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1. 发明申请

US20040105936A1 Substrate processing method, substrate processing apparatus and substrate processing system 失效
标题翻译：基板加工方法，基板处理装置和基板处理系统
公开(公告)号：US20040105936A1
公开(公告)日：2004-06-03
申请号：US10700020
申请日：2003-11-03
申请人： Dainippon Screen Mfg. Co. Ltd.
发明人： Yusuke Muraoka , Kimitsugu Saito , Tomomi Iwata , Eiji Fukatsu , Ikuo Mizobata , Hiroyuki Ueno , Yasuo Okuyama , Takashi Gama , Yoshihiko Sakashita , Katsumi Watanabe , Jun Munemasa , Hisanori Oshiba , Shogo Sarumaru
IPC分类号： B05D003/02 , A23G003/20
CPC分类号： H01L21/67051 , G11B7/261 , G11B7/265 , H01L21/67028 , Y10S134/902
摘要： After subjected to a developing process, a rinsing process and a replacing process in this order in a developing unit 10A, 10B, a substrate W wet with an anti-drying solution is wet-transported to a supercritical drying unit 20 by a primary transport robot 30. The supercritical drying unit 20 performs a high-pressure drying process (supercritical drying process) in a dedicated manner. Accordingly, by virtue of the presence of the anti-drying solution, the substrate W is effectively prevented from becoming air-dry during the transportation of the substrate W.
摘要翻译：在显影单元10A，10B中，依次进行显影处理，漂洗处理和替换处理后，用防干燥溶液湿润的基板W通过主输送机器人被湿式输送到超临界干燥单元20 超临界干燥装置20以专用的方式进行高压干燥处理（超临界干燥处理）。因此，通过存在防干燥溶液，能够有效地防止基板W在基板W的输送过程中变得风干。

2. 发明申请

US20030177659A1 High-pressure drying apparatus, high-pressure drying method and substrate processing apparatus 失效
标题翻译：高压干燥装置，高压干燥方法和基板处理装置
公开(公告)号：US20030177659A1
公开(公告)日：2003-09-25
申请号：US10382616
申请日：2003-03-04
申请人： Dainippon Screen Mfg. Co., Ltd.
发明人： Kimitsugu Saito , Yusuke Muraoka , Ryuji Kitakado , Takashi Miyake , Tomomi Iwata , Ikuo Mizobata
IPC分类号： F26B003/00
CPC分类号： H01L21/67034 , Y10S134/902
摘要： Liquid for prevention of substrate drying is supplied into a processing chamber so that a pool of the liquid is created as an anti-drying atmosphere in advance inside a processing chamber, and substrates, as they are dipped in the pool, are kept on stand-by in a substrate board. In this manner, air drying of the substrates which are kept on stand-by is prevented. When the number of the substrates in the substrate board reaches a certain number, the anti-drying atmosphere is removed from the processing chamber, which is followed by introduction of an SCF into the processing chamber and supercritical drying (high pressure drying) of all of the plurality of substrates inside the processing chamber, namely, batch supercritical drying.
摘要翻译：将用于防止基材干燥的液体供应到处理室中，使得在处理室内预先产生作为防干燥气氛的液体池，并且当浸入池中时，将基板保持在待机状态，通过在衬底板中。以这种方式，防止了保持待机的基板的空气干燥。当基板中的基板数量达到一定数量时，从处理室中除去防干燥气氛，然后将SCF引入处理室，并将超临界干燥（高压干燥）全部处理室内的多个基板，即分批超临界干燥。

3. 发明申请

US20040123484A1 High pressure processing method and apparatus 失效
标题翻译：高压加工方法及装置
公开(公告)号：US20040123484A1
公开(公告)日：2004-07-01
申请号：US10688889
申请日：2003-10-21
申请人： KABUSHIKI KAISHA KOBE SEIKO SHO , DAINIPPON SCREEN MFG. CO., LTD.
发明人： Tetsuya Yoshikawa , Yoichi Inoue , Katsumi Watanabe , Kaoru Masuda , Katsuyuki Iijima , Tomomi Iwata , Yusuke Muraoka , Kimitsugu Saito , Ikuo Mizobata
IPC分类号： C25F001/00
CPC分类号： H01L21/67017 , B08B7/0021
摘要： Disclosed is a high pressure processing method for subjecting a processing object to a high pressure processing using a high pressure fluid. In this method, the high pressure fluid is brought into collision with the surface of the processing object placed in a high pressure processing chamber, and then distributed along the surface of the processing object in an outward direction beyond the processing object.
摘要翻译：公开了一种用于使处理对象使用高压流体进行高压处理的高压处理方法。在该方法中，使高压流体与放置在高压处理室中的处理对象的表面碰撞，然后沿着处理对象的表面向外方向分布超过处理对象。

4. 发明申请

US20030019578A1 Substrate processing apparatus equipping with high-pressure processing unit 有权
标题翻译：衬底处理设备配备高压处理单元
公开(公告)号：US20030019578A1
公开(公告)日：2003-01-30
申请号：US10201383
申请日：2002-07-23
申请人： Dainippon Screen Mfg. Co., Ltd.
发明人： Tomomi Iwata , Yusuke Muraoka , Kimitsugu Saito , Ikuo Mizobata , Takashi Miyake , Ryuji Kitakado
IPC分类号： C23F001/00
CPC分类号： H01L21/67161 , C03C15/00 , C03C23/0075 , C03C23/0085 , H01L21/67173
摘要： With respect to any one of processing units, a main transportation path, a developing unit, a dedicated transportation robot and a high-pressure processing unit are disposed linearly in this order in a direction. Hence, even if a processing fluid adhering to a substrate or an evaporant of the processing fluid moves toward the main transportation path while the high-pressure processing unit transports the substrate wet with the processing fluid, there are the processing units located which the processing fluid or its evaporant must arrive at before reaching the main transportation path.
摘要翻译：对于处理单元中的任何一个，主传送路径，显影单元，专用传送机器人和高压处理单元在该方向上以该顺序线性地设置。因此，即使附着在处理液的基板或蒸发剂上的处理流体朝着主输送路径移动，而高压处理单元用处理流体输送基板，则存在处理单元，处理流体或其蒸发器必须在到达主要运输路径之前到达。

5. 发明申请

US20040182419A1 High-pressure processing apparatus and high-pressure processing method 失效
标题翻译：高压加工设备及高压加工方法
公开(公告)号：US20040182419A1
公开(公告)日：2004-09-23
申请号：US10772546
申请日：2004-02-05
申请人： Dainippon Screen Mfg. Co., Ltd. , Kabushiki Kaisha Kobe Seiko Sho
发明人： Yusuke Muraoka , Tomomi Iwata , Kimitsugu Saito , Masahiro Yamagata , Hisanori Oshiba , Shogo Sarumaru
IPC分类号： B08B003/00
CPC分类号： B08B7/0021
摘要： A mixing valve assembly 42 is communicated with a dedicated tank 51D, storing therein a compatibilizer D, via an inlet valve 43 and is also communicated with dedicated tanks 51A-51C via three injection valves, the tanks storing therein auxiliaries A-C respectively. A chemical formulation is prepared by selectively injecting any one(s) of four chemical agents into the mixing valve assembly 42 by way of on-off control of the inlet valve 43 and the injection valves and blending together the injected chemical agents. Then, the chemical formulation is pumped into SCF by a high-pressure pump 45 such that the SCF and the chemical formulation are mixed together to form a process fluid. Thus, the number of components of a high-pressure portion can be reduced to achieve a cost reduction of an apparatus. Furthermore, a pipe line for pumping the chemical agents is simplified.
摘要翻译：混合阀组件42与专用罐51D连通，经由入口阀43存储增容器D，并且还经由三个喷射阀与专用罐51A-51C连通，储罐分别存储有辅助件A-C。通过对入口阀43和喷射阀的开关控制并将注射的化学试剂混合在一起，通过选择性地将四种化学试剂中的一种或几种四种化学试剂注入混合阀组件42来制备化学制剂。然后，通过高压泵45将化学制剂泵送到SCF中，使得SCF和化学制剂混合在一起以形成工艺流体。因此，可以减少高压部分的部件的数量，以实现装置的成本降低。此外，简化了用于泵送化学试剂的管线。

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