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    • 1. 发明申请
    • INTEGRATED MICROTOMOGRAPHY AND OPTICAL IMAGING SYSTEMS
    • 综合微电影和光学成像系统
    • US20120321033A1
    • 2012-12-20
    • US13164640
    • 2011-06-20
    • Daniel G. STEARNSDavid G. NILSONBradley W. RICE
    • Daniel G. STEARNSDavid G. NILSONBradley W. RICE
    • G01N23/083
    • A61B6/4417A61B5/0035A61B5/0073A61B6/032A61B6/035A61B6/0457A61B6/4405A61B6/508A61B6/5247A61B2503/40G01N21/763G01N23/046G01N2223/419
    • An integrated microtomography and optical imaging system includes a rotating table that supports an imaging object, an optical stage, and separate optical and microtomography imaging systems. The table rotates the imaging object about a vertical axis running therethrough to a plurality of different rotational positions during a combined microtomography and optical imaging process. The optical stage can be a trans-illumination, epi-illumination or bioluminescent stage. The optical imaging system includes a camera positioned vertically above the imaging object. The microtomography system includes an x-ray source positioned horizontally with respect to the imaging object. Optical and x-ray images are both obtained while the imaging object remains in place on the rotating table. The stage and table are included within an imaging chamber, and all components are included within a portable cabinet. Multiple imaging objects can be imaged simultaneously, and side mirrors can provide side views of the object to the overhead camera.
    • 集成的微影像学和光学成像系统包括支持成像对象的旋转台,光学平台以及单独的光学和微影像成像系统。 在组合的微影像学和光学成像过程期间,桌子将成像对象围绕其穿过的垂直轴旋转到多个不同的旋转位置。 光学舞台可以是反照,外照明或生物发光阶段。 光学成像系统包括垂直地位于成像对象上方的照相机。 微图像系统包括相对于成像对象水平定位的x射线源。 当成像对象保持在旋转台上的适当位置时,都获得光学和X射线图像。 舞台和桌子包括在成像室内,所有组件都包含在便携式机柜中。 可以同时对多个成像对象进行成像,并且侧视镜可以向顶置摄像机提供对象的侧视图。
    • 5. 发明授权
    • Method and apparatus for determining target depth, brightness and size within a body region
    • 用于确定身体区域内的目标深度,亮度和尺寸的方法和装置
    • US08180435B2
    • 2012-05-15
    • US12823019
    • 2010-06-24
    • Bradley W. RiceDaniel G. StearnsTamara L. Troy
    • Bradley W. RiceDaniel G. StearnsTamara L. Troy
    • A61B6/00
    • G01N21/6456G01N21/4795G01N21/6428
    • A method of investigating the location and size of a light-emitting source in a subject is disclosed. In practicing the method, one first obtains a light intensity profile by measuring, from a first perspective with a photodetector device, photons which (i) originate from the light-emitting source, (ii) travel through turbid biological tissue of the subject, and (iii) are emitted from a first surface region of interest of the subject. The light-intensity profile is matched against with a parameter-based biophotonic function, to estimate function parameters such as depth and size. The parameters so determined are refined using data other than the first measured light intensity profile, to obtain an approximate depth and size of the source in the subject. Also disclosed is an apparatus for carrying out the method.
    • 公开了一种调查受试者中发光源的位置和尺寸的方法。 在实施该方法时,首先通过用光电检测器件从第一个角度测量光源(i)来源于发光源,(ii)穿过受试者的混浊生物组织,以及 (iii)从对象的感兴趣的第一表面区域发射。 光强度曲线与基于参数的生物光子函数匹配,以估计诸如深度和大小的函数参数。 使用除第一测量光强度分布之外的数据来精确地确定如此确定的参数,以获得对象中源的近似深度和大小。 还公开了一种用于执行该方法的装置。
    • 6. 发明申请
    • METHOD AND APPARATUS FOR DETERMINING TARGET DEPTH, BRIGHTNESS AND SIZE WITHIN A BODY REGION
    • 用于确定目标区域的目标深度,亮度和大小的方法和装置
    • US20100262019A1
    • 2010-10-14
    • US12823019
    • 2010-06-24
    • Bradley W. RiceDaniel G. StearnsTamara L. Troy
    • Bradley W. RiceDaniel G. StearnsTamara L. Troy
    • A61B6/00
    • G01N21/6456G01N21/4795G01N21/6428
    • A method of investigating the location and size of a light-emitting source in a subject is disclosed. In practicing the method, one first obtains a light intensity profile by measuring, from a first perspective with a photodetector device, photons which (i) originate from the light-emitting source, (ii) travel through turbid biological tissue of the subject, and (iii) are emitted from a first surface region of interest of the subject. The light-intensity profile is matched against with a parameter-based biophotonic function, to estimate function parameters such as depth and size. The parameters so determined are refined using data other than the first measured light intensity profile, to obtain an approximate depth and size of the source in the subject. Also disclosed is an apparatus for carrying out the method.
    • 公开了一种调查受试者中发光源的位置和尺寸的方法。 在实施该方法时,首先通过用光电检测器件从第一个角度测量光源(i)来源于发光源,(ii)穿过受试者的混浊生物组织,以及 (iii)从对象的感兴趣的第一表面区域发射。 光强度曲线与基于参数的生物光子函数匹配,以估计诸如深度和大小的函数参数。 使用除第一测量光强度分布之外的数据来精确地确定如此确定的参数,以获得对象中源的近似深度和大小。 还公开了一种用于执行该方法的装置。
    • 9. 发明授权
    • Compensation of flare-induced CD changes EUVL
    • 火炬引起的CD变化的补偿EUVL
    • US06815129B1
    • 2004-11-09
    • US09669958
    • 2000-09-26
    • John E. BjorkholmDaniel G. StearnsEric M. GulliksonDaniel A. TichenorScott D. Hector
    • John E. BjorkholmDaniel G. StearnsEric M. GulliksonDaniel A. TichenorScott D. Hector
    • G03F900
    • G03F7/705G03F7/70433G03F7/70941
    • A method for compensating for flare-induced critical dimensions (CD) changes in photolithography. Changes in the flare level results in undesirable CD changes. The method when used in extreme ultraviolet (EUV) lithography essentially eliminates the unwanted CD changes. The method is based on the recognition that the intrinsic level of flare for an EUV camera (the flare level for an isolated sub-resolution opaque dot in a bright field mask) is essentially constant over the image field. The method involves calculating the flare and its variation over the area of a patterned mask that will be imaged and then using mask biasing to largely eliminate the CD variations that the flare and its variations would otherwise cause. This method would be difficult to apply to optical or DUV lithography since the intrinsic flare for those lithographies is not constant over the image field.
    • 用于补偿光刻中闪耀引起的临界尺寸(CD)变化的方法。 闪光水平的变化导致不良CD变化。 当用于极紫外(EUV)光刻技术时,该方法基本上消除了不必要的CD变化。 该方法基于这样的认识:对于EUV摄像机(对于明场掩模中的隔离的子分辨率不透明点的闪光级别)的本征水平在图像场上基本上是恒定的。 该方法包括计算闪耀及其在将被成像的图案化掩模的面积上的变化,然后使用掩模偏置来大大消除闪光及其变化否则将导致的CD变化。 这种方法将难以应用于光学或DUV光刻,因为用于这些平版印刷的本征闪光在图像场上不是恒定的。