化的横向空间分辨率由能量沉积的定位来控制。局部调整膜厚以校正反射场的扰动。例如，当结构改性是局部薄膜收缩时，缺陷的修复包括使平坦化的墩或扩展凹陷的侧面。

6. 发明授权

US4516743A Scanning beam beamrider missile guidance system 失效
标题翻译：扫射梁光束导弹引导系统
公开(公告)号：US4516743A
公开(公告)日：1985-05-14
申请号：US486127
申请日：1983-04-18
申请人： Donald W. Sweeney , Neal C. Gallagher , Charles R. Christensen
发明人： Donald W. Sweeney , Neal C. Gallagher , Charles R. Christensen
IPC分类号： F41G7/26
CPC分类号： F41G7/26
摘要： A beamrider guidance system for missiles wherein a laser beam is given two circular motions around the boresight axis to produce amplitude and phase modulation on the signal received at the missile. The information on distance from boresight is contained in the amplitude modulation and the angular information is contained as phase modulation. A laser optical system with a spinning holographic element provides one of the circular motions for the beam. The other circular motion is provided by a low frequency, circular scanning mirror.
摘要翻译：用于导弹的光束引导系统，其中激光束被给予围绕视轴的两个圆周运动，以对在导弹上接收的信号产生振幅和相位调制。与视轴距离的信息包含在幅度调制中，并且角度信息被包含为相位调制。具有旋转全息元件的激光光学系统为光束提供圆形运动之一。另一个圆周运动由低频圆形扫描镜提供。

7. 发明授权

US4949389A Optical ranked-order filtering using threshold decomposition 失效
标题翻译：使用阈值分解进行光学排序顺序滤波
公开(公告)号：US4949389A
公开(公告)日：1990-08-14
申请号：US106295
申请日：1987-10-09
申请人： Jan P. Allebach , Ellen Ochoa , Donald W. Sweeney
发明人： Jan P. Allebach , Ellen Ochoa , Donald W. Sweeney
IPC分类号： G06E3/00 , G06K9/58
CPC分类号： G06E3/00 , G06K9/58 , G03H1/0808 , G03H1/0841 , G03H2001/0066
摘要： A hybrid optical/electronic system performs median filtering and related ranked-order operations using threshold decomposition to encode the image. Threshold decomposition transforms the nonlinear neighborhood ranking operation into a linear space-invariant filtering step followed by a point-to-point threshold comparison step. Spatial multiplexing allows parallel processing of all the threshold components as well as recombination by a second linear, space-invariant filtering step. An incoherent optical correlation system performs the linear filtering, using a magneto-optic spatial light modulator as the input device and a computer-generated hologram in the filter plane. Thresholding is done electronically. By adjusting the value of the threshold, the same architecture is used to perform median, minimum, and maximum filtering of images. A totally optical system is also disclosed.
摘要翻译：混合光学/电子系统使用阈值分解来执行中值滤波和相关的排序次序操作以对图像进行编码。阈值分解将非线性邻域排序操作转换为线性空间不变滤波步骤，接着是点对点阈值比较步骤。空间复用允许所有阈值分量的并行处理以及通过第二线性，空间不变滤波步骤的复合。非相干光学相关系统使用磁光空间光调制器作为输入设备和在滤波器平面中的计算机生成的全息图进行线性滤波。阈值是以电子方式完成的。通过调整阈值的值，使用相同的架构来执行图像的中值，最小和最大滤波。还公开了一种全光学系统。

8. 发明授权

US5986795A Deformable mirror for short wavelength applications 失效
标题翻译：适用于短波长应用的变形镜
公开(公告)号：US5986795A
公开(公告)日：1999-11-16
申请号：US98024
申请日：1998-06-15
申请人： Henry N. Chapman , Donald W. Sweeney
发明人： Henry N. Chapman , Donald W. Sweeney
IPC分类号： G02B26/06 , G03F7/20 , G02B26/08
CPC分类号： G03F7/70233 , G02B26/06 , G03F7/70266
摘要： A deformable mirror compatible with short wavelength (extreme ultraviolet) radiation that can be precisely controlled to nanometer and subnanometer accuracy is described. Actuators are coupled between a reaction plate and a face plate which has a reflective coating. A control system adjusts the voltage supplied to the actuators; by coordinating the voltages supplied to the actuators, the reflective surface of the mirror can be deformed to correct for dimensional errors in the mirror or to produce a desired contour.
摘要翻译：描述了可以精确控制到纳米和亚纳米计精度的短波长（极紫外）辐射兼容的可变形反射镜。致动器耦合在具有反射涂层的反应板和面板之间。控制系统调节供应给致动器的电压; 通过协调提供给致动器的电压，反射镜的反射表面可以变形以校正反射镜中的尺寸误差或产生期望的轮廓。

9. 发明授权

US06235434B1 Method for mask repair using defect compensation 有权
标题翻译：使用缺陷补偿进行面膜修复的方法
公开(公告)号：US06235434B1
公开(公告)日：2001-05-22
申请号：US09208622
申请日：1998-12-08
申请人： Donald W. Sweeney , Avijit K. Ray-Chaudhuri
发明人： Donald W. Sweeney , Avijit K. Ray-Chaudhuri
IPC分类号： G03F900
CPC分类号： G03F1/24 , B82Y10/00 , B82Y40/00 , G03F1/72
摘要： A method for repair of amplitude and/or phase defects in lithographic masks. The method involves modifying or altering a portion of the absorber pattern on the surface of the mask blank proximate to the mask defect to compensate for the local disturbance (amplitude or phase) of the optical field due to the defect.
摘要翻译：一种用于修复光刻掩模中的幅度和/或相位缺陷的方法。该方法包括修改或改变掩模板的靠近掩模缺陷的表面上的吸收体图案的一部分，以补偿由于缺陷导致的光场的局部干扰（振幅或相位）。

10. 发明授权

US06210865B1 Extreme-UV lithography condenser 有权
标题翻译：极紫外光刻冷凝器
公开(公告)号：US06210865B1
公开(公告)日：2001-04-03
申请号：US09249738
申请日：1999-02-11
申请人： William C. Sweatt , Donald W. Sweeney , David Shafer , James McGuire
发明人： William C. Sweatt , Donald W. Sweeney , David Shafer , James McGuire
IPC分类号： G03C500
CPC分类号： G03F7/70066 , G03F7/70158 , G03F7/702 , G21K1/06 , Y10S430/167
摘要： Condenser system for use with a ringfield camera in projection lithography where the condenser includes a series of segments of a parent aspheric mirror having one foci at a quasi-point source of radiation and the other foci at the radius of a ringfield have all but one or all of their beams translated and rotated by sets of mirrors such that all of the beams pass through the real entrance pupil of a ringfield camera about one of the beams and fall onto the ringfield radius as a coincident image as an arc of the ringfield. The condenser has a set of correcting mirrors with one of the correcting mirrors of each set, or a mirror that is common to said sets of mirrors, from which the radiation emanates, is a concave mirror that is positioned to shape a beam segment having a chord angle of about 25 to 85 degrees into a second beam segment having a chord angle of about 0 to 60 degrees.
摘要翻译：用于投影光刻中的环形相机的冷凝器系统，其中电容器包括具有在准点辐射源处的一个焦点的父非球面反射镜的一系列段，并且在环形场的半径处具有另一个焦点，除了一个或它们的所有光束通过一组镜子平移和旋转，使得所有的光束通过围绕其中一个光束的环形相机的真实入射光瞳，并且作为环形圆弧的重合图像落入环形半径。冷凝器具有一组校正镜，每组具有校准镜之一，或者是所述反射镜组共同的反射镜，辐射从该反射镜发射出来，该凹面镜定位成使具有具有大约25至85度的弦角到具有约0至60度的弦角的第二光束段中。

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